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21. 发明授权

US06492090B2 Polymers, resist compositions and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06492090B2
公开(公告)日：2002-12-10
申请号：US09842113
申请日：2001-04-26
申请人： Tsunehiro Nishi , Seiichiro Tachibana , Mutsuo Nakashima , Takeshi Kinsho , Takeru Watanabe , Koji Hasegawa , Jun Hatakeyama
发明人： Tsunehiro Nishi , Seiichiro Tachibana , Mutsuo Nakashima , Takeshi Kinsho , Takeru Watanabe , Koji Hasegawa , Jun Hatakeyama
IPC分类号： G03F7038
CPC分类号： G03F7/039 , C08F222/06 , C08F222/40 , C08F232/08 , G03F7/0045 , C08F2220/1866 , C08F232/04 , C08F234/04 , C08F232/00
摘要： A polymer comprising units of formulas (1) and (2) and having a Mw of 1,000-500,000 is provided. R1 is H, CH3 or CH2CO2R3, R2 is H, CH3 or CO2R3, R3 is alkyl, R4 is H, alkyl, alkoxyalkyl or acyl, R5 is alkyl or aryl, Y is a divalent hydrocarbon group which may contain a hetero atom and which forms a ring with the carbon atom, Z is a trivalent hydrocarbon group, k is 0 or 1, and W is —O— or —(NR)— wherein R is H or alkyl. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV rays.
摘要翻译：提供了包含式（1）和（2）单元并且Mw为1,000-500,000的聚合物。 R1是H，CH3或CH2CO2R3，R2是H，CH3或CO2R3，R3是烷基，R4是H，烷基，烷氧基烷基或酰基，R5是烷基或芳基，Y是可以含有杂原子的二价烃基，与碳原子形成环，Z为三价烃基，k为0或1，W为-O-或 - （NR） - ，其中R为H或烷基。包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，具有优异的灵敏度，分辨率和耐蚀刻性，并且适用于电子束或深紫外线的微图案化。

22. 发明授权

US06448420B1 Acid-decomposable ester compound suitable for use in resist material 有权
标题翻译：适用于抗蚀材料的酸分解酯化合物
公开(公告)号：US06448420B1
公开(公告)日：2002-09-10
申请号：US09572975
申请日：2000-05-18
申请人： Takeshi Kinsho , Tsunehiro Nishi , Takeru Watanabe , Koji Hasegawa , Mutsuo Nakashima , Jun Hatakeyama
发明人： Takeshi Kinsho , Tsunehiro Nishi , Takeru Watanabe , Koji Hasegawa , Mutsuo Nakashima , Jun Hatakeyama
IPC分类号： C07J900
CPC分类号： C07C69/753 , C07C69/013 , C07C2602/42 , C07C2603/68 , C07C2603/74 , G03F7/0045 , G03F7/038 , G03F7/039
摘要： A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl ester as the acid-decomposable site is used as a dissolution regulator to formulate a resist composition having a high sensitivity, resolution, etching resistance and storage stability.
摘要翻译：使用具有外型2-烷基双环[2.2.1]庚-2-基酯作为酸可分解部位的新型酯化合物作为溶解调节剂，以配制具有高灵敏度，分辨率，耐蚀刻性和储存稳定性。

23. 发明授权

US06399274B1 Resist composition and patterning process 有权
标题翻译：抗蚀剂组成和图案化工艺
公开(公告)号：US06399274B1
公开(公告)日：2002-06-04
申请号：US09694706
申请日：2000-10-24
申请人： Takeshi Kinsho , Tsunehiro Nishi , Koji Hasegawa , Takeru Watanabe , Jun Hatakeyama
发明人： Takeshi Kinsho , Tsunehiro Nishi , Koji Hasegawa , Takeru Watanabe , Jun Hatakeyama
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045
摘要： A resist composition contains as a base resin a polymer comprising recurring units of the formula (1-1) or (1-2) and having a Mw of 1,000-500,000. R1 is H, methyl or CO2R2, R2 is a straight, branched or cyclic C1-15 alkyl group, R3 is hydrogen, methyl or CH2CO2R2, R4 is an acid labile group, i is an integer of 1 to 4, and k is equal to 0 or 1. The resist composition has significantly improved sensitivity, resolution and etching resistance and is very useful in precise microfabrication.
摘要翻译：抗蚀剂组合物含有作为基础树脂的包含式（1-1）或（1-2）的重复单元并且具有1,000-500,000的Mw的聚合物.R1是H，甲基或CO 2 R 2，R 2是直链，支链的或环状C 1-15烷基，R 3是氢，甲基或CH 2 CO 2 R 2，R 4是酸不稳定基团，i是1至4的整数，并且k等于0或1.抗蚀剂组合物具有显着提高的灵敏度，分辨率和抗蚀刻性，并且在精密微细加工中非常有用。

