会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 21. 发明申请
    • METHOD FOR PRODUCING SANSHOOL
    • 生产SANSHOOL的方法
    • US20130245303A1
    • 2013-09-19
    • US13988401
    • 2011-11-28
    • Katsuyuki Aoki
    • Katsuyuki Aoki
    • C07C231/12C07F15/02
    • C07C231/12C07F15/02C07C233/09C07C233/20
    • Provided are a method for producing a sanshool, which method has a short process and exhibits high stereoselectivity, as well as an iron carbonyl complex compound that is an intermediate useful for the production method.A diene iron complex compound characterized by being represented by the following general formula (I): (in which A represents CO, P(RA)3, CN, NO, SO(RA)3, or N(RA)2; RA represents a straight chain or branched chain alkyl group having 1 to 4 carbon atoms or an aryl group having 6 to 12 carbon atoms; and one of R1 and R2 represents a hydrogen atom and the other one thereof represents a structure represented by the following formula (II)): (in which R represents a hydrogen atom, a hydroxyl group, or a methyl group).
    • 本发明提供了一种生产方法,该方法具有短的工艺并具有高立体选择性,以及作为制备方法有用的中间体的羰基铁配合物。 一种二烯铁络合物,其特征在于由以下通式(I)表示:(其中A表示CO,P(RA)3,CN,NO,SO(RA)3或N(RA)2) 具有1至4个碳原子的直链或支链烷基或具有6至12个碳原子的芳基; R 1和R 2之一表示氢原子,另一个表示由下式(II )):(其中R表示氢原子,羟基或甲基)。
    • 27. 发明授权
    • Polishing apparatus with swinging structures
    • 具有摆动结构的抛光装置
    • US5653624A
    • 1997-08-05
    • US527422
    • 1995-09-13
    • Seiji IshikawaNorio KimuraKatsuyuki Aoki
    • Seiji IshikawaNorio KimuraKatsuyuki Aoki
    • B24B37/10B24B5/00B24B29/00
    • B24B37/105
    • A compact polishing apparatus requires less operating space than a conventional polishing apparatus generally used for polishing semiconductor wafers. The present apparatus has a swing shaft to provide a swing motion to a pressing device including a top ring member. There are three ranges of swing motion, i.e. a polishing range which is a small motion range used for polishing a wafer within the confined area of a turntable, a receiving range which is a medium motion range used for loading/unloading of a wafer in an area beyond the turntable, and a standby range which is a large motion range used for moving the top ring member to a standby or rinsing position in an area beyond the turntable. Because of the swing-based arrangement of the components in the present apparatus, isolation of critical components is easily achieved, thus resulting in low maintenance costs and long service life of the present apparatus. These advantages offer significant cost savings in the management of polishing operations.
    • 紧凑的抛光装置比通常用于抛光半导体晶片的常规抛光装置需要较少的操作空间。 本装置具有摆动轴,以向包括顶环构件的按压装置提供摆动运动。 有三个摆动运动范围,即抛光范围,该抛光范围是用于在转台的受限区域内抛光晶片的小运动范围,作为用于将晶片加载/卸载的介质运动范围的接收范围 以及用于将顶环构件移动到转台之外的区域中的待机或冲洗位置的大的运动范围的待机范围。 由于本装置中的部件的基于摆动的布置,容易实现关键部件的隔离,因此导致本装置的维护成本低和使用寿命长。 这些优点为抛光操作的管理提供了显着的成本节约。