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31. 发明授权

US11841620B2 Method of assembling a facet mirror of an optical system 有权
公开(公告)号：US11841620B2
公开(公告)日：2023-12-12
申请号：US17989477
申请日：2022-11-17
申请人： Carl Zeiss SMT GmbH
发明人： Andreas Königer , Ulrich Müller , Daniel Guhr
IPC分类号： G03F7/00
CPC分类号： G03F7/7055 , G03F7/70075 , G03F7/7085 , G03F7/70116 , G03F7/70975
摘要： A method of assembling a facet mirror of an optical system, in which facets of the facet mirror are imaged onto a field plane of the optical system, includes: a) determining positions of the facets of the facet mirror relative to interfaces of the facet mirror, with the aid of which the facet mirror is able to be connected to a support structure; b) calculating an actual position of an object field of the optical system arising for the facet mirror in the field plane; and c) arranging spacers between the interfaces and the support structure so that the object field in the field plane is brought from the calculated actual position to a target position.

32. 发明授权

US11796926B2 Metrology system for examining objects with EUV measurement light 有权
公开(公告)号：US11796926B2
公开(公告)日：2023-10-24
申请号：US17992034
申请日：2022-11-22
申请人： Carl Zeiss SMT GmbH
发明人： Renzo Capelli , Klaus Gwosch
IPC分类号： G03F7/20 , G03F1/84 , G03F7/00
CPC分类号： G03F7/7085 , G03F1/84 , G03F7/702 , G03F7/70033 , G03F7/70775
摘要： A metrology system serves for examining objects with EUV measurement light. An illumination optical unit serves for guiding the EUV measurement light towards the object to be examined. The illumination optical unit has an illumination optical unit stop for prescribing a measurement light intensity distribution in an illumination pupil in a pupil plane of the illumination optical unit. An output coupling mirror serves for coupling a part of the measurement light out of an illumination beam path of the illumination optical unit. The output coupling mirror has a mirror surface which is used to couple out measurement light and has an aspect ratio of a greatest mirror surface extent A longitudinally with respect to a mirror surface longitudinal dimension (x) to a smallest mirror surface extent B longitudinally with respect to a mirror surface transverse dimension (y) perpendicular to the mirror surface longitudinal dimension (x). The aspect ratio A/B is greater than 1.1. The result is a metrology system in which a measurement light throughput is optimized even in the simulation or emulation of an imaging optical unit of a projection exposure apparatus having an image-side numerical aperture of greater than 0.5 and in particular in the simulation or emulation of an anamorphic imaging optical unit.

33. 发明公开

US20230324649A1 FILTER ASSEMBLY, IN PARTICULAR FOR A CONTROL LOOP FOR CONTROLLING THE POSITION OF AT LEAST ONE ELEMENT 审中-公开
公开(公告)号：US20230324649A1
公开(公告)日：2023-10-12
申请号：US18333808
申请日：2023-06-13
申请人： Carl Zeiss SMT GmbH
发明人： Thomas Gorius
IPC分类号： G02B7/182 , H03H1/00 , G03F7/20
CPC分类号： G02B7/182 , H03H1/00 , G03F7/70258 , G03F7/70825 , G03F7/709 , G03F7/70883
摘要： A filter assembly, for example for a control loop for controlling the position of at least one element, comprises first and second filters. The first filter suppresses an undesired component in a signal to be filtered. The first filter produces a first signal delay in a first frequency range. The second filter produces a second signal delay in the first frequency range. The second signal delay at least partly compensates the first signal delay.

34. 发明授权

US11774859B2 Method and apparatus for evaluating an unknown effect of defects of an element of a photolithography process 有权
公开(公告)号：US11774859B2
公开(公告)日：2023-10-03
申请号：US17087970
申请日：2020-11-03
申请人： Carl Zeiss SMT GmbH
发明人： Alexander Freytag , Christoph Husemann , Dirk Seidel , Carsten Schmidt
IPC分类号： G06N20/00 , G03F7/00 , G06F30/20 , G06N3/08 , G06T7/00 , G06V10/75 , G06V10/774 , G06V20/13
CPC分类号： G03F7/705 , G06F30/20 , G06N3/08 , G06N20/00 , G06T7/001 , G06T7/0006 , G06V10/751 , G06V10/774 , G06V20/13 , G06T2207/10032 , G06T2207/20081 , G06T2207/20084 , G06T2207/30148
摘要： The present invention relates to a method and an apparatus for determining at least one unknown effect of defects of an element of a photolithography process. The method comprises the steps of: (a) providing a model of machine learning for a relationship between an image, design data associated with the image and at least one effect of the defects of the element of the photolithography process arising from the image; (b) training the model of machine learning using a multiplicity of images used for training purposes, design data associated with the images used for training purposes and corresponding effects of the defects; and (c) determining the at least one unknown effect of the defects by applying the trained model to a measured image and the design data associated with the measured image.

35. 发明公开

US20230288260A1 METHOD AND DEVICE FOR DETERMINING THE HEATING STATE OF AN OPTICAL ELEMENT IN AN OPTICAL SYSTEM 审中-公开
公开(公告)号：US20230288260A1
公开(公告)日：2023-09-14
申请号：US18320685
申请日：2023-05-19
申请人： Carl Zeiss SMT GmbH
发明人： Johannes Schurer , Maike Lorenz , Eva Schneider , Vladimir Mitev , Ruediger Mack
IPC分类号： G01J5/02 , G03F7/20 , G02B5/08 , G01J5/80
CPC分类号： G01J5/027 , G01J5/80 , G02B5/08 , G03F7/70358 , G03F7/70891
摘要： A method and a device determine the heating state of an optical element in an optical system, for example in a microlithographic projection exposure system. Electromagnetic radiation hits an incidence surface of the optical element during operation of the optical system. Using a calibration parameter, an average temperature at the incidence surface is estimated on the basis of a temperature measurement carried out via at least one temperature sensor located a distance from the incidence surface. The calibration parameter is selected differently in accordance with the illumination setting which is set in the optical system.

