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21. 发明授权

US06927839B2 Method and apparatus for forming pattern on thin substrate or the like 失效
公开(公告)号：US06927839B2
公开(公告)日：2005-08-09
申请号：US10685494
申请日：2003-10-16
申请人： Yukio Taniguchi , Hirotaka Yamaguchi , Susumu Tsujikawa
发明人： Yukio Taniguchi , Hirotaka Yamaguchi , Susumu Tsujikawa
IPC分类号： H01L21/027 , G03F7/20 , G03B27/58 , G03B27/62
CPC分类号： G03F7/70783 , G03F7/70791
摘要： A substrate processing apparatus of the present invention has a retaining base which retains a substrate, a device detecting undulation or thickness unevenness, and a control device which operates the detecting device. The substrate is deformed in a range of a field to be processed, by locally displacing the retaining base on the basis of the detected undulation or thickness unevenness of the substrate. Blurring of an image formed on the substrate can be thereby prevented.

22. 发明授权

US06819401B2 Exposure method and apparatus 失效
标题翻译：曝光方法和装置
公开(公告)号：US06819401B2
公开(公告)日：2004-11-16
申请号：US10383332
申请日：2003-03-07
申请人： Susumu Tsujikawa , Yukio Taniguchi , Hirotaka Yamaguchi , Masakiyo Matsumura
发明人： Susumu Tsujikawa , Yukio Taniguchi , Hirotaka Yamaguchi , Masakiyo Matsumura
IPC分类号： G03B1328
CPC分类号： G03F7/70058 , G03F7/70216 , G03F7/70283 , G03F7/70358
摘要： An exposure method includes the light incidence step of letting at least a part of light emitted from a light source for exposure use be incident on a mask supported by a supporting device, and the imaging step of forming an image of a mask pattern on a photosensitive material by guiding the reflecting light from the mask such that the photosensitive material supported by the supporting device receives the reflecting light coming from an incidence direction which is different from the incidence direction of the light incident on the mask.
摘要翻译：曝光方法包括：将从用于曝光的光源发射的光的至少一部分入射到由支撑装置支撑的掩模上的光入射步骤，以及在感光体上形成掩模图案的图像的成像步骤通过引导来自掩模的反射光使得由支撑装置支撑的感光材料接收来自与入射在掩模上的光的入射方向不同的入射方向的反射光。

23. 发明申请

US20090278163A1 LIGHT-EMITTING DEVICE AND MANUFACTURING METHOD OF THE SAME 有权
标题翻译：发光装置及其制造方法
公开(公告)号：US20090278163A1
公开(公告)日：2009-11-12
申请号：US12088983
申请日：2006-09-28
申请人： Ryo Sakamoto , Masatoshi Iwata , Susumu Tsujikawa , Yoshiyuki Kobayashi
发明人： Ryo Sakamoto , Masatoshi Iwata , Susumu Tsujikawa , Yoshiyuki Kobayashi
IPC分类号： H01L33/00
CPC分类号： H01S5/18311 , H01L33/025 , H01L33/105 , H01L33/145 , H01L33/32 , H01S5/0282
摘要： A light-emitting device (1) is provided having a current blocking layer (9) of buried structure, a portion of the current blocking layer (9) having an oxygen concentration higher than that of a light-emitting layer, the current blocking layer being of a thickness of not less than 5 nm and not more than 100 nm. It includes an etching stop layer (24) below the current blocking layer (9), the etching stop layer being good in oxidation resistance. The light-emitting device (1) and its manufacturing method are provided such that the device has its current confinement effect improved and its output increased at lower forward voltage.
摘要翻译：提供一种发光器件（1），其具有掩埋结构的电流阻挡层（9），电流阻挡层（9）的氧浓度高于发光层的一部分，电流阻挡层厚度不小于5nm且不大于100nm。它包括在电流阻挡层（9）下方的蚀刻停止层（24），该抗蚀剂层具有良好的抗氧化性。提供发光装置（1）及其制造方法，使得该装置的电流约束效果得到改善，并且其输出在较低的正向电压下增加。

