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21. 发明申请

US20050126712A1 Plasma processing method 审中-公开
标题翻译：等离子体处理方法
公开(公告)号：US20050126712A1
公开(公告)日：2005-06-16
申请号：US11043971
申请日：2005-01-28
申请人： Masahiro Sumiya , Naoki Yasui , Tomoyuki Tamura
发明人： Masahiro Sumiya , Naoki Yasui , Tomoyuki Tamura
IPC分类号： H05H1/46 , C23C16/505 , C23C16/509 , H01J37/32 , H01L21/3065 , C23F1/00
CPC分类号： H01J37/32082 , C23C16/5096 , H01J37/32165 , H01J37/32706
摘要： A plasma processing method utilizing an apparatus comprising a processing chamber to which is connected an exhaust pump for decompressing the chamber, a gas feeding apparatus for feeding gas into the processing chamber, an object to be processed, a wafer electrode for mounting the object, an antenna electrode for generating plasma and opposed to the plate electrode, a plasma generating high frequency power supply connected to the antenna electrode, a first high frequency power supply connected to the wafer electrode, and a second high frequency power supply connected to the antenna electrode. The method includes setting the high frequencies applied from the first high frequency power supply and the second high frequency power supply to be equal and controlling the phase of the respective high frequencies.
摘要翻译：一种等离子体处理方法，其特征在于，利用包括连接有用于对所述室进行减压的排气泵的处理室的设备，用于将气体供给到所述处理室中的气体供给装置，待处理物体，用于安装所述物体的晶片电极，用于产生等离子体并与板电极相对的天线电极，连接到天线电极的等离子体产生高频电源，连接到晶片电极的第一高频电源和连接到天线电极的第二高频电源。该方法包括将从第一高频电源和第二高频电源施加的高频设置为相等并控制各个高频的相位。

22. 发明申请

US20120187595A1 EXTRUSION MOLDING DIE, EXTRUSION MOLDING APPARATUS, MEDICAL TUBE, AND METHOD FOR PRODUCING MEDICAL TUBE 审中-公开
标题翻译：挤出成型模具，挤出成型装置，医用管和生产医用管的方法
公开(公告)号：US20120187595A1
公开(公告)日：2012-07-26
申请号：US13357185
申请日：2012-01-24
申请人： Atsushi Ohigawa , Tomoyuki Tamura , Shinichiro Yokota
发明人： Atsushi Ohigawa , Tomoyuki Tamura , Shinichiro Yokota
IPC分类号： B29C47/06 , B29C47/26
CPC分类号： B29C48/337 , A61M25/0009 , A61M25/0026 , A61M25/0054 , B29C48/09 , B29C48/18 , B29C48/2528 , B29C48/30 , B29C48/325 , B29C48/92 , B29C2948/926 , B29C2948/92647 , B29C2948/92904 , B29L2031/7542
摘要： An extrusion molding die is provided which produces a tube that contains a portion in which the cross-sectional area ratio of an inner layer and outer layer in axial cross-section continuously varies, wherein said cross-sectional area ratio can be changed in a short time. The extrusion molding die 50 moves a second inner layer mandrel 54 in the axial direction and changes the flow passage volume of an inner layer resin flow passage 62a in accordance with changes in supply quantity of an inner layer forming resin.
摘要翻译：提供了一种挤出成型模具，其产生包含轴向横截面中的内层和外层的截面积连续变化的部分的管，其中所述横截面积比可以短暂地改变时间。挤压成形模具50使第二内层心轴54沿轴向移动，并且根据内层形成树脂的供给量的变化改变内层树脂流路62a的流路容积。

