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21. 发明授权

US06312869B1 Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group 有权
标题翻译：化学扩增正型抗蚀剂组合物，图案形成方法，以及制备具有交联基团的聚合物的方法
公开(公告)号：US06312869B1
公开(公告)日：2001-11-06
申请号：US09592419
申请日：2000-06-12
申请人： Satoshi Watanabe , Osamu Watanabe , Tomoyoshi Furihata , Yoshihumi Takeda , Shigehiro Nagura , Toshinobu Ishihara , Tsuguo Yamaoka
发明人： Satoshi Watanabe , Osamu Watanabe , Tomoyoshi Furihata , Yoshihumi Takeda , Shigehiro Nagura , Toshinobu Ishihara , Tsuguo Yamaoka
IPC分类号： G03F7039
CPC分类号： G03F7/039 , C08F8/00 , C08F2810/20 , C08F2810/30 , G03F7/0045 , Y10S430/106 , C08F112/14
摘要： A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polymer having at least one acid labile group and crosslinked within a molecule and/or between molecules with a crosslinking group having a C—O—C linkage, the polymer having a weight average molecular weight of 1,000-500,000, (C) a photoacid generator, (D) a basic compound, and (E) an aromatic compound having a group ≡C—COOH in a molecule. The composition has a high alkali dissolution contrast, high sensitivity and high resolution.
摘要翻译：化学放大正性抗蚀剂组合物包含（A）有机溶剂，（B）具有至少一个酸不稳定基团的聚合物形式的基础树脂，并且在分子内和/或具有交联基团的分子之间具有COC 连接，重均分子量为1,000〜500,000的聚合物，（C）光酸产生剂，（D）碱性化合物和（E）分子中具有= C-COOH基团的芳族化合物。该组合物具有高碱溶性对比度，高灵敏度和高分辨率。

22. 发明授权

US6106993A Chemically amplified positive resist composition 失效
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US6106993A
公开(公告)日：2000-08-22
申请号：US114067
申请日：1998-07-13
申请人： Satoshi Watanabe , Osamu Watanabe , Shigehiro Nagura , Toshinobu Ishihara
发明人： Satoshi Watanabe , Osamu Watanabe , Shigehiro Nagura , Toshinobu Ishihara
IPC分类号： G03F7/00 , G03F7/004 , G03F7/039
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106
摘要： A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin, (C) a photoacid generator, and optionally, (D) a dissolution rate regulator. The base resin (B) is a hydroxystyrene copolymer having different acid labile groups and Mw of 3,000-300,000. The resist composition is highly sensitive to actinic radiation such as deep-UV, electron beam and X-ray, can be developed with aqueous base to form a pattern, and is thus suitable for use in a fine patterning technique.
摘要翻译：化学放大正性抗蚀剂组合物包含（A）有机溶剂，（B）基础树脂，（C）光致酸产生剂，和任选的（D）溶出速率调节剂。基础树脂（B）是具有不同酸不稳定基团和Mw为3,000-300,000的羟基苯乙烯共聚物。抗蚀剂组合物对光化辐射如深UV，电子束和X射线高度敏感，可以用碱水溶液显影以形成图案，因此适用于精细图案化技术。

23. 发明授权

US5880169A Sulfonium salts and chemically amplified positive resist compositions 失效
标题翻译：锍盐和化学增幅阳性抗蚀剂组合物
公开(公告)号：US5880169A
公开(公告)日：1999-03-09
申请号：US742324
申请日：1996-11-01
申请人： Yoichi Osawa , Satoshi Watanabe , Katsuya Takemura , Shigehiro Nagura , Akinobu Tanaka , Yoshio Kawai
发明人： Yoichi Osawa , Satoshi Watanabe , Katsuya Takemura , Shigehiro Nagura , Akinobu Tanaka , Yoshio Kawai
IPC分类号： G03F7/004 , G03F7/039 , G03F7/038
CPC分类号： G03F7/0045
摘要： The invention provides a novel sulfonium salt having at least one acid labile group attached to a phenyl group in a molecule and a normal, branched or cyclic C.sub.1 -C.sub.20 alkylsulfonate anion. The novel sulfonium salt is effective for increasing the dissolution contrast between exposed and unexposed areas. Upon exposure, it generates an alkylsulfonic acid which is a weak acid, minimizing the influence of side reaction and deactivation during PEB step. The sulfonium salt is useful in a chemically amplified positive resist composition which lends itself to fine patterning and features high resolution.
摘要翻译：本发明提供了一种新的锍盐，其具有至少一个与分子中的苯基连接的酸不稳定基团以及正，支链或环状的C 1 -C 20烷基磺酸根阴离子。新型锍盐对于增加曝光和未曝光区域之间的溶解度对比是有效的。暴露后，产生弱酸的烷基磺酸，使PEB步骤中副反应和失活的影响最小化。锍盐可用于化学放大的正性抗蚀剂组合物，其具有精细的图案化并具有高分辨率。

