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21. 发明授权

US4291231A Electron beam exposure system and an apparatus for carrying out the same 失效
标题翻译：电子束曝光系统及其执行装置
公开(公告)号：US4291231A
公开(公告)日：1981-09-22
申请号：US971693
申请日：1978-12-21
申请人： Kenichi Kawashima , Hiroshi Yasuda , Kenyu Uema
发明人： Kenichi Kawashima , Hiroshi Yasuda , Kenyu Uema
IPC分类号： H01L21/027 , H01J37/302 , H01J37/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J2237/31762
摘要： Electron beam exposure system provides a basic pattern data memory for storing data corresponding to the dimensions and the positions of patterns of a basic unit pattern which frequently appears as a unit in a pattern to be exposed on a wafer, and a central processing unit provided with an additional memory system which stores data corresponding to the position at which the basic unit pattern is to be exposed. This system determines the position of the basic unit pattern by adding data from the basic pattern data memory and data from the additional memory system through the central processing unit in accordance with a command of the central processing unit. Thereafter, data corresponding to the dimensions of the patterns in the basic unit patterns from the basic pattern data memory are sent as an input to a deflection system. As a result, the system according to the present invention applies electron beam deflection signals, which are produced by using the obtained data corresponding to the positions and the dimensions of the basic unit patterns, to the deflecting means of the electron beam exposure apparatus.
摘要翻译：电子束曝光系统提供基本图案数据存储器，用于存储对应于经常以要暴露在晶片上的图案中以单元形式出现的基本单元图案的尺寸和图案的尺寸和位置的数据;以及中央处理单元，存储与基本单元图案要被曝光的位置对应的数据的附加存储器系统。该系统根据中央处理单元的命令，通过从基本模式数据存储器和来自附加存储器系统的数据通过中央处理单元添加数据来确定基本单元模式的位置。此后，将与来自基本图案数据存储器的基本单元图案中的图案的尺寸相对应的数据作为输入发送到偏转系统。结果，根据本发明的系统将通过使用与基本单元图案的位置和尺寸对应的获得的数据产生的电子束偏转信号应用于电子束曝光装置的偏转装置。

22. 发明授权

US06443375B1 Fuel injection valve coated with anti-fouling perfluoropolyether film layer and associated method, and direct injection engine using same 有权
公开(公告)号：US06443375B1
公开(公告)日：2002-09-03
申请号：US09887118
申请日：2001-06-25
申请人： Mitsuyoshi Shouji , Hiroshi Sasaki , Kenichi Kawashima , Yutaka Ito , Yoshiyuki Tanabe , Atsushi Sekine
发明人： Mitsuyoshi Shouji , Hiroshi Sasaki , Kenichi Kawashima , Yutaka Ito , Yoshiyuki Tanabe , Atsushi Sekine
IPC分类号： F02M3710
摘要： A fuel injection valve for a direct gasoline injection engine, a direct injection engine, and an automobile using the same. The fuel injection valve can prevent the deposits produced during combustion of gasoline from accumulating on the surface of the fuel injection valve, or easily remove the deposits therefrom. A reaction-bonded layer of perfluoropolyether compounds having alkoxy silane as its terminal group is provided on the surface of the fuel injection valve of the invention.

23. 发明授权

US06273348B1 Fuel injection valve and direct injection engine using the same 有权
标题翻译：燃油喷射阀和直喷式发动机使用相同
公开(公告)号：US06273348B1
公开(公告)日：2001-08-14
申请号：US09300523
申请日：1999-04-28
申请人： Mitsuyoshi Shouji , Hiroshi Sasaki , Kenichi Kawashima , Yutaka Ito , Yoshiyuki Tanabe , Atsushi Sekine
发明人： Mitsuyoshi Shouji , Hiroshi Sasaki , Kenichi Kawashima , Yutaka Ito , Yoshiyuki Tanabe , Atsushi Sekine
IPC分类号： F02M3710
CPC分类号： F02M69/045 , B05D5/083 , F02B23/101 , F02B2075/125 , F02M51/0675 , F02M51/0678 , F02M61/166 , F02M61/18 , Y02T10/123
摘要： The invention provides for a fuel injection valve for a direct gasoline injection engine, a direct injection engine and an automobile using the same, which can prevent the deposits produced during combustion of gasoline from accumulating on the surface of the fuel injection valve, or easily remove the deposits therefrom. A reaction-bonded layer of perfluoropolyether compounds having alkoxy silane as its terminal group is provided on the surface of the fuel injection valve of the invention.
摘要翻译：本发明提供一种用于直接汽油喷射发动机的燃料喷射阀，直接喷射发动机和使用该燃料喷射发动机的汽车，其可以防止汽油燃烧期间产生的沉积物积聚在燃料喷射阀的表面上，或容易地去除存款。在本发明的燃料喷射阀的表面上设置有具有烷氧基硅烷作为其端基的全氟聚醚化合物的反应键层。