24. 发明申请

US20080019002A1 CRYSTALLIZATION APPARATUS, CRYSTALLIZATION METHOD, AND PHASE SHIFTER 失效
标题翻译：结晶装置，结晶方法和相位改变
公开(公告)号：US20080019002A1
公开(公告)日：2008-01-24
申请号：US11861885
申请日：2007-09-26
申请人： Yukio TANIGUCHI , Masakiyo Matsumura , Hirotaka Yamaguchi , Mikihiko Nishitani , Susumu Tsujikawa , Yoshinobu Kimura , Masayuki Jyumonji
发明人： Yukio TANIGUCHI , Masakiyo Matsumura , Hirotaka Yamaguchi , Mikihiko Nishitani , Susumu Tsujikawa , Yoshinobu Kimura , Masayuki Jyumonji
IPC分类号： G02B27/00
CPC分类号： H01L29/78675 , B23K26/066 , B23K26/073 , B23K26/0734 , G02B5/02 , G02B5/3083 , G03F1/28 , G03F1/34 , H01L21/02532 , H01L21/02678 , H01L21/02686 , H01L27/1285 , H01L29/66757 , Y10T117/10
摘要： A crystallization apparatus includes an illumination system which applies illumination light for crystallization to a non-single-crystal semiconductor film, and a phase shifter which includes first and second regions disposed to form a straight boundary and transmitting the illumination light from the illumination system by a first phase retardation therebetween, and phase-modulates the illumination light to provide a light intensity distribution having an inverse peak pattern that light intensity falls in a zone of the non-single-crystal semiconductor film containing an axis corresponding to the boundary. The phase shifter further includes a small region which extends into at least one of the first and second regions from the boundary and transmits the illumination light by a second phase retardation with respect to the at least one of the first and second regions.
摘要翻译：结晶装置包括：向非单晶半导体膜施加用于结晶的照明光的照明系统;以及移相器，其包括设置成形成直边界的第一和第二区域，并将来自照明系统的照明光透过第一相位相位差，并且对照明光进行相位调制，以提供具有光强度落在包含对应于边界的轴的非单晶半导体膜的区域中的反峰值图案的光强度分布。移相器还包括从边界延伸到第一和第二区域中的至少一个区域的小区域，并相对于第一和第二区域中的至少一个透射照明光第二相位延迟。

25. 发明授权

US07101436B2 Crystallization apparatus, optical member for use in crystallization apparatus, crystallization method, manufacturing method of thin film transistor, and manufacturing method of matrix circuit substrate of display 失效
标题翻译：结晶装置，结晶装置中使用的光学构件，结晶方法，薄膜晶体管的制造方法以及显示器的矩阵电路基板的制造方法
公开(公告)号：US07101436B2
公开(公告)日：2006-09-05
申请号：US10603821
申请日：2003-06-26
申请人： Yukio Taniguchi , Masakiyo Matsumura , Hirotaka Yamaguchi , Mikihiko Nishitani , Susumu Tsujikawa , Yoshinobu Kimura , Masayuki Jyumonji
发明人： Yukio Taniguchi , Masakiyo Matsumura , Hirotaka Yamaguchi , Mikihiko Nishitani , Susumu Tsujikawa , Yoshinobu Kimura , Masayuki Jyumonji
IPC分类号： C30B29/16
CPC分类号： G03B21/56 , Y10T117/10 , Y10T117/1004 , Y10T117/1008 , Y10T117/1012
摘要： A crystallization apparatus includes an optical illumination system to illuminate a phase shift mask and which irradiates an amorphous semiconductor film with a light beam having an inverse peak type light intensity distribution including a minimum light intensity in a point corresponding to a phase shift portion of the phase shift mask to produce a crystallized semiconductor film. A wavefront dividing element is disposed on a light path between the optical illumination system and the phase shift mask. The wavefront dividing element wavefront-divides the light beam supplied from the optical illumination system into a plurality of light beams, and condenses the wavefront-divided light beams in the corresponding phase shift portion or in the vicinity of the portion.
摘要翻译：结晶装置包括：光照射系统，用于照射相移掩模，并且对具有反相峰值型光强度分布的光束照射非晶半导体膜，所述光束具有相对于相的相移部分的点的最小光强度移位掩模以产生结晶半导体膜。波前分割元件设置在光学照明系统和相移掩模之间的光路上。波前分割元件将从光学照明系统提供的光束前后分割为多个光束，并将波前划分的光束聚集在相应的相移部分或该部分附近。

