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21. 发明申请

US20120268722A1 Radiation Detector, Method of Manufacturing a Radiation Detector, and Lithographic Apparatus Comprising a Radiation Detector 有权
标题翻译：辐射检测器，辐射检测器的制造方法和包含辐射检测器的平版印刷设备
公开(公告)号：US20120268722A1
公开(公告)日：2012-10-25
申请号：US13399560
申请日：2012-02-17
申请人： Stoyan NIHTIANOV , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus Josephus Maria Kemper , Marc Antonius Maria Haast , Gerardus Wilhelmus Petrus Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus Maria Sholtes
发明人： Stoyan NIHTIANOV , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus Josephus Maria Kemper , Marc Antonius Maria Haast , Gerardus Wilhelmus Petrus Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus Maria Sholtes
IPC分类号： G03B27/54 , H01L31/18 , H01L21/66 , H01L31/0224
CPC分类号： G03F7/7085 , H01L21/67225 , H01L31/103
摘要： In one an embodiment, there is provided an assembly comprising at least one detector. Each of the at least one detector includes a substrate having a doped region of a first conduction type, a layer of dopant material of a second conduction type located on the substrate, a diffusion layer formed within the substrate and in contact with the layer of dopant material and the doped region of the substrate, wherein a doping profile, which is representative of a doping material concentration of the diffusion layer, increases from the doped region of the substrate to the layer of dopant material, a first electrode connected to the layer of dopant material, and a second electrode connected to the substrate. The diffusion layer is arranged to form a radiation sensitive surface.
摘要翻译：在一个实施例中，提供了一种包括至少一个检测器的组件。所述至少一个检测器中的每一个包括具有第一导电类型的掺杂区的衬底，位于衬底上的第二导电类型的掺杂剂材料层，形成在衬底内并与掺杂剂层接触的扩散层材料和衬底的掺杂区域，其中代表扩散层的掺杂材料浓度的掺杂分布从衬底的掺杂区域增加到掺杂剂材料层，第一电极连接到掺杂剂材料和连接到该衬底的第二电极。扩散层被布置成形成辐射敏感表面。

22. 发明授权

US08138485B2 Radiation detector, method of manufacturing a radiation detector, and lithographic apparatus comprising a radiation detector 有权
标题翻译：放射线检测器，辐射检测器的制造方法以及包括放射线检测器的光刻设备
公开(公告)号：US08138485B2
公开(公告)日：2012-03-20
申请号：US12144874
申请日：2008-06-24
申请人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus Joseph Maria Kemper , Marc Antonius Maria Haast , Gerardus Wilhelmus Petrus Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus Maria Scholtes
发明人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus Joseph Maria Kemper , Marc Antonius Maria Haast , Gerardus Wilhelmus Petrus Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus Maria Scholtes
IPC分类号： G21K5/00
CPC分类号： G03F7/7085 , H01L21/67225 , H01L31/103
摘要： A radiation detector, a method of manufacturing a radiation detector, and a lithographic apparatus comprising a radiation detector. The radiation detector has a radiation sensitive surface. The radiation sensitive surface is sensitive to radiation wavelengths between 10-200 nm and charged particles. The radiation detector has a silicon substrate, a dopant layer, a first electrode, and a second electrode. The silicon substrate is provided in a surface area at a first surface side with doping profile of a certain conduction type. The dopant layer is provided on the first surface side of the silicon substrate. The dopant layer has a first layer of dopant material and a second layer. The second layer is a diffusion layer in contact with the surface area at the first surface side of the silicon substrate. The first electrode is connected to dopant layer. The second electrode is connected to the silicon substrate.
摘要翻译：放射线检测器，制造放射线检测器的方法以及包括放射线检测器的光刻设备。辐射检测器具有辐射敏感表面。辐射敏感表面对10-200nm和带电粒子之间的辐射波长敏感。辐射检测器具有硅衬底，掺杂剂层，第一电极和第二电极。硅衬底在第一表面侧的表面区域设置有一定导电类型的掺杂分布。掺杂剂层设置在硅衬底的第一表面侧上。掺杂剂层具有掺杂剂材料的第一层和第二层。第二层是与硅衬底的第一表面侧的表面区域接触的扩散层。第一电极连接到掺杂剂层。第二电极连接到硅衬底。

23. 发明申请

US20100091260A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20100091260A1
公开(公告)日：2010-04-15
申请号：US12644903
申请日：2009-12-22
申请人： Erik Petrus Buurman , Thomas Josephus Maria Castenmiller , Johannes Wilhelmus Maria Cornelis Teeuwsen , Bearrach Moest , Marc Antonius Maria Haast
发明人： Erik Petrus Buurman , Thomas Josephus Maria Castenmiller , Johannes Wilhelmus Maria Cornelis Teeuwsen , Bearrach Moest , Marc Antonius Maria Haast
IPC分类号： G03B27/54
CPC分类号： G03F7/70575 , G03F7/70641 , G03F9/7026
摘要： A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by an inboard sensor, such as a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.
摘要翻译：一种方法和装置利用表示辐射源的波长变化的数据来提供焦平面位置的控制或提供传感器数据的校正。在第一方面中，波长变化数据被提供给通过移动包括例如掩模台，基板台或投影光学系统的光学元件的装置部件来控制焦点的控制系统。在第二方面，变化数据用于校正例如由诸如传输图像传感器的内部传感器测量的焦平面位置数据。这两个方面可以组合在单个装置中或者可以单独使用。