36. 发明授权

US11754934B2 Projection exposure apparatus for semiconductor lithography having an optical element with sensor reference and method for aligning the sensor reference 有权
公开(公告)号：US11754934B2
公开(公告)日：2023-09-12
申请号：US17475168
申请日：2021-09-14
申请人： Carl Zeiss SMT GmbH
发明人： Peter Nieland , Matthias Stepper , Hans-Martin Hoevel
IPC分类号： G03F7/20 , G03F7/00
CPC分类号： G03F7/70833 , G03F7/70258 , G03F7/70825
摘要： A semiconductor lithography projection exposure apparatus includes a sensor reference including reference elements. The apparatus also includes an optical element, which includes a main body comprising receiving elements receiving the reference elements. The optical element further includes a referential surface that is an optically active surface of the optical element. The reference elements are arranged to determine a position and an orientation of the optical element. A method includes aligning a sensor reference with respect to a referential surface in a semiconductor lithography projection exposure apparatus.

37. 发明公开

US20230251285A1 DEVICE AND METHOD FOR OPERATING A BENDING BEAM IN A CLOSED CONTROL LOOP 审中-公开
公开(公告)号：US20230251285A1
公开(公告)日：2023-08-10
申请号：US18128690
申请日：2023-03-30
申请人： Carl Zeiss SMT GmbH
发明人： Christof Baur , Florian Demski
IPC分类号： G01Q30/04 , G01Q10/06
CPC分类号： G01Q30/04 , G01Q10/065
摘要： The present invention relates to a device for operating at least one bending beam in at least one closed control loop, wherein the device has: (a) at least one first interface designed to receive at least one controlled variable of the at least one control loop; (b) at least one programmable logic circuit designed to process a control error of the at least one control loop using a bit depth greater than the bit depth of the controlled variable; and (c) at least one second interface designed to provide a manipulated variable of the at least one control loop.

38. 发明公开

US20230236516A1 SUPPORT FOR AN OPTICAL ELEMENT 审中-公开
公开(公告)号：US20230236516A1
公开(公告)日：2023-07-27
申请号：US18296186
申请日：2023-04-05
申请人： Carl Zeiss SMT GmbH
发明人： Toralf Gruner , Joachim Hartjes
IPC分类号： G03F7/00
CPC分类号： G03F7/70725 , G03F7/70825 , G03F7/70758
摘要： An optical assembly of a microlithography imaging device comprises a holding device for holding an optical element. The holding device has a holding element having first and second interface sections. The first interface section for a first interface connecting the holding element and the optical element in an installed state. The second interface section forms a second interface connecting the holding element and a support unit in the installed state. The support unit connects the optical element to a support structure to support the optical element on the support structure via a supporting force. The holding device comprises an actuator device engaging on the holding element between the first and second interfaces. The actuator device acts on the holding element via a controller so that a specifiable interface deformation and/or a specifiable interface force distribution acting on the optical element is set on the first interface.

39. 发明公开

US20230221571A1 OPTICAL SYSTEM, IN PARTICULAR FOR CHARACTERIZING A MICROLITHOGRAPHY MASK 审中-公开
公开(公告)号：US20230221571A1
公开(公告)日：2023-07-13
申请号：US18095175
申请日：2023-01-10
申请人： Carl Zeiss SMT GmbH
发明人： Ulrich Matejka , Sascha Perlitz , Johannes Ruoff
IPC分类号： G02B27/14 , G03F7/20
CPC分类号： G02B27/142 , G03F7/70133
摘要： The invention relates to an optical system and, in particular for characterizing a microlithography mask, comprising a light source for generating light of a wavelength of less than 30 nm, an illumination beam path leading from the light source to an object plane, an imaging beam path leading from the object plane to an image plane and a beam splitter, via which both the illumination beam path and the imaging beam path run.

40. 发明公开

US20230205090A1 REFLECTIVE OPTICAL ELEMENT, ILLUMINATION OPTICAL UNIT, PROJECTION EXPOSURE APPARATUS, AND METHOD FOR PRODUCING A PROTECTIVE LAYER 审中-公开
公开(公告)号：US20230205090A1
公开(公告)日：2023-06-29
申请号：US18171449
申请日：2023-02-20
申请人： Carl Zeiss SMT GmbH
发明人： Sandro HOFFMANN , Valentin Jonatan BOLSINGER , Sandra HASCHKE
IPC分类号： G03F7/20
CPC分类号： G03F7/2008 , G03F7/70958 , G03F7/70983
摘要： A reflective optical element (17), in particular for an illumination optical unit of a projection exposure apparatus includes: a structured surface (25a) that preferably forms a grating structure (29), and a reflective coating (36) that is applied to the structured surface (25a). The reflective coating (36) covers the structured surface (25a) discontinuously, and the reflective optical element (17) has at least one protective layer (37) that covers the structured surface (25a) continuously. Also disclosed are an illumination optical unit (4) for a projection exposure apparatus (1) including at least one reflective optical element (17) of this type, to a projection exposure apparatus (1) including an illumination optical unit (4) of this type, and to a method for producing a protective layer (37) on a reflective optical element (17) of this type.

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