26. 发明申请

US20060065185A1 Crystallization apparatus, crystallization method, and phase shifter 失效
公开(公告)号：US20060065185A1
公开(公告)日：2006-03-30
申请号：US11224014
申请日：2005-09-13
申请人： Yukio Taniguchi , Masakiyo Matsumura , Hirotaka Yamaguchi , Mikihiko Nishitani , Susumu Tsujikawa , Yoshinobu Kimura , Masayuki Jyumonji
发明人： Yukio Taniguchi , Masakiyo Matsumura , Hirotaka Yamaguchi , Mikihiko Nishitani , Susumu Tsujikawa , Yoshinobu Kimura , Masayuki Jyumonji
IPC分类号： C30B23/00 , C30B28/12 , C30B28/14 , C30B25/00
CPC分类号： H01L29/78675 , B23K26/066 , B23K26/073 , B23K26/0734 , G02B5/02 , G02B5/3083 , G03F1/28 , G03F1/34 , H01L21/02532 , H01L21/02678 , H01L21/02686 , H01L27/1285 , H01L29/66757 , Y10T117/10
摘要： A crystallization apparatus includes an illumination system which applies illumination light for crystallization to a non-single-crystal semiconductor film, and a phase shifter which includes first and second regions disposed to form a straight boundary and transmitting the illumination light from the illumination system by a first phase retardation therebetween, and phase-modulates the illumination light to provide a light intensity distribution having an inverse peak pattern that light intensity falls in a zone of the non-single-crystal semiconductor film containing an axis corresponding to the boundary. The phase shifter further includes a small region which extends into at least one of the first and second regions from the boundary and transmits the illumination light by a second phase retardation with respect to the at least one of the first and second regions.

27. 发明申请

US20050048383A1 Crystallization apparatus and crystallization method 失效
标题翻译：结晶装置和结晶方法
公开(公告)号：US20050048383A1
公开(公告)日：2005-03-03
申请号：US10958396
申请日：2004-10-06
申请人： Yukio Taniguchi , Masakiyo Matsumura , Hirotaka Yamaguchi , Mikihiko Nishitani , Susumu Tsujikawa , Yoshinobu Kimura , Masayuki Jyumonji
发明人： Yukio Taniguchi , Masakiyo Matsumura , Hirotaka Yamaguchi , Mikihiko Nishitani , Susumu Tsujikawa , Yoshinobu Kimura , Masayuki Jyumonji
IPC分类号： B23K26/06 , H01L21/20 , H01L21/268 , H01L21/336 , H01L29/786 , H01L31/036 , G21K5/10 , H01L29/04 , G03F9/00 , H01J37/08
CPC分类号： H01L21/02678 , B23K26/066 , H01L21/2026 , H01L21/268 , H01L29/66757 , H01L29/78675 , Y10S117/90 , Y10S117/904 , Y10S117/905 , Y10T117/10 , Y10T117/1004 , Y10T117/1008
摘要： A crystallization apparatus includes an illumination system which illuminates a phase-shift mask and an image-forming optical system arranged in an optical path between the phase-shift mask and a semiconductor film. The semiconductor film is irradiated with a light beam having a light intensity distribution of inverted peak patterns whose light intensity is the lowest in portions corresponding to phase shift sections to form a crystallized semiconductor film. The image-forming optical system is located to optically conjugate the phase-shift mask and the semiconductor film and has an aberration corresponding to the given wavelength range to form a light intensity distribution of inverted peak patterns with no swell of intensity in the middle portion.
摘要翻译：结晶装置包括照射相移掩模的照明系统和布置在相移掩模和半导体膜之间的光路中的成像光学系统。用对应于相移部分的部分的光强度最低的具有反相峰值图案的光强度分布的光束照射半导体膜，以形成结晶的半导体膜。成像光学系统被定位为将相移掩模和半导体膜光学共轭，并且具有对应于给定波长范围的像差，以形成中间部分没有强度波动的反向峰值图案的光强度分布。

