会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 21. 发明申请
    • Method for Manufacturing Semiconductor Device
    • 半导体器件制造方法
    • US20080057632A1
    • 2008-03-06
    • US11843745
    • 2007-08-23
    • Yasuyuki AraiKoichiro TanakaYukie Suzuki
    • Yasuyuki AraiKoichiro TanakaYukie Suzuki
    • H01L21/84
    • H01L27/1288H01L27/1214
    • The present invention offers a method for forming an opening portion by a simple process without using a photomask or a resist. Further, the present invention proposes a method for manufacturing a semiconductor device at low cost. A plurality of light absorbing layers is formed over a substrate, an interlayer insulating layer is formed over the plurality of light absorbing layers, the plurality of light absorbing layers is irradiated with a linear or rectangular laser beam from the interlayer insulating layer side, and at least the interlayer insulating layer which is over the plurality of light absorbing layers is removed and an opening portion is formed; and accordingly, a plurality of opening portions can be formed by removing the plurality of light absorbing layers and an insulating film formed over the plurality of light absorbing layers.
    • 本发明提供一种通过简单的工艺形成开口部分的方法,而不使用光掩模或抗蚀剂。 此外,本发明提供一种以低成本制造半导体器件的方法。 在衬底上形成多个光吸收层,在多个光吸收层上形成层间绝缘层,多层光吸收层用来自层间绝缘层侧的直线或矩形激光束照射,并且在 除去多个光吸收层之上的层间绝缘层的最小值,形成开口部; 因此,可以通过去除多个光吸收层和形成在多个光吸收层上的绝缘膜来形成多个开口部。
    • 24. 发明授权
    • Method for manufacturing semiconductor device
    • 制造半导体器件的方法
    • US08148259B2
    • 2012-04-03
    • US11843745
    • 2007-08-23
    • Yasuyuki AraiKoichiro TanakaYukie Suzuki
    • Yasuyuki AraiKoichiro TanakaYukie Suzuki
    • H01L21/4763
    • H01L27/1288H01L27/1214
    • The present invention offers a method for forming an opening portion by a simple process without using a photomask or a resist. Further, the present invention proposes a method for manufacturing a semiconductor device at low cost. A plurality of light absorbing layers is formed over a substrate, an interlayer insulating layer is formed over the plurality of light absorbing layers, the plurality of light absorbing layers is irradiated with a linear or rectangular laser beam from the interlayer insulating layer side, and at least the interlayer insulating layer which is over the plurality of light absorbing layers is removed and an opening portion is formed; and accordingly, a plurality of opening portions can be formed by removing the plurality of light absorbing layers and an insulating film formed over the plurality of light absorbing layers.
    • 本发明提供一种通过简单的工艺形成开口部分的方法,而不使用光掩模或抗蚀剂。 此外,本发明提供一种以低成本制造半导体器件的方法。 在衬底上形成多个光吸收层,在多个光吸收层上形成层间绝缘层,多层光吸收层用来自层间绝缘层侧的直线或矩形激光束照射,并且在 除去多个光吸收层之上的层间绝缘层的最小值,形成开口部; 因此,可以通过去除多个光吸收层和形成在多个光吸收层上的绝缘膜来形成多个开口部。