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    • 22. 发明授权
    • High-speed, low-power continuous-time CMOS current comparator
    • 高速,低功耗连续CMOS电流比较器
    • US06320427B1
    • 2001-11-20
    • US09689567
    • 2000-10-11
    • Bingxue ShiLu Chen
    • Bingxue ShiLu Chen
    • H03K522
    • H03K5/2472H03K5/086
    • A CMOS current comparator featuring shortened response delay times lower power consumption, smaller area and enhanced process robustness. The current comparator is comprised of a CMOS complementary amplifier, two resistive-load amplifiers and two CMOS inverters. The CMOS complementary amplifier receives an input current from an input node which generates an output voltage at a corresponding output node. The CMOS complementary amplifier is comprised of an N-type metal oxide semiconductor field effect transistor (NMOS) and a P-type metal oxide semiconductor field effect transistor (PMOS) connected in series. Control gates on both the NMOS and PMOS are connected to form the input node. NMOS and PMOS drain electrodes are also coupled to the output node. The CMOS complementary amplifier further has a resistive feedback circuit which is connected between the input and output nodes. The two resistive-load amplifiers are connected in cascade form to receive and amplify output voltage from the CMOS complementary amplifier. The result being a correspondingly output of amplified voltage. The two CMOS inverters are also connected in cascade form to receive the amplified voltage and output corresponding rail-to-rail result signal.
    • 具有缩短响应延迟的CMOS电流比较器,功耗更低,面积更小,工艺稳定性更强。 电流比较器由CMOS互补放大器,两个电阻负载放大器和两个CMOS反相器组成。 CMOS互补放大器从输入节点接收输入电流,其在相应的输出节点处产生输出电压。 CMOS互补放大器由串联连接的N型金属氧化物半导体场效应晶体管(NMOS)和P型金属氧化物半导体场效应晶体管(PMOS)构成。 连接NMOS和PMOS两端的控制栅极,形成输入节点。 NMOS和PMOS漏电极也耦合到输出节点。 CMOS互补放大器还具有连接在输入和输出节点之间的电阻反馈电路。 两个电阻负载放大器以级联形式连接,以接收和放大CMOS互补放大器的输出电压。 结果是放大电压的相应输出。 两个CMOS反相器也以级联形式连接以接收放大的电压并输出相应的轨至轨结果信号。
    • 23. 发明申请
    • Method and System for Transmitting Network File
    • 传输网络文件的方法和系统
    • US20150006623A1
    • 2015-01-01
    • US14361018
    • 2012-03-15
    • Lu ChenSheng Zhong
    • Lu ChenSheng Zhong
    • H04L29/06H04L29/08
    • H04L67/42H04L67/02H04L67/06H04L69/04
    • Disclosed are a method and system for transmitting a network file. The method includes: a client sends to a server a network file request message carrying a first network file identifier, wherein the network file request message is used by the client to request to obtain the current content in the network file from the server, and the first network file identifier is used for indicating the content in the network file obtained by the client; the client receives a differential file from the server, wherein the differential file stores the difference between the current content in the network file and the content in the network file obtained by the client; and the client combines the differential file with the content in the network file obtained by the client to obtain the current content in the network file. The disclosure reduces the transmission traffic and shortens the transmission time.
