专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明授权

US4797321A Magnetic recording medium 失效
标题翻译：磁记录介质
公开(公告)号：US4797321A
公开(公告)日：1989-01-10
申请号：US918973
申请日：1986-10-15
申请人： Masaya Funahashi , Teruhisa Miyata , Kenichi Inoue , Akira Miyake , Kohji Norimatsu
发明人： Masaya Funahashi , Teruhisa Miyata , Kenichi Inoue , Akira Miyake , Kohji Norimatsu
IPC分类号： C09D5/23 , G11B5/708 , G11B5/71 , G11B5/82 , G11B5/70
CPC分类号： G11B5/71 , G11B5/7085 , Y10S428/90 , Y10T428/256 , Y10T428/257 , Y10T428/259 , Y10T428/265
摘要： A magnetic recording disc having a high durability and good electromagnetic conversion characteristics which comprises a non-magnetic support and a magnetic layer provided on at least one surface of the support, wherein the magnetic layer comprises magnetic powder, a resinous binder, polishing particles and a lubricating agent, characterized in that the polishing particles have a Mohs' scale of hardness of not less than 7 and an average particle size of 0.25 r to 0.75 r (r being the thickness (.mu.m) of the magnetic layer) and the lubricating agent is a fatty acid ester having a melting point of not higher than 10.degree. C.
摘要翻译：一种具有高耐久性和良好的电磁转换特性的磁记录盘，包括设置在载体的至少一个表面上的非磁性载体和磁性层，其中磁性层包括磁性粉末，树脂粘合剂，抛光颗粒和润滑剂，其特征在于，研磨粒子的莫氏硬度为7以上，平均粒径为0.25〜0.75r（r为磁性层的厚度），润滑剂是熔点不高于10℃的脂肪酸酯。

22. 发明授权

US4520521A Process of manufacturing a sleeve and wedge for an anchor bolt 失效
标题翻译：制造用于锚栓的套筒和楔块的工艺
公开(公告)号：US4520521A
公开(公告)日：1985-06-04
申请号：US473341
申请日：1983-03-08
申请人： Akira Miyake
发明人： Akira Miyake
IPC分类号： E04B1/41 , B21K1/76 , B23P15/00 , E04C5/12 , F16B13/10 , F16B13/12 , B21K1/44 , B21D31/00
CPC分类号： E04C5/122 , B21K1/76 , B23P15/00 , F16B13/12 , F16B13/126
摘要： A structure and method of manufacture of a sleeve for an anchor bolt which has a wedge held in its bolt hole, not separate from the sleeve body. The wedge is formed by striking the sleeve from the side opposite to the bolt hole on an area smaller than the cross-sectional area of the bolt hole.
摘要翻译：一种制造用于锚定螺栓的套筒的结构和方法，其具有保持在其螺栓孔中的楔形件，而不是与套筒主体分离。楔形件通过在与螺栓孔的横截面积小的区域上从与螺栓孔相对的一侧撞击套筒而形成。

23. 发明授权

US08698095B2 Charged particle beam drawing apparatus and article manufacturing method 失效
标题翻译：带电粒子束拉制装置及制品的制造方法
公开(公告)号：US08698095B2
公开(公告)日：2014-04-15
申请号：US13343752
申请日：2012-01-05
申请人： Ichiro Tanaka , Akira Miyake , Hiromitsu Takase
发明人： Ichiro Tanaka , Akira Miyake , Hiromitsu Takase
IPC分类号： G21K5/04
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , G03F7/70925 , H01J2237/022 , H01J2237/04924
摘要： The charged particle beam drawing apparatus of the present invention performs drawing to a substrate with a plurality of charged particle beams. The drawing apparatus includes an electron lens positioned at a location facing opposite to the substrate and including a plurality of holes through which the charged particle beams pass; and a cleaning unit configured to release active species to a decomposition product that has adhered to the electron lens and reduce the decomposition product by the reaction of the active species and the decomposition product to thereby change the decomposition product to a volatile gas. Here, the cleaning unit has a plurality of openings formed such that the active species are released toward the plurality of holes of the electron lens.
摘要翻译：本发明的带电粒子束描绘装置利用多个带电粒子束对基片进行拉伸。拉伸装置包括位于与基板相对的位置的电子透镜，并且包括多个孔，带电粒子束穿过该孔; 以及清洁单元，其被配置为将活性物质释放到已经附着到电子透镜上的分解产物，并且通过活性种类和分解产物的反应来减少分解产物，从而将分解产物改变为挥发性气体。这里，清洁单元具有形成为使得活性物质朝向电子透镜的多个孔释放的多个开口。

