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31. 发明申请

US20060035745A1 System for producing gearboxes 审中-公开
标题翻译：齿轮箱制造系统
公开(公告)号：US20060035745A1
公开(公告)日：2006-02-16
申请号：US10519667
申请日：2003-05-15
申请人： Manfred Wittenstein , Thomas Bayer
发明人： Manfred Wittenstein , Thomas Bayer
IPC分类号： F16H57/08
CPC分类号： F16H57/033 , F16H1/46 , F16H57/08 , F16H2057/0335
摘要： A system which is used to produce gearboxes and consists of various components (M, AM, A1, A2, A3, Han, Hab, AE). A SP kinematics or TP kinematics gearbox can be produced by mounting a different assembly of the component (Han) and the components (Hab) and (A2).
摘要翻译：一种用于制造齿轮箱并由各种组件（M，A M 1，A 1，A 2，A 2）组成的系统， H 3，H B，H A，A B）。 SP运动学或TP运动学齿轮箱可以通过安装组件（H SUB）和组件（H SUB）和（A 2）的不同组件来生产）。

32. 发明授权

US06942785B2 System for automated treatment of fluids having successive and interchangeable process modules 失效
标题翻译：用于具有连续和可互换的工艺模块的流体的自动处理系统
公开(公告)号：US06942785B2
公开(公告)日：2005-09-13
申请号：US10639427
申请日：2003-08-13
申请人： Thomas Bayer , Klaus-Dieter Fiebelkorn , Axel Gerlt , Joerg Hassel , Richard Mateman , Arno Steckenborn , Jeroen Wissink
发明人： Thomas Bayer , Klaus-Dieter Fiebelkorn , Axel Gerlt , Joerg Hassel , Richard Mateman , Arno Steckenborn , Jeroen Wissink
IPC分类号： B01F13/00 , B01F13/10 , B01J19/00 , B01L9/00 , G01N35/00 , G05B19/05 , B01D17/12
CPC分类号： B01L9/527 , B01F13/0059 , B01F13/1013 , B01F13/1016 , B01F15/00935 , B01J19/0093 , B01J2219/0081 , B01L2200/027 , G01N2035/00326 , G05B19/05 , G05B2219/15074 , G05B2219/25012 , Y10T137/5196 , Y10T137/5283 , Y10T137/8225
摘要： A system for automated treatment of fluids having interchangeable process modules (39, 40, 41, 42, 43), which are arranged next to each other, and which are respectively provided with a control unit and a fluid unit. The fluid unit is controlled by the control unit in order to carry out a module-specific process function during the treatment of the fluids. The control units are interconnected via a data bus (48), which is common to the process modules (39, 40, 41, 42, 43), and the fluid units are interconnected by a fluid bus (49) that has several channels. A fluid bus section is provided for at least one part of the channels inside each process module (e.g., 42). This section has fluid bus interfaces (52) at the ends thereof. A connection unit (51) is configured to be mounted between the respectively adjacent fluid bus interfaces (52) of two successive process modules (e.g., 41, 42) in at least two different mounting positions. The connection unit (51) connects channel sections that terminate at the adjacent fluid bus interfaces (52) of both process modules (41, 42) in a series of different configurations.
摘要翻译：一种用于自动处理流体的系统，具有彼此相邻布置的可互换的处理模块（39,40,41,42,43），并且分别设置有控制单元和流体单元。流体单元由控制单元控制，以便在流体处理期间执行模块特定的过程功能。所述控制单元经由数据总线（48）互连，所述数据总线对于所述过程模块（39,40,41,42,43）是共同的，并且所述流体单元通过具有多个通道的流体总线（49）互连。为每个处理模块（例如42）内的通道的至少一部分提供流体总线部分。本节在其末端具有流体总线接口（52）。连接单元（51）构造成安装在两个连续的过程模块（例如，41,42）的相邻的流体总线接口（52）之间的至少两个不同的安装位置。连接单元（51）以一系列不同的配置连接在两个处理模块（41,42）的相邻的流体总线接口（52）处终止的通道部分。