24. 发明授权

US6087072A Article having a light-controllable super-water-repellent surface and a printing machine using the article 失效
标题翻译：具有光可控超防水表面的物品和使用该物品的印刷机
公开(公告)号：US6087072A
公开(公告)日：2000-07-11
申请号：US365869
申请日：1999-08-03
申请人： Hiroshi Sasaki , Mitsuyoshi Shouji , Kenichi Kawashima , Yutaka Ito
发明人： Hiroshi Sasaki , Mitsuyoshi Shouji , Kenichi Kawashima , Yutaka Ito
IPC分类号： B41F17/00 , B41C1/10 , B41M5/26 , B41N1/22 , C09K3/18 , C09K9/02 , G03C1/73 , G03F7/00 , G03F7/004 , G03F7/09
CPC分类号： B41C1/1041 , G03F7/004
摘要： The present invention relates to an article with a surface having an contact angle with water of at least 150.degree. or more in which the contact angle with water on the surface is lowered to less than 150.degree. by photo-irradiation to the surface. According to the present invention, it is possible to control the super-water-repellency of an article with a super-water-repellent surface by photo-irradiation.
摘要翻译：本发明涉及具有至少150°以上与水接触角的表面的物品，其中通过对表面进行光照射将表面上的水的接触角降低到小于150°。根据本发明，可以通过光照射来控制具有超疏水表面的物品的超疏水性。

25. 发明授权

US6086454A Method of fabricating a semiconductor device using a CMP process 失效
标题翻译：使用CMP工艺制造半导体器件的方法
公开(公告)号：US6086454A
公开(公告)日：2000-07-11
申请号：US902278
申请日：1997-07-29
申请人： Yoshio Watanabe , Kenichi Kawashima
发明人： Yoshio Watanabe , Kenichi Kawashima
IPC分类号： H01L21/304 , B24B57/02 , H01L21/00 , B24B1/00
CPC分类号： H01L21/67051 , B24B37/04 , B24B57/02
摘要： A polishing apparatus includes a rotatable platen, a first driving device for causing the rotatable platen to rotate, a polishing head provided above the platen rotatably and holding a substrate in a manner such that the substrate faces the platen, a second driving device for causing the polishing head to rotate, an urging device for urging the substrate on the polishing head against the platen, a slurry feeding system for feeding a slurry to the platen, and a cleaning system for supplying a cleaning liquid containing an acid that dissolves a manganese oxide, to the polishing head. The cleaning system includes a nozzle provided in the polishing head for spraying the cleaning liquid to the platen.
摘要翻译：抛光装置包括可转动的压板，用于使可转动的压盘旋转的第一驱动装置，设置在压板上方的可旋转的抛光头，并以使得基板面向压板的方式保持基板;第二驱动装置，抛光头旋转，用于将研磨头上的基板压靠在压板上的施力装置，用于将浆料供给到压板的浆料供给系统，以及用于供给含有溶解氧化锰的酸的清洗液的清洗系统，到抛光头。清洁系统包括设置在抛光头中的用于将清洁液喷射到压板的喷嘴。