24. 发明授权

US06335141B1 Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group 有权
标题翻译：化学扩增正型抗蚀剂组合物，图案形成方法，以及制备具有交联基团的聚合物的方法
公开(公告)号：US06335141B1
公开(公告)日：2002-01-01
申请号：US09592423
申请日：2000-06-12
申请人： Satoshi Watanabe , Osamu Watanabe , Tomoyoshi Furihata , Yoshihumi Takeda , Shigehiro Nagura , Toshinobu Ishihara , Tsuguo Yamaoka
发明人： Satoshi Watanabe , Osamu Watanabe , Tomoyoshi Furihata , Yoshihumi Takeda , Shigehiro Nagura , Toshinobu Ishihara , Tsuguo Yamaoka
IPC分类号： G03F7039
CPC分类号： G03F7/039 , C08F8/00 , C08F2810/20 , C08F2810/30 , G03F7/0045 , Y10S430/106 , C08F112/14
摘要： A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polymer having at least one acid labile group and crosslinked within a molecule and/or between molecules with a crosslinking group having a C—O—C linkage, the polymer having a weight average molecular weight of 1,000-500,000, (C) a photoacid generator, (D) a basic compound, and (E) an aromatic compound having a group ≡C—COOH in a molecule. The composition has a high alkali dissolution contrast, high sensitivity and high resolution.
摘要翻译：化学放大正性抗蚀剂组合物包含（A）有机溶剂，（B）具有至少一个酸不稳定基团的聚合物形式的基础树脂，并且在分子内和/或具有交联基团的分子之间具有COC 连接，重均分子量为1,000〜500,000的聚合物，（C）光酸产生剂，（D）碱性化合物和（E）分子中具有= C-COOH基团的芳族化合物。该组合物具有高碱溶性对比度，高灵敏度和高分辨率。

25. 发明授权

US06156477A Polymers and chemically amplified positive resist compositions 失效
标题翻译：聚合物和化学增幅阳性抗蚀剂组合物
公开(公告)号：US06156477A
公开(公告)日：2000-12-05
申请号：US13270
申请日：1998-01-26
申请人： Kiyoshi Motomi , Osamu Watanabe , Satoshi Watanabe , Shigehiro Nagura , Toshinobu Ishihara
发明人： Kiyoshi Motomi , Osamu Watanabe , Satoshi Watanabe , Shigehiro Nagura , Toshinobu Ishihara
IPC分类号： C08F8/00 , G03F7/004 , G03F7/039
CPC分类号： G03F7/039 , C08F8/14 , G03F7/0045 , C08F2800/20 , C08F2810/20 , Y10S430/106 , Y10S430/111
摘要： A polymer comprising recurring units of formula (1) is provided wherein some hydrogen atoms of phenolic hydroxyl groups and/or carboxyl groups are replaced by acid labile groups. The polymer is crosslinked with a crosslinking group having a C--O--C linkage resulting from reaction of some of the remaining phenolic hydroxyl groups and/or carboxyl groups with an alkenyl ether compound or halogenated alkyl ether compound. The amount of the acid labile group and the crosslinking group combined is on the average from more than 0 mol % to 80 mol % of the entirety of the phenolic hydroxyl group and carboxyl group. The polymer has Mw of 1,000-500,000. R.sup.1 is H or methyl, R.sup.2 is C.sub.1 -C.sub.8 alkyl, R.sup.3 is H, R.sup.4 is --COOR.sup.5, C.sub.1 -C.sub.5 alkyl or phenyl, or R.sup.3 and R.sup.4, taken together, may form --COOCO--, R.sup.5 is H or C.sub.1 -C.sub.8 alkyl, x and y are integers satisfying x+y.ltoreq.5, p and q are positive numbers satisfying p+q=1 and 0
摘要翻译：提供了包含式（1）的重复单元的聚合物，其中酚羟基和/或羧基的一些氢原子被酸不稳定基团取代。聚合物与由一些残留的酚羟基和/或羧基与烯基醚化合物或卤代烷基醚化合物反应得到的具有C-O-C键的交联基团交联。酸不稳定基团和交联基团的用量平均为全部酚羟基和羧基的0摩尔％至80摩尔％以上。聚合物的Mw为1,000-500,000。 R1是H或甲基，R2是C1-C8烷基，R3是H，R4是-COOR5，C1-C5烷基或苯基，或R3和R4一起可以形成-COOCO-，R5是H或C1-C8 烷基，x和y是满足x + y <5的整数，p和q是满足p + q = 1和0