24. 发明授权

US08581487B2 Light-emitting device with reflection layers 失效
标题翻译：具有反射层的发光装置
公开(公告)号：US08581487B2
公开(公告)日：2013-11-12
申请号：US13503604
申请日：2010-11-25
申请人： Takashi Sawai , Emi Mukai , Kousuke Katabe , Akira Miyake
发明人： Takashi Sawai , Emi Mukai , Kousuke Katabe , Akira Miyake
IPC分类号： H05B33/22
CPC分类号： H01L33/60 , H01L33/44 , H01L33/486 , H01L2224/48091 , H01L2224/48227 , H01L2924/181 , H01L2924/00014 , H01L2924/00012
摘要： A light-emitting device includes a substrate, a pair of electrode layers disposed on the substrate, a light-emitting element disposed between the pair of electrode layers to keep a first space with each of the pair of electrode layers while electrically connecting with each of the pair of electrode layers, and a pair of reflection layers, each extending in overlapping relation from one to the other one of the pair of electrode layers as seen in a transparent plan view. The light-emitting element is disposed between the pair of reflection layers to keep a second space with each of the pair of reflection layers.
摘要翻译：发光装置包括基板，设置在基板上的一对电极层，设置在该对电极层之间的发光元件，以与第一对电极层中的每一个电极层保持第一空间，同时与一对电极层和一对反射层，每个反射层以透明平面图的方式从该对电极层中的一个至另一个的重叠关系延伸。所述发光元件设置在所述一对反射层之间，以与所述一对反射层中的每一个保持第二空间。

25. 发明申请

US20120025986A1 WORK DIRECTION DETERMINING METHOD AND DEVICE, AND WORK PROVIDED WITH DIRECTION DETERMINING FUNCTION 有权
标题翻译：工作方向确定方法和设备，并提供方向确定功能的工作
公开(公告)号：US20120025986A1
公开(公告)日：2012-02-02
申请号：US13148675
申请日：2010-03-24
申请人： Yoshiharu Hino , Akira Miyake , Daisuke Kuroki , Takuya Yamaguchi , Yusuke Minemura
发明人： Yoshiharu Hino , Akira Miyake , Daisuke Kuroki , Takuya Yamaguchi , Yusuke Minemura
IPC分类号： G08B13/14
CPC分类号： H01Q1/2225 , G06K7/10445 , G06K2017/0048 , H01Q1/38 , H01Q7/00 , H01Q9/27
摘要： A work direction determining device includes a passive tag type IC tag secured at a predetermined position on the front surface thereof. The IC tag includes a substrate, an IC module and an antenna coil disposed on the substrate in an offset manner. The device includes an antenna communicating with the IC tag, and a determination circuit. Where the work and the direction determining device are located at respective predetermined communication positions, communication is done between the antenna of the direction determining device and the antenna coil of the IC tag, and the magnitude of communication intensity during the communication is determined by the determination circuit to thereby determine a direction of the work.
摘要翻译：工作方向确定装置包括固定在其前表面上的预定位置处的无源标签型IC标签。 IC标签包括以偏移方式设置在基板上的基板，IC模块和天线线圈。该装置包括与IC标签通信的天线和确定电路。在工作和方向确定装置位于相应的预定通信位置的情况下，在方向确定装置的天线和IC标签的天线线圈之间进行通信，并且通信确定通信强度的大小电路，从而确定工作的方向。

26. 发明授权

US07544960B2 Evaluation method and fabrication method of optical element having multilayer film, exposure apparatus having the multilayer film, and device fabrication method 失效
标题翻译：具有多层膜的光学元件的评价方法和制造方法，具有该多层膜的曝光装置及其制造方法
公开(公告)号：US07544960B2
公开(公告)日：2009-06-09
申请号：US11124000
申请日：2005-05-06
申请人： Takeshi Miyachi , Akira Miyake
发明人： Takeshi Miyachi , Akira Miyake
IPC分类号： G03B21/00 , G01B11/24
CPC分类号： G03F7/70316 , B82Y10/00 , G02B5/0891 , G03F7/70591 , G21K1/062 , G21K2201/067
摘要： A fabrication method of an optical element having a multilayer film includes the steps of forming a multilayer film on a substrate, measuring a secondary radiation radiated from the multilayer film when a light with a wavelength of 2 to 40 nm is irradiated to the multilayer film, determining a phase difference between the light irradiated to the multilayer film and the light reflected from the multilayer film based on a measurement result of the measuring step, and modifying the multilayer film based on the determined phase difference.
摘要翻译：具有多层膜的光学元件的制造方法包括以下步骤：在基板上形成多层膜，当将多个膜的波长为2〜40nm的光照射时，测定从多层膜发射的次级辐射，基于测量步骤的测量结果确定照射到多层膜的光与从多层膜反射的光之间的相位差，以及基于所确定的相位差来修饰多层膜。

