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    • 26. 发明授权
    • Nanoimprint lithograph for fabricating nanoadhesive
    • 用于制造纳米粘合剂的纳米印刷版画
    • US07449123B2
    • 2008-11-11
    • US11265096
    • 2005-11-03
    • Chih-Yu ChaoWen-Jiunn Hsieh
    • Chih-Yu ChaoWen-Jiunn Hsieh
    • C03C25/68B44C1/22
    • B29C43/021B29C43/003B29C43/06B29C2043/025B29C2043/463B82Y10/00B82Y40/00G03F7/0002
    • A nanoimprint lithography method of fabricating a nanoadhesive includes steps of (a) preparing a substrate and a transfer stamp, said transfer stamp having a transfer face and nanometer-scale features formed on said transfer face, said nanometer-scale features having a plurality of convexities and concavities, said substrate having an etched layer; (b) proceeding a staining process to enable either of said convexities and concavities to be stained with a photoresist; (c) proceeding a transfer process to enable said nanometer-scale features to touch said etched layer to transfer said photoresist onto said etched layer; and (d) proceeding an etching process to enable parts of said etched layer that are not stained with the photoresist to be each etched for a predetermined depth. As the steps indicated above, the nanoadhesive can be produced with mass production and low cost.
    • 制造纳米粘合剂的纳米压印光刻方法包括以下步骤:(a)制备基材和转印印模,所述转印印模具有形成在所述转印面上的转印面和纳米级特征,所述纳米级特征具有多个凸面 和凹面,所述衬底具有蚀刻层; (b)进行染色过程以使所述凸起和凹陷中的任一个能够被光致抗蚀剂染色; (c)进行转移过程以使所述纳米级特征能够接触所述蚀刻层以将所述光致抗蚀剂转移到所述蚀刻层上; 和(d)进行蚀刻工艺,以使得不被光致抗蚀剂污染的所述蚀刻层的部分被蚀刻达预定深度。 如上所述,纳米粘合剂可以批量生产和低成本生产。