24. 发明授权

US06312867B1 Ester compounds, polymers, resist compositions and patterning process 有权
公开(公告)号：US06312867B1
公开(公告)日：2001-11-06
申请号：US09431139
申请日：1999-11-01
申请人： Takeshi Kinsho , Tsunehiro Nishi , Hideshi Kurihara , Koji Hasegawa , Takeru Watanabe , Osamu Watanabe , Mutsuo Nakashima , Takanobu Takeda , Jun Hatakeyama
发明人： Takeshi Kinsho , Tsunehiro Nishi , Hideshi Kurihara , Koji Hasegawa , Takeru Watanabe , Osamu Watanabe , Mutsuo Nakashima , Takanobu Takeda , Jun Hatakeyama
IPC分类号： G03F7004
CPC分类号： C07C69/56 , C07C69/013 , C07C69/533 , C07C69/54 , C07C69/593 , C07C69/60 , C07C2602/42 , C07C2603/68 , C07C2603/86 , C08F20/18 , G03F7/0045 , G03F7/039 , Y02P20/55
摘要： A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.

25. 发明授权

US08420290B2 Acetal compounds and their preparation, polymers, resist compositions and patterning process 有权
标题翻译：乙缩醛化合物及其制备方法，聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US08420290B2
公开(公告)日：2013-04-16
申请号：US12625711
申请日：2009-11-25
申请人： Koji Hasegawa , Masaki Ohashi , Takeshi Kinsho , Tsunehiro Nishi , Masayoshi Sagehashi
发明人： Koji Hasegawa , Masaki Ohashi , Takeshi Kinsho , Tsunehiro Nishi , Masayoshi Sagehashi
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38 , G03F7/11
CPC分类号： C08F32/08 , C07C41/16 , C07C41/18 , C07C41/22 , C07C41/32 , C07C67/11 , C07C69/54 , C07C2603/74 , G03F7/0045 , G03F7/0397 , G03F7/2041 , C07C43/188 , C07C43/192
摘要： An acetal compound of formula (1) is provided wherein R1 is H, methyl or trifluoromethyl, R2 is a monovalent C1-C10 hydrocarbon group, R3 and R4 are H or a monovalent C1-C10 hydrocarbon group, R2 and R3 may together form an aliphatic hydrocarbon ring, and X1 is a single bond or a divalent C1-C4 hydrocarbon group. A polymer comprising recurring units derived from the acetal compound is used as a base resin to formulate a resist composition which exhibits a high resolution when processed by micropatterning technology, especially ArF lithography.
摘要翻译：提供式（1）的缩醛化合物，其中R1是H，甲基或三氟甲基，R2是一价C1-C10烃基，R3和R4是H或一价C1-C10烃基，R2和R3可以一起形成脂族烃环，X1是单键或二价C1-C4烃基。使用包含衍生自缩醛化合物的重复单元的聚合物作为基础树脂，以配制在通过微图案技术特别是ArF光刻处理时显示出高分辨率的抗蚀剂组合物。

