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21. 发明申请

US20060215134A1 Lithographic apparatus and device manufacturing method 失效
公开(公告)号：US20060215134A1
公开(公告)日：2006-09-28
申请号：US11086667
申请日：2005-03-23
申请人： Erik Buurman , Thomas Castenmiller , Johannes Wilhelmus Teeuwsen , Bearrach Moest , Mare Haast
发明人： Erik Buurman , Thomas Castenmiller , Johannes Wilhelmus Teeuwsen , Bearrach Moest , Mare Haast
IPC分类号： G03F7/20
CPC分类号： G03F7/70575 , G03F7/70641 , G03F9/7026
摘要： A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.

22. 发明授权

US09329500B2 Lithographic apparatus configured to reconstruct an aerial pattern and to compare the reconstructed aerial pattern with an aerial pattern detected by an image sensor 有权
标题翻译：所述平版印刷装置被配置为重构天线图案并且将所述重建的天线图案与由图像传感器检测到的天线图案进行比较
公开(公告)号：US09329500B2
公开(公告)日：2016-05-03
申请号：US12598377
申请日：2008-04-29
申请人： Frank Staals , Joeri Lof , Erik Roelof Loopstra , Wim Tjibbo Tel , Bearrach Moest
发明人： Frank Staals , Joeri Lof , Erik Roelof Loopstra , Wim Tjibbo Tel , Bearrach Moest
IPC分类号： G03F7/09 , G03F7/20 , G03F9/00
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70483 , G03F9/7088
摘要： The invention relates to an image for detection of an aerial pattern comprising spatial differences in radiation intensity in a cross section of a beam of radiation in a lithographic apparatus for exposing a substrate. The image sensor comprises a lens (5) arranged to form a detection image of the aerial pattern and an image detector (6) arranged to measure radiation intensities in a plurality, of positions in the detection image.
摘要翻译：本发明涉及一种用于检测天线图案的图像，其包括用于曝光基板的光刻设备中的辐射束的横截面中的辐射强度的空间差异。图像传感器包括布置成形成天线图案的检测图像的透镜（5）和布置成测量检测图像中的多个位置中的辐射强度的图像检测器（6）。

23. 发明授权

US09116446B2 Lithographic apparatus and method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US09116446B2
公开(公告)日：2015-08-25
申请号：US13243528
申请日：2011-09-23
申请人： Robbert Jan Voogd , Haico Victor Kok , Bearrach Moest , Petrus Franciscus Van Gils
发明人： Robbert Jan Voogd , Haico Victor Kok , Bearrach Moest , Petrus Franciscus Van Gils
IPC分类号： G03F9/00 , G03F7/20
CPC分类号： G03F9/7069 , G03F7/70066 , G03F7/7085
摘要： A lithographic apparatus comprising an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, the patterning device serving to impart the radiation beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned radiation beam onto a target portion of the substrate, wherein the lithographic apparatus further comprises a patterning device masking blade provided with a hole, a diffusing material being located at the hole.
摘要翻译：一种光刻设备，包括用于提供辐射束的照明系统，用于支撑图案形成装置的支撑结构，用于使辐射束在其横截面上具有图案的图案形成装置，用于保持衬底的衬底台，以及用于将图案化的辐射束投影到基板的目标部分上的投影系统，其中所述光刻设备还包括设置有孔的图案形成装置掩蔽刮板，位于所述孔处的扩散材料。

24. 发明授权

US09036130B2 Device and method for transmission image sensing 有权
标题翻译：用于传输图像感测的装置和方法
公开(公告)号：US09036130B2
公开(公告)日：2015-05-19
申请号：US12708986
申请日：2010-02-19
申请人： Bearrach Moest
发明人： Bearrach Moest
IPC分类号： G03B27/54 , G03B27/32 , G03B27/42 , G03F7/20 , G03F1/84
CPC分类号： G03F7/70666 , G03F1/84
摘要： A device for transmission image sensing for sensing an aerial image in a lithographic exposure apparatus comprises a projection system arranged to form, at an image side of the projection system, an aerial image of an object mark. The device further comprises a detector comprising a slit pattern having features corresponding to at least a part of the aerial image. The slit pattern is arranged to be exposed to the aerial image. The detector is further being arranged to detect detection radiation transmitted by the slit pattern; wherein d
摘要翻译：用于感测平版印刷曝光设备中的空间图像的透射图像感测装置包括投影系统，其布置成在投影系统的像侧形成物体标记的空中图像。该装置还包括检测器，其包括具有对应于空中图像的至少一部分的特征的狭缝图案。狭缝图案布置成暴露于空中图像。检测器还被布置成检测由狭缝图案传输的检测辐射; 其中d <0.85λ/ NA，其中d表示狭缝图案的最小特征的尺寸，λ表示检测辐射的预期波长，并且大于1的NA表示图像侧的数值孔径。

