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21. 发明申请

US20110273611A1 Single-Focus Optical System, Image Pickup Device, and Digital Apparatus 有权
标题翻译：单焦点光学系统，图像拾取装置和数字装置
公开(公告)号：US20110273611A1
公开(公告)日：2011-11-10
申请号：US13145338
申请日：2010-08-25
申请人： Keiji Matsusaka , Taizo Wakimura , Masashi Isono , Eigo Sano , Keiko Yamada , Hiroaki Tanaka
发明人： Keiji Matsusaka , Taizo Wakimura , Masashi Isono , Eigo Sano , Keiko Yamada , Hiroaki Tanaka
IPC分类号： H04N5/232 , G02B13/18
CPC分类号： G02B13/0045
摘要： Provided is a single-focus optical system which is configured, in order from the object side to the image side, of a first to third lens groups and in which the first lens group and the third lens group are fixed with respect to a predetermined imaging surface, and the second lens group is moved in the optical axis direction to focus, wherein the first lens group comprises at least one positive lens and at least one negative lens, the second lens group comprises at least one positive lens, the third lens group comprises at least one lens having at least one aspheric surface and having a positive optical power at a peripheral portion thereof, and 5
摘要翻译：提供了从物体侧到图像侧依次配置第一至第三透镜组的单焦点光学系统，其中第一透镜组和第三透镜组相对于预定成像被固定表面，并且第二透镜组沿光轴方向移动以进行聚焦，其中第一透镜组包括至少一个正透镜和至少一个负透镜，第二透镜组包括至少一个正透镜，第三透镜组包括至少一个透镜，其具有至少一个非球面并且在其周边部分具有正光焦度，并且满足＆lt; | | Dgr | v1 | <70，其中＆Dgr; v1是最大值之间的阿贝数差正透镜和第一透镜组中的负透镜。

22. 发明授权

US07965454B2 Imaging lens and small-size image pickup apparatus using the same 有权
标题翻译：成像透镜和使用其的小尺寸图像拾取装置
公开(公告)号：US07965454B2
公开(公告)日：2011-06-21
申请号：US12546459
申请日：2009-08-24
申请人： Hiroaki Tanaka , Masashi Isono
发明人： Hiroaki Tanaka , Masashi Isono
IPC分类号： G02B9/00 , G02B27/64
CPC分类号： G02B13/0045 , G02B9/60
摘要： There are provided an imaging lens, which is capable of promoting high definition and miniaturization of a small-size image pickup apparatus, and the small-size image pickup apparatus using the same. A aperture diaphragm S is arranged between a first lens L1 and a second lens L2 so that the first lens L1 is configured to be displaced into the orthogonal direction to the optical axis. Even when an error sensitivity of a lens is large, a stable high resolution can be secured by performing a lens alignment by displacing the first lens L1 into the orthogonal direction to the optical axis at the time of assembling, and thereby a high definition image can be obtained.
摘要翻译：提供了能够促进小尺寸图像拾取装置的高清晰度和小型化以及使用其的小尺寸图像拾取装置的成像透镜。在第一透镜L1和第二透镜L2之间设置孔径光阑S，使得第一透镜L1被配置为向与光轴正交的方向移位。即使当透镜的误差灵敏度大时，通过在组装时将第一透镜L1移位到与光轴正交的方向上执行透镜对准，可以确保稳定的高分辨率，从而高分辨率图像可以得到。

