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    • 22. 发明授权
    • Prepared ceramic powder
    • 制备陶瓷粉末
    • US06254991B1
    • 2001-07-03
    • US09436346
    • 1999-11-09
    • Yasuhisa KonoKenji SaitoYoichi MizunoHirokazu Chazono
    • Yasuhisa KonoKenji SaitoYoichi MizunoHirokazu Chazono
    • B32B1502
    • C04B35/62818C04B35/4682C04B35/472C04B35/49C04B35/491C04B35/628C04B35/62805C04B35/62826C04B35/62886C04B2235/3215C04B2235/3234C04B2235/3236C04B2235/3239C04B2235/3241C04B2235/3249C04B2235/3251C04B2235/3267C04B2235/3277C04B2235/5445H01G4/12H01G4/1227H01G4/1245Y10T428/2991
    • The process for preparing ceramic powder having a core-shell structure by dissolving a crystalline ceramic powder In water so as to leave a core portion of the ceramic powder while heating; depositing a component of the ceramic powder dissolved in the water on and around surfaces of the core portion thereof as a deposited material from the water by gradually cooling the ceramic powder and the water obtained in the step of dissolving; and firing a mixture of the ceramic powder obtained in the step of depositing with an additive at a high temperature to subject the deposited material and the additive to solid phase reaction to form a shell portion on and around the core portion of the ceramic powder. The process can produce the ceramic powder having a core-shell structure from a crystalline ceramic powder, thereby achieving high electrical and mechanical features when formed into ceramic electronic parts. On the other hand, conventional ceramic electronic parts produced from highly crystalline ceramic powder raise the manufacturing cost because such ceramic powder is low in reactivity so that it requires high firing temperature. Ceramic powder in a core-shell structure produced from low-crystalline ceramic powder results to conventional ceramic electronic parts which are poor in electrical and mechanical characteristics.
    • 通过将结晶陶瓷粉末溶解在水中以在加热时留下陶瓷粉末的核心部分来制备具有核 - 壳结构的陶瓷粉末的方法; 通过逐渐冷却陶瓷粉末和溶解步骤中得到的水,将从其水中沉积的作为沉积材料的芯部的表面上的溶解在水中的陶瓷粉末的组分沉淀在水中; 并在高温下焙烧在沉积步骤中与添加剂步骤获得的陶瓷粉末的混合物,以使沉积材料和添加剂进行固相反应,以在陶瓷粉末的芯部分上和周围形成壳部分。 该方法可以从陶瓷粉末制成具有核 - 壳结构的陶瓷粉末,从而在形成陶瓷电子部件时实现高的电气和机械特性。另一方面,由高结晶陶瓷粉末制备的常规陶瓷电子部件提高了 制造成本是因为这样的陶瓷粉末的反应性低,因此需要高的烧制温度。 由低结晶陶瓷粉末制成的芯壳结构中的陶瓷粉末导致电气和机械特性差的常规陶瓷电子部件。
    • 25. 发明授权
    • X-ray mask structure, process for production thereof, apparatus and
method for X-ray exposure with the X-ray mask structure, and
semiconductor device produced by the X-ray exposure method
    • X射线掩模结构,其制造方法,用X射线掩模结构X射线曝光的装置和方法以及通过X射线曝光方法制造的半导体器件
    • US5553110A
    • 1996-09-03
    • US345395
    • 1994-11-18
    • Koichi SentokuKenji SaitoKeiko ChibaHiroshi Maehara
    • Koichi SentokuKenji SaitoKeiko ChibaHiroshi Maehara
    • G03F7/20C30B33/00G03F1/22H01L21/027H01L21/302H01L21/3065H01L39/00
    • G03F1/22Y10S430/167Y10S430/168
    • An X-ray mask structure for X-ray lithography comprises a pattern, an X-ray transmissive film for holding the pattern, and a frame for supporting the X-ray transmissive film, wherein a light-scattering prevention film is formed on at least a part of the surface of the X-ray transmissive film and/or of the pattern, and the light scattering prevention film may be a flat coating film formed on at least one of the top face and the back face of the X-ray transmissive film and having a refractive index substantially equal to the refractive index of the X-ray transmissive film. A process for producing the X-ray mask structure comprises steps of forming a flat coating film having a refractive index substantially the same as that of the X-ray transmissive film on at least one of the top face and the back face of the X-ray transmissive film, and forming a pattern at least on the top face of the X-ray transmissive film. An X-ray exposure apparatus comprises an X-ray source, and the X-ray mask structure, and conducts transcription of the pattern formed on the x-ray mask structure onto a transcription-receiving member by projecting X-rays through the X-ray mask structure to the transcription receiving member.
    • 用于X射线光刻的X射线掩模结构包括图案,用于保持图案的X射线透射膜和用于支撑X射线透射膜的框架,其中至少形成光散射防止膜 X射线透过膜表面的一部分和/或图案的一部分,光散射防止膜可以是形成在X射线透射性的上表面和背面的至少一面上的平坦的涂膜 并且具有基本上等于X射线透射膜的折射率的折射率。 一种X射线掩模结构体的制造方法,其特征在于,在上述X射线掩模结构的上表面和背面的至少一面上,形成与X射线透过膜的折射率基本相同的折射率的平面涂膜, 并且至少在X射线透射膜的顶面上形成图案。 X射线曝光装置包括X射线源和X射线掩模结构,并且通过X射线X射线透过X射线掩模结构将X射线掩模结构上形成的图案转印到转录接收部件上, 射线掩模结构。