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    • 24. 发明授权
    • Replaceable plate expanded thermal plasma apparatus and method
    • 可更换板膨胀热等离子体装置及方法
    • US07282244B2
    • 2007-10-16
    • US10655350
    • 2003-09-05
    • Mark SchaepkensCharles Dominic IacovangeloThomas Miebach
    • Mark SchaepkensCharles Dominic IacovangeloThomas Miebach
    • H05H1/24
    • C23C16/513H01J37/32009H01J37/32357
    • The present invention provides a deposition process for plasma enhanced chemical vapor deposition of a coating on a substrate. The process comprises detennining a target process condition within a chamber of an expanding thermal plasma generator; the generator comprising a cathode, a replaceable cascade plate and an anode comprising a concentric orifice; and thereafter replacing the cascade plate with another plate having a configured orifice to effect the identified target process condition. The plasma is then generated at the target process condition by providing a plasma gas to the plasma generator and ionizing the plasma gas in an arc between cathode and anode within the generator and expanding the gas as a plasma onto a substrate in a deposition chamber.
    • 本发明提供了一种用于等离子体增强化学气相沉积在衬底上的涂层的沉积工艺。 该方法包括确定膨胀热等离子体发生器的腔室内的目标工艺条件; 所述发生器包括阴极,可替换级联板和包括同心孔的阳极; 然后用具有配置的孔的另一个板代替级联板以实现所识别的目标工艺条件。 然后通过向等离子体发生器提供等离子体气体并使等离子体气体在发生器内的阴极和阳极之间的电弧中离子化并且将等离子体气体作为等离子体扩散到沉积室中的衬底上,从而在目标工艺条件下生成等离子体。