26. 发明授权

US06899990B2 Epoxy compound having alicyclic structure, polymer, resist composition and patterning process 失效
标题翻译：具有脂环结构的环氧化合物，聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06899990B2
公开(公告)日：2005-05-31
申请号：US10167393
申请日：2002-06-13
申请人： Koji Hasegawa , Takeshi Kinsho , Takeru Watanabe , Tsunehiro Nishi
发明人： Koji Hasegawa , Takeshi Kinsho , Takeru Watanabe , Tsunehiro Nishi
IPC分类号： C07D493/00 , C07D493/20 , C07D493/22 , C07D495/22 , C08F34/02 , C08F34/04 , C08G61/06 , C08G61/12 , C08G65/14 , C08G65/22 , G03F7/004 , G03F7/039 , H01L21/027 , G03F7/00 , C08F8/00
CPC分类号： C07D493/00 , C08G61/06 , C08G65/14 , C08G65/22 , G03F7/0045 , G03F7/0395
摘要： Epoxy compounds of formula (1) are provided wherein W is CH2, O or S, X and Y are —CR1R2— or —C(═O)—, k is 0 or 1, R1 and R2 are H or alkyl, or R1 and R2, taken together, may form an aliphatic hydrocarbon ring with the carbon atom to which they are connected. A resist composition comprising a polymer having recurring units of the epoxy compound as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV.
摘要翻译：提供式（1）的环氧化合物，其中W是CH 2，O或S，X和Y是-CR 1，R 2 - 或-C（-O） - ，k为0或1，R 1和R 2为H或烷基，或R 1和 R 2可以一起形成与它们连接的碳原子的脂族烃环。包含具有作为基础树脂的环氧化合物的重复单元的聚合物的抗蚀剂组合物对高能量辐射敏感，具有优异的灵敏度，分辨率，耐腐蚀性和最小化的溶胀，并且使其自身具有电子束或深UV的微图形化。

27. 发明授权

US06743566B2 Cyclic acetal compound, polymer, resist composition and patterning process 有权
标题翻译：环状缩醛化合物，聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06743566B2
公开(公告)日：2004-06-01
申请号：US10219139
申请日：2002-08-16
申请人： Mutsuo Nakashima , Seiichiro Tachibana , Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Tsunehiro Nishi , Jun Hatakeyama
发明人： Mutsuo Nakashima , Seiichiro Tachibana , Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Tsunehiro Nishi , Jun Hatakeyama
IPC分类号： G03C500
CPC分类号： C07D317/24 , C08F232/08 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： Cyclic acetal compounds of formula (1) wherein k=0 or 1 and n is an integer of 0 to 6 are novel. Using the cyclic acetal compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.
摘要翻译：其中k = 0或1，n为0至6的整数的式（1）的环状缩醛化合物是新颖的。使用环状缩醛化合物作为单体，得到聚合物。包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，并且具有优异的灵敏度，分辨率和耐蚀刻性。

28. 发明授权

US06673515B2 Polymer, resist composition and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06673515B2
公开(公告)日：2004-01-06
申请号：US09951523
申请日：2001-09-14
申请人： Tsunehiro Nishi , Mutsuo Nakashima , Seiichiro Tachibana , Takeshi Kinsho , Koji Hasegawa , Takeru Watanabe , Jun Hatakeyama
发明人： Tsunehiro Nishi , Mutsuo Nakashima , Seiichiro Tachibana , Takeshi Kinsho , Koji Hasegawa , Takeru Watanabe , Jun Hatakeyama
IPC分类号： G03F7038
CPC分类号： G03F7/039 , C08G61/08 , G03F7/0045
摘要： The invention provides a polymer comprising recurring units of formula (1—1) or (1-2) wherein k is 0 or 1, m is 0, 1, 2, 3 or 4, and n is 1 or 2 and having a weight average molecular weight of 1,000 to 500,000. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV.
摘要翻译：本发明提供了包含式（1-1）或（1-2）的重复单元的聚合物，其中k为0或1，m为0,1,2,3或4，n为1或2，并且具有重量平均分子量为1,000〜500,000。包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，具有优异的灵敏度，分辨率和耐蚀刻性，并且适用于电子束或深紫外线的微图案化。

