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    • 21. 发明授权
    • Organic electrolytic solution and lithium battery using the same
    • 有机电解液和锂电池使用相同
    • US07217480B2
    • 2007-05-15
    • US10754731
    • 2004-01-12
    • Jae-il HanHyo-sug LeeHan-soo Kim
    • Jae-il HanHyo-sug LeeHan-soo Kim
    • H01M10/40
    • H01M6/168H01M2/0212H01M2/0217H01M10/052H01M10/0567
    • An organic electrolytic solution includes a lithium salt and an organic solvent containing a phosphonate compound, and a lithium battery utilizes the organic electrolytic solution. When using the organic electrolyte containing the phosphonate compound to manufacture a lithium secondary battery, the lithium secondary battery has improved stability to reduction-induced decomposition, reduced first cycle irreversible capacity, and improved charging/discharging efficiency and lifespan. In addition, the lithium secondary battery does not swell beyond a predetermined thickness range after formation and standard charging at room temperature and has improved reliability. Even when the lithium secondary battery swells seriously at a high temperature, its capacity is high enough for practical applications. The capacity of the lithium secondary battery may substantially be recovered after being left at a high temperature.
    • 有机电解液包含锂盐和含有膦酸酯化合物的有机溶剂,锂电池利用有机电解液。 当使用含有膦酸酯化合物的有机电解质来制造锂二次电池时,锂二次电池具有改善的还原诱导分解稳定性,降低第一循环不可逆容量,提高充放电效率和寿命。 此外,锂二次电池在室温下成型和标准充电之后不会膨胀超过预定的厚度范围并且具有改善的可靠性。 即使锂二次电池在高温下发生严重的膨胀,其实际应用也足够高。 锂二次电池的容量在高温下放电后可以大体上恢复。
    • 22. 发明申请
    • Nonvolatile memory device and method of fabricating the same
    • 非易失性存储器件及其制造方法
    • US20090045455A1
    • 2009-02-19
    • US12219465
    • 2008-07-23
    • Kwang-soo SeolSang-jin ParkSang-moo ChoiHyo-sug LeeJung-hun Sung
    • Kwang-soo SeolSang-jin ParkSang-moo ChoiHyo-sug LeeJung-hun Sung
    • H01L29/792H01L21/28
    • H01L29/4234H01L29/40117H01L29/513H01L29/66833
    • Example embodiments relate to nonvolatile semiconductor memory devices using an electric charge storing layer as a storage node and fabrication methods thereof. An electric charge trap type nonvolatile memory device may include a tunneling film, an electric charge storing layer, a blocking insulation film, and a gate electrode. The blocking insulation film may be an aluminum oxide having an energy band gap larger than that of a γ-phase aluminum oxide film. An α-phase crystalline aluminum oxide film as a blocking insulation film may have an energy band gap of about 7.0 eV or more along with fewer defects. The crystalline aluminum oxide film may be formed by providing a source film (e.g., AlF3 film) on or within a preliminary blocking insulation film (e.g., amorphous aluminum oxide film) and performing a heat treatment. Alternatively, an aluminum compound (e.g., AlF3) may be introduced into the preliminary blocking insulation film by other diffusion methods or ion implantation. Accordingly, the ability of the memory device to maintain electric charges may be improved, the operating voltage for programming and erasing may be lowered, and the operating speed may be increased.
    • 示例性实施例涉及使用电荷存储层作为存储节点的非易失性半导体存储器件及其制造方法。 电荷阱型非易失性存储器件可以包括隧穿膜,电荷存储层,阻挡绝缘膜和栅电极。 阻挡绝缘膜可以是具有比γ相氧化铝膜的能带隙大的能带隙的氧化铝。 作为阻挡绝缘膜的α相结晶氧化铝膜可以具有约7.0eV以上的能带隙和更少的缺陷。 结晶氧化铝膜可以通过在预先隔离绝缘膜(例如无定形氧化铝膜)上或内部提供源膜(例如,AlF 3膜)并进行热处理而形成。 或者,可以通过其它扩散方法或离子注入将铝化合物(例如,AlF 3)引入到初步阻挡绝缘膜中。 因此,可以提高存储器件保持电荷的能力,可以降低用于编程和擦除的操作电压,并且可以提高操作速度。