    • 公开了一种用于发送网络文件的方法和系统。 该方法包括:客户端向服务器发送携带第一网络文件标识符的网络文件请求消息,其中客户端使用网络文件请求消息来请求从服务器获取网络文件中的当前内容,并且 第一网络文件标识符用于指示由客户端获取的网络文件中的内容; 客户端从服务器接收差分文件,其中差分文件存储网络文件中的当前内容与由客户端获取的网络文件中的内容之间的差异; 并且客户端将差分文件与客户端获取的网络文件中的内容相结合,以获取网络文件中的当前内容。 本公开减少了传输流量并缩短了传输时间。
    • 24. 发明授权
    • Methods for improved growth of group III nitride buffer layers
    • 改善III族氮化物缓冲层生长的方法
    • US08778783B2
    • 2014-07-15
    • US13469050
    • 2012-05-10
    • Yuriy MelnikLu ChenHidehiro Kojiri
    • Yuriy MelnikLu ChenHidehiro Kojiri
    • H01L21/20H01L21/02
    • H01L21/02304H01L21/0242H01L21/02458H01L21/02505H01L21/0254H01L21/0262H01L29/2003H01L29/872
    • Methods are disclosed for growing high crystal quality group III-nitride epitaxial layers with advanced multiple buffer layer techniques. In an embodiment, a method includes forming group III-nitride buffer layers that contain aluminum on suitable substrate in a processing chamber of a hydride vapor phase epitaxy processing system. A hydrogen halide or halogen gas is flowing into the growth zone during deposition of buffer layers to suppress homogeneous particle formation. Some combinations of low temperature buffers that contain aluminum (e.g., AlN, AlGaN) and high temperature buffers that contain aluminum (e.g., AlN, AlGaN) may be used to improve crystal quality and morphology of subsequently grown group III-nitride epitaxial layers. The buffer may be deposited on the substrate, or on the surface of another buffer. The additional buffer layers may be added as interlayers in group III-nitride layers (e.g., GaN, AlGaN, AlN).
    • 公开了用于生长具有先进的多缓冲层技术的高结晶质量III族氮化物外延层的方法。 在一个实施例中,一种方法包括在氢化物气相外延处理系统的处理室中形成在合适的衬底上含有铝的III族氮化物缓冲层。 在沉积缓冲层期间,卤化氢或卤素气体流入生长区以抑制均匀的颗粒形成。 可以使用含有铝的低温缓冲液(例如AlN,AlGaN)和含有铝的高温缓冲液(例如AlN,AlGaN)的一些组合来改善随后生长的III族氮化物外延层的晶体质量和形态。 缓冲液可以沉积在衬底上,或者沉积在另一缓冲液的表面上。 附加的缓冲层可以作为III族氮化物层(例如,GaN,AlGaN,AlN)中的中间层添加。
    • 25. 发明申请
    • METHODS FOR PRETREATMENT OF GROUP III-NITRIDE DEPOSITIONS
    • 用于预处理III-NITRIDE沉积物的方法
    • US20120295428A1
    • 2012-11-22
    • US13469048
    • 2012-05-10
    • Yuriy MelnikLu ChenHidehiro Kojiri
    • Yuriy MelnikLu ChenHidehiro Kojiri
    • H01L21/311
    • H01L21/0254H01L21/0242H01L21/02458H01L21/0262H01L21/02658H01L33/007
    • Embodiments of the present disclosure relate to methods for pretreatment of substrates and group III-nitride layers for manufacturing devices such as light emitting diodes (LEDs), laser diodes (LDs) or power electronic devices. One embodiment of the present disclosure provides a method including providing one or more substrates having an aluminum containing surface in a processing chamber and exposing a surface of each of the one or more substrates having an aluminum containing surface to a pretreatment gas mixture to form a pretreated surface. The pretreatment gas mixture includes ammonia (NH3), an aluminum halide gas (e.g., AlCl3, AlCl) and an etchant containing gas that includes a halogen gas (e.g., Cl2) or hydrogen halide gas (e.g., HCl).
    • 本公开的实施例涉及用于制造诸如发光二极管(LED),激光二极管(LD)或功率电子器件的器件的衬底和III族氮化物层的预处理的方法。 本公开的一个实施方案提供了一种方法,包括在处理室中提供具有含铝表面的一个或多个基材,并将具有含铝表面的一个或多个基材中的每一个的表面暴露于预处理气体混合物以形成预处理 表面。 预处理气体混合物包括氨(NH 3),卤化铝气体(例如AlCl 3,AlCl)和含有卤素气体(例如Cl 2)或卤化氢气体(例如HCl)的含蚀刻剂的气体。
    • 26. 发明申请
    • METHODS FOR IMPROVED GROWTH OF GROUP III NITRIDE SEMICONDUCTOR COMPOUNDS
    • 改善III族氮化物半导体化合物生长的方法
    • US20120291698A1
    • 2012-11-22
    • US13469045
    • 2012-05-10
    • Yuriy MelnikLu ChenHidehiro Kojiri
    • Yuriy MelnikLu ChenHidehiro Kojiri
    • C30B25/14C30B25/18
    • C30B25/14C30B25/02C30B25/18C30B25/183C30B29/40C30B29/403C30B29/406
    • Methods are disclosed for growing group III-nitride semiconductor compounds with advanced buffer layer technique. In an embodiment, a method includes providing a suitable substrate in a processing chamber of a hydride vapor phase epitaxy processing system. The method includes forming an AlN buffer layer by flowing an ammonia gas into a growth zone of the processing chamber, flowing an aluminum halide containing precursor to the growth zone and at the same time flowing additional hydrogen halide or halogen gas into the growth zone of the processing chamber. The additional hydrogen halide or halogen gas that is flowed into the growth zone during buffer layer deposition suppresses homogeneous AlN particle formation. The hydrogen halide or halogen gas may continue flowing for a time period while the flow of the aluminum halide containing precursor is turned off.
