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21. 发明申请

US20050238859A1 Metal member-buried ceramics article and method of producing the same 审中-公开
标题翻译：金属构件陶瓷制品及其制造方法
公开(公告)号：US20050238859A1
公开(公告)日：2005-10-27
申请号：US11076038
申请日：2005-03-10
申请人： Tomonori Uchimaru , Atsushi Arai , Shigeko Muramatsu , Shinichiro Aomura , Mitsuhiro Fujita , Susumu Kimijima , Keisuke Watanabe
发明人： Tomonori Uchimaru , Atsushi Arai , Shigeko Muramatsu , Shinichiro Aomura , Mitsuhiro Fujita , Susumu Kimijima , Keisuke Watanabe
IPC分类号： C04B35/581 , B32B15/00 , H01L21/68 , H01L21/683
CPC分类号： C04B35/581 , C04B35/6261 , C04B35/62625 , C04B35/62655 , C04B35/62695 , C04B35/6342 , C04B35/645 , C04B37/001 , C04B37/005 , C04B2235/3225 , C04B2235/604 , C04B2235/656 , C04B2235/661 , C04B2235/721 , C04B2235/723 , C04B2235/9638 , C04B2235/9661 , C04B2237/08 , C04B2237/366 , C04B2237/403 , C04B2237/704 , Y10T428/24917
摘要： A metal member-buried ceramics article which can uniformalize adsorption force or adsorption force and distribution of temperature in plane, decrease pollution of a semiconductor wafer, and suppress warping of the whole body is provided. This article has a three layer structure comprising, between an upper layer 2 and a lower layer 3 composed of an AlN sintered body in the form of plate, an intermediate connecting layer 4 having a thickness of 0.5 to 10 mm composed of a sintered body of defatted AlN powder and a metal electrode 5 in contact with the inner surface of the upper layer or lower layer or a metal electrode in contact with the inner surface of the upper layer and a metal electric resistor in contact with the inner surface of the lower layer sandwiched between them, and has means for suppressing a stress remaining in sintering the defatted AlN powder.
摘要翻译：提供能够使吸附力或吸附力均匀化，平面温度分布均匀化的金属构件埋层陶瓷制品，降低半导体晶片的污染，抑制全身翘曲。该制品具有三层结构，在上层2和下层3之间，由板状的AlN烧结体组成，中间连接层4的厚度为0.5〜10mm，由烧结体脱脂AlN粉末和与上层或下层的内表面接触的金属电极5或与上层的内表面接触的金属电极和与下层的内表面接触的金属电阻器夹在它们之间，并且具有抑制烧结脱脂AlN粉末时剩余的应力的手段。

22. 发明授权

US5599394A Apparatus for delivering a silica film forming solution 失效
标题翻译：用于输送二氧化硅膜形成溶液的装置
公开(公告)号：US5599394A
公开(公告)日：1997-02-04
申请号：US312733
申请日：1994-09-27
申请人： Manabu Yabe , Masaru Kitagawa , Takafumi Ohki , Mitsuhiro Fujita
发明人： Manabu Yabe , Masaru Kitagawa , Takafumi Ohki , Mitsuhiro Fujita
IPC分类号： B05C5/00 , B05C11/08 , B05C11/10 , F04B43/073 , H01L21/00 , H01L21/316
CPC分类号： H01L21/67011 , B05C11/08 , B05C11/1002 , F04B43/0733
摘要： A dispensing apparatus for delivering a silica coating solution in a fixed quantity from a liquid container to a surface of a substrate to form a silica film thereon. The liquid container storing the silica coating solution is connected to a diaphragm pump through a suction pipe. The diaphragm pump is connected to a nozzle through a delivery pipe. The coating solution in the liquid container is supplied to the nozzle by sucking and delivering action of the diaphragm pump. The coating solution is discharged from the nozzle to a surface of a substrate supported by a spin chuck of a spin coating apparatus.
摘要翻译：一种用于将固定量的二氧化硅涂层溶液从液体容器输送到基底表面以在其上形成二氧化硅膜的分配装置。储存二氧化硅涂布液的液体容器通过抽吸管连接到隔膜泵。隔膜泵通过输送管连接到喷嘴。液体容器中的涂布液通过隔膜泵的吸引和输送动作被供给到喷嘴。涂布溶液从喷嘴排出到由旋涂装置的旋转卡盘支撑的基板的表面上。

