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21. 发明授权

US07491648B2 Method of patterning a photoresist film using a lithographic 失效
标题翻译：使用平版印刷图案化光致抗蚀剂膜的方法
公开(公告)号：US07491648B2
公开(公告)日：2009-02-17
申请号：US11024706
申请日：2004-12-30
申请人： Il Ho Lee
发明人： Il Ho Lee
IPC分类号： H01L21/302
CPC分类号： G03F7/40 , G03F7/2024
摘要： Method for patterning a photoresist film in lithographic process including the steps of: coating the photoresist film on a substrate provided with an under layer; exposing the substrate; firstly developing the photoresist film; exposing a whole surface of the substrate; and secondly developing the photoresist film. The present method has effects on improving an accuracy of formation of pattern and preventing from scum, photoresist residues, and so on, with relatively low cost and short process time.
摘要翻译：在光刻工艺中图案化光致抗蚀剂膜的方法，包括以下步骤：在具有下层的基底上涂覆光致抗蚀剂膜; 曝光基板; 首先开发光致抗蚀剂膜; 暴露基片的整个表面; 并且其次显影光刻胶膜。本方法具有提高图案形成精度和防止浮渣，光致抗蚀剂残留等的效果，成本低，处理时间短。

22. 发明申请

US20070252940A1 Display device module 审中-公开
标题翻译：显示设备模块
公开(公告)号：US20070252940A1
公开(公告)日：2007-11-01
申请号：US11543145
申请日：2006-10-05
申请人： Il Ho Lee
发明人： Il Ho Lee
IPC分类号： G02F1/1345
CPC分类号： H01L27/3276 , H01L27/3288
摘要： The present invention discloses the display device module in which the first and second lines can be connected easily to a device-driving unit or a connecting means on which the device-driving unit is mounted, the display device module of the present invention comprises a pixel circuit section including at least one light emitting area, each light emitting area being formed at an overlying area of a substrate between a first electrode and a second electrode on a substrate; at least one first line being electrically connected to the first electrode in the pixel circuit section; at least one second line being electrically connected to the second electrode in the pixel circuit section, wherein each of the first lines and the second lines has a connecting portion formed thereon and the connecting portion is larger than the line in the width, the connecting portions are alternated with the connecting portion(s) of the neighbor line(s) so as to prevent two adjacent connecting portions from being contacted with each other.
摘要翻译：本发明公开了一种显示设备模块，其中第一和第二线路可以容易地连接到设备驱动单元或其上安装设备驱动单元的连接装置，本发明的显示设备模块包括像素电路部分包括至少一个发光区域，每个发光区域形成在衬底的覆盖区域上，位于衬底上的第一电极和第二电极之间; 至少一条第一线电连接到像素电路部分中的第一电极; 至少一条第二线电连接到像素电路部分中的第二电极，其中第一线和第二线中的每一条具有形成在其上的连接部分，并且连接部分大于宽度线，连接部分与相邻线路的连接部分交替，以便防止两个相邻的连接部分彼此接触。

23. 发明授权

US07193686B2 Lithography apparatus and method for measuring alignment mark 失效
标题翻译：平版印刷设备和测量对准标记的方法
公开(公告)号：US07193686B2
公开(公告)日：2007-03-20
申请号：US11024743
申请日：2004-12-30
申请人： Il Ho Lee
发明人： Il Ho Lee
IPC分类号： G03B27/72 , G03B27/42 , G03B27/52
CPC分类号： G03F9/7011 , G03F9/7065
摘要： A lithographic exposing system having an optical system including a light source, a lens, a mirror and a filter, and transferring patterns formed on a reticle to a substrate. The method includes a device for lowering the energy of the light from the light source below a threshold energy, an equipment for making the light that has passed through the device a light source for measuring alignment marks formed on the substrate, and a light path controlling device for directing the light from the light source toward the optical system in an exposing process and for making the light from the light source toward said the alignment mark measuring equipment.
摘要翻译：一种光刻曝光系统，其具有包括光源，透镜，反射镜和滤光器的光学系统，以及将形成在掩模版上的图案转印到基板上。该方法包括用于降低来自光源的光的能量低于阈值能量的装置，用于使已经穿过该装置的光用于测量形成在基板上的对准标记的光源的设备，以及控制光用于在曝光过程中将来自光源的光引向光学系统并用于使来自光源的光朝向对准标记测量设备的装置。

24. 发明申请

US20060040216A1 Method of patterning photoresist film 审中-公开
标题翻译：图案化光刻胶膜的方法
公开(公告)号：US20060040216A1
公开(公告)日：2006-02-23
申请号：US11024721
申请日：2004-12-30
申请人： Il Ho Lee
发明人： Il Ho Lee
IPC分类号： G03F7/30
CPC分类号： G03F7/322
摘要： A method for patterning a photoresist film provided on a substrate can include exposing the photoresist film, and developing the photoresist film with a developer including a thinner. The method can also include exposing the photoresist film, developing the photoresist film, and cleaning the photoresist film with a cleaning solution including a thinner.
摘要翻译：用于图案化设置在基板上的光致抗蚀剂膜的方法可以包括曝光光致抗蚀剂膜，以及用包括较薄的显影剂显影光致抗蚀剂膜。该方法还可以包括曝光光致抗蚀剂膜，显影光致抗蚀剂膜，以及用包括稀释剂的清洁溶液清洁光致抗蚀剂膜。

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