24. 发明申请

US20120242967A1 Lithographic Apparatus and Method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US20120242967A1
公开(公告)日：2012-09-27
申请号：US13243528
申请日：2011-09-23
申请人： Robbert Jan Voogd , Haico Victor Kok , Bearrach Moest , Petrus Franciscus Van Gils
发明人： Robbert Jan Voogd , Haico Victor Kok , Bearrach Moest , Petrus Franciscus Van Gils
IPC分类号： G03B27/54
CPC分类号： G03F9/7069 , G03F7/70066 , G03F7/7085
摘要： A lithographic apparatus comprising an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, the patterning device serving to impart the radiation beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned radiation beam onto a target portion of the substrate, wherein the lithographic apparatus further comprises a patterning device masking blade provided with a hole, a diffusing material being located at the hole.
摘要翻译：一种光刻设备，包括用于提供辐射束的照明系统，用于支撑图案形成装置的支撑结构，用于使辐射束在其横截面上具有图案的图案形成装置，用于保持衬底的衬底台，以及用于将图案化的辐射束投影到基板的目标部分上的投影系统，其中所述光刻设备还包括设置有孔的图案形成装置掩蔽刮板，位于所述孔处的扩散材料。

25. 发明授权

US09116446B2 Lithographic apparatus and method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US09116446B2
公开(公告)日：2015-08-25
申请号：US13243528
申请日：2011-09-23
申请人： Robbert Jan Voogd , Haico Victor Kok , Bearrach Moest , Petrus Franciscus Van Gils
发明人： Robbert Jan Voogd , Haico Victor Kok , Bearrach Moest , Petrus Franciscus Van Gils
IPC分类号： G03F9/00 , G03F7/20
CPC分类号： G03F9/7069 , G03F7/70066 , G03F7/7085
摘要： A lithographic apparatus comprising an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, the patterning device serving to impart the radiation beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned radiation beam onto a target portion of the substrate, wherein the lithographic apparatus further comprises a patterning device masking blade provided with a hole, a diffusing material being located at the hole.
摘要翻译：一种光刻设备，包括用于提供辐射束的照明系统，用于支撑图案形成装置的支撑结构，用于使辐射束在其横截面上具有图案的图案形成装置，用于保持衬底的衬底台，以及用于将图案化的辐射束投影到基板的目标部分上的投影系统，其中所述光刻设备还包括设置有孔的图案形成装置掩蔽刮板，位于所述孔处的扩散材料。

26. 发明授权

US08975599B2 Image sensor, lithographic apparatus comprising an image sensor and use of an image sensor in a lithographic apparatus 有权
标题翻译：图像传感器，包括图像传感器的光刻设备和光刻设备中的图像传感器的使用
公开(公告)号：US08975599B2
公开(公告)日：2015-03-10
申请号：US11797505
申请日：2007-05-03
申请人： Frank Staals , Joeri Lof , Erik Roelof Loopstra , Wim Tjibbo Tel , Bearrach Moest
发明人： Frank Staals , Joeri Lof , Erik Roelof Loopstra , Wim Tjibbo Tel , Bearrach Moest
IPC分类号： G01J1/04 , G21K5/10 , G03F7/20 , G03F9/00
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70483 , G03F9/7088
摘要： The invention relates to an image sensor for detection of an aerial image formed by a beam of radiation in a lithographic projection apparatus for exposing a pattern onto a substrate held in a substrate plane by a substrate holder. The image sensor has an image detector and a lens. The lens is arranged to project at least part of the aerial image onto the image detector. The image sensor is positioned such within the substrate holder that the lens is positioned proximate the substrate plane.
摘要翻译：本发明涉及一种用于检测由光刻投影设备中的辐射束形成的空间图像的图像传感器，用于通过基板保持器将图案曝光在保持在基板平面中的基板上。图像传感器具有图像检测器和透镜。透镜布置成将至少一部分空间图像投影到图像检测器上。图像传感器被定位在衬底保持器内，透镜位于衬底平面附近。