    • 公开了采用先进缓冲层技术生长III族氮化物半导体化合物的方法。 在一个实施例中,一种方法包括在氢化物气相外延处理系统的处理室中提供合适的衬底。 该方法包括通过使氨气流入处理室的生长区而形成AlN缓冲层,将含卤化铝的前体流过生长区,同时将另外的卤化氢或卤素气体流入生长区的生长区 处理室。 在缓冲层沉积期间流入生长区的附加卤化氢或卤素气体抑制均匀的AlN颗粒形成。 卤化氢或卤素气体可以持续流动一段时间,同时关闭含卤化铝的前体的流动。
    • 27. 发明申请
    • LIGHT EMITTING DIODE WITH ENHANCED QUANTUM EFFICIENCY AND METHOD OF FABRICATION
    • 具有增强量子效率的发光二极管和制造方法
    • US20120235116A1
    • 2012-09-20
    • US13387713
    • 2010-07-30
    • Jie SuOlga KrylioukYuriy MelnikHidehiro KojiriLu ChenTetsuya Ishikawa
    • Jie SuOlga KrylioukYuriy MelnikHidehiro KojiriLu ChenTetsuya Ishikawa
    • H01L33/04C30B25/02H01B1/02C30B25/08
    • H01L33/06H01L33/04H01L33/325
    • One embodiment of a quantum well structure comprises an active region including active layers that comprise quantum wells and barrier layers wherein some or all of the active layers are p type doped. P type doping some or all of the active layers improves the quantum efficiency of III-V compound semiconductor light emitting diodes by locating the position of the P-N junction in the active region of the device thereby enabling the dominant radiative recombination to occur within the active region. In one embodiment, the quantum well structure is fabricated in a cluster tool having a hydride vapor phase epitaxial (HVPE) deposition chamber with a eutectic source alloy. In one embodiment, the indium gallium nitride (InGaN) layer and the magnesium doped gallium nitride (Mg—GaN) or magnesium doped aluminum gallium nitride (Mg—AlGaN) layer are grown in separate chambers by a cluster tool to avoid indium and magnesium cross contamination. Doping of group III-nitrides by hydride vapor phase epitaxy using group III-metal eutectics is also described. In one embodiment, a source is provided for HVPE deposition of a p-type or an n-type group III-nitride epitaxial film, the source including a liquid phase mechanical (eutectic) mixture with a group III species. In one embodiment, a method is provided for performing HVPE deposition of a p-type or an n-type group III-nitride epitaxial film, the method including using a liquid phase mechanical (eutectic) mixture with a group III species.