27. 发明授权

US07543948B2 Multilayer mirror manufacturing method, optical system manufacturing method, exposure apparatus, and device manufacturing method 有权
标题翻译：多层镜面制造方法，光学系统制造方法，曝光装置和装置制造方法
公开(公告)号：US07543948B2
公开(公告)日：2009-06-09
申请号：US11548107
申请日：2006-10-10
申请人： Akira Miyake
发明人： Akira Miyake
IPC分类号： G02B5/08
CPC分类号： G02B5/0891 , B82Y10/00 , G02B5/0841 , G03F7/70316 , G21K1/062 , Y10S359/90
摘要： A method for manufacturing a multilayer mirror that includes a substrate and a multilayer film formed on the substrate, and has a reflection surface shape includes the steps of estimating a surface shape variation amount as a difference between a surface shape of the substrate before the multilayer film is formed on the substrate and a surface shape of the multilayer mirror after the multilayer film is formed on the substrate, processing the surface shape of the substrate into a shape generated by subtracting the surface shape variation amount from the reflection surface shape, and forming the multilayer film on the substrate processed by the processing step.
摘要翻译：一种制造多层反射镜的方法，其包括形成在基板上的基板和多层膜，并且具有反射面形状的步骤包括以下步骤：将表面形状变化量估计为多层膜之前的基板的表面形状之间的差异形成在基板上，并且在基板上形成多层膜之后的多层反射镜的表面形状，将基板的表面形状加工成从反射表面形状减去表面形状变化量所产生的形状，并形成通过处理步骤处理的基板上的多层膜。

28. 发明授权

US07453560B2 Method of evaluating optical element 有权
标题翻译：光学元件评估方法
公开(公告)号：US07453560B2
公开(公告)日：2008-11-18
申请号：US10933570
申请日：2004-09-03
申请人： Akira Miyake
发明人： Akira Miyake
IPC分类号： G01N21/00 , G01B9/02
CPC分类号： G03F7/706
摘要： There is provided an evaluation method of a reflective optical element on which a multilayer film is formed, including the step of calculating a phase difference between light incident upon the multilayer film and light reflected from the multilayer film using a standing wave produced when introducing light with a wavelength of 2 to 40 into the optical element.
摘要翻译：提供了一种其上形成多层膜的反射型光学元件的评价方法，包括以下步骤：使用在将光引入时产生的驻波计算入射到多层膜上的光与多层膜反射的光之间的相位差波长为2〜40的光学元件。

29. 发明授权

US07280184B2 Assembly and adjusting method of optical system, exposure apparatus having the optical system 失效
标题翻译：光学系统的装配和调整方法，具有光学系统的曝光装置
公开(公告)号：US07280184B2
公开(公告)日：2007-10-09
申请号：US11123975
申请日：2005-05-06
申请人： Takayuki Hasegawa , Akira Miyake
发明人： Takayuki Hasegawa , Akira Miyake
IPC分类号： G03B27/42 , G03B27/32
CPC分类号： G03F7/706 , G03F7/70258
摘要： An adjusting method of an optical system composed plural optical elements each having a multilayer film, said adjusting method that includes a first measuring step that obtains, for each optical element, a difference between a phase distribution of which an EUV light (Extreme Ultraviolet light) is reflected from the optical element and a phase distribution of which a light with a wavelength that is longer than the EUV light is reflected from the optical element, a second measuring step that measures a phase distribution of which the light passes the optical system, a deciding step that decides a phase distribution of which the EUV light passes through the optical system based on the phase distribution difference obtained by the first measuring step and the phase distribution measured by the second measuring step, and an adjusting step that adjusts at least one of a position and a posture of the optical element based on the phase distribution decided by the deciding step.
摘要翻译：一种由多个光学元件组成的光学系统的调整方法，所述多个光学元件具有多层膜，所述调整方法包括对于每个光学元件获得EUV光（极紫外光）的相位分布之间的差异的第一测量步骤，从所述光学元件反射并且从所述光学元件反射具有比所述EUV光更长的波长的光的相位分布，测量所述光通过所述光学系统的相位分布的第二测量步骤，决定步骤，其基于由所述第一测量步骤获得的相位分布差和由所述第二测量步骤测量的相位分布，决定所述EUV光通过所述光学系统的相位分布;以及调整步骤，基于由判定步骤决定的相位分布的光学元件的位置和姿势。

30. 发明授权

US07091507B2 Light generator and exposure apparatus 有权
标题翻译：光发生器和曝光装置
公开(公告)号：US07091507B2
公开(公告)日：2006-08-15
申请号：US11060198
申请日：2005-02-17
申请人： Fumitaro Masaki , Akira Miyake
发明人： Fumitaro Masaki , Akira Miyake
IPC分类号： H05H1/00 , H05H1/24 , G21G4/00 , G01J1/00
CPC分类号： H05G2/001 , G03F7/70916 , G03F7/70925
摘要： A light generator for irradiating a laser onto a target, for generating plasma, and for producing light from the plasma, includes a first optical system for introducing the light to the target, a second optical system for introducing the light, and a unit for irradiating the laser onto debris that attaches to at least one of the first and second optical systems by changing an irradiation condition of the laser differently from that used to generate the plasma.
摘要翻译：一种用于将激光照射到靶上用于产生等离子体并用于从等离子体产生光的光发生器包括：用于将光引入靶的第一光学系统，用于引入光的第二光学系统和用于照射的单元通过改变激光的照射条件与用于产生等离子体的照射条件不同，将激光附着到第一和第二光学系统中的至少一个的碎片上。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式