33. 发明授权

US6091124A Micromechanical sensor for AFM/STM profilometry 失效
标题翻译：用于AFM / STM轮廓测量的微机械传感器
公开(公告)号：US6091124A
公开(公告)日：2000-07-18
申请号：US876167
申请日：1997-06-13
申请人： Thomas Bayer , Johann Greschner , Helga Weiss
发明人： Thomas Bayer , Johann Greschner , Helga Weiss
IPC分类号： G01B7/30 , G01L1/14 , G01N37/00 , G01Q60/16 , G01Q60/38 , G01Q70/10 , G01Q70/14 , G01H23/00
CPC分类号： G01Q60/16 , B82Y35/00 , G01Q60/38 , G01Q70/10 , G01Q70/14 , Y10S977/878
摘要： The invention pertains to a micromechanical sensor for AFM/STM profilometry which consists of a beam with a point for interaction with a test surface to be sampled on one end and a fixing block on the other end. The point consists of a basically conical shank with a countersunk point at the end of the shank. The micromechanical sensor has excellent mechanical rigidity and is particularly suited to the measurement of extremely deep and narrow structures with positive side flank angles.
摘要翻译：本发明涉及用于AFM / STM轮廓测量的微机械传感器，其由具有与待测样品在一端被取样的测试表面相互作用的点和另一端的固定块组成的光束组成。该点包括在柄端部具有埋头点的基本上圆锥形的柄。微机械传感器具有优异的机械刚度，特别适用于具有正侧面角的极深和窄结构的测量。

34. 发明授权

US5716156A Shaft fastening 失效
标题翻译：轴紧固
公开(公告)号：US5716156A
公开(公告)日：1998-02-10
申请号：US765516
申请日：1996-12-30
申请人： Thomas Bayer , Werner Hofmann
发明人： Thomas Bayer , Werner Hofmann
IPC分类号： F16D1/06 , F16D1/072 , F16B11/00
CPC分类号： F16D1/072 , Y10T403/4949 , Y10T403/4966 , Y10T403/7035
摘要： In a shaft fixture in which a toothed and especially knurled region (B) of a shaft (2) is pressed into a drilling (3) in a seat (4) to form a positive fit with great centric precision via two separate centering sections (A, C), the solidity of the fixture is to be increased in that the shaft has a toothed region (D) outside the section to be introduced into a securing drilling. This toothed region may in particular be a pinion (1) which is pressed via a shaped shaft (2) with a hurled region (B) into a seat drilling (3) to provide a positive fit. To this end the end sections of the gaps between the teeth in the pinion region (D) can terminate in the adjacent shaft region (C) so that the diameter of the shaft may be made larger in relation to that of the pinion than if the sections did not so terminate.
摘要翻译： PCT No.PCT / DE96 / 00440 Sec。 371日期1996年12月30日第 102（e）日期1996年12月30日PCT 1996年3月8日PCT公布。出版物WO96 / 35885 日期1996年11月14日在轴固定装置中，其中将轴（2）的带齿且特别滚花的区域（B）压入座（4）中的钻孔（3）中以形成具有高精度中心精度的正配合两个单独的定心部分（A，C），要增加固定装置的坚固性，因为轴具有在引导到固定钻孔中的部分之外的齿形区域（D）。这个齿形区域可以特别地是经由具有倾倒区域（B）的成形轴（2）压入座椅钻孔（3）中以提供正配合的小齿轮（1）。为此，小齿轮区域（D）中的齿之间的间隙的端部部分可以在相邻的轴区域（C）中终止，使得轴的直径可以相对于小齿轮的直径大于如果部分没有这样终止。