26. 发明授权

US6114462A Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group 有权
标题翻译：化学扩增正型抗蚀剂组合物，图案形成方法，以及制备具有交联基团的聚合物的方法
公开(公告)号：US6114462A
公开(公告)日：2000-09-05
申请号：US302304
申请日：1999-04-30
申请人： Satoshi Watanabe , Osamu Watanabe , Tomoyoshi Furihata , Yoshihumi Takeda , Shigehiro Nagura , Toshinobu Ishihara , Tsuguo Yamaoka
发明人： Satoshi Watanabe , Osamu Watanabe , Tomoyoshi Furihata , Yoshihumi Takeda , Shigehiro Nagura , Toshinobu Ishihara , Tsuguo Yamaoka
IPC分类号： C08F8/00 , G03F7/004 , G03F7/039 , C08F261/06
CPC分类号： G03F7/039 , C08F8/00 , G03F7/0045 , C08F2810/20 , C08F2810/30 , Y10S430/106
摘要： A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polymer having at least one acid labile group and crosslinked within a molecule and/or between molecules with a crosslinking group having a C--O--C linkage, the polymer having a weight average molecular weight of 1,000-500,000, (C) a photoacid generator, (D) a basic compound, and (E) an aromatic compound having a group .tbd.C--COOH in a molecule. The composition has a high alkali dissolution contrast, high sensitivity and high resolution.
摘要翻译：化学放大正性抗蚀剂组合物包含（A）有机溶剂，（B）具有至少一个酸不稳定基团的聚合物形式的基础树脂，并且在分子内和/或具有交联基团的分子之间具有COC 连接，重均分子量为1,000〜500,000的聚合物，（C）光酸产生剂，（D）碱性化合物和（E）分子中具有第3BOND C-COOH基团的芳族化合物。该组合物具有高碱溶性对比度，高灵敏度和高分辨率。

27. 发明授权

US6027854A Polymers chemically amplified positive resist compositions, and patterning method 失效
标题翻译：聚合物化学放大正性抗蚀剂组合物和图案化方法
公开(公告)号：US6027854A
公开(公告)日：2000-02-22
申请号：US31560
申请日：1998-02-27
申请人： Tsunehiro Nishi , Osamu Watanabe , Satoshi Watanabe , Shigehiro Nagura , Toshinobu Ishihara
发明人： Tsunehiro Nishi , Osamu Watanabe , Satoshi Watanabe , Shigehiro Nagura , Toshinobu Ishihara
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106
摘要： A polymer comprising recurring units of formula (1) is provided wherein some hydrogen atoms of phenolic hydroxyl groups and/or alcoholic hydroxyl groups and/or carboxyl groups are replaced by acid labile groups. The polymer is crosslinked with a crosslinking group having a C--O--C linkage resulting from reaction of some of the remaining alcoholic hydroxyl groups and/or carboxyl groups with an alkenyl ether compound or halogenated alkyl ether compound. The amount of the acid labile group and the crosslinking group combined is on the average from more than 0 mol % to 80 mol % of the entirety of the phenolic hydroxyl group, alcoholic hydroxyl group and carboxyl group. The polymer has Mw of 1,000-500,000. ##STR1## R.sup.1 is H or methyl, R.sup.2 is C.sub.1 -C.sub.8 alkyl, R.sup.3 is a divalent C.sub.1 -C.sub.18 hydrocarbon group which may have a hetero atom, R.sup.4 and R.sup.5 are H or monovalent C.sub.1 -C.sub.18 hydrocarbon groups which may have a hetero atom, x and y are integers satisfying x+y.ltoreq.5, x', y' and z' are integers satisfying x'+y'+z'.ltoreq.5, p, q and r are numbers satisfying 0.ltoreq.p.ltoreq.0.4, 0.ltoreq.q.ltoreq.0.4, 0.01.ltoreq.p+q.ltoreq.0.8, and p+q+r=1. A chemically amplified positive resist composition comprising the polymer as a base resin has high sensitivity, high resolution, a wide latitude of exposure, and process adaptability and forms resist patterns having plasma etching resistance and heat resistance.
摘要翻译：提供了包含式（1）的重复单元的聚合物，其中酚羟基和/或醇羟基和/或羧基的一些氢原子被酸不稳定基团取代。聚合物与由一些残留的醇羟基和/或羧基与链烯基醚化合物或卤代烷基醚化合物的反应产生的具有C-O-C键的交联基团交联。酸不稳定基团和交联基团的结合量平均为全部酚羟基，醇羟基和羧基的0摩尔％至80摩尔％以上。聚合物的Mw为1,000-500,000。 R1是H或甲基，R2是C1-C8烷基，R3是可以具有杂原子的二价C1-C18烃基，R4和R5是H或可以具有杂原子的一价C1-C18烃基，x和 y是满足x + y <5的整数，x'，y'和z'是满足x'+ y'+ z'= 5的整数，p，q和r是满足0