23. 发明授权

US07753974B2 Polishing composition for semiconductor wafer, method for production thereof and polishing method 失效
标题翻译：半导体晶片抛光组合物及其制造方法及研磨方法
公开(公告)号：US07753974B2
公开(公告)日：2010-07-13
申请号：US12153111
申请日：2008-05-14
申请人： Shinsuke Miyabe , Kuniaki Maejima , Masahiro Izumi , Hiroaki Tanaka
发明人： Shinsuke Miyabe , Kuniaki Maejima , Masahiro Izumi , Hiroaki Tanaka
IPC分类号： B24D3/02 , C09C1/68 , C09C1/02 , C09K3/14 , H01L21/302
CPC分类号： H01L21/3212 , C09G1/02
摘要： The present invention relates to a polishing composition for a substrate including a metal such as wiring, etc., formed on a semiconductor wafer, which can provide a high polishing rate without causing scratches on the wiring metal, a method of producing the polishing composition, and a polishing method. The polishing composition for a semiconductor wafer comprises an acid and an aqueous medium dispersion containing positively-charged silica particles having an amino group-containing silane coupling agent bonded on a surface thereof, the polishing composition having a pH of 2 to 6.
摘要翻译：本发明涉及一种用于基板的抛光组合物，其包括形成在半导体晶片上的诸如布线等的金属，其能够提供高的抛光速率而不会在布线金属上产生划痕，制造抛光组合物的方法，和抛光方法。用于半导体晶片的抛光组合物包括酸和包含在其表面上结合有含氨基的硅烷偶联剂的带正电荷的二氧化硅颗粒的水性介质分散体，该抛光组合物的pH为2至6。

24. 发明申请

US20100163786A1 Polishing composition for semiconductor wafer 审中-公开
标题翻译：半导体晶圆抛光组合物
公开(公告)号：US20100163786A1
公开(公告)日：2010-07-01
申请号：US12653683
申请日：2009-12-17
申请人： Masahiro Izumi , Masaru Nakajo , Yukiyo Saito , Kuniaki Maejima , Hiroaki Tanaka
发明人： Masahiro Izumi , Masaru Nakajo , Yukiyo Saito , Kuniaki Maejima , Hiroaki Tanaka
IPC分类号： C09K13/00
CPC分类号： C09K3/1463 , C09G1/02 , H01L21/02024
摘要： A polishing composition for semiconductor wafer polishing comprising, colloidal silica prepared from an active silicic acid aqueous solution obtained by removal of alkali from alkali silicate and at least one nitrogen containing basic compound selected from a group consisting of ethylenediamine, diethylenediamine, imidazole, methylimidazole, piperidine, morpholine, arginine, and hydrazine, wherein pH of the colloidal silica is of 8.5 to 11.0 at 25° C. by containing quaternary ammonium hydroxide.
摘要翻译：一种用于半导体晶片抛光的抛光组合物，其包括由通过从碱金属硅酸盐除去碱而获得的活性硅酸水溶液制备的胶体二氧化硅和至少一种选自乙二胺，二乙二胺，咪唑，甲基咪唑，哌啶，吗啉，精氨酸和肼，其中胶体二氧化硅的pH在25℃下为8.5〜11.0，含有氢氧化季铵。

25. 发明申请

US20100025725A1 SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCTION THEREOF 审中-公开
标题翻译：半导体器件及其制造方法
公开(公告)号：US20100025725A1
公开(公告)日：2010-02-04
申请号：US12514637
申请日：2007-11-13
申请人： Hiroaki Tanaka
发明人： Hiroaki Tanaka
IPC分类号： H01L29/739 , H01L21/331
CPC分类号： H01L29/7397 , H01L29/1095 , H01L29/66348
摘要： A semiconductor device has a drift region (20) (third semiconductor region) of an n-type (first conductivity type); a body region (50) (second semiconductor region) of a p-type (second conductivity type) provided on the drift region (20); an emitter region (60) (first semiconductor region) of the n-type formed in the top surface of the body region (50) and separated from the drift region (20) by the body region (50); a trench (14) extending from the top surface of the emitter region (60) through the body region (50) into the drift region (20); a trench gate electrode (13) filled in the trench (14); and a semiconductor region (70) (fourth semiconductor region) of the p-type formed in contact with side faces of the trench protruding into the drift region (20). Therefore, the semiconductor device can suppress a surge voltage at turn-off, and can be produced easily.
摘要翻译：半导体器件具有n型（第一导电型）的漂移区域（20）（第三半导体区域）; 设置在漂移区域（20）上的p型（第二导电型）的体区（50）（第二半导体区域）; 所述n型的发射极区域（60）（第一半导体区域）形成在所述主体区域（50）的顶表面中并且通过所述主体区域（50）与所述漂移区域（20）分离。从所述发射极区域（60）的顶表面延伸通过所述体区（50）延伸到所述漂移区域（20）中的沟槽（14）。填充在沟槽（14）中的沟槽栅电极（13）; 以及形成为与突出到漂移区域（20）中的沟槽的侧面接触的p型半导体区域（第四半导体区域）（第四半导体区域）。因此，半导体装置能够抑制关断时的浪涌电压，能够容易地制造。