35. 发明授权

US5282924A Micromechanical sensor fabrication process 失效
标题翻译：微机械传感器制造工艺
公开(公告)号：US5282924A
公开(公告)日：1994-02-01
申请号：US034639
申请日：1993-03-22
申请人： Thomas Bayer , Johann Greschner
发明人： Thomas Bayer , Johann Greschner
IPC分类号： G01Q70/10 , B44C1/22 , B81C1/00 , C03C15/00 , C23F4/00 , G01B7/34 , G01B21/30 , G01Q60/04 , G01Q60/08 , G01Q60/16 , G01Q60/38 , G01Q70/16 , H01J9/14 , H01J37/00 , H01J37/28 , H01L21/306 , C03C25/06
CPC分类号： G01Q60/38 , B82Y35/00 , G01Q60/04 , G01Q60/08 , G01Q60/16 , Y10S977/878
摘要： A method for producing micromechanical sensors for the AFM/STM/MFM profilometry is described in which a multiple step mask of cantilever beam and tip is transferred step by step into the wafer substrate by reactive ion etching. A particular highly anisotropic etching step is used for etching and shaping of the tip. This process step uses an Ar/C12 ambient at a pressure of about 100 .sup.6 bar and a self bias voltage of about 300 V DC. The ratio of pressure to self bias voltage determines the concave shape of the tip side-walls. This etching step is followed by a thermal oxidation step. The oxidation is carried out for a time until the oxidation fronts at the thinnest point of the tip shaft touch each other. A stripping process with buffered hydrofluoric acid gently removes the thermally grown oxide. The oxidation process allows--via oxidation time--a modification of tip height and angle in an extremely controllable manner. To prevent sticking of the tip to the structure to be profiled the ratio of tip diameter to tip height should be about 1:10. Should this ratio be exceeded the tip has to be arranged on a pedestal. The structure, comprising a cantilever beam and a tip on pedestal, can be produced with the same but slightly modified process of the invention.
摘要翻译：描述了用于AFM / STM / MFM轮廓测量法的微机械传感器的制造方法，其中悬臂梁和尖端的多步骤掩模通过反应离子蚀刻逐步转移到晶片衬底中。特别是高度各向异性的蚀刻步骤用于尖端的蚀刻和成型。该工艺步骤在约100 6bar的压力和约300V DC的自偏压下使用Ar / C12环境。压力与自偏压的比率决定了顶端侧壁的凹形。该蚀刻步骤之后是热氧化步骤。氧化进行一段时间，直到尖端轴的最薄点处的氧化前沿相互接触。用缓冲氢氟酸的汽提过程轻轻地除去热生长的氧化物。氧化过程允许通过氧化时间 - 以极其可控的方式改变尖端高度和角度。为了防止尖端粘附到待成型的结构上，尖端直径与尖端高度的比率应为约1:10。如果超过该比率，则必须将尖端布置在基座上。包括悬臂梁和基座上的尖端的结构可以用本发明的相同但略微改进的方法制造。

36. 发明授权

US5242541A Method of producing ultrafine silicon tips for the AFM/STM profilometry 失效
标题翻译：生产AFM / STM型材超导硅胶的方法
公开(公告)号：US5242541A
公开(公告)日：1993-09-07
申请号：US568451
申请日：1990-08-16
申请人： Thomas Bayer , Johann Greschner , Yves Martin , Helga Weiss , Hemantha K. Wickramasinghe , Olaf Wolter
发明人： Thomas Bayer , Johann Greschner , Yves Martin , Helga Weiss , Hemantha K. Wickramasinghe , Olaf Wolter
IPC分类号： G01B7/34 , G01B21/30 , G01N27/00 , G01Q10/04 , G01Q60/04 , G01Q60/16 , G01Q60/38 , G01Q70/10 , H01J37/28 , H01L21/00 , H01L21/66
CPC分类号： G01Q60/38 , B82Y35/00 , G01Q60/04 , G01Q60/16 , G01Q70/10 , Y10S977/878
摘要： A method is described for producing ultrafine silicon tips for the AFM/STM profilometry comprising:1. providing a silicon substrate and applying a silicon dioxide layer thereto;2. producing a mask in said silicon dioxide layer by photolithography and wet or dry etching;3. producing a tip shaft by transferring the mask pattern, produced in step 2, by reactive ion etching into the silicon substrate;4. thinning the shaft and forming a base by isotropic wet etching; and5. removing the mask by etching.The resulting tip shaft with a rectangular end may be pointed by argon ion milling.In a second embodiment there is an anisotropic wet etching step, prior to step 5, through the intact silicon dioxide mask, producing a negative profile of the shaft immediately below the mask. After this etching step the mask is removed by etching.
摘要翻译：描述了一种用于生产用于AFM / STM轮廓测量法的超细硅尖端的方法，包括：1.提供硅衬底并向其施加二氧化硅层; 2.通过光刻和湿法或干蚀刻在所述二氧化硅层中产生掩模; 3.通过将在步骤2中产生的掩模图案通过反应离子蚀刻转移到硅衬底中来生产尖端轴; 4.通过各向同性湿法蚀刻使轴变薄并形成基座; 和5.通过蚀刻去除掩模。所产生的具有矩形端部的尖端轴可以通过氩离子铣削来尖。在第二实施例中，在步骤5之前，通过完整的二氧化硅掩模存在各向异性湿法蚀刻步骤，从而产生正好在掩模下面的轴的负轮廓。在该蚀刻步骤之后，通过蚀刻除去掩模。

