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    • 22. 发明授权
    • Glass for information recording media substrate, glass substrate for magnetic disk and magnetic disk
    • 用于信息记录介质基板的玻璃,用于磁盘和磁盘的玻璃基板
    • US07838136B2
    • 2010-11-23
    • US12256172
    • 2008-10-22
    • Tetsuya NakashimaKei MaedaNoriaki ShimodairaAtsuyoshi Takenaka
    • Tetsuya NakashimaKei MaedaNoriaki ShimodairaAtsuyoshi Takenaka
    • G11B5/73C03C3/087
    • G11B5/7315C03C3/083C03C3/085C03C4/20Y10T428/31Y10T428/315
    • To provide a glass for an information recording media substrate, which is excellent in weather resistance.A glass for an information recording media substrate, which comprises, as represented by mol % based on oxide, from 61 to 66% of SiO2, from 11.5 to 17% of Al2O3, from 8 to 16% of Li2O, from 2 to 8% of Na2O, from 2.5 to 8% of K2O, from 0 to 6% of MgO, from 0 to 4% of TiO2 and from 0 to 3% of ZrO2, provided that Al2O3+MgO+TiO2 is at least 12%, and Li2O+Na2O+K2O is from 16 to 23%, wherein in a case of where B2O3 is contained, its content is less than 1%. The above glass for an information recording media substrate, wherein when the glass is left under steam atmosphere at 120° C. at 0.2 MPa for 20 hours, and the amount of Li, the amount of Na and the amount of K, which precipitate on a surface of the glass are represented as CLi, CNa and CK respectively, CNa is at most 0.7 nmol/cm2, and CLi+CNa+CK is at most 3.5 nmol/cm2.
    • 提供耐候性优异的信息记录介质基板用玻璃。 用于信息记录介质基板的玻璃,其以氧化物的摩尔%表示,SiO 2的61至66%,Al 2 O 3的11.5至17%,Li 2 O的8至16%,2至8重量% 的Na 2 O,2.5〜8%的K 2 O,0〜6%的MgO,0〜4%的TiO 2和0〜3%的ZrO 2,条件是Al 2 O 3 + MgO + TiO 2为至少12%,Li 2 O + Na 2 O + K 2 O为16〜23%,其中,在含有B 2 O 3的情况下,其含量小于1%。 上述用于信息记录介质基板的玻璃,其中当玻璃在蒸气气氛中在120℃下在0.2MPa下放置20小时时,并且Li的量,Na的量和沉淀的K的量 玻璃的表面分别表示为CLi,CNa和CK,CNa为0.7nmol / cm 2以下,CLi + CNa + CK为3.5nmol / cm 3以下。
    • 27. 发明申请
    • GLASS SUBSTRATE FOR INFORMATION RECORDING MEDIUM AND METHOD FOR MANUFACTURING THE SAME, AND MAGNETIC RECORDING MEDIUM
    • 用于信息记录介质的玻璃基板及其制造方法和磁记录介质
    • US20110008649A1
    • 2011-01-13
    • US12833410
    • 2010-07-09
    • Masahiko TAMURAToru MomoseKatsuaki MiyataniTetsuya Nakashima
    • Masahiko TAMURAToru MomoseKatsuaki MiyataniTetsuya Nakashima
    • G11B5/73B24B7/24B24B1/00G11B5/84
    • G11B5/8404B24B37/042B24B37/08C03C19/00G11B5/7315
    • The present invention relates to a method for manufacturing a glass substrate for information recording medium, the method including: a lapping step of lapping a circular glass plate made of an alkali aluminosilicate glass; and a subsequent cerium oxide polishing step of polishing the circular glass plate with a slurry containing a cerium oxide abrasive, in which a difference (SiO2−Al2O3) obtained by subtracting an Al2O3 content from an SiO2 content in the alkali aluminosilicate glass is 62% by mole or less; and in which the method further includes: subsequently to the cerium oxide polishing step, a cleaning step of cleaning the circular glass plate with a cleaning liquid having a sulfuric acid concentration of 20% by mass or more and 80% by mass or less and a hydrogen peroxide concentration of 1% by mass or more and 10% by mass or less at a liquid temperature of 50° C. or higher and 100° C. or lower, and after the cleaning step, a finish polishing step of polishing a main surface of the circular glass plate with a slurry containing a colloidal silica abrasive.
    • 本发明涉及一种用于信息记录介质的玻璃基板的制造方法,该方法包括:研磨由铝硅酸铝玻璃制成的圆形玻璃板的研磨步骤; 以及后续的氧化铈抛光步骤,用含有氧化铈磨料的浆料研磨圆形玻璃板,其中通过从碱性铝硅酸盐玻璃中的SiO 2含量减去Al 2 O 3含量而得到的差异(SiO 2 -Al 2 O 3)为62% 摩尔或更少; 该方法还包括:随后的氧化铈抛光步骤,用硫酸浓度为20质量%以上且80质量%以下的清洗液清洗圆形玻璃板的清洗工序, 过氧化氢浓度在50℃以上且100℃以下的液温下为1质量%以上且10质量%以下,在清洗工序后,对主体进行研磨的精抛光工序 具有含有胶体二氧化硅研磨剂的浆料的圆形玻璃板的表面。
    • 29. 发明授权
    • Glass substrate for information recording medium and method for manufacturing the same, and magnetic recording medium
    • 用于信息记录介质的玻璃基板及其制造方法和磁记录介质
    • US08328602B2
    • 2012-12-11
    • US12833410
    • 2010-07-09
    • Masahiko TamuraToru MomoseKatsuaki MiyataniTetsuya Nakashima
    • Masahiko TamuraToru MomoseKatsuaki MiyataniTetsuya Nakashima
    • C03B27/00B24C3/08G11B9/04
    • G11B5/8404B24B37/042B24B37/08C03C19/00G11B5/7315
    • The present invention relates to a method for manufacturing a glass substrate for information recording medium, the method including: a lapping step of lapping a circular glass plate made of an alkali aluminosilicate glass; and a subsequent cerium oxide polishing step of polishing the circular glass plate with a slurry containing a cerium oxide abrasive, in which a difference (SiO2−Al2O3) obtained by subtracting an Al2O3 content from an SiO2 content in the alkali aluminosilicate glass is 62% by mole or less; and in which the method further includes: subsequently to the cerium oxide polishing step, a cleaning step of cleaning the circular glass plate with a cleaning liquid having a sulfuric acid concentration of 20% by mass or more and 80% by mass or less and a hydrogen peroxide concentration of 1% by mass or more and 10% by mass or less at a liquid temperature of 50° C. or higher and 100° C. or lower, and after the cleaning step, a finish polishing step of polishing a main surface of the circular glass plate with a slurry containing a colloidal silica abrasive.
    • 本发明涉及一种用于信息记录介质的玻璃基板的制造方法,该方法包括:研磨由铝硅酸铝玻璃制成的圆形玻璃板的研磨步骤; 以及后续的氧化铈抛光步骤,用含有氧化铈磨料的浆料研磨圆形玻璃板,其中通过从碱性铝硅酸盐玻璃中的SiO 2含量减去Al 2 O 3含量而得到的差异(SiO 2 -Al 2 O 3)为62% 摩尔或更少; 该方法还包括:随后的氧化铈抛光步骤,用硫酸浓度为20质量%以上且80质量%以下的清洗液清洗圆形玻璃板的清洗工序, 过氧化氢浓度在50℃以上且100℃以下的液温下为1质量%以上且10质量%以下,在清洗工序后,对主体进行研磨的精抛光工序 具有含有胶体二氧化硅研磨剂的浆料的圆形玻璃板的表面。