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    • 22. 发明授权
    • Semiconductor integrated circuit and semiconductor integrated circuit apparatus
    • 半导体集成电路和半导体集成电路设备
    • US09087714B2
    • 2015-07-21
    • US13223356
    • 2011-09-01
    • Yuuichi Ueda
    • Yuuichi Ueda
    • H01L27/088H01L21/8234
    • H01L27/088H01L21/823418H01L21/823425
    • A semiconductor integrated circuit includes a substrate of a first conductivity type, and a first MOS transistor and a second MOS transistor both formed in the substrate. The first MOS transistor includes first drain and first source regions as first active regions of a second conductivity type; a second active region of the first conductivity type; a first gate electrode disposed between the first drain and source regions; and a first substrate electrode connected to the second active region. The second MOS transistor includes a second drain region and a second source region which are formed between the first source region and the second active region, such that the first source region is proximate to the second drain region. The first substrate electrode is electrically separated from the first drain and source electrodes, and the second MOS transistor is connected between the first substrate electrode and the first source electrode.
    • 半导体集成电路包括第一导电类型的衬底,以及形成在衬底中的第一MOS晶体管和第二MOS晶体管。 第一MOS晶体管包括第一漏极和第一源极区域作为第二导电类型的第一有源区域; 第一导电类型的第二有源区; 设置在所述第一漏极和源极区域之间的第一栅电极; 以及连接到第二有源区的第一衬底电极。 第二MOS晶体管包括形成在第一源极区域和第二有源区域之间的第二漏极区域和第二源极区域,使得第一源极区域接近第二漏极区域。 第一基板电极与第一漏极和源极电气分离,并且第二MOS晶体管连接在第一基板电极和第一源极电极之间。