26. 发明授权

US07626671B2 LCD device having scanning lines and common lines 有权
公开(公告)号：US07626671B2
公开(公告)日：2009-12-01
申请号：US11152422
申请日：2005-06-14
申请人： Shigeru Kimura , Hiroaki Tanaka , Akira Fujita , Kiyofumi Kudou , Takahiko Watanabe , Hiroyuki Uchida , Akitoshi Maeda
发明人： Shigeru Kimura , Hiroaki Tanaka , Akira Fujita , Kiyofumi Kudou , Takahiko Watanabe , Hiroyuki Uchida , Akitoshi Maeda
IPC分类号： G02F1/1345
CPC分类号： G02F1/134363 , G02F1/1345
摘要： An active matrix LCD device includes a TFT panel, a counter panel and liquid crystal interposed therebetween. The TFT panel includes a plurality of scanning lines and a plurality of common lines formed in one layer and extending in a row direction, and a plurality of signal lines extending in a column direction. A coupling line for coupling the common lines together is disposed outside the pixel array of the TFT panel, such as in a TCP mounted on the TFT panel and mounting thereon a driver IC for driving the scanning lines.

27. 发明申请

US20080311750A1 Polishing composition for semiconductor wafer and polishing method 失效
标题翻译：半导体晶圆抛光组合物及抛光方法
公开(公告)号：US20080311750A1
公开(公告)日：2008-12-18
申请号：US12081829
申请日：2008-04-22
申请人： Masahiro Izumi , Shinsuke Miyabe , Kuniaki Maejima , Hiroaki Tanaka
发明人： Masahiro Izumi , Shinsuke Miyabe , Kuniaki Maejima , Hiroaki Tanaka
IPC分类号： H01L21/304 , B24B1/00 , C09K3/14
CPC分类号： H01L21/02024 , B24B37/044 , C09K3/1409 , C09K3/1463
摘要： The present invention relates to a polishing composition for a semiconductor wafer which is excellent in polishing property, and a polishing method. The polishing composition for a semiconductor wafer comprises colloidal silica consisting of non-spherical silica particles having a ratio of long axis to short axis of 1.5 to 15. The polishing method for a semiconductor wafer uses the polishing composition. The polishing composition can provide a remarkably high polishing rate compared with a polishing composition using spherical colloidal silica, and can provide good mirror-polishing without causing scratches. In addition, small alkali metal content enables reduction of adverse effects on a semiconductor wafer, such as residual abrasives after polishing.
摘要翻译：本发明涉及抛光性优异的半导体晶片用研磨用组合物及研磨方法。用于半导体晶片的抛光组合物包括由长轴与短轴的比率为1.5至15的非球形二氧化硅颗粒组成的胶体二氧化硅。半导体晶片的抛光方法使用抛光组合物。抛光组合物与使用球形胶体二氧化硅的抛光组合物相比可以提供非常高的抛光速率，并且可以提供良好的镜面抛光而不会产生划痕。此外，小的碱金属含量可以减少半导体晶片的不利影响，例如抛光后的残留磨料。

