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    • 26. 发明授权
    • Insulating gate type semiconductor device
    • 绝缘栅型半导体器件
    • US06777743B2
    • 2004-08-17
    • US10061152
    • 2002-02-04
    • Shigeru Hasegawa
    • Shigeru Hasegawa
    • H01L2976
    • H01L29/66348H01L29/7397
    • An insulating gate type semiconductor device has a plurality of trench gate electrodes provided substantially in parallel. In this semiconductor device, among the trench gate electrodes, a thinning-out trench gate electrode excluding a channel-forming trench gate electrode is insulated from a gate wire and is connected to an emitter electrode or to a predetermined electric potential generating device for generating a negative electric potential with respect to an emitter potential. With this construction, a gate capacitance is decreased without drawbacks such as a decline of manufacturing yield and an increase in gate wire resistance, there are decreased oscillations of waveforms of voltage and current when in switching in the case of an element having a large area and operating the elements in parallel.
    • 绝缘栅型半导体器件具有大致平行设置的多个沟槽栅电极。 在该半导体装置中,在沟槽栅电极中,除沟道形成用沟槽栅电极之外的稀疏沟槽栅电极与栅极导线绝缘,并与发射电极或预定电位生成装置连接, 相对于发射极电位的负电位。 利用这种结构,栅极电容降低而没有诸如制造成品率的下降和栅极线电阻增加的缺点,当在具有大面积的元件的情况下切换时,电压和电流的波形的振荡减小,并且 并行运行元素。