25. 发明授权

US07655367B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07655367B2
公开(公告)日：2010-02-02
申请号：US11384824
申请日：2006-03-21
申请人： Erik Petrus Buurman , Thomas Josephus Maria Castenmiller , Johannes Wilhelmus Maria Cornelis Teeuwsen , Bearrach Moest , Marc Antonius Maria Haast
发明人： Erik Petrus Buurman , Thomas Josephus Maria Castenmiller , Johannes Wilhelmus Maria Cornelis Teeuwsen , Bearrach Moest , Marc Antonius Maria Haast
IPC分类号： G03F9/00 , G03C5/00
CPC分类号： G03F7/70575 , G03F7/70641 , G03F9/7026
摘要： A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by an inboard sensor, such as a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.
摘要翻译：一种方法和装置利用表示辐射源的波长变化的数据来提供焦平面位置的控制或提供传感器数据的校正。在第一方面中，波长变化数据被提供给通过移动包括例如掩模台，基板台或投影光学系统的光学元件的装置部件来控制焦点的控制系统。在第二方面，变化数据用于校正例如由诸如传输图像传感器的内部传感器测量的焦平面位置数据。这两个方面可以组合在单个装置中或者可以单独使用。

26. 发明申请

US20080315121A1 Radiation detector, method of manufacturing a radiation detector and lithographic apparatus comprising a radiation detector 有权
标题翻译：辐射检测器，辐射检测器的制造方法和包括放射线检测器的光刻设备
公开(公告)号：US20080315121A1
公开(公告)日：2008-12-25
申请号：US11819160
申请日：2007-06-25
申请人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus Josephus Maria Kemper , Marc Antonius Maria Haast , Gerardus Wilhelmus Petrus Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus Maria Scholtes
发明人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus Josephus Maria Kemper , Marc Antonius Maria Haast , Gerardus Wilhelmus Petrus Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus Maria Scholtes
IPC分类号： G21K5/00 , H01L31/028 , H01L31/18
CPC分类号： H01L31/103 , G03F7/7085 , G03F7/70958 , H01L31/02161 , H01L31/022408 , H01L31/022416 , H01L31/1185 , H01L31/1804 , Y02E10/547
摘要： The invention relates to a radiation detector, a method of manufacturing a radiation detector and a lithographic apparatus comprising a radiation detector. The radiation detector has a radiation-sensitive surface. The radiation-sensitive surface is sensitive for radiation with a wavelength between 10-200 nm. The radiation detector has a silicon substrate, a dopant layer, a first electrode and a second electrode. The silicon substrate is provided in a surface area at a first surface side with doping profile of a certain conduction type. The dopant layer is provided on the first surface side of the silicon substrate. The dopant layer has a first layer of dopant material and a second layer. The second layer is a diffusion layer which is in contact with the surface area at the first surface side of the silicon substrate. The first electrode is connected to dopant layer. The second electrode is connected to the Silicon substrate.
摘要翻译：本发明涉及一种辐射检测器，一种制造辐射探测器的方法和一种包括辐射探测器的光刻设备。辐射检测器具有辐射敏感表面。辐射敏感表面对波长在10-200nm之间的辐射敏感。辐射检测器具有硅衬底，掺杂剂层，第一电极和第二电极。硅衬底在第一表面侧的表面区域设置有一定导电类型的掺杂分布。掺杂剂层设置在硅衬底的第一表面侧上。掺杂剂层具有掺杂剂材料的第一层和第二层。第二层是与硅衬底的第一表面侧的表面区域接触的扩散层。第一电极连接到掺杂剂层。第二电极连接到硅衬底。

