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    • 32. 发明申请
    • High throughput wafer notch aligner
    • 高通量晶圆缺口对准器
    • US20080138175A1
    • 2008-06-12
    • US11634697
    • 2006-12-06
    • Robert J. MitchellJoseph Ferrara
    • Robert J. MitchellJoseph Ferrara
    • H01L21/677B65H1/00G06F7/00
    • H01L21/681H01L21/67265H01L21/67745
    • An ion implantation apparatus, system, and method are provided for a transferring a plurality of workpieces between vacuum and atmospheric pressures, wherein an alignment mechanism is operable to align a plurality of workpieces for generally simultaneous transportation to a dual-workpiece load lock chamber. The alignment mechanism comprises a characterization device, an elevator, and two vertically-aligned workpiece supports for supporting two workpieces. First and second atmospheric robots are configured to generally simultaneously transfer two workpieces at a time between load lock modules, the alignment mechanism, and a FOUP. Third and fourth vacuum robots are configured to transfer one workpiece at a time between the load lock modules and a process module.
    • 提供一种用于在真空和大气压之间传送多个工件的离子注入装置,系统和方法,其中对准机构可操作以将多个工件对准,以便大体上同时传送到双工件加载锁定室。 对准机构包括表征装置,电梯和用于支撑两个工件的两个垂直对齐的工件支撑件。 第一和第二大气机器人被配置为一般在负载锁定模块,对准机构和FOUP之间同时传送两个工件。 第三和第四真空机器人被配置为在加载锁模块和处理模块之间一次传送一个工件。
    • 35. 发明申请
    • METHOD OF HEAT TREATING A SUPERALLOY COMPONENT AND AN ALLOY COMPONENT
    • 加热处理超级组件和合金部件的方法
    • US20110198001A1
    • 2011-08-18
    • US13097567
    • 2011-04-29
    • Robert J. MITCHELLDavid U. FURRERJoseph A. LEMSKYMark C. HARDY
    • Robert J. MITCHELLDavid U. FURRERJoseph A. LEMSKYMark C. HARDY
    • C22C19/03C22C14/00
    • C21D1/70C21D1/26C21D9/0068C21D2221/00
    • A method of heat treating a superalloy component includes solution heat treating the component at a temperature below the gamma prime solvus temperature to produce a fine grain structure. Insulation is placed over a first area to form an insulated assembly that is placed in a furnace at a temperature below the solvus temperature and maintained at that temperature for a predetermined time to achieve a uniform temperature. The temperature is increased at a predetermined rate to a temperature above the solvus temperature to maintain a fine grain structure in a first region, produce a coarse grain structure in a second region and produce a transitional structure in a third region between the first and second regions. The insulated assembly is removed from the furnace when the second region has been above the solvus temperature for a predetermined time and/or the first region has reached a predetermined temperature.
    • 热处理超合金部件的方法包括在低于γ'固溶温度的温度下对组分进行固溶热处理以产生细晶粒结构。 将绝缘材料放置在第一区域上以形成绝缘组件,其被放置在低于固溶温度的温度下的炉中,并在该温度下保持预定时间以达到均匀的温度。 将温度以预定的速率增加到高于溶剂温度的温度以保持第一区域中的细晶粒结构,在第二区域中产生粗晶粒结构,并在第一和第二区域之间的第三区域中产生过渡结构 。 当第二区域已经超过固溶温度达预定时间和/或第一区域已经达到预定温度时,将绝热组件从炉中移出。
    • 36. 发明授权
    • High throughput wafer notch aligner
    • 高通量晶圆缺口对准器
    • US07949425B2
    • 2011-05-24
    • US11634697
    • 2006-12-06
    • Robert J. MitchellJoseph Ferrara
    • Robert J. MitchellJoseph Ferrara
    • G07F7/00
    • H01L21/681H01L21/67265H01L21/67745
    • An ion implantation apparatus, system, and method are provided for a transferring a plurality of workpieces between vacuum and atmospheric pressures, wherein an alignment mechanism is operable to align a plurality of workpieces for generally simultaneous transportation to a dual-workpiece load lock chamber. The alignment mechanism comprises a characterization device, an elevator, and two vertically-aligned workpiece supports for supporting two workpieces. First and second atmospheric robots are configured to generally simultaneously transfer two workpieces at a time between load lock modules, the alignment mechanism, and a FOUP. Third and fourth vacuum robots are configured to transfer one workpiece at a time between the load lock modules and a process module.
