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    • 21. 发明授权
    • Pellicle for lithography and a method for making the same
    • 光刻用薄膜及其制造方法
    • US08273507B2
    • 2012-09-25
    • US12926481
    • 2010-11-22
    • Yoshihiko Nagata
    • Yoshihiko Nagata
    • G03F1/64G03F1/62A47G1/12
    • G03F1/64Y10T83/0207
    • There is provided a pellicle in which the frame is chamfered along all of its horizontal edges (as viewed when the pellicle frame is laid flat), and in particular those edges of the frame where the membrane-bonding frame face meets the external side walls of the frame are chamfered to the extent of C:0.01 mm-C:0.12 mm; in relation to this chamfer, a method is also provided wherein, after attaching a preformed pellicle membrane to the membrane-bonding frame face, the excessive part of the preformed membrane which extends beyond outer edges of the frame face is cut off in a manner wherein a blade of a knife is caused to scour the chamfer over the membrane in a manner such that the knife blade is kept in such an angle that the blade gets in a face-to-face contact with the chamfer face or that the blade touches only that edge of the frame where the chamfer face meets the first frame face while the knife blade is moved along the chamfered edge of the frame.
    • 提供防护薄膜组件,其中框架沿着其所有水平边缘(当防护薄膜框架平放时观察)被倒角,并且特别是框架粘合框架面与框架的外侧壁相交的框架的边缘 框架倒角至C:0.01 mm-C:0.12 mm; 关于该倒角,还提供了一种方法,其中在将预成型防护薄膜组件附接到膜粘合框架面之后,预先形成的膜的超过框架表面的外边缘的部分被切断,其中 使刮刀刀片以这样的方式冲洗膜上的倒角,使得刀片保持如此角度,使得刀片与倒角面面对面接触或者刀片仅接触 当刀片沿着框架的倒角边缘移动时,倒角面与第一框架面相交的框架边缘。
    • 22. 发明授权
    • Pellicle for photolithography and pellicle frame
    • 用于光刻和防护薄膜框架的防护薄膜
    • US07927763B2
    • 2011-04-19
    • US11311413
    • 2005-12-20
    • Yoshihiko Nagata
    • Yoshihiko Nagata
    • G03F1/00
    • C22C21/06C22C21/10G03F7/70983Y10T428/13Y10T428/24273
    • There is disclosed a pellicle 1 for photolithography comprising, a pellicle frame 2 for constituting a pellicle for photolithography, wherein the frame is made of an aluminum alloy whose surface is anodized, and each content of sulfate ion, nitrate ion, chlorine ion, and organic acid (total of oxalic acid, formic acid, and acetic acid) is 1.1 ppm or less in elution concentration after immersed in 100 ml of pure water at 25° C. for 168 hours, per 100 cm2 of a surface area of the frame, and a pellicle film 3 that is adhered to one end face of the frame. Thereby, there can be provided a pellicle that can effectively prevent haze from being generated on a mask substrate even in a photolithography process with a wavelength being shorter.
    • 公开了一种用于光刻的防护薄膜1,其包括用于构成光刻用防护薄膜组件的防护薄膜组件框架2,其中所述框架由表面阳极氧化的铝合金制成,并且硫酸根离子,硝酸根离子,氯离子和有机物的含量 酸(总计草酸,甲酸和乙酸)在浸入100毫升纯水中的溶液浓度为1.1ppm或更少,在25℃静置168小时,每100cm 2的框架表面积, 以及附着在框架的一个端面上的防护薄膜3。 由此,即使在波长短的光刻工序中也能够提供能够有效地防止在掩模基板上产生雾度的防护薄膜组件。
    • 25. 发明申请
    • Balance training device
    • 平衡训练装置
    • US20060229159A1
    • 2006-10-12
    • US10525919
    • 2003-08-27
    • Yoshihiko NagataOsamu Fukuda
    • Yoshihiko NagataOsamu Fukuda
    • A63B15/02A63B21/00
    • A63B26/003A63B22/16
    • The present invention realizes a balance training device usable for training a capability of balancing with a user carried thereon in a standing posture or a sitting posture without the need for any complicated linkage mechanism, said device comprising: a plate (1) for carrying a user; a motor (2) for driving said plate; a sensor (3) for measuring a rotation angle of said plate; a torque measuring mechanism (including a pair of force plates 41) for measuring a torque applied to said plate; a kinetic model analyzer (5) for determining a target rotation angle for said plate (1) from said measured torque; and a motor controller (6) for controlling said motor in accordance with a predetermined kinetic model.
    • 本发明实现了一种平衡训练装置,其可用于训练与站立姿势或坐姿下携带的用户平衡的能力,而不需要任何复杂的连动机构,所述装置包括:用于携带用户的板(1) ; 用于驱动所述板的马达(2); 用于测量所述板的旋转角度的传感器(3); 用于测量施加到所述板的扭矩的扭矩测量机构(包括一对力板41) 用于根据所述测量的扭矩确定所述板(1)的目标旋转角度的动力学模型分析器(5) 以及用于根据预定动力学模型控制所述马达的马达控制器(6)。
    • 26. 发明授权
    • Method, apparatus, and system for inspecting transparent objects
    • 用于检查透明物体的方法,装置和系统
    • US06396579B1
    • 2002-05-28
    • US09036967
    • 1998-03-09
    • Mitsuru HayamizuYoshihiko Nagata
    • Mitsuru HayamizuYoshihiko Nagata
    • G01N2100
    • G01N21/958
    • In an inspection method for a transparent object, a transparent object is irradiated with light from a light source, and the surface or interior of the transparent object is inspected by observing transmitted light on the side of the transparent object that is opposite to the light source. An inspection apparatus for a transparent object includes a transparent-object-moving unit, an irradiation unit, and a detection unit. The transparent-object-moving unit moves a transparent object to an inspection position and fixes the transparent object in the inspection position. The irradiation unit emits light from a light source disposed on one side of the transparent object so as to irradiate light onto the transparent object fixed in the inspection position by the transparent-object-moving unit. The detection unit is located on the side of the transparent object opposite the light source and has a detector for detecting light that has been emitted from the light source and has passed through the transparent object. The inspection method and the inspection apparatus realize improved inspection accuracy and inspection efficiency.
    • 在透明物体的检查方法中,用来自光源的光照射透明物体,通过观察与光源相反的透明物体一侧的透射光来检查透明物体的表面或内部 。 用于透明物体的检查装置包括透明物体移动单元,照射单元和检测单元。 透明物体移动单元将透明物体移动到检查位置,并将透明物体固定在检查位置。 照射单元从设置在透明物体的一侧的光源发射光,以便通过透明物体移动单元将光照射到固定在检查位置的透明物体上。 检测单元位于与光源相对的透明物体的一侧,并且具有用于检测从光源发射并已经透过透明物体的光的检测器。 检验方法和检验设备提高了检测精度和检验效率。