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    • 24. 发明授权
    • Semiconductor integrated circuit device and method of manufacturing the same, and cell size calculation method for DRAM memory cells
    • 半导体集成电路器件及其制造方法,以及DRAM存储单元的单元尺寸计算方法
    • US06459113B1
    • 2002-10-01
    • US09760804
    • 2001-01-17
    • Toshinori MoriharaHiroki ShimanoKazutami Arimoto
    • Toshinori MoriharaHiroki ShimanoKazutami Arimoto
    • H01L27108
    • H01L27/10805H01L27/0207
    • There is provided a semiconductor integrated circuit device comprising: a field placement creating a field pattern in an array form by closest packing on a first conductance-type semiconductor substrate, the field pattern including a plurality of memory cells which define an active area and a device isolation region of a field effect transistor, and which are arranged in a predetermined pitch in the longitudinal and transverse directions, respectively, each memory cell having a pattern of a certain length-to-width size; a cell plate placement providing a capacitor structure between a second conductance-type diffusion region formed by an impurity implant to the active area and a cell plate electrode formed so as to cover part of the active area with a predetermined cell plate pattern through a capacitor dielectric, the cell plate pattern extending in the transverse direction with a certain length size; and a word line placement in which a word line pattern is arranged in the transverse direction of a vacant zone of the active area in which the cell plate electrode is not formed and serves as a gate electrode of the field effect transistor on the active area, the word line pattern being formed through a gate oxide at a predetermined interval, wherein the layout of a cell array of the memory cells is provided by a closest packing cell configuration.
    • 提供了一种半导体集成电路器件,包括:场放置,通过在第一导电型半导体衬底上的最密堆积产生阵列形式的场图案,场图案包括限定有源区域的多个存储单元和器件 隔离区域,并且分别以纵向和横向方向以预定间距布置,每个存储单元具有一定长度至宽度尺寸的图案; 在通过杂质注入形成的第二电导型扩散区域与有源区域之间提供电容器结构的单元板布置和通过电容器电介质以预定的单元板图案覆盖部分有源区域形成的单元板电极 ,细胞板图案以一定的长度尺寸在横向上延伸; 以及字线图案,其中在没有形成单元板电极的有源区域的空白区域的横向上布置字线图案,并且用作有源区域上的场效应晶体管的栅电极, 所述字线图案是以预定间隔通过栅极氧化物形成的,其中所述存储单元的单元阵列的布局由最接近的封装单元配置提供。
    • 28. 发明申请
    • SEMICONDUCTOR SIGNAL PROCESSING APPARATUS
    • 半导体信号处理设备
    • US20110085364A1
    • 2011-04-14
    • US12900915
    • 2010-10-08
    • Hiroki ShimanoKazutami Arimoto
    • Hiroki ShimanoKazutami Arimoto
    • G11C15/00
    • G11C15/04
    • A pair of operator cells each having a series-coupled circuit of first and second transistors is used as a storage unit. To-be-retrieved data and retrieval data are respectively stored in the first and second transistors, and mutually complementary data items are stored in the operator cells of the storage unit. The operator cells supply currents according to the result of an AND operation between the stored data items to corresponding bit lines, and the read data from the storage unit corresponds to the result of an EXOR operation between the retrieval data and the to-be-retrieved data. The currents flowing in the corresponding bit lines are amplified with sense amplifier circuits to drive local match lines. In the individual sub-blocks of an operator cell array, data items having different pattern lengths can be stored. The potentials of the local match lines are selected according to the data pattern lengths, and match retrieval is performed for the data items having the different pattern lengths.
    • 每个具有第一和第二晶体管的串联耦合电路的一对操作单元被用作存储单元。 待检索的数据和检索数据分别存储在第一和第二晶体管中,相互补充的数据项存储在存储单元的操作员单元中。 操作员单元根据存储的数据项与对应的位线之间的AND运算结果来提供电流,并且来自存储单元的读取数据对应于检索数据和待检索的EXOR操作的结果 数据。 在对应位线中流动的电流用读出放大器电路放大,以驱动局部匹配线。 在操作员单元阵列的各个子块中,可以存储具有不同图案长度的数据项。 根据数据图案长度选择局部匹配线的电位,并且对具有不同图案长度的数据项执行匹配检索。
    • 30. 发明授权
    • Semiconductor memory device
    • 半导体存储器件
    • US07248495B2
    • 2007-07-24
    • US11397811
    • 2006-04-05
    • Kazutami ArimotoHiroki Shimano
    • Kazutami ArimotoHiroki Shimano
    • G11C11/24
    • G11C7/18G11C8/14G11C11/4085G11C11/4087G11C11/4097G11C2211/4013H01L27/0207H01L27/108H01L27/1085H01L27/10873H01L27/10882
    • Conductive lines constituting word lines of memory cells and conductive lines constituting memory cell plate electrodes are formed in the same interconnecting layer in a memory device including a plurality of memory cells each including a capacitor for storing data in an electrical charge form. By forming the capacitors of the memory cells into a planar capacitor configuration, a step due to the capacitors is removed. Thus, a dynamic semiconductor memory device can be formed through CMOS process, and a dynamic semiconductor memory device suitable for merging with logic is achieved. Data of 1 bit is stored by two memory cells, and data can be reliably stored even if the capacitance value of the memory cell is reduced due to the planar type capacitor.
    • 构成存储单元板的导体线的导电线和构成存储单元板电极的导线被形成在包括多个存储单元的存储器件的同一互连层中,每个存储单元均包括用于以电荷形式存储数据的电容器。 通过将存储单元的电容器形成为平面电容器配置,由于电容器而导致的步骤被去除。 因此,可以通过CMOS工艺形成动态半导体存储器件,并且实现适合于与逻辑合并的动态半导体存储器件。 1位的数据由两个存储单元存储,即使由于平面型电容器而使存储单元的电容值减小,也可以可靠地存储数据。