    • 提供一种用于在真空和大气压之间传送多个工件的离子注入装置,系统和方法,其中对准机构可操作以将多个工件对准,以便大体上同时传送到双工件加载锁定室。 对准机构包括表征装置,电梯和用于支撑两个工件的两个垂直对准的工件支撑件。 第一和第二大气机器人被配置为一般在负载锁定模块,对准机构和FOUP之间同时传送两个工件。 第三和第四真空机器人被配置为在加载锁模块和处理模块之间一次传送一个工件。
    • 39. 发明授权
    • Work-piece treatment system having load lock and buffer
    • 具有加载锁定和缓冲功能的工件处理系统
    • US07010388B2
    • 2006-03-07
    • US10444019
    • 2003-05-22
    • Robert J. MitchellAllan D. WeedRichard Gueler
    • Robert J. MitchellAllan D. WeedRichard Gueler
    • G06F7/00
    • H01L21/67763H01L21/67213H01L21/67745Y10S414/139Y10S414/141
    • A transfer system for use with a tool for treating a work-piece at sub-atmospheric pressure such as an ion implanter for implanting silicon wafers. An enclosure defines a low pressure region for treatment of work-pieces placed at a work-piece treatment station within the low pressure region. Multiple work-piece isolation load locks transfer work-pieces, one or two at a time, from a higher pressure region to the lower pressure for treatment and back to said higher pressure subsequent to said treatment. A first robot transfers work-pieces within the low pressure region from the load locks to a treatment station within the low pressure region. Multiple other robots positioned outside the low pressure region transfers work-pieces to and from the multiple work-piece isolation load locks from a source of said work-pieces prior to treatment and to a destination of said work-pieces after said treatment.
    • 一种用于处理亚大气压下的工件的工具的转移系统,例如用于植入硅晶片的离子注入机。 外壳限定了用于处理放置在低压区域内的工件处理站的工件的低压区域。 多个工件隔离负载锁将工件一次一个或两个从较高压力区域传递到较低压力以进行处理,并在所述处理之后返回到所述较高压力。 第一机器人将低压区域内的工件从负载锁转移到低压区域内的处理站。 定位在低压区域之外的多个其它机器人在处理之前将工件从多个工件隔离负载锁转移到所述工件的源并在所述处理之后传送到所述工件的目的地。
    • 40. 发明授权
    • Adjustable implantation angle workpiece support structure for an ion beam implanter utilizing a linear scan motor
    • 使用线性扫描电机的离子束注入机的可调植入角度工件支撑结构
    • US06740894B1
    • 2004-05-25
    • US10371606
    • 2003-02-21
    • Robert J. Mitchell
    • Robert J. Mitchell
    • H01J37317
    • H01J37/20H01J37/3171H01J2237/202
    • An ion beam implanter includes an ion beam source for generating an ion beam moving along a beam line and a vacuum or implantation chamber wherein a workpiece is positioned to intersect the ion beam for ion implantation of a surface of the workpiece by the ion beam. The ion beam implanter further includes a workpiece support structure coupled to the implantation chamber and supporting the workpiece. The workpiece support structure includes a rotation member rotatably affixed to the implantation chamber. Rotation of the rotation member with respect to the implantation chamber changes an implantation angle of the workpiece with respect to the portion of the ion beam beam line within the implantation chamber. The workpiece support structure further includes a translation member disposed within the implantation chamber, movably coupled to the rotation member and supporting the workpiece for linear movement along a path of travel. The translation member includes a linear motor.
    • 离子束注入机包括用于产生沿着束线移动的离子束的离子束源和真空或注入室,其中工件被定位成与离子束相交,用于通过离子束离子注入工件的表面。 离子束注入机还包括耦合到注入室并支撑工件的工件支撑结构。 工件支撑结构包括可旋转地固定到植入室的旋转构件。 旋转构件相对于注入室的旋转改变了工件相对于植入室内的离子束束线的部分的注入角度。 所述工件支撑结构还包括设置在所述注入室内的平移构件,所述平移构件可移动地联接到所述旋转构件并且支撑所述工件以沿着行进路径线性移动。 平移构件包括线性电动机。