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21. 发明申请

US20100006417A1 CAPACITIVELY-COUPLED ELECTROSTATIC (CCE) PROBE ARRANGEMENT FOR DETECTING STRIKE STEP IN A PLASMA PROCESSING CHAMBER AND METHODS THEREOF 有权
标题翻译：用于检测等离子体加工室中的冲击步骤的电容耦合静电（CCE）探测器布置及其方法
公开(公告)号：US20100006417A1
公开(公告)日：2010-01-14
申请号：US12498936
申请日：2009-07-07
申请人： Jean-Paul Booth , Douglas L. Keil
发明人： Jean-Paul Booth , Douglas L. Keil
IPC分类号： H05H1/24 , B01J19/08
CPC分类号： H05H1/0081 , H05H1/0012
摘要： A method for identifying a stabilized plasma within a processing chamber of a plasma processing system is provided. The method includes executing a strike step within the processing chamber to generate a plasma. The strike step includes applying a substantially high gas pressure within the processing chamber and maintaining a low radio frequency (RF) power within the processing chamber. The method also includes employing a probe head to collect a set of characteristic parameter measurements during the strike step, the probe head being on a surface of the processing chamber, wherein the surface is within close proximity to a substrate surface. The method further includes comparing the set of characteristic parameter measurements against a pre-defined range. If the set of characteristic parameter measurements is within the pre-defined range, the stabilized plasma exists.
摘要翻译：提供了一种在等离子体处理系统的处理室内识别稳定的等离子体的方法。该方法包括在处理室内执行击打步骤以产生等离子体。冲击步骤包括在处理室内施加基本上高的气体压力并且在处理室内保持低射频（RF）功率。该方法还包括采用探针头在罢工步骤期间收集一组特征参数测量值，探针头位于处理室的表面上，其中该表面紧邻衬底表面。该方法还包括将特征参数测量集合与预定义范围进行比较。如果一组特征参数测量值在预定范围内，则存在稳定的等离子体。

22. 发明授权

US08894804B2 Plasma unconfinement sensor and methods thereof 有权
标题翻译：等离子体无约束传感器及其方法
公开(公告)号：US08894804B2
公开(公告)日：2014-11-25
申请号：US12747491
申请日：2008-12-12
申请人： Jean-Paul Booth , Alexei Marakhtanov , Rajinder Dhindsa , Luc Albarede , Seyed Jafar Jafarian-Tehrani
发明人： Jean-Paul Booth , Alexei Marakhtanov , Rajinder Dhindsa , Luc Albarede , Seyed Jafar Jafarian-Tehrani
IPC分类号： C23F1/00 , H01J37/32
CPC分类号： H01J37/32935
摘要： An arrangement within a plasma reactor for detecting a plasma unconfinement event is provided. The arrangement includes a sensor, which is a capacitive-based sensor implemented within the plasma reactor. The sensor is implemented outside of a plasma confinement region and is configured to produce a transient current when the sensor is exposed to plasma associated with the plasma unconfinement event. The sensor has at least one electrically insulative layer oriented toward the plasma associated with the plasma unconfined event. The arrangement also includes a detection circuit, which is electrically connected to the sensor for converting the transient current into a transient voltage signal and for processing the transient voltage signal to ascertain whether the plasma unconfinement event exists.
摘要翻译：提供了用于检测等离子体无约束事件的等离子体反应器内的布置。该装置包括传感器，其是在等离子体反应器内实现的基于电容的传感器。传感器在等离子体限制区域外部实现，并且被配置为当传感器暴露于与等离子体无约束事件相关联的等离子体时产生瞬态电流。传感器具有至少一个朝向与等离子体无约束事件相关联的等离子体的电绝缘层。该装置还包括检测电路，其与传感器电连接，用于将瞬态电流转换成瞬态电压信号，并用于处理瞬态电压信号以确定是否存在等离子体无约束事件。

23. 发明授权

US08780522B2 Capacitively-coupled electrostatic (CCE) probe arrangement for detecting dechucking in a plasma processing chamber and methods thereof 有权
标题翻译：用于检测等离子体处理室中的脱扣的电容耦合静电（CCE）探针装置及其方法
公开(公告)号：US08780522B2
公开(公告)日：2014-07-15
申请号：US12498939
申请日：2009-07-07
申请人： Jean-Paul Booth , Douglas L. Keil
发明人： Jean-Paul Booth , Douglas L. Keil
IPC分类号： H01L21/683
CPC分类号： H01L21/6833
摘要： A method for identifying a signal perturbation characteristic of a dechucking event within a processing chamber of a plasma processing system is provided. The method includes executing a dechucking step within the processing chamber to remove a substrate from a lower electrode, wherein the dechucking step includes generating plasma capable of providing a current to neutralize an electrostatic charge on the substrate. The method also includes employing a probe head to collect a set of characteristic parameter measurements during the dechucking step. The probe head is on a surface of the processing chamber, wherein the surface is within close proximity to a substrate surface. The method further includes comparing the set of characteristic parameter measurements against a pre-defined range. If the set of characteristic parameter measurements is within the pre-defined range, the electrostatic charge is removed from the substrate and the signal perturbation characteristic of the dechucking event is detected.
摘要翻译：提供了一种用于识别等离子体处理系统的处理室内的消磁事件的信号扰动特性的方法。该方法包括执行处理室内的脱扣步骤以从下电极去除衬底，其中所述去开关步骤包括产生能够提供电流以中和衬底上的静电电荷的等离子体。该方法还包括使用探针头在脱胶步骤期间收集一组特征参数测量。探头位于处理室的表面上，其中表面在基板表面附近。该方法还包括将特征参数测量集合与预定义范围进行比较。如果特征参数测量集合在预定范围内，则从衬底去除静电电荷，并且检测到脱扣事件的信号扰动特性。