37. 发明授权

US5162133A Process for fabricating silicon carbide films with a predetermined stress 失效
标题翻译：用于制造具有预定应力的碳化硅膜的工艺
公开(公告)号：US5162133A
公开(公告)日：1992-11-10
申请号：US631138
申请日：1990-12-20
申请人： Johann W. Bartha , Thomas Bayer , Johann Greschner , Georg Kraus , Olaf Wolter
发明人： Johann W. Bartha , Thomas Bayer , Johann Greschner , Georg Kraus , Olaf Wolter
IPC分类号： C01B31/36 , C23C16/32 , C23C16/50 , C23C16/52 , G01Q30/12
CPC分类号： C23C16/325
摘要： The present invention relates to a process for fabricating silicon carbide films and membranes with a predetermined stress via control of the deposition parameters which comprises the following steps:a) introducing a gas mixture of silane (SiH.sub.4)/helium and ethylene at flow rates of about 1000 sccm/min. and about 10 sccm/min. into a reaction chamber;b) reacting the silane and ethylene at a temperature >400.degree. C., and in a total pressure range of about 26.6 to 266 Pa, at an RF power
摘要翻译：本发明涉及通过控制沉积参数来制造具有预定应力的碳化硅膜和膜的方法，其包括以下步骤：a）以大约流速引入硅烷（SiH4）/氦和乙烯的气体混合物 1000 sccm / min。和约10sccm / min。进入反应室; b）在温度> 400℃，总压力范围约26.6至266Pa，在13.56MHz的RF功率<100W下使硅烷和乙烯反应，所述硅烷和乙烯之间的反应开始并通过辉光放电增强。在优选的实施方案中，本征薄膜应力是拉伸，硅烷和乙烯在约500℃的温度下，总压力范围超过106.4Pa，在13.56MHz的RF功率为75W下反应。拉伸应力膜可以涂覆有金属吸收层，在吸收层中产生期望的掩模图案，并且从湿蚀刻的背面去除基底。所得的X射线掩模具有光滑的表面，优异的尺寸稳定性和X射线辐射的透明度。