27. 发明申请

US20090002656A1 Device and method for transmission image detection, lithographic apparatus and mask for use in a lithographic apparatus 审中-公开
标题翻译：用于光刻设备的透射图像检测装置和方法，光刻设备和掩模
公开(公告)号：US20090002656A1
公开(公告)日：2009-01-01
申请号：US11819958
申请日：2007-06-29
申请人： Bearrach Moest
发明人： Bearrach Moest
IPC分类号： G03B27/52 , G01V8/10
CPC分类号： G03F7/70666 , G03F1/84
摘要： A device is provided for transmission image detection of an aerial image formed in a lithographic projection apparatus. The device has a structure provided with an object mark, an projection system and a detector. The object mark is arranged to form a object mark pattern upon illumination by radiation with a predetermined wavelength. The projection system is arranged to form an object mark aerial image of the object mark pattern at an image side of the projection system, where the image side has a numerical aperture larger than 1. The detector has a slit pattern and a photo-sensitive device. The slit pattern is positioned in a plane proximate to image plane of the projection system. The device can be configured to satisfy the following condition: d
摘要翻译：提供了一种用于在光刻投影设备中形成的空间图像的透射图像检测的装置。该装置具有设置有物体标记，投影系统和检测器的结构。对象标记被布置成在通过预定波长的辐射照射时形成对象标记图案。投影系统被布置成在投影系统的图像侧处形成物体标记图案的物体标记空间图像，其中像侧具有大于1的数值孔径。检测器具有狭缝图案和感光装置。狭缝图案位于靠近投影系统的图像平面的平面中。该设备可以配置为满足以下条件： $d其中d表示在像平面上的物体标记空间图像的关键维度，λ表示预定波长的辐射，NA表示数值孔径。$

28. 发明授权

US07675605B2 Device and method for transmission image sensing 有权
标题翻译：用于传输图像感测的装置和方法
公开(公告)号：US07675605B2
公开(公告)日：2010-03-09
申请号：US12155502
申请日：2008-06-05
申请人： Bearrach Moest
发明人： Bearrach Moest
IPC分类号： G03B27/54 , G03B27/32 , G03B27/42
CPC分类号： G03F7/70666 , G03F1/84
摘要： A device for transmission image sensing for sensing an aerial image in a lithographic exposure apparatus comprises a projection system arranged to form, at an image side of the projection system, an aerial image of an object mark. The device further comprises a detector comprising a slit pattern having features corresponding to at least a part of the aerial image. The slit pattern is arranged to be exposed to the aerial image. The detector is further being arranged to detect detection radiation transmitted by the slit pattern; wherein d
摘要翻译：用于感测平版印刷曝光设备中的空间图像的透射图像感测装置包括投影系统，其布置成在投影系统的像侧形成物体标记的空中图像。该装置还包括检测器，其包括具有对应于空中图像的至少一部分的特征的狭缝图案。狭缝图案布置成暴露于空中图像。检测器还被布置成检测由狭缝图案传输的检测辐射; 其中d <0.85·λNA，其中d表示狭缝图案的最小特征的尺寸，λ表示检测辐射的预期波长，并且大于1的NA表示图像侧的数值孔径。

29. 发明申请

US20070258074A1 Reduction of fit error due to non-uniform sample distribution 有权
标题翻译：减少由于不均匀样本分布引起的拟合误差
公开(公告)号：US20070258074A1
公开(公告)日：2007-11-08
申请号：US11418464
申请日：2006-05-05
申请人： Bearrach Moest
发明人： Bearrach Moest
IPC分类号： G03B27/52
CPC分类号： G03F9/7011 , G03F9/7092
摘要： A weighted fit based on a sample density of a plurality of samples is used to determine an alignment curve. A scan that produces the samples may include portions having greater and lesser sample density. While performing an interpolation to produce a best fit curve, a plurality of neighboring samples are chosen for each sample point, for sample points associated with a value above a threshold. A weighting function may be performed based on a distance between a given sample and the chosen nearest neighbors, wherein measurements that are taken in a region with denser samples are given less weight than measurements that are taken in a region with sparser samples.
摘要翻译：使用基于多个样本的样本密度的加权拟合来确定对准曲线。产生样品的扫描可以包括具有更大和更小样品密度的部分。在执行插值以产生最佳拟合曲线时，对于与高于阈值的值相关联的采样点，针对每个采样点选择多个相邻采样。可以基于给定样本与所选择的最近邻居之间的距离来执行加权函数，其中在具有更密集样本的区域中进行的测量的权重小于在具有较稀疏样本的区域中进行的度量。

30. 发明申请

US20070115452A1 Method of measuring the magnification of a projection system, device manufacturing method and computer program product 审中-公开
公开(公告)号：US20070115452A1
公开(公告)日：2007-05-24
申请号：US11285766
申请日：2005-11-23
申请人： Bearrach Moest , Arnout Van De Stadt , Cornelis Andreas Francisus Johannes Van Der Poel
发明人： Bearrach Moest , Arnout Van De Stadt , Cornelis Andreas Francisus Johannes Van Der Poel
IPC分类号： G03B27/32
CPC分类号： G03F9/7003 , G03F7/70633
摘要： A transmission image sensor is provided that is optimized for detection of an alignment marker that includes gratings, which are used to detect the position of a part of an overlay marker, e.g. of box-in-box type. Both the alignment markers and the overlay markers may be used to derive a measurement of magnification of a projection system. Magnification values obtained from the overlay marker components using the transmission image sensors link the values conventionally obtained using the transmission image sensor to detect alignment markers and an off-line tool to detect overlay markers.

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