23. 发明申请

US20110130065A1 METHOD FOR ADHERING LIGHT-TRANSMISSIVE SUBSTRATES AND METHOD FOR PRODUCING DISPLAY 审中-公开
标题翻译：用于安装光传输基板的方法和用于制造显示器的方法
公开(公告)号：US20110130065A1
公开(公告)日：2011-06-02
申请号：US12953628
申请日：2010-11-24
申请人： Tomokazu Andoh , Tomoyuki Tamura , Shintarou Akiba , Haruo Tomono , Kazuya Morohashi
发明人： Tomokazu Andoh , Tomoyuki Tamura , Shintarou Akiba , Haruo Tomono , Kazuya Morohashi
IPC分类号： H01J9/00
CPC分类号： H01J9/20 , H01J9/241
摘要： A method for producing a display is provided, the method comprising a step of adhering a light-transmissive substrate, wherein it is possible to suppress the occurrence of any bubble when the light-transmissive substrate is adhered to a display surface, even when the display surface is large-sized. A plurality of adhesive puddles 3 are formed in an area which is disposed on a first light-transmissive substrate 1 and which is opposed to an adhesive puddle 4 formed on a second light-transmissive substrate 2. The spacing distance between the first and second light-transmissive substrates 1, 2 is narrowed while allowing the first and second light-transmissive substrates 1, 2 to be opposed to one another, and a space between the both is filled with the adhesive.
摘要翻译：提供了一种显示器的制造方法，其特征在于，包括粘接透光性基板的步骤，即使在显示面上粘贴透光性基板时，也可以抑制发生气泡的现象表面尺寸大。在设置在第一透光性基板1上并且与形成在第二透光性基板2上的粘合剂水槽4相对的区域中形成有多个粘合剂水槽3。第一和第二光线之间的间隔距离在允许第一和第二透光性基板1,2彼此相对的同时使透光性基板1,2变窄，两者之间的空间填充有粘合剂。

24. 发明授权

US07435687B2 Plasma processing method and plasma processing device 失效
标题翻译：等离子体处理方法和等离子体处理装置
公开(公告)号：US07435687B2
公开(公告)日：2008-10-14
申请号：US11336872
申请日：2006-01-23
申请人： Kenji Maeda , Tomoyuki Tamura , Hiroyuki Kobayashi , Kenetsu Yokogawa , Tadamitsu Kanekiyo
发明人： Kenji Maeda , Tomoyuki Tamura , Hiroyuki Kobayashi , Kenetsu Yokogawa , Tadamitsu Kanekiyo
IPC分类号： H01L21/302
CPC分类号： H01L21/67069 , H01J37/32082 , H01J37/32623 , H01J37/32706 , H01L21/31116 , H01L21/32136
摘要： The invention provides a plasma processing method and plasma processing device for manufacturing semiconductor devices in which the number of foreign particles being adhered to the wafer is reduced greatly and the yield is improved. In a plasma processing device having a plasma source capable of controlling plasma distribution, the shape of a sheath/bulk boundary above the wafer is controlled to a convexed shape when the plasma is turned on and off. By adding a step of applying a low source power and wafer bias power when the plasma is turned on and off in order to realize an out-high plasma distribution, it is possible to form a sheath that is thicker near the center of the wafer and thinner at the outer circumference portion thereof.
摘要翻译：本发明提供一种用于制造半导体器件的等离子体处理方法和等离子体处理装置，其中附着在晶片上的异物颗粒的数量大大降低并且产率提高。在具有能够控制等离子体分布的等离子体源的等离子体处理装置中，当等离子体被打开和关闭时，晶片上方的鞘/体边界的形状被控制为凸形。为了实现高等离子体分布，通过添加等离子体开启和关闭时施加低源功率和晶片偏置功率的步骤，可以形成在晶片中心附近较厚的护套，在其外圆周部分变薄。

25. 发明申请

US20060033040A1 Radiation detecting apparatus, manufacturing method thereof, scintillator panel and radiation detecting system 失效
标题翻译：辐射检测装置及其制造方法，闪烁体面板和放射线检测系统
公开(公告)号：US20060033040A1
公开(公告)日：2006-02-16
申请号：US11199201
申请日：2005-08-09
申请人： Satoshi Okada , Yoshihiro Ogawa , Masato Inoue , Kazumi Nagano , Shinichi Takeda , Tomoyuki Tamura
发明人： Satoshi Okada , Yoshihiro Ogawa , Masato Inoue , Kazumi Nagano , Shinichi Takeda , Tomoyuki Tamura
IPC分类号： H05B33/00
CPC分类号： G21K4/00
摘要： A radiation detecting apparatus includes a sensor panel 100, a phosphor layer 111 formed on the sensor panel 100 to convert a radiation into light, and a phosphor protecting member 110 covering the phosphor layer 111 to adhere closely to the phosphor protecting member 110. The phosphor protecting member 110 includes a phosphor protecting layer 116 made of vapor deposition polymerization polyimide formed by vapor deposition polymerization, a reflecting layer 113 reflecting the light converted by the phosphor layer 111, and a protecting layer 117 made of vapor deposition polymerization polyurea formed by the vapor deposition polymerization. By such a configuration, a polymerization reaction of the phosphor protecting layer 116 is performed on the substrate. Thereby, the generation of by-products is suppressed to make it easy to acquire the uniformity of film quality. Consequently, the generation of a situation in which structural disorders are generated on the reflection surface of the reflecting layer 113 to cause image defects can be suppressed.
摘要翻译：辐射检测装置包括传感器面板100，形成在传感器面板100上以将辐射转换为光的荧光体层111和覆盖荧光体层111以紧密附着于荧光体保护构件110的荧光体保护构件110。荧光体保护构件110包括由气相沉积聚合形成的蒸镀聚合聚酰亚胺制成的荧光体保护层116，反射层113反射由荧光体层111转换的光，以及由气相沉积聚合聚脲制成的保护层117，气相沉积聚合。通过这样的结构，在基板上进行荧光体保护层116的聚合反应。由此，抑制了副产物的产生，从而容易获得膜质量的均匀性。因此，可以抑制在反射层113的反射面上产生结构紊乱以引起图像缺陷的情况的产生。

