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21. 发明授权

US06423383B1 Plasma processing apparatus and method 失效
标题翻译：等离子体处理装置及方法
公开(公告)号：US06423383B1
公开(公告)日：2002-07-23
申请号：US09196141
申请日：1998-11-20
申请人： Naoki Hirose , Takashi Inujima , Toru Takayama
发明人： Naoki Hirose , Takashi Inujima , Toru Takayama
IPC分类号： H05H124
CPC分类号： H01J37/32192 , C23C16/511 , H01J37/32623 , H01J37/32678 , Y10S427/104
摘要： A plasma processing apparatus and method is equipped with a reaction chamber, a microwave generator for generating a microwave within the reaction chamber, and main and auxiliary magnets for producing a magnetic filed parallel with microwave propagation direction. The auxiliary magnet is located along the wall of the reaction chamber so as to strengthen the magnetic filed at the periphery of the reaction chamber. A reactive gas containing a carbon compound gas is introduced into the chamber wherein the reactive gas is converted into a plasma by a resonance using the microwaves and the magnetic field. The presence of the auxiliary magnet produces a centrifugal drifting force within the reaction chamber, thereby confining the plasma gas to the center of the chamber. A substrate is then placed within the chamber and a film comprising amorphous carbon is deposited thereon.
摘要翻译：等离子体处理装置和方法配备有反应室，用于在反应室内产生微波的微波发生器，以及用于产生与微波传播方向平行的磁场的主磁辅助磁铁。辅助磁体位于反应室的壁上，以加强反应室周围的磁场。将含有碳化合物气体的反应性气体引入室中，其中通过使用微波和磁场的共振将反应气体转化为等离子体。辅助磁体的存在在反应室内产生离心漂移力，从而将等离子体气体限制在室的中心。然后将衬底放置在室内，并且其上沉积包含无定形碳的膜。

22. 发明授权

US06217661B1 Plasma processing apparatus and method 失效
标题翻译：等离子体处理装置及方法
公开(公告)号：US06217661B1
公开(公告)日：2001-04-17
申请号：US09196744
申请日：1998-11-20
申请人： Naoki Hirose , Takashi Inujima , Toru Takayama
发明人： Naoki Hirose , Takashi Inujima , Toru Takayama
IPC分类号： C23C1600
CPC分类号： H01J37/32192 , C23C16/511 , H01J37/32623 , H01J37/32678 , Y10S427/104
摘要： A plasma processing apparatus and method is equipped with a vacuum chamber, helmholtz coils, a microwave generator and gas feeding systems. An auxiliary magnet is further provided in order to strengthen the magnetic field in the vacuum chamber to produce centrifugal drifting force which confine the plasma gas about the center position of the vacuum chamber.
摘要翻译：等离子体处理装置和方法配备有真空室，亥姆霍兹线圈，微波发生器和气体供给系统。进一步提供辅助磁体以加强真空室中的磁场，以产生围绕真空室的中心位置限制等离子体气体的离心漂移力。

23. 发明申请

US20080317545A1 Member mounting structure 失效
标题翻译：会员安装结构
公开(公告)号：US20080317545A1
公开(公告)日：2008-12-25
申请号：US12000277
申请日：2007-12-11
申请人： Masamori Hirose , Fumihiko Okada , Naoki Hirose
发明人： Masamori Hirose , Fumihiko Okada , Naoki Hirose
IPC分类号： F16B7/04
CPC分类号： F16B5/0258 , F16B5/025 , F16B17/008 , Y10T403/1624 , Y10T403/335 , Y10T403/75
摘要： A mounting part (second member) 12 has a positioning hole 26 to be fitted to an outer peripheral side of a boss 18 disposed on a vehicle interior part (first member) 10, to be positioned thereto. A facing surface 24 of the mounting part 12 is formed into a flat surface. By a slidable-contact of the flat facing surface 24 with a tip end of the boss 18 for a positional alignment, the positioning hole 26 can be fitted readily to the boss 18. A tubular portion 28 is disposed on a surface at a side opposite to the facing surface 24 to be fitted to the boss 18 substantially over its entire length thereof. Such fitting maintains the aligned state, so that a fastening work during fixing of the mounting part 12 by screwing a mounting screw 30 into a cylindrical hole 16 of the boss 18 is facilitated.
摘要翻译：安装部（第二构件）12具有定位孔26，该定位孔26配合到设置在车辆内部（第一构件）10上的凸台18的外周侧，以定位在其上。安装部12的面对面24形成为平坦面。通过平面对面24与凸台18的前端的可滑动接触以进行位置对准，定位孔26可以容易地装配到凸台18.管状部分28设置在相对侧的表面上相对于面对面24大致在其整个长度上安装到凸台18上。这种配合保持对准状态，从而便于通过将安装螺钉30拧入凸台18的圆柱形孔16来固定安装部分12期间的紧固工作。

