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21. 发明授权

US6053801A Substrate polishing with reduced contamination 有权
标题翻译：底物抛光，污染减少
公开(公告)号：US6053801A
公开(公告)日：2000-04-25
申请号：US309182
申请日：1999-05-10
申请人： Jay D. Pinson , Nitin Shah , David W. Groechel , Joe Waidl
发明人： Jay D. Pinson , Nitin Shah , David W. Groechel , Joe Waidl
IPC分类号： B08B17/02 , B24B53/007 , B24B53/017 , B24B57/02 , B24B55/12
CPC分类号： B24B53/017 , B08B17/02 , B24B57/02
摘要： Systems and methods for polishing a substrate with reduced contamination are described. A rinse arm has one or more nozzles configured to direct rinse fluid toward a polishing surface for polishing a substrate. The rinse arm further includes a fluid dispenser configured to direct rinse fluid to one or more surfaces of the rinse arm in proximity to the polishing surface and exposed to airborne slurry particles generated from slurry on the polishing surface. By maintaining the atmosphere in the vicinity of the exposed rinse arm surfaces at an elevated relative humidity level, airborne slurry particles adhering to the exposed rinse arm surfaces remain in suspension and, therefore, may be easily cleaned, e.g., during a high pressure rinse cycle. This feature reduces the likelihood that slurry particles will accumulate on exposed surfaces of the polishing apparatus and flake off while a substrate is being polished, reducing the likelihood of substrate defects caused by such slurry contamination.
摘要翻译：描述了用于抛光具有降低的污染物的基底的系统和方法。冲洗臂具有一个或多个喷嘴，其构造成将冲洗流体引向研磨表面以抛光基底。冲洗臂还包括流体分配器，其配置成将冲洗流体引导到靠近抛光表面的冲洗臂的一个或多个表面，并暴露于由抛光表面上的浆料产生的空气传播的浆料颗粒。通过在升高的相对湿度水平下保持暴露的冲洗臂表面附近的气氛，附着在暴露的冲洗臂表面上的气载浆料颗粒保持悬浮状态，因此可以容易地清洁，例如在高压漂洗循环。该特征降低了浆料颗粒在抛光装置的暴露表面上积聚的可能性，并且在抛光衬底时剥落，从而降低了由这种浆料污染引起的衬底缺陷的可能性。

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