24. 发明申请

US20110128017A1 PLASMA UNCONFINEMENT SENSOR AND METHODS THEREOF 有权
标题翻译：等离子体不连续传感器及其方法
公开(公告)号：US20110128017A1
公开(公告)日：2011-06-02
申请号：US12747491
申请日：2008-12-12
申请人： Jean-Paul Booth , Alexei Marakhtanov , Rajinder Dhindsa , Luc Albarede , Seyed Jafar Jafarian-Tehrani
发明人： Jean-Paul Booth , Alexei Marakhtanov , Rajinder Dhindsa , Luc Albarede , Seyed Jafar Jafarian-Tehrani
IPC分类号： G01R27/26
CPC分类号： H01J37/32935
摘要： An arrangement within a plasma reactor for detecting a plasma unconfinement event is provided. The arrangement includes a sensor, which is a capacitive-based sensor implemented within the plasma reactor. The sensor is implemented outside of a plasma confinement region and is configured to produce a transient current when the sensor is exposed to plasma associated with the plasma unconfinement event. The sensor has at least one electrically insulative layer oriented toward the plasma associated with the plasma unconfined event. The arrangement also includes a detection circuit, which is electrically connected to the sensor for converting the transient current into a transient voltage signal and for processing the transient voltage signal to ascertain whether the plasma unconfinement event exists.
摘要翻译：提供了用于检测等离子体无约束事件的等离子体反应器内的布置。该装置包括传感器，其是在等离子体反应器内实现的基于电容的传感器。传感器在等离子体限制区域外部实现，并且被配置为当传感器暴露于与等离子体无约束事件相关联的等离子体时产生瞬态电流。传感器具有至少一个朝向与等离子体无约束事件相关联的等离子体的电绝缘层。该装置还包括检测电路，其与传感器电连接，用于将瞬态电流转换成瞬态电压信号，并用于处理瞬态电压信号以确定是否存在等离子体无约束事件。

25. 发明申请

US20100008015A1 CAPACITIVELY-COUPLED ELECTROSTATIC (CCE) PROBE ARRANGEMENT FOR DETECTING DECHUCKING IN A PLASMA PROCESSING CHAMBER AND METHODS THEREOF 有权
标题翻译：用于检测等离子体加工室中的检测的电容耦合静电（CCE）检测装置及其方法
公开(公告)号：US20100008015A1
公开(公告)日：2010-01-14
申请号：US12498939
申请日：2009-07-07
申请人： Jean-Paul Booth , Douglas L. Keil
发明人： Jean-Paul Booth , Douglas L. Keil
IPC分类号： H01L21/683
CPC分类号： H01L21/6833
摘要： A method for identifying a signal perturbation characteristic of a dechucking event within a processing chamber of a plasma processing system is provided. The method includes executing a dechucking step within the processing chamber to remove a substrate from a lower electrode, wherein the dechucking step includes generating plasma capable of providing a current to neutralize an electrostatic charge on the substrate. The method also includes employing a probe head to collect a set of characteristic parameter measurements during the dechucking step. The probe head is on a surface of the processing chamber, wherein the surface is within close proximity to a substrate surface. The method further includes comparing the set of characteristic parameter measurements against a pre-defined range. If the set of characteristic parameter measurements is within the pre-defined range, the electrostatic charge is removed from the substrate and the signal perturbation characteristic of the dechucking event is detected.
摘要翻译：提供了一种用于识别等离子体处理系统的处理室内的消磁事件的信号扰动特性的方法。该方法包括执行处理室内的脱扣步骤以从下电极去除衬底，其中所述去开关步骤包括产生能够提供电流以中和衬底上的静电电荷的等离子体。该方法还包括使用探针头在脱胶步骤期间收集一组特征参数测量。探头位于处理室的表面上，其中表面在基板表面附近。该方法还包括将特征参数测量集合与预定义范围进行比较。如果特征参数测量集合在预定范围内，则从衬底去除静电电荷，并且检测到脱扣事件的信号扰动特性。

26. 发明申请

US20130136872A1 PLASMA PROCESSING IN A CAPACITIVELY-COUPLED REACTOR WITH TRAPEZOIDAL-WAVEFORM EXCITATION 有权
标题翻译：电容耦合反应器中等离子体处理与TRAPEZOIDAL-WAVEFORM激发的等离子体处理
公开(公告)号：US20130136872A1
公开(公告)日：2013-05-30
申请号：US13809784
申请日：2011-07-12
申请人： Jean-Paul Booth , Erik Johnson
发明人： Jean-Paul Booth , Erik Johnson
IPC分类号： C23C16/509
CPC分类号： C23C16/509 , H01J37/32091 , H01J2237/3348
摘要： A method is provided for exciting at least one electrode of a capacitively coupled reactive plasma reactor containing a substrate. The electrode is excited by applying a RF voltage with a trapezoidal waveform comprising a ramp-up, a high plateau