24. 发明授权

US5858259A Plasma processing apparatus and method 失效
标题翻译：等离子体处理装置及方法
公开(公告)号：US5858259A
公开(公告)日：1999-01-12
申请号：US892267
申请日：1997-07-14
申请人： Naoki Hirose , Takashi Inujima , Toru Takayama
发明人： Naoki Hirose , Takashi Inujima , Toru Takayama
IPC分类号： H01L21/205 , C23C16/26 , C23C16/27 , C23C16/34 , C23C16/42 , C23C16/50 , C23C16/511 , C23F4/00 , H01J37/32 , H01L21/302 , H01L21/3065 , B44C1/22
CPC分类号： H01J37/32192 , C23C16/511 , H01J37/32623 , H01J37/32678 , Y10S427/104
摘要： A plasma processing apparatus and method is equipped with a vacuum chamber, helmholtz coils, a microwave generator and gas feeding systems. An auxiliary magnet is further provided in order to strengthen the magnetic field in the vacuum chamber to produce centrifugal drifting force which confine the plasma gas about the center position of the vacuum chamber.
摘要翻译：等离子体处理装置和方法配备有真空室，亥姆霍兹线圈，微波发生器和气体馈送系统。进一步提供辅助磁体以加强真空室中的磁场，以产生围绕真空室的中心位置限制等离子体气体的离心漂移力。

25. 发明授权

US5196366A Method of manufacturing electric devices 失效
标题翻译：制造电气设备的方法
公开(公告)号：US5196366A
公开(公告)日：1993-03-23
申请号：US567352
申请日：1990-08-15
申请人： Shunpei Yamazaki , Kenji Itoh , Masaya Kadono , Naoki Hirose
发明人： Shunpei Yamazaki , Kenji Itoh , Masaya Kadono , Naoki Hirose
IPC分类号： H01L21/20 , H01L33/00
CPC分类号： H01L33/0054 , H01L21/02381 , H01L21/02527 , H01L21/0259 , H01L21/0262 , H01L21/02658 , Y10S117/913 , Y10S438/932
摘要： A method of manufacturing electric devices is described. Discrete single crystals are formed on a substrate to be coated. The formation of these crystals is carried out by forming discrete crystallization centers in the surface of the substrate and growing a single crystal from each center. The spaces separating these crystals are filled with an insulating material in order not to form short current paths therein. The top surfaces of the crystals are exposed in order to make contact with an upper electrode.

26. 发明授权

US4926791A Microwave plasma apparatus employing helmholtz coils and ioffe bars 失效
标题翻译：采用亥姆霍兹线圈和io条的微波等离子体设备
公开(公告)号：US4926791A
公开(公告)日：1990-05-22
申请号：US186219
申请日：1988-04-26
申请人： Naoki Hirose , Takashi Inujima , Toru Takayama
发明人： Naoki Hirose , Takashi Inujima , Toru Takayama
IPC分类号： H01L21/205 , C23C16/26 , C23C16/27 , C23C16/34 , C23C16/42 , C23C16/50 , C23C16/511 , C23F4/00 , H01J37/32 , H01L21/302 , H01L21/3065
CPC分类号： H01J37/32192 , C23C16/511 , H01J37/32623 , H01J37/32678 , Y10S427/104
摘要： A plasma processing apparatus and method is equipped with a vacuum chamber, helmholtz coils, a microwave generator and gas feeding systems. An auxiliary magnet is further provided in order to strengthen the magnetic field in the vacuum chamber to produce centrifugal drifting force which confine the plasma gas about the center position of the vacuum chamber.
摘要翻译：等离子体处理装置和方法配备有真空室，亥姆霍兹线圈，微波发生器和气体馈送系统。进一步提供辅助磁体以加强真空室中的磁场，以产生围绕真空室的中心位置限制等离子体气体的离心漂移力。