23. 发明授权

US5180431A Apparatus for applying liquid agent on surface of rotating substrate 失效
标题翻译：用于将液体试剂涂在旋转基片的表面上的装置
公开(公告)号：US5180431A
公开(公告)日：1993-01-19
申请号：US538239
申请日：1990-06-14
申请人： Kenji Sugimoto , Mitsuhiro Fujita
发明人： Kenji Sugimoto , Mitsuhiro Fujita
IPC分类号： B05C11/08 , H01L21/00 , H01L21/027 , H01L21/30
CPC分类号： H01L21/6715 , B05C11/08
摘要： An apparatus for applying liquid agent to a substrate includes a cup member for preventing liquid agent from scattering. Cleaning agent is supplied to an inner circumferential surface of the cup member through openings located at an upper portion of the inner circumferential surface. The structure for supplying the cleaning agent is integrally formed on an outer circumferential surface of the cup member. The apparatus also has a slanted surface for regulating and guiding air, liquid agent and cleaning agent downwardly through the cup member. Cleaning agent is supplied to the slanted surface through openings which are located at an upper portion thereof. Preferably, the openings are angled so that cleaning agent is directed substantially horizontally therefrom. Preferably, the apparatus has fine irregularities for spreading cleaning agent on the inner circumferential and slanted surfaces.
摘要翻译：将液体试剂涂敷于基材的装置包括防止液剂飞散的杯状部件。通过位于内周面的上部的开口将清洗剂供给到杯构件的内周面。用于供给清洁剂的结构一体地形成在杯状构件的外周面上。该装置还具有用于通过杯构件向下调节和引导空气，液体剂和清洁剂的倾斜表面。清洁剂通过位于其上部的开口供给到倾斜表面。优选地，开口成角度，使得清洁剂基本上水平地被定向。优选地，该装置具有用于在内周和倾斜表面上铺展清洁剂的细小凹凸。

24. 发明授权

US08846290B2 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same 有权
标题翻译：光化射线敏感性或辐射敏感性树脂组合物和使用其的图案形成方法
公开(公告)号：US08846290B2
公开(公告)日：2014-09-30
申请号：US13260777
申请日：2010-03-26
申请人： Naohiro Tango , Michihiro Shirakawa , Mitsuhiro Fujita , Shuhei Yamaguchi , Akinori Shibuya , Shohei Kataoka
发明人： Naohiro Tango , Michihiro Shirakawa , Mitsuhiro Fujita , Shuhei Yamaguchi , Akinori Shibuya , Shohei Kataoka
IPC分类号： G03F7/027 , C08F220/18
CPC分类号： G03F7/0045 , C08F220/18 , C08F220/28 , C08F220/42 , G03F7/0397 , G03F7/2041 , C08F220/22
摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, wherein (B) the compound capable of generating an acid upon irradiation with an actinic ray or radiation is contained in an amount of 10 to 30 mass % based on the entire solid content of the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method uses the composition.
摘要翻译：光化射线敏感或辐射敏感性树脂组合物包括：（A）能够通过酸的作用增加树脂（A）在碱性显影剂中的溶解度的树脂; 和（B）能够在用光化射线或辐射照射时能够产生酸的化合物，其中（B）当以光化射线或辐射照射时能够产生酸的化合物的含量为10〜30质量％基于光化射线敏感性或辐射敏感性树脂组合物的全部固体含量，并且图案形成方法使用该组合物。

25. 发明授权

US07608553B2 Transparent rare-earth oxide sintered body and manufacturing method thereof 有权
标题翻译：透明稀土氧化物烧结体及其制造方法
公开(公告)号：US07608553B2
公开(公告)日：2009-10-27
申请号：US11589795
申请日：2006-10-31
申请人： Mitsuhiro Fujita , Masaki Irie
发明人： Mitsuhiro Fujita , Masaki Irie
IPC分类号： C04B35/505
CPC分类号： C04B35/505 , C04B35/50 , C04B35/62695 , C04B2235/3251 , C04B2235/5409 , C04B2235/5436 , C04B2235/604 , C04B2235/656 , C04B2235/6567 , C04B2235/658 , C04B2235/6581 , C04B2235/6582 , C04B2235/72 , C04B2235/9653
摘要： The invention intends to obtain a transparent yttrium oxide sintered body of which in-line transmittance in a visible wavelength region of 400 to 800 nm at a thickness of 1 mm is 60% or more, without using aluminum that readily segregates in grain boundaries of yttrium oxide, without using special raw materials in which a silicon content is particularly reduced and without finely pulverizing raw materials. A transparent yttrium oxide sintered body that contains, with yttrium oxide as a main component, at least either one of tantalum or niobium or both thereof and has the in-line transmittance of 60% or more at a thickness of 1 mm in a visible wavelength region in the range of 400 to 800 nm.
摘要翻译：本发明旨在获得一种透明的氧化钇烧结体，其中在1mm至5mm的可见光波长范围内的直线透射率为60％以上，而不使用易于在钇的晶界中分离的铝氧化物，而不使用其中硅含量特别降低的特殊原料，而不需要细粉碎原料。一种透明氧化钇烧结体，其以氧化钇为主要成分，含有钽或铌中的至少一种或二者，并且在可见波长为1mm的条件下具有60％以上的直线透射率范围在400至800nm之间。