29. 发明授权

US06566038B2 Polymers, resist compositions and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06566038B2
公开(公告)日：2003-05-20
申请号：US09842396
申请日：2001-04-26
申请人： Tsunehiro Nishi , Mutsuo Nakashima , Seiichiro Tachibana , Takeshi Kinsho , Koji Hasegawa , Takeru Watanabe , Jun Hatakeyama
发明人： Tsunehiro Nishi , Mutsuo Nakashima , Seiichiro Tachibana , Takeshi Kinsho , Koji Hasegawa , Takeru Watanabe , Jun Hatakeyama
IPC分类号： G03F7039
CPC分类号： C08F222/06 , C08F222/40 , C08F232/08 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/111 , C08F232/04 , C08F2220/1866 , C08F232/00
摘要： A polymer comprising units of formulas (1) and (2) and having a Mw of 1,000-500,000 is provided. R1 is H, CH3 or CH2CO2R3, R2 is H, CH3 or CO2R3, R3 is alkyl, R4 is halogen or acyloxy, alkoxycarbonyloxy or alkylsulfonyloxy group which may be substituted with halogen, R5 is H or alkyl, R6 is an acid labile group, Z is a single bond or a divalent hydrocarbon group, k is 0 or 1, and W is —O— or —(NR)— wherein R is H or alkyl. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV rays.
摘要翻译：提供了包含式（1）和（2）单元并且Mw为1,000-500,000的聚合物。 R 1为H，CH 3或CH 2 CO 2 R 3，R 2为H，CH 3或CO 2 R 3，R 3为烷基，R 4为卤素或酰氧基，可被卤素取代的烷氧基羰氧基或烷基磺酰氧基，R 5为H或烷基，R 6为酸不稳定基团， Z为单键或二价烃基，k为0或1，W为-O-或 - （NR） - ，其中R为H或烷基。包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，具有优异的灵敏度，分辨率和耐蚀刻性，并且适用于电子束或深紫外线的微图案化。

30. 发明授权

US06566037B2 Polymer, resist composition and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06566037B2
公开(公告)日：2003-05-20
申请号：US09797878
申请日：2001-03-05
申请人： Tsunehiro Nishi , Koji Hasegawa , Takeru Watanabe , Takeshi Kinsho , Jun Hatakeyama
发明人： Tsunehiro Nishi , Koji Hasegawa , Takeru Watanabe , Takeshi Kinsho , Jun Hatakeyama
IPC分类号： G03F7038
CPC分类号： C08F232/08 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/111
摘要： A polymer comprising recurring units of formula (1) and having a Mw of 1,000-500,000 is provided. R1 is H, methyl or CH2CO2R3, R2 is H, methyl or CO2R3, R3 is alkyl, R4 is H, alkyl, alkoxyalkyl or acyl, R5 and R15 are acid labile groups, and at least one of R6 to R9 is a carboxyl or hydroxyl-containing monovalent hydrocarbon group, and the reminders are H or alkyl, at least one of R10 to R13 is a monovalent hydrocarbon group containing a —CO2— partial structure, and the reminders are H or alkyl, R14 is a polycyclic hydrocarbon group or polycyclic hydrocarbon-containing alkyl group, Z is a trivalent hydrocarbon group, k=0 or 1, x is>0, a, b, c and d are≧0, satisfying x+a+b+c+d=1. A resist composition comprising the polymer has significantly improved sensitivity, resolution and etching resistance and is very useful in microfabrication.
摘要翻译：提供了包含式（1）的重复单元并且具有1,000-500,000的Mw的聚合物.R1是H，甲基或CH2CO2R3，R2是H，甲基或CO2R3，R3是烷基，R4是H，烷基，烷氧基烷基或酰基 R 5和R 15为酸不稳定基团，R 6〜R 9中的至少一个为羧基或羟基的一价烃基，提醒为H或烷基，R 10〜R 13中的至少一个为含有 -CO 2部分结构，提醒为H或烷基，R 14为多环烃基或含多环烃基的烷基，Z为三价烃基，k = 0或1，x为> 0，a，b， c和d为> = 0，满足x + a + b + c + d = 1。包含聚合物的抗蚀剂组合物具有显着提高的灵敏度，分辨率和耐蚀刻性，并且在微细加工中非常有用。

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