26. 发明授权

US06506686B2 Plasma processing apparatus and plasma processing method 失效
标题翻译：等离子体处理装置和等离子体处理方法
公开(公告)号：US06506686B2
公开(公告)日：2003-01-14
申请号：US09790702
申请日：2001-02-23
申请人： Toshio Masuda , Kazue Takahashi , Ryoji Fukuyama , Tomoyuki Tamura
发明人： Toshio Masuda , Kazue Takahashi , Ryoji Fukuyama , Tomoyuki Tamura
IPC分类号： H01L2100
CPC分类号： H01J37/32082 , H01J37/3266 , H01J37/32697
摘要： In a plasma processing apparatus that has a vacuum chamber, a process gas supply means of supply gas to a processing chamber, an electrode to hold a sample inside said vacuum chamber, a plasma generator installed in said vacuum chamber opposite to said sample, and a vacuum exhaust system to decrease pressure of said vacuum chamber, a bias voltage of Vdc=−300 to −50 V is applied and the surface temperature of said plate ranges from 100 to 200° C. In addition, the surface temperature fluctuation of the silicon-made plate in said plasma processing apparatus is kept within ±25° C.
摘要翻译：在具有真空室的等离子体处理装置中，向处理室供给气体的处理气体供给单元，将真空室内的样品保持的电极，安装在与所述样品相对的所述真空室内的等离子体发生器，真空排气系统减小所述真空室的压力，施加Vdc = -300至-50V的偏置电压，并且所述板的表面温度为100至200℃。此外，硅的表面温度波动所述等离子体处理装置中制成的板保持在±25℃

27. 发明授权

US5234633A Cast molding die and process for producing information recording medium using the same 失效
标题翻译：铸造模具及使用该模具的信息记录介质的制造方法
公开(公告)号：US5234633A
公开(公告)日：1993-08-10
申请号：US811900
申请日：1991-12-20
申请人： Hiroyuki Imataki , Tetsuya Satoh , Mizuho Hiraoka , Tomoyuki Tamura
发明人： Hiroyuki Imataki , Tetsuya Satoh , Mizuho Hiraoka , Tomoyuki Tamura
IPC分类号： B29C33/42 , B29C39/26 , G11B7/26
CPC分类号： B29C33/424 , B29C39/26 , G11B7/263 , Y10S425/81
摘要： There is provided a cast molding die for an information recording medium, having a mold surface with a prescribed unevenness pattern including a projection; wherein the projection has at least one pair of opposite side slopes each of which forms an acute angle with respect to the extension of the mold surface. By using the cast molding die having the above-mentioned projection with a three-dimensional shape, a defect such as lack in the resultant information recording medium is prevented.
摘要翻译：提供了一种用于信息记录介质的铸造模具，具有包括突起的具有规定的凹凸图案的模具表面; 其中所述突起具有至少一对相对的侧边，每个斜面相对于所述模具表面的延伸部形成锐角。通过使用具有上述具有三维形状的突起的铸塑模具，可以防止所得到的信息记录介质中缺少缺陷。