26. 发明授权

US06492042B2 Ceramics material and producing the same 失效
标题翻译：陶瓷材料和生产相同
公开(公告)号：US06492042B2
公开(公告)日：2002-12-10
申请号：US09901070
申请日：2001-07-10
申请人： Keiji Morita , Mitsuhiro Fujita , Haruo Murayama
发明人： Keiji Morita , Mitsuhiro Fujita , Haruo Murayama
IPC分类号： B32B900
CPC分类号： C04B41/009 , C04B41/5032 , C04B41/87 , Y10T428/265 , C04B41/4539 , C04B35/10
摘要： The invention is a method of producing a ceramics material comprising the steps of: preparing a raw powder in which alumina particles having an average particle diameter of 0.1-1.0 &mgr;are doped with at least magnesia of 0.01-1 weight % and a solution containing yttrium of 0.1-15 weight % in yttria; molding said raw powder and calcining a molding thus created; and heating the calcined molding in an atmosphere containing a hydrogen gas to create YAG which is leached to the surface to deposit YAG on the surface and sintering the molding.
摘要翻译：本发明是一种制造陶瓷材料的方法，包括以下步骤：制备原料粉末，其中平均粒径为0.1-1.0μm的氧化铝颗粒掺杂至少0.01-1重量％的氧化镁和含有钇的溶液 0.1-15重量％的氧化钇; 模制所述原料粉末并煅烧由此产生的模制品; 并在含有氢气的气氛中加热煅烧的成型体，以产生YAG，该YAG浸出到表面以将YAG沉积在表面上并烧结成型体。

27. 发明授权

US5846327A Substrate spin treating apparatus 失效
标题翻译：底物旋转处理装置
公开(公告)号：US5846327A
公开(公告)日：1998-12-08
申请号：US816555
申请日：1997-03-13
申请人： Takanori Kawamoto , Mitsuhiro Fujita
发明人： Takanori Kawamoto , Mitsuhiro Fujita
IPC分类号： G03F7/16 , B05C11/08 , G03F7/30 , H01L21/00 , H01L21/027 , H01L21/304 , B05B13/02 , B08B3/00
CPC分类号： H01L21/6715 , B05C11/08 , G03F7/162 , G03F7/30
摘要： A substrate spin treating apparatus includes a spin chuck for supporting a substrate in a horizontal posture and spinning the substrate about a vertical axis. A nozzle is provided for supplying a treating solution to the substrate supported by the spin chuck, and a scatter preventive cup in disposed to surround the substrate on the spin chuck and has an inclined surface extending around an entire inner circumference of the cup for downwardly guiding sprays of the treating solution and the like formed by a spinning of the substrate. The scatter preventive cup includes an inner skirt extending around an entire circumference adjacent an upper end of the inclined surface The inner skirt has a surface opposed to the inclined surface and bent away from a spin center of the substrate. This construction suppresses the treating solution from adhering to and accumulating on portions, adjacent the upper end of the inclined surface, of the surface of the inner skirt opposed to the inclined surface. During cup rinsing, a rinsing solution spreads well over that surface of the inner skirt.
摘要翻译：基片旋转处理装置包括：旋转卡盘，其用于以水平姿态支撑基板，并使基板围绕纵轴旋转。提供了一种用于将处理溶液供给到由旋转卡盘支撑的基板的喷嘴和设置成围绕旋转卡盘的基板设置的防散射杯，并且具有围绕杯的整个内周延伸的倾斜表面，用于向下引导通过基材的纺丝形成的处理液等的喷雾。散射防止杯包括围绕与倾斜表面的上端相邻的整个圆周延伸的内裙部。内裙部具有与倾斜表面相对的表面并且远离基底的旋转中心弯曲。这种结构抑制处理液粘附在与倾斜表面相对的内裙部的表面邻近倾斜表面的上部的部分上并积聚。在杯子冲洗期间，冲洗溶液在内裙的表面上很好地扩散。

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