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    • 21. 发明授权
    • Compensator for multiple surface imaging
    • 多表面成像补偿器
    • US08071962B1
    • 2011-12-06
    • US13209306
    • 2011-08-12
    • Wenyi FengJason BryantDale Buermann
    • Wenyi FengJason BryantDale Buermann
    • G01N21/64
    • C12Q1/6874C12Q1/6825C12Q1/6869G01N21/05G01N21/6458G01N2021/0346G01N2021/6419G01N2021/6421G02B21/0024G02B2207/113
    • A system and method for imaging biological samples on multiple surfaces of a support structure are disclosed. The support structure may be a flow cell through which a reagent fluid is allowed to flow and interact with the biological samples. Excitation radiation from at least one radiation source may be used to excite the biological samples on multiple surfaces. In this manner, fluorescent emission radiation may be generated from the biological samples and subsequently captured and detected by detection optics and at least one detector. The detected fluorescent emission radiation may then be used to generate image data. This imaging of multiple surfaces may be accomplished either sequentially or simultaneously. In addition, the techniques of the present invention may be used with any type of imaging system. For instance, both epifluorescent and total internal reflection methods may benefit from the techniques of the present invention.
    • 公开了用于在支撑结构的多个表面上成像生物样品的系统和方法。 支撑结构可以是允许试剂流体通过其流动并与生物样品相互作用的流动池。 来自至少一个辐射源的激发辐射可用于在多个表面上激发生物样品。 以这种方式,可以从生物样品产生荧光发射辐射,随后由检测光学器件和至少一个检测器捕获和检测。 然后可以使用检测到的荧光发射辐射来产生图像数据。 多个表面的这种成像可以顺序地或同时地完成。 此外,本发明的技术可以与任何类型的成像系统一起使用。 例如,荧光和全内反射方法都可以受益于本发明的技术。
    • 23. 发明申请
    • Apparatus and method for determining orientation parameters of an elongate object
    • 用于确定细长物体的取向参数的装置和方法
    • US20050195387A1
    • 2005-09-08
    • US10796236
    • 2004-03-08
    • Guanghua ZhangDale BuermannMichael MandellaHector Gonzalez-BanosStewart Carl
    • Guanghua ZhangDale BuermannMichael MandellaHector Gonzalez-BanosStewart Carl
    • G01B11/26G01C1/00
    • G01B11/002G01B11/272G01S17/46G06F3/0304G06F3/03545
    • An apparatus and method employing principles of stereo vision for determining one or more orientation parameters and especially the second and third Euler angles θ, ψ of an elongate object whose tip is contacting a surface at a contact point. The apparatus has a projector mounted on the elongate object for illuminating the surface with a probe radiation in a known pattern from a first point of view and a detector mounted on the elongate object for detecting a scattered portion of the probe radiation returning from the surface to the elongate object from a second point of view. The orientation parameters are determined from a difference between the projected and detected probe radiation such as the difference between the shape of the feature produced by the projected probe radiation and the shape of the feature detected by the detector. The pattern of probe radiation is chosen to provide information for determination of the one or more orientation parameters and can include asymmetric patterns such as lines, ellipses, rectangles, polygons or the symmetric cases including circles, squares and regular polygons. To produce the patterns the projector can use a scanning arrangement or a structured light optic such as a holographic, diffractive, refractive or reflective element and any combinations thereof. The apparatus is suitable for determining the orientation of a jotting implement such as a pen, pencil or stylus.
    • 一种采用立体视觉原理的装置和方法,用于确定一个或多个取向参数,特别是尖端在接触点处接触表面的细长物体的第二和第三欧拉角θ,psi。 该装置具有安装在细长物体上的投影仪,用于从第一角度以已知图案的探测辐射照射表面,以及安装在细长物体上的检测器,用于检测从表面返回的探针辐射的散射部分 细长物体从第二个角度来看。 取向参数根据投射和检测的探针辐射之间的差异确定,例如由投射的探针辐射产生的特征的形状与由检测器检测到的特征的形状之间的差异。 选择探针辐射的图案以提供用于确定一个或多个取向参数的信息,并且可以包括不对称图案,例如线,椭圆,矩形,多边形或包括圆形,正方形和正多边形的对称情况。 为了产生图案,投影仪可以使用扫描装置或诸如全息衍射,折射或反射元件的结构化光学元件及其任何组合。 该装置适用于确定诸如笔,铅笔或触笔之类的记录工具的取向。
    • 28. 发明授权
    • Wafer handling robot having X-Y stage for wafer handling and positioning
    • 具有用于晶片处理和定位的X-Y平台的晶片处理机器人
    • US06811370B2
    • 2004-11-02
    • US09747201
    • 2000-12-21
    • Dale Buermann
    • Dale Buermann
    • G01N2101
    • H01L21/67766H01L21/67778H01L21/68Y10S414/137
    • An apparatus for handling and positioning wafers or other flat objects. The apparatus has an XY stage with an X-drive and a Y-drive, and a bed attached to the XY stage. A chuck (e.g. a vacuum chuck) is disposed on the bed and an effector is attached to the bed. The effector can rotate about an axis of rotation extending in the Z-direction. The effector can pick up objects and place the objects onto the chuck. The effector can also pick up objects from the chuck. Preferably, the chuck has a recessed region for accommodating the effector so that the effector can be inserted under a flat object on the chuck. The X-drive or Y-drive of the XY stage provides linear motion for the effector so that the effector can pull wafers from a cassette such as used in the semiconductor industry. Alternatively, the effector is attached to a linear actuator disposed on the bed.