28. 发明授权

US5972559A Chemically amplified positive resist compositions 失效
标题翻译：化学扩增的正性抗蚀剂组合物
公开(公告)号：US5972559A
公开(公告)日：1999-10-26
申请号：US884503
申请日：1997-06-27
申请人： Satoshi Watanabe , Katsuya Takemura , Shigehiro Nagura
发明人： Satoshi Watanabe , Katsuya Takemura , Shigehiro Nagura
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106
摘要： A chemically amplified positive resist composition is prepared by blending (A) an organic solvent, (B) a base resin in the form of a polyhydroxystyrene having some hydroxyl groups replaced by acid labile groups and a Mw of 3,000-300,000, (C) a photoacid generator, and (D) an aromatic compound having a group: --R.sup.13 --COOH in a molecule. The resist composition is sensitive to actinic radiation, especially KrF excimer laser and X-ray, has high sensitivity, resolution, and plasma etching resistance, and is effective for improving the footing and PED on nitride substrates.
摘要翻译：通过将（A）有机溶剂，（B）具有由酸不稳定基团取代的一些羟基的聚羟基苯乙烯形式的基础树脂和3,000-300,000的Mw（C）共混制备化学放大正性抗蚀剂组合物光生酸发生剂，（D）分子中具有-R13-COOH基团的芳香族化合物。抗蚀剂组合物对光化辐射敏感，特别是KrF准分子激光和X射线，具有高灵敏度，分辨率和等离子体耐蚀刻性，对于改善氮化物衬底上的基脚和PED是有效的。

29. 发明授权

US5824824A Sulfonium salts and chemically amplified positive resist compositions 失效
标题翻译：锍盐和化学增幅阳性抗蚀剂组合物
公开(公告)号：US5824824A
公开(公告)日：1998-10-20
申请号：US742323
申请日：1996-11-01
申请人： Yoichi Osawa , Satoshi Watanabe , Kaysuya Takemura , Shigehiro Nagura , Akinobu Tanaka , Yoshio Kawai
发明人： Yoichi Osawa , Satoshi Watanabe , Kaysuya Takemura , Shigehiro Nagura , Akinobu Tanaka , Yoshio Kawai
IPC分类号： C07C381/12 , G03F7/004 , C07C319/00
CPC分类号： G03F7/0045 , C07C381/12 , Y10S430/115 , Y10S430/122 , Y10S430/126
摘要： The invention provides a novel sulfonium salt having at least one acid labile group attached to a phenyl group in a molecule and a C.sub.2 -C.sub.20 alkylsulfonate or arylsulfonate anion whose alkyl or aryl has as a substituent an electron withdrawing group such as fluorine and nitro group. The novel sulfonium salt is effective for increasing the dissolution contrast between exposed and unexposed areas. Upon exposure, it generates a substituted alkyl or arylsulfonic acid which is a weak acid, minimizing the influence of side reaction and deactivation during PEB step. The sulfonium salt is useful in a chemically amplified positive resist composition which lends itself to fine patterning and features high resolution.
摘要翻译：本发明提供了一种新的锍盐，其具有至少一个与分子中的苯基连接的酸不稳定基团，和其烷基或芳基具有诸如氟和硝基的吸电子基团的取代基的C 2 -C 20烷基磺酸盐或芳基磺酸根阴离子。新型锍盐对于增加曝光和未曝光区域之间的溶解度对比是有效的。暴露后，产生弱酸的取代烷基或芳基磺酸，使PEB步骤中副反应和失活的影响最小化。锍盐可用于化学放大的正性抗蚀剂组合物，其具有精细的图案化并具有高分辨率。

30. 发明授权

US5126254A Process for preparation of streptovaricin 失效
标题翻译：制备链脲霉素的方法
公开(公告)号：US5126254A
公开(公告)日：1992-06-30
申请号：US601875
申请日：1990-10-23
申请人： Isao Endo , Shigehiro Nagura , Kaname Inoue , Jun Watanabe
发明人： Isao Endo , Shigehiro Nagura , Kaname Inoue , Jun Watanabe
IPC分类号： C12P17/18
CPC分类号： C12P17/18 , Y10S435/886
摘要： A method for producing streptovaricin by culturing a streptovaricin producing strain in the presence of a nonionic adsorbent. This procedure substantially increases the production efficiency of the streptovaricin. A second embodiment wherein the streptovaricin producing strain is produced in the presence of fumaric acid or its water soluble salts to provide improvements in production efficiency is also disclosed.
摘要翻译：通过在非离子吸附剂的存在下培养产生链脲霉素的菌株来生产链脲霉素的方法。该方法显着提高了链脲菌素的生产效率。还公开了在富马酸或其水溶性盐存在下生产链脲菌素生产菌株以提供生产效率的改进的第二个实施方案。

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