27. 发明申请

US20120169514A1 NAVIGATION DEVICE 审中-公开
标题翻译：导航设备
公开(公告)号：US20120169514A1
公开(公告)日：2012-07-05
申请号：US13394411
申请日：2010-09-27
申请人： Akira Imanaga , Naoki Hirose
发明人： Akira Imanaga , Naoki Hirose
IPC分类号： G08G1/0967
CPC分类号： G08G1/09626 , G01C21/3697 , G08G1/162 , G08G1/164
摘要： Disclosed is a navigation device provided with a radio communication unit, a GPS unit, a positional information acquisition unit, a display unit, and a voice output unit, further provided with a warning operation unit for performing a warning operation, further provided with a recording unit for recording map information, further provided with a warning history generation unit for acquiring point information indicating a point at which the warning operation is detected, and generating warning history information in which the contents of the warning operation and the point information are associated with each other, further provided with a point detection unit for determining, using the positional information acquisition unit and the map information, whether or not the current position is within a predetermined range from an intersection and within a predetermined range from a position indicated by the point information, and further provided with a notification unit for, when the current position is determined to be within the abovementioned ranges, generating information for notification from the warning history information including said point information, and performing output control.
摘要翻译：公开了一种设置有无线电通信单元，GPS单元，位置信息获取单元，显示单元和语音输出单元的导航设备，还具有用于执行警告操作的警告操作单元，还具有记录记录地图信息的单元，还具有用于获取指示检测到警告操作的点的点信息的警告历史生成单元，并且生成其中警告操作和点信息的内容与每个相关联的警告历史信息另外还设置有点检测单元，用于使用位置信息获取单元和地图信息确定当前位置是否在距离交叉点的预定范围内并且在从点信息指示的位置的预定范围内并进一步提供通知单位，当时 t位置确定在上述范围内，从包括所述点信息的警告历史信息生成用于通知的信息，并执行输出控制。

28. 发明申请

US20050106331A1 Plasma processing apparatus and method 审中-公开
标题翻译：等离子体处理装置及方法
公开(公告)号：US20050106331A1
公开(公告)日：2005-05-19
申请号：US11022812
申请日：2004-12-28
申请人： Naoki Hirose , Takashi Inujima , Toru Takayama
发明人： Naoki Hirose , Takashi Inujima , Toru Takayama
IPC分类号： H01L21/205 , C23C16/26 , C23C16/27 , C23C16/34 , C23C16/42 , C23C16/50 , C23C16/511 , C23F4/00 , H01J37/32 , H01L21/302 , H01L21/3065 , H05H1/46
CPC分类号： H01J37/32192 , C23C16/511 , H01J37/32623 , H01J37/32678 , Y10S427/104
摘要： A plasma processing apparatus and method is equipped with a vacuum chamber, helmholtz coils, a microwave generator and gas feeding systems. An auxiliary magnet is further provided in order to strengthen the magnetic field in the vacuum chamber to produce centrifugal drifting force which confine the plasma gas about the center position of the vacuum chamber.
摘要翻译：等离子体处理装置和方法配备有真空室，亥姆霍兹线圈，微波发生器和气体馈送系统。进一步提供辅助磁体以加强真空室中的磁场，以产生围绕真空室的中心位置限制等离子体气体的离心漂移力。

29. 发明授权

US06838126B2 Method for forming I-carbon film 失效
标题翻译：形成I-碳膜的方法
公开(公告)号：US06838126B2
公开(公告)日：2005-01-04
申请号：US10189422
申请日：2002-07-08
申请人： Naoki Hirose , Takashi Inujima , Toru Takayama
发明人： Naoki Hirose , Takashi Inujima , Toru Takayama
IPC分类号： H01L21/205 , C23C16/26 , C23C16/27 , C23C16/34 , C23C16/42 , C23C16/50 , C23C16/511 , C23F4/00 , H01J37/32 , H01L21/302 , H01L21/3065 , H05H1/24
CPC分类号： H01J37/32192 , C23C16/511 , H01J37/32623 , H01J37/32678 , Y10S427/104
摘要： A film comprising an i-carbon is formed by converting a reactive gas containing a carbon compound gas into plasma by a resonance using a microwave and a magnetic field.
摘要翻译：通过使用微波和磁场的共振将含有碳化合物气体的反应气体转化为等离子体来形成包含i-碳的膜。

30. 发明授权

US5225367A Method for manufacturing an electronic device 失效
标题翻译：电子设备的制造方法
公开(公告)号：US5225367A
公开(公告)日：1993-07-06
申请号：US567398
申请日：1990-08-15
申请人： Shunpei Yamazaki , Kenji Itoh , Masaya Kadono , Naoki Hirose
发明人： Shunpei Yamazaki , Kenji Itoh , Masaya Kadono , Naoki Hirose
IPC分类号： C30B29/38 , C30B31/22 , C30B33/02 , H01L21/00 , H01L21/205 , H01L21/265 , H01L21/268 , H01L21/425 , H01L21/428 , H01L33/10 , H01L33/16 , H01L33/30 , H01L33/34 , H01L33/42 , H01L33/62
CPC分类号： H01L21/67011 , H01L21/26546 , H01L21/268 , Y10S438/932
摘要： A method of manufacturing an electronic device using boron nitrides comprises the steps of adding impurities in boron nitrides by ion implantation to form a doped region and directing a laser beam onto the doped region while the boron nitrides are placed in a vacuum or a non-oxidizing atmosphere.
摘要翻译：使用氮化硼制造电子器件的方法包括以下步骤：通过离子注入在硼氮化物中添加杂质以形成掺杂区域并将激光束引导到掺杂区域上，同时将氮化硼置于真空中或非氧化大气层。

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