    • 用于处理和定位晶片或其他平坦物体的装置。 该装置具有XY台,其具有X驱动和Y驱动,以及附接到XY台的床。 卡盘(例如真空吸盘)设置在床上,效应器附着在床上。 效应器可围绕沿Z方向延伸的旋转轴线旋转。 效应器可拾取物体并将物体放置在卡盘上。 效应器还可以从卡盘拾取物体。 优选地,卡盘具有用于容纳效应器的凹陷区域,使得效果器可以插入在卡盘上的平坦物体下方。 XY台的X驱动或Y驱动器为效应器提供线性运动,使得效应器可以从例如半导体工业中使用的盒子拉取晶片。 或者,效应器附接到设置在床上的线性致动器。
    • 29. 发明授权
    • Simultaneous compensation of source and detector drift in optical systems
    • 光学系统中源和检测器漂移的同时补偿
    • US06765676B1
    • 2004-07-20
    • US09651421
    • 2000-08-30
    • Dale Buermann
    • Dale Buermann
    • G01N2155
    • G01N21/274
    • An optical system for simultaneously compensating a source drift of a light source and a detector drift of a light detector includes a test location, a first beam path from the light source to the test location, a second beam path from the test location to the light detector. First and second beam paths are arranged to intersect at a beam crossing. A calibration sample having a known reflectivity is positioned at the test location and illuminated by a probe beam generated by the light source. A known response beam of the calibration sample is used for calibrating the light source and the detector. A reference sample is placed at the beam crossing and illuminated by the probe beam. In response, the reference sample sends a reference beam along the second path length, which is used for compensating the source and detector drift.
    • 用于同时补偿光源的源偏移和光检测器的检测器漂移的光学系统包括测试位置,从光源到测试位置的第一光束路径,从测试位置到光的第二光束路径 探测器。 第一和第二光束路径被布置成在光束交叉处相交。 具有已知反射率的校准样品位于测试位置处并由光源产生的探测光束照射。 校准样品的已知响应光束用于校准光源和检测器。 参考样品放置在光束交叉处并被探测光束照射。 作为响应,参考样本沿着第二路径长度发送参考光束,其用于补偿源和检测器漂移。
    • 30. 发明申请
    • Apparatus and method for optical determination of intermediate distances
    • 用于中间距离光学测定的装置和方法
    • US20050225742A1
    • 2005-10-13
    • US10824330
    • 2004-04-13
    • Dale BuermannMichael Mandella
    • Dale BuermannMichael Mandella
    • G01B11/02G01C3/08G01S17/46G01S17/87
    • G01B11/02G01S17/46G01S17/87
    • An apparatus and a method are disclosed for optically determining a distance r to a feature from an origin or a center. The apparatus uses a beam generation unit for launching a reference beam on a reference path and a first beam on a first path. The center from which distance r is determined is selected such that it is along a line of the reference path and not along a line of the first path. Alternatively, the center can be chosen not to lie along a line of the reference path. A rotation mechanism rotates the reference path and the first path about the center such that the reference beam moves over the feature at a reference time tr and the first beam moves over the feature at a first time t1. A determination unit determines distance r between the center and the feature from an angular velocity ω of the reference beam over the feature and from times tr, t1.
    • 公开了一种用于光学地确定从原点或中心到特征的距离r的装置和方法。 该装置使用光束产生单元,用于在参考路径上发射参考光束,并在第一路径上发射第一光束。 选择距离r确定的中心,使得其沿着参考路径的线并且不沿着第一路径的线。 或者,可以选择中心不能沿着参考路径的一条直线。 旋转机构使参考路径和第一路径围绕中心旋转,使得参考光束在参考时间t 1上移动到特征上,并且第一光束在第一时间t 1上移动到特征上, SUB> 1 。 确定单元根据特征和时间t 1,t 1 1从参考光束的角速度ω来确定中心和特征之间的距离r。