28. 发明授权

US5073101A Information recording medium, production process and molding die for substrate therefor 失效
标题翻译：信息记录介质，生产工艺及其基材模具
公开(公告)号：US5073101A
公开(公告)日：1991-12-17
申请号：US544652
申请日：1990-06-27
申请人： Hiroyuki Imataki , Mizuho Hiraoka , Tomoyuki Tamura , Tetsuya Satoh
发明人： Hiroyuki Imataki , Mizuho Hiraoka , Tomoyuki Tamura , Tetsuya Satoh
IPC分类号： B29C33/42 , G11B7/013 , G11B7/24 , G11B7/26 , G11B11/105 , G11B23/00
CPC分类号： G11B7/24085 , G11B11/10582 , G11B23/0057 , G11B7/26 , Y10S425/81 , Y10S428/913
摘要： A molding die for an information recording medium substrate having a prescribed unevenness pattern comprising a track portion and an information pit portion which has a planar shape of a polygon wherein at least one diagonal is substantially parallel to the track portion. Such molding die provides an information recording medium substrate without lack in the periphery of a pre-format.

29. 发明授权

US08487415B2 Rectifier and process for producing the rectifier 有权
标题翻译：整流器和整流器的制造工艺
公开(公告)号：US08487415B2
公开(公告)日：2013-07-16
申请号：US12740460
申请日：2008-10-30
申请人： Hisashi Shima , Hiroyuki Akinaga , Shoji Ishibashi , Tomoyuki Tamura
发明人： Hisashi Shima , Hiroyuki Akinaga , Shoji Ishibashi , Tomoyuki Tamura
IPC分类号： H01L29/861
CPC分类号： H01L29/872 , H01L29/24
摘要： The present invention provides a rectifier element that has a titanium oxide layer interposed between first and second electrodes containing a transition metal with an electronegativity larger than that of Ti, wherein, in the titanium oxide layer, only the interface on the side facing any one of the electrodes has a stoichiometric composition, and wherein the average composition of the whole layer is represented by the formula TiOx (wherein x satisfies the relationship 1.6≦x
摘要翻译：本发明提供了一种整流元件，其具有插入在第一和第二电极之间的氧化钛层，其包含电负性大于Ti的过渡金属，其中，在氧化钛层中，仅在与电极具有化学计量组成，并且其中整个层的平均组成由式TiOx表示（其中x满足关系1.6@x <2），并且其中可以通过施加反向电信号来反转整流特性，在相反方向超过第一和第二电极之间的临界反向电力。本发明还提供一种整流元件的制造方法，该方法包括以下步骤：在基片上沉积含有电负性大于Ti的过渡金属的第一电极; 在第一电极上沉积一层氧化钛（TiOx，其中x满足关系1.6@x <2）; 将氧化钛（TiOx）层的表面暴露于氧气氛中; 以及在暴露于氧气氛的氧化钛（TiOx）层的表面上沉积含有电负性大于Ti的过渡金属的第二电极。

30. 发明申请

US20110304265A1 LIGHT EMITTING SUBSTRATE AND IMAGE DISPLAY APPARATUS INCLUDING THE SAME 失效
标题翻译：发光基板和图像显示装置，包括它们
公开(公告)号：US20110304265A1
公开(公告)日：2011-12-15
申请号：US13152568
申请日：2011-06-03
申请人： Tomoyuki Ikegami , Tatsundo Kawai , Tomoyuki Tamura
发明人： Tomoyuki Ikegami , Tatsundo Kawai , Tomoyuki Tamura
IPC分类号： H01J1/62 , H01L33/08 , H01L33/60 , B82Y99/00
CPC分类号： B82Y30/00 , B82Y20/00
摘要： A light emitting substrate configured to enhance luminance of an image display apparatus is disclosed. The light emitting substrate includes a transparent substrate, a photonic crystal structure, a transparent anode, a light emitting layer having a diffuse reflectance of 0.04% or less and having a side reflecting member at a side thereof. The photonic crystal structure, the transparent anode, and the light emitting layer are successively laminated in this order on the transparent substrate. The light emitting substrate satisfies the following Condition 1 or Condition 2: Condition 1: 95≦c, and 40≦a
摘要翻译：公开了一种被配置为增强图像显示装置的亮度的发光基板。发光基板包括透明基板，光子晶体结构，透明阳极，具有0.04％以下的漫反射率的发光层，在侧面具有侧面反射部件。将光子晶体结构，透明阳极和发光层依次层叠在透明基板上。发光基板满足以下条件1或条件2：条件1：95＆nlE; c和40＆nlE; a <100条件2：85＆nlE; c <95和80＆nlE; a <100其中a是光子的相对面积晶体结构与发光层的结构，c是侧反射部件的反射率。

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