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    • 23. 发明授权
    • Method for producing organic thin film by using film physical property improving process
    • 通过使用膜物理性能改进工艺制造有机薄膜的方法
    • US08133546B2
    • 2012-03-13
    • US12309801
    • 2007-07-31
    • Kazuhisa Kumazawa
    • Kazuhisa Kumazawa
    • B05D7/24B05D3/02B05D3/10
    • B05D3/0254B01J10/02B05D1/185B05D3/0473B82Y30/00B82Y40/00
    • A method is provided for producing an organic thin film on a substrate surface comprising improved heat resistance or durability; said method comprising at least a step (B) of allowing the substrate to contact with an organic solvent solution comprising a metal surfactant having at least one or more hydrolysable group or hydroxyl group, and a catalyst that can interact with the metal surfactant, wherein the method further comprises after step (B), step (E1) of heating the substrate which has been in contact with the organic solvent solution at 100° C. to 150° C.; step (E2) of immersing the substrate which has been in contact with the organic solvent solution in a warm water of 40° C. or more and less than the boiling point; or step (E3) of allowing the substrate which has been in contact with the organic solvent solution to contact with a moisture vapor of 60° C. to 150° C.
    • 提供一种用于在衬底表面上生产有机薄膜的方法,其包括改进的耐热性或耐久性; 所述方法至少包括使基材与包含具有至少一个或多个可水解基团或羟基的金属表面活性剂的有机溶剂溶液和可与金属表面活性剂相互作用的催化剂接触的步骤(B),其中 方法还包括在步骤(B)之后,在100℃至150℃下加热已经与有机溶剂溶液接触的基材的步骤(E1); 将与有机溶剂溶液接触的基板浸入温度为40℃以上且小于沸点的步骤(E2); 或使已经与有机溶剂溶液接触的基板与60℃至150℃的湿气接触的步骤(E3)