28. 发明申请

US20080124415A1 Fat Combustion Accelerator 审中-公开
标题翻译：燃烧加速器
公开(公告)号：US20080124415A1
公开(公告)日：2008-05-29
申请号：US11630126
申请日：2005-06-29
申请人： Hiroaki Tanaka , Yoshinobu Kiso , Taeko Iino
发明人： Hiroaki Tanaka , Yoshinobu Kiso , Taeko Iino
IPC分类号： A61K36/15 , A61P3/04
CPC分类号： A61K31/352 , A23F3/163 , A23L33/105 , A61K31/353
摘要： The present invention provides a novel fat combustion accelerator which can promote lipid metabolism without changing the total consumption calories, characterized in that said fat combustion accelerator comprises proanthocyanidin as an active ingredient.
摘要翻译：本发明提供了一种能够促进脂质代谢而不改变总消耗卡路里的新型脂肪燃烧促进剂，其特征在于所述脂肪燃烧促进剂包含原花色素作为活性成分。

29. 发明授权

US07285631B2 Human cDNAs and proteins and uses thereof 失效
标题翻译：人类cDNA和蛋白质及其用途
公开(公告)号：US07285631B2
公开(公告)日：2007-10-23
申请号：US10485231
申请日：2001-10-15
申请人： Stephane Bejanin , Hiroaki Tanaka
发明人： Stephane Bejanin , Hiroaki Tanaka
IPC分类号： C07K14/435
CPC分类号： G01N33/50 , A61K38/00 , C07K14/47 , G01N33/5005 , G01N33/5008 , G01N33/502 , G01N33/68 , G01N33/6845 , G01N2500/00 , Y10T436/143333
摘要： The invention concerns GENSET polynucleotides and polypeptides. Such GENSET products may be used as reagents in forensic analyses, as chromosome markers, as tissue/cell/organelle-specific markers, in the production of expression vectors. In addition, they may be used in screening and diagnosis assays for abnormal GENSET expression and/or biological activity and for screening compounds that may be used in the treatment of GENSET-related disorders.
摘要翻译：本发明涉及GENSET多核苷酸和多肽。在产生表达载体中，这种GENSET产品可用作法医分析中的试剂，作为染色体标记物，作为组织/细胞/细胞器特异性标志物。此外，它们可用于异常GENSET表达和/或生物活性的筛选和诊断测定，并用于筛选可用于治疗GENSET相关疾病的化合物。

30. 发明申请

US20070099853A1 Agent for improving physiological motor functions 审中-公开
标题翻译：改善生理运动功能的药剂
公开(公告)号：US20070099853A1
公开(公告)日：2007-05-03
申请号：US10561171
申请日：2004-05-14
申请人： Taeko Iino , Hiroaki Tanaka , Keisuke Sawaki , Natsue Koikawa , Yoshinobu Kiso
发明人： Taeko Iino , Hiroaki Tanaka , Keisuke Sawaki , Natsue Koikawa , Yoshinobu Kiso
IPC分类号： A61K31/7048 , A61K31/353
CPC分类号： A61K31/352 , A23L33/105
摘要： The present invention provides an agent for improving physiological motor functions which is characterized in containing proanthocyanidin as an effective ingredient. It is useful as an agent for preventing and improving the fatigue in which rise in lactic cid value upon physical exercise is suppressed whereby muscular fatigue is reduced and continuous exercise is made easy, and particularly as an agent for prevention and improvement of muscular fatigue, and as a health food for prevention and improvement of fatigue.
摘要翻译：本发明提供一种改善生理运动功能的药剂，其特征在于含有原花色素作为有效成分。作为用于预防和改善体育锻炼时乳酸值上升被抑制从而减轻肌肉疲劳并使连续运动变得容易的疲劳的作用剂，特别是作为预防和改善肌肉疲劳的药剂是有用的，以及作为预防和改善疲劳的保健食品。

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