27. 发明申请

US20080273183A1 Image sensor, lithographic apparatus comprising an image sensor and use of an image sensor in a lithographic apparatus 有权
标题翻译：图像传感器，包括图像传感器的光刻设备和光刻设备中的图像传感器的使用
公开(公告)号：US20080273183A1
公开(公告)日：2008-11-06
申请号：US11797505
申请日：2007-05-03
申请人： Frank Staals , Joeri Lof , Erik Roelof Loopstra , Wim Tjibbo Tel , Bearrach Moest
发明人： Frank Staals , Joeri Lof , Erik Roelof Loopstra , Wim Tjibbo Tel , Bearrach Moest
IPC分类号： G03B27/58 , G03B27/80
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70483 , G03F9/7088
摘要： The invention relates to an image sensor for detection of an aerial image formed by a beam of radiation in a lithographic projection apparatus for exposing a pattern onto a substrate held in a substrate plane by a substrate holder. The image sensor has an image detector and a lens. The lens is arranged to project at least part of the aerial image onto the image detector. The image sensor is positioned such within the substrate holder that the lens is positioned proximate the substrate plane.
摘要翻译：本发明涉及一种用于检测由光刻投影设备中的辐射束形成的空间图像的图像传感器，用于通过基板保持器将图案曝光在保持在基板平面中的基板上。图像传感器具有图像检测器和透镜。透镜布置成将至少一部分空间图像投影到图像检测器上。图像传感器被定位在衬底保持器内，透镜位于衬底平面附近。

28. 发明申请

US20070159622A1 Method of measuring the magnification of a projection system, device manufacturing method and computer program product 审中-公开
标题翻译：测量投影系统放大倍数的方法，装置制造方法和计算机程序产品
公开(公告)号：US20070159622A1
公开(公告)日：2007-07-12
申请号：US11603256
申请日：2006-11-22
申请人： Bearrach Moest , Arnout Stadt , Cornelis Andreas Francisus Van Der Poel
发明人： Bearrach Moest , Arnout Stadt , Cornelis Andreas Francisus Van Der Poel
IPC分类号： G01B9/00
CPC分类号： G03F9/7003 , G03F7/70633
摘要： A transmission image sensor is provided that is optimized for detection of an alignment marker that includes gratings, which are used to detect the position of a part of an overlay marker, e.g. of box-in-box type. Both the alignment markers and the overlay markers may be used to derive a measurement of magnification of a projection system. Magnification values obtained from the overlay marker components using the transmission image sensors link the values conventionally obtained using the transmission image sensor to detect alignment markers and an off-line tool to detect overlay markers.
摘要翻译：提供了一种透射图像传感器，其优化用于检测包括光栅的对准标记，其用于检测覆盖标记的一部分的位置，例如，盒装盒式。对准标记和覆盖标记都可用于导出投影系统的放大倍数的测量。使用透射图像传感器从覆盖标记分量获得的放大倍数值链接使用透射图像传感器常规获得的值以检测对准标记和离线工具以检测重叠标记。

29. 发明申请

US20070091290A1 Lithographic projection apparatus, device manufacturing methods and mask for use in a device manufacturing method 有权
公开(公告)号：US20070091290A1
公开(公告)日：2007-04-26
申请号：US11545763
申请日：2006-10-11
申请人： Marcus Van De Kerkhof , Bearrach Moest
发明人： Marcus Van De Kerkhof , Bearrach Moest
IPC分类号： G03B27/54
CPC分类号： G03F7/706 , G03F7/70075 , G03F9/7069 , G03F9/7088
摘要： During an alignment calibration process in a lithographic apparatus using a sensor to detect a property of a projected image at substrate level, a diffuser is inserted into the illumination beam to increase the range of angles of radiation incident on the substrate. Thereby it can be ensured that sufficient radiation enters the sensor even when the is a mismatch between the illumination mode used and the acceptance NA of the sensor.

30. 发明申请

US20070081138A1 Lithographic projection apparatus, device manufacturing methods and mask for use in a device manufacturing method 审中-公开
标题翻译：平版印刷设备，用于器件制造方法的器件制造方法和掩模
公开(公告)号：US20070081138A1
公开(公告)日：2007-04-12
申请号：US11246551
申请日：2005-10-11
申请人： Marcus Kerkhof , Bearrach Moest
发明人： Marcus Kerkhof , Bearrach Moest
IPC分类号： G03B27/72
CPC分类号： G03F7/706 , G03F7/70075 , G03F9/7069 , G03F9/7088
摘要： During an alignment calibration process in a lithographic apparatus using a sensor to detect a property of a projected image at substrate level, a diffuser is inserted into the illumination beam to increase the range of angles of radiation incident on the substrate. Thereby it can be ensured that sufficient radiation enters the sensor even when the is a mismatch between the illumination mode used and the acceptance NA of the sensor.
摘要翻译：在使用传感器检测投影图像在基板水平的特性的光刻设备中的对准校准过程中，将扩散器插入到照明光束中，以增加入射到基板上的辐射角度的范围。因此，即使当所使用的照明模式和传感器的接受NA之间不匹配时，也可以确保足够的辐射进入传感器。

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