26. 发明授权

US4861245A Scroll compressor with sealed pressure space biasing the orbiting scroll member 失效
标题翻译：涡旋压缩机具有偏压绕动涡旋件的密封压力空间
公开(公告)号：US4861245A
公开(公告)日：1989-08-29
申请号：US85754
申请日：1987-08-17
申请人： Kenji Tojo , Kenichi Kawashima , Kazutaka Suefuji , Yozo Nakamura
发明人： Kenji Tojo , Kenichi Kawashima , Kazutaka Suefuji , Yozo Nakamura
IPC分类号： F04C18/02 , F01C17/06 , F04C27/00
CPC分类号： F04C27/005 , F01C17/066
摘要： A scroll compressor comprises two scroll members, each of which has an end plate and a wrap formed on the end plate so as to extend perpendicularly therefrom, are meshed with each other, one scroll member being orbited with respect to the other without being self-revolved, to introduce a gas into working chamber. The working chamber is formed by these two scroll members, compresses the gas therein and then discharge the same to the outside. A seal mechanism for pressure-sealing between the working chamber or the suction side and a space on a rear surface of the orbiting scroll member is provided on the same rear surface, and also a pair of small-diameter ports for communicating the mentioned space and working chamber with each other are provided on the end plate of the above-mentioned scroll member, whereby the outer diameter of the scroll members can be minimized, and the axial opposed end surfaces of the two scroll members can be maintained in sealed condition.
摘要翻译：涡旋压缩机包括两个涡旋构件，每个涡旋构件具有端板和形成在端板上以从其垂直延伸的涡卷彼此啮合，一个涡旋构件相对于另一个旋转，旋转，将气体引入工作室。工作室由这两个涡旋件构成，将其中的气体压缩，然后将其排出到外部。用于在工作室或吸入侧之间进行压力密封的密封机构与绕动涡旋构件的后表面上的空间设置在同一个后表面上，还设有一对用于连通所述空间的小直径端口和工作室彼此设置在上述涡旋构件的端板上，从而可以使涡旋构件的外径最小化，并且可以将两个涡旋构件的轴向相对的端面保持在密封状态。

27. 发明授权

US5338647A Reflection type photomask and reflection type photolithography method comprising a concavo-convex surface 失效
标题翻译：反射型光掩模和反射型光刻法，其包括凹凸表面
公开(公告)号：US5338647A
公开(公告)日：1994-08-16
申请号：US965086
申请日：1992-10-22
申请人： Kenji Nakagawa , Kenichi Kawashima
发明人： Kenji Nakagawa , Kenichi Kawashima
IPC分类号： G03F1/70 , G03F1/00 , G03F1/26 , G03F1/76 , G03F1/80 , G03F7/20 , H01L21/027 , G03C5/00
CPC分类号： G03F1/26
摘要： A reflection type photomask includes a substrate, and a reflecting surface formed on the substrate and including a first region and a second region which have a relative height difference. Due to the concavo-convex structure of the reflecting surface, a light reflected from the first region and a light reflected from the second region have a predetermined phase difference which may be used effectively to form a pattern on a photoresist layer.
摘要翻译：反射型光掩模包括基板和形成在基板上并包括第一区域和具有相对高度差的第二区域的反射表面。由于反射表面的凹凸结构，从第一区域反射的光和从第二区域反射的光具有预定的相位差，其可以有效地用于在光致抗蚀剂层上形成图案。

28. 发明授权

US5276334A Charged particle beam exposure method and apparatus 失效
标题翻译：带电粒子束曝光方法和装置
公开(公告)号：US5276334A
公开(公告)日：1994-01-04
申请号：US916750
申请日：1992-07-22
申请人： Akio Yamada , Kiichi Sakamoto , Kenichi Kawashima
发明人： Akio Yamada , Kiichi Sakamoto , Kenichi Kawashima
IPC分类号： H01L21/027 , H01J37/317 , H01L21/30 , H01J37/302
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/30411 , H01J2237/31776
摘要： A charged particle beam exposure method includes the steps of (a) selectively irradiating a charged particle beam on at least one selected opening forming a selected pattern of a mask which includes a plurality of openings related to a plurality of kinds of patterns so as to shape a cross section of the charged particle beam which is transmitted through the selected opening, where the area of the mask is divided into a plurality of blocks each including at least one opening which is related to one pattern, and (b) irradiating the charged particle beam which is transmitted through the selected opening of the mask onto an object surface so as to expose a desired pattern corresponding to at least a part of the pattern of the selected opening on the object surface, where the step (a) carries out first and second deflections independently of each other with respect to the charged particle beam. The first deflection deflects the charged particle beam within a first deflection range which corresponds to the size of one block and the second deflection deflects the charged particle beam within a second irradiating range which covers a plurality of blocks of the mask, so that the second deflection deflects the charged particle beam to irradiate the selected opening out of the plurality of openings of the mask and the first deflection sets the first deflection range of the charged particle beam with respect to the selected opening.
摘要翻译：带电粒子束曝光方法包括以下步骤：（a）在至少一个选定的开口上选择性地照射带电粒子束，所述至少一个选择的开口形成掩模的选定图案，所述图案包括与多种图案相关的多个开口以形成所述带电粒子束的透射通过所述选择的开口的横截面，其中所述掩模的面积被分成多个块，每个块包括与一个图案相关的至少一个开口，以及（b）照射所述带电粒子光束，其通过掩模的所选择的开口透射到物体表面上，以暴露与物体表面上的所选择的开口的图案的至少一部分的至少一部分相对应的期望图案，其中步骤（a）首先执行，相对于带电粒子束彼此独立的第二偏转。第一偏转将带电粒子束偏转在对应于一个块的尺寸的第一偏转范围内，并且第二偏转使带电粒子束在覆盖掩模的多个块的第二照射范围内偏转，使得第二偏转使带电粒子束偏转以将所选择的开口照射到掩模的多个开口中，并且第一偏转相对于所选择的开口设置带电粒子束的第一偏转范围。