    • 量子阱结构的一个实施例包括有源区,包括有源层,其包括量子阱和阻挡层,其中一些或全部有源层是p型掺杂的。 通过将PN结的位置定位在器件的有源区域中,P型掺杂部分或全部有源层提高了III-V族化合物半导体发光二极管的量子效率,从而能够在主动区域内发生主要的辐射复合 。 在一个实施例中,量子阱结构在具有共晶源合金的氢化物气相外延(HVPE)沉积室的簇工具中制造。 在一个实施例中,氮化铟镓(InGaN)层和掺杂镁的氮化镓(Mg-GaN)或镁掺杂的氮化铝镓(Mg-AlGaN)层通过簇工具在分开的室中生长以避免铟和镁的交叉 污染。 还描述了使用III族金属共晶体通过氢化物气相外延掺杂的III族氮化物。 在一个实施例中,提供了用于HVPE沉积p型或n型III族氮化物外延膜的源,该源包括具有III族的液相机械(共晶)混合物。 在一个实施例中,提供了一种用于执行p型或n型III族氮化物外延膜的HVPE沉积的方法,该方法包括使用具有III族物质的液相机械(共晶)混合物。
    • 28. 发明申请
    • DEVICE AND METHOD FOR CYLINDER-TORQUE EQUALIZATION OF AN INTERNAL COMBUSTION ENGINE, COMPUTER PROGRAM, COMPUTER PROGRAM PRODUCT
    • 内燃机,计算机程序,计算机程序产品的气缸 - 扭矩均衡的装置和方法
    • US20110302999A1
    • 2011-12-15
    • US13141627
    • 2009-12-17
    • Guido PortenLu ChenMarc Schott
    • Guido PortenLu ChenMarc Schott
    • G01M15/00
    • F02D41/221F02D41/0085F02D41/1498F02D41/3076Y02T10/40
    • A device, a method, a computer program and a computer program product for diagnosing an internal combustion engine (100), in which a first cylinder (102) includes a combustion chamber (101), a fuel quantity and a fresh air quantity being supplied to the combustion chamber (101) for combustion; a torque contribution (D), generated by the combustion, of the first cylinder (102) in a first operating mode (B1) of the internal combustion engine (100) being a function of the fresh air quantity supplied, and in a second operating mode (B2) of the internal combustion engine (100) being essentially a function of the fuel quantity, wherein a first variable (L1) characterizing a smooth running of the internal combustion engine (100) in the first operating mode (B1) is ascertained, a second variable (L2) characterizing the smooth running of the internal combustion engine (100) in the second operating mode is ascertained, the first variable (L1) is compared to the second variable (L2), a diagnosis of the internal combustion engine (100) is made as a function of the result of the comparison.
    • 一种用于诊断内燃机(100)的装置,方法,计算机程序和计算机程序产品,其中第一气缸(102)包括燃烧室(101),供应的燃料量和新鲜空气量 到燃烧室(101)进行燃烧; 在内燃机(100)的第一操作模式(B1)中由第一气缸(102)产生的扭矩贡献(D)是所供应的新鲜空气量的函数,并且在第二操作 确定内燃机(100)的模式(B2)基本上是燃料量的函数,其中确定表征第一运行模式(B1)中的内燃机(100)的平稳运行的第一变量(L1) 确定表征内燃机(100)在第二运​​行模式下的平稳运行的第二变量(L2),将第一变量(L1)与第二变量(L2)进行比较,内燃机 (100)作为比较结果的函数。
    • 30. 发明申请
    • Coupling flatness compensated directional coupler
    • 耦合平坦度补偿定向耦合器
    • US20060164181A1
    • 2006-07-27
    • US11040793
    • 2005-01-24
    • Lu Chen
    • Lu Chen
    • H01P5/18
    • H01P5/184
    • A directional coupler that has improved coupling flatness. The directional coupler includes a first, second and third coupler. Each of the couplers has an input port, an output port, a forward coupled port and a reverse coupled port. The forward coupled port of the first coupler is connected to the input port of the second coupler. The reverse coupled port of the first coupler is connected to ground. The output port of the second coupler is connected to the input port of the third coupler. The output port of the third coupler forms a second forward coupled port. The second and third couplers reduce the variation in coupling over a frequency range.
    • 具有改善的耦合平坦度的定向耦合器。 定向耦合器包括第一,第二和第三耦合器。 每个耦合器具有输入端口,输出端口,正向耦合端口和反向耦合端口。 第一耦合器的正向耦合端口连接到第二耦合器的输入端口。 第一耦合器的反向耦合端口连接到地。 第二耦合器的输出端口连接到第三耦合器的输入端口。 第三耦合器的输出端口形成第二前向耦合端口。 第二和第三耦合器减少频率范围内的耦合变化。