28. 发明授权

US06816231B2 Method and apparatus for exposure 失效
标题翻译：暴露方法和装置
公开(公告)号：US06816231B2
公开(公告)日：2004-11-09
申请号：US10458387
申请日：2003-06-09
申请人： Susumu Tsujikawa , Yukio Taniguchi , Hirotaka Yamaguchi , Masakiyo Matsumura
发明人： Susumu Tsujikawa , Yukio Taniguchi , Hirotaka Yamaguchi , Masakiyo Matsumura
IPC分类号： G03B2742
CPC分类号： G03F7/70075 , G03B27/42 , G03F7/70366
摘要： Disclosed is an exposure method and apparatus (aligner) for exposure wherein there is reduced a physical load put on a driving mechanism which moves a supporting device for supporting a mask and an exposure object which has a photosensitive material, and the structure of the driving mechanism is simplified. The method comprises an incidence step of letting at least a part of light from a light source for exposure be incident on a mask supported by a supporting device; an imaging step of letting transmission light from the mask be incident on a photosensitive material supported by the supporting device from a direction which is different from a direction of light incident on the mask, thereby causing the transmission light to form an image on the photosensitive material; a rotation step of rotating the supporting device such that a position of irradiation to the mask caused by light from the light source changes along a circumferential direction of the supporting device; and an irradiation position changing step of changing the position of irradiation of light to the mask as well as a position of irradiation of light to the photosensitive material along a direction which is different from the circumferential direction of the supporting device in a rotating plane of the supporting device while the supporting device is being rotated.
摘要翻译：公开了一种用于曝光的曝光方法和装置（对准器），其中减少了放置在驱动机构上的物理负载，该驱动机构移动用于支撑掩模的支撑装置和具有感光材料的曝光对象，以及驱动机构的结构简化了。该方法包括使来自用于曝光的光源的至少一部分光入射到由支撑装置支撑的掩模上的入射步骤; 使来自掩模的透射光的成像步骤从与入射到掩模上的光的方向不同的方向入射到由支撑装置支撑的感光材料上，从而使透射光在感光材料上形成图像 ; 旋转步骤，使所述支撑装置旋转，使得由来自所述光源的光引起的对所述掩模的照射位置沿所述支撑装置的圆周方向变化; 以及照射位置改变步骤，其将光照射到掩模的位置以及沿着与支撑装置的圆周方向不同的方向在光敏材料的旋转平面中将光照射到感光材料的位置支撑装置正在旋转。

29. 发明授权

US06476880B2 Projection type color liquid crystal display apparatus capable of enhancing optical utilization efficiency 有权
标题翻译：能够提高光学利用效率的投射型彩色液晶显示装置
公开(公告)号：US06476880B2
公开(公告)日：2002-11-05
申请号：US09966602
申请日：2001-10-01
申请人： Susumu Tsujikawa , Masao Imai
发明人： Susumu Tsujikawa , Masao Imai
IPC分类号： G02F113
CPC分类号： G02F1/133621 , G02B27/1053 , G02B27/123 , G02B27/145 , G02B27/148 , G02B27/283 , G02F1/13362 , G02F2001/133623 , H04N5/7441 , H04N9/3108 , H04N9/3167
摘要： In a projection type color liquid crystal display apparatus, a polarization conversion section receives a luminous flux from a light source to convert the luminous flux into a unified luminous flux having a single linearly-polarized direction. A color separation section receives the unified luminous flux to selectively reflect a plurality of color components of the unified luminous flux individually at different angles. Convex lenses of a microlens array converge the reflected color components into different pixels of a liquid crystal element.
摘要翻译：在投影型彩色液晶显示装置中，偏振转换部接收来自光源的光束，以将光束转换为具有单一线性偏振方向的统一光束。色分离部分接收统一的光通量，以分别以不同的角度选择性地反射统一光通量的多个颜色分量。微透镜阵列的凸透镜将反射的颜色分量会聚到液晶元件的不同像素中。

30. 发明授权

US06320628B1 Projection type color liquid crystal display apparatus capable of enhancing optical utilization efficiency 失效
标题翻译：能够提高光学利用效率的投射型彩色液晶显示装置
公开(公告)号：US06320628B1
公开(公告)日：2001-11-20
申请号：US08960037
申请日：1997-10-29
申请人： Susumu Tsujikawa , Masao Imai
发明人： Susumu Tsujikawa , Masao Imai
IPC分类号： G02F11335
CPC分类号： G02F1/133621 , G02B27/1053 , G02B27/123 , G02B27/145 , G02B27/148 , G02B27/283 , G02F1/13362 , G02F2001/133623 , H04N5/7441 , H04N9/3108 , H04N9/3167
摘要： In a projection type color liquid crystal display apparatus, a polarization conversion section receives a luminous flux from a light source to convert the luminous flux into a unified luminous flux having a single linearly-polarized direction. A color separation section receives the unified luminous flux to selectively reflect a plurality of color components of the unified luminous flux individually at different angles. Convex lenses of a microlens array converge the reflected color components into different pixels of a liquid crystal element.
摘要翻译：在投影型彩色液晶显示装置中，偏振转换部接收来自光源的光束，以将光束转换为具有单一线性偏振方向的统一光束。色分离部分接收统一的光通量，以分别以不同的角度选择性地反射统一光通量的多个颜色分量。微透镜阵列的凸透镜将反射的颜色分量会聚到液晶元件的不同像素中。

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