29. 发明授权

US5260579A Charged particle beam exposure system and charged particle beam exposure method 失效
标题翻译：带电粒子束曝光系统和带电粒子束曝光方法
公开(公告)号：US5260579A
公开(公告)日：1993-11-09
申请号：US851400
申请日：1992-03-13
申请人： Hiroshi Yasuda , Yasushi Takahashi , Kiichi Sakamoto , Akio Yamada , Yoshihisa Oae , Junichi Kai , Shunsuke Fueki , Kenichi Kawashima
发明人： Hiroshi Yasuda , Yasushi Takahashi , Kiichi Sakamoto , Akio Yamada , Yoshihisa Oae , Junichi Kai , Shunsuke Fueki , Kenichi Kawashima
IPC分类号： H01J37/09 , H01J37/317 , H01J37/302
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/3177 , H01J2237/0435
摘要： A charged particle beam exposure system is directed to an exposure process of an electron beam for sequentially scanning an electron beam employing a blanking aperture array including a plurality of blanking apertures. The system facilitates re-focusing for compensation of focus error due to Coulumb effect and makes wiring the blanking aperture array easier. The system further allows exposure without an irradiation gap. The blanking aperture array 6 is formed with a plurality of said blanking apertures 62 arranged in a two-dimensional configuration. A control system 24 controls the blanking aperture array 62 to set the blanking aperture to the ON state where the charged particle beams pass through the blanking aperture and reach the object 19 to be exposed or the OFF state where the charged particle beams cannot reach the object 19 to be exposed. The other control system of the control means performs a control so that a plurality of said charged particle beams that have passed through different blanking apertures of said blanking aperture array overlaps and is irradiated a plurality of times onto the specified position or the peripheral position in the vicinity of the specified position of the object to be exposed to the charged particle beams.

30. 发明授权

US4508968A Apparatus for processing negative photoresist 失效
标题翻译：用于处理负光致抗蚀剂的设备
公开(公告)号：US4508968A
公开(公告)日：1985-04-02
申请号：US510584
申请日：1983-07-05
申请人： Koichi Kobayashi , Kenichi Kawashima , Shuzo Oshio
发明人： Koichi Kobayashi , Kenichi Kawashima , Shuzo Oshio
IPC分类号： H01L21/302 , G03F7/038 , G03F7/20 , G03F7/26 , G03F7/38 , H01L21/3065 , G01N23/00 , G01N21/00
CPC分类号： G03F7/38 , G03F7/20 , Y10S430/168
摘要： A negative photoresist emulsion, wherein after a film of negative photoresist emulsion on a substrate has been exposed for pattern writing in vacuum to charged particle beams or soft X-ray beams, the film-coated substrate is transferred to, and kept in, a chamber filled with non-oxidizing gas, and then the substrate is removed to the outside atmosphere. By this method, a curing effect of the photoresist film is prevented, enabling formation of fine patterns with precision. An apparatus for carrying out the above method has a gas chamber filled with non-oxidizing gas connected to an exposure chamber, and the substrate, after such exposure, is kept in an atmosphere of non-oxidizing gas in the gas chamber before being removed to the outside atmosphere. In either the above-method or apparatus, the concentration of oxygen in the non-oxidizing gas must be less than 5%, preferably less than 1%.

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