38. 发明授权

US4871418A Process for fabricating arbitrarily shaped through holes in a component 失效
标题翻译：用于在部件中制造任意形状的通孔的工艺
公开(公告)号：US4871418A
公开(公告)日：1989-10-03
申请号：US172736
申请日：1988-03-23
申请人： Jurgen Wittlinger , Johann Greschner , Thomas Bayer , Johann W. Bartha
发明人： Jurgen Wittlinger , Johann Greschner , Thomas Bayer , Johann W. Bartha
IPC分类号： H01L21/302 , B26F1/28 , G03F1/20 , G03F7/00 , G03F7/12 , G03F7/40 , H01L21/3065 , H01L21/48 , H05K1/00 , H05K1/03 , H05K3/00 , H05K3/42
CPC分类号： H05K3/0041 , B26F1/28 , G03F1/20 , G03F7/00 , G03F7/12 , G03F7/40 , H01L21/4803 , H01L21/4807 , H01L21/486 , H01L2924/0002 , H05K1/0326 , H05K1/0393 , H05K2201/0166 , H05K3/42 , Y10S438/928
摘要： According to a preferred embodiment, arbitrarily shaped holes are fabricated in 0.1 to 2 mm thick plates of polyoxymethylene homo- or copolymers. For that purpose, the polymeric substrate is photoresist-coated on either side; the desired pattern is simultaneously applied to both the front and the back side of the photoresist layers by imagewise exposure at optimum mask alignment; the photoresist layers are developed and blanket-exposed; the resultant photoresist structures are treated with a cyclic organosilicon compound and postbaked; the through holes are produced by sequential reactive ion etching of the polyoxymethylene from the front and the back side, each time down to a depth of about 2/3 of the substrate thickness; and the silylated photoresist masks are stripped from the front and the back side of the substrate.
摘要翻译：根据优选实施例，在0.1至2mm厚的聚甲醛均聚物或共聚物板中制造任意形状的孔。为此目的，聚合物基材在任一侧被光致抗蚀剂涂覆; 通过在最佳掩模对准下的图像曝光同时将期望的图案施加到光致抗蚀剂层的前侧和后侧; 光致抗蚀剂层被显影和覆盖曝光; 所得光致抗蚀剂结构用环状有机硅化合物处理并进行后烘; 通孔是从前面和后面依次反应离子蚀刻聚甲醛制成的，每次下降至基片厚度的约2/3的深度; 并且硅烷基化的光致抗蚀剂掩模从基板的前侧和后侧剥离。

39. 发明授权

US09204623B2 Transgenic mouse model expressing amyloid β 4-42 peptide 有权
标题翻译：表达淀粉样蛋白的转基因小鼠模型 4-42肽
公开(公告)号：US09204623B2
公开(公告)日：2015-12-08
申请号：US13702390
申请日：2010-06-08
申请人： Thomas Bayer , Oliver Wirths
发明人： Thomas Bayer , Oliver Wirths
IPC分类号： A01K67/00 , G01N33/00 , A01K67/027 , C07K14/47 , C12N15/85
CPC分类号： A01K67/0278 , A01K67/0275 , A01K2217/052 , A01K2227/105 , A01K2267/0312 , C07K14/4711 , C12N15/8509
摘要： The present invention describes a novel transgenic mouse model for the common sporadic form of Alzheimer's disease. More particularly, the invention relates to a nucleotide sequence encoding Aβ 4-42 in functional linkage with at least a promoter, signal peptide sequence and a polyadenylation signal sequence, a cell and a transgenic non-human animal comprising said nucleotide sequence, and their respective use in screening methods.
摘要翻译：本发明描述了用于常见散发形式的阿尔茨海默氏病的新型转基因小鼠模型。更具体地，本发明涉及编码A＆bgr的核苷酸序列; 4-42，其与至少一种启动子，信号肽序列和多聚腺苷酸化信号序列功能连接，包含所述核苷酸序列的细胞和转基因非人动物，以及它们在筛选方法中的各自用途。

40. 发明授权

US08823227B2 Drive unit having at least one transmission stage 有权
标题翻译：驱动单元具有至少一个传动级
公开(公告)号：US08823227B2
公开(公告)日：2014-09-02
申请号：US12745571
申请日：2008-11-27
申请人： Thomas Bayer
发明人： Thomas Bayer
IPC分类号： H02K7/116 , F16H49/00 , F16H25/06
CPC分类号： F16H25/06 , H02K7/116
摘要： In a drive unit having at least one transmission stage (Ü) and one drive element (4) for driving with high power density, having a drive element (4), and element (8), and an output element (14), wherein a translation and transmission of a drive torque occurs between the drive element (4) and the output element (14) via a plurality of radially movable toothed segments (10), the drive element (4) is to be embodied as an electrical drive for the transmission stage (Ü).
摘要翻译：在具有至少一个传动级（Ü）和用于以高功率密度驱动的驱动元件（4）的驱动单元中，具有驱动元件（4）和元件（8）以及输出元件（14），其中通过多个可径向移动的齿形段（10）在驱动元件（4）和输出元件（14）之间发生驱动扭矩的平移和传递，驱动元件（4）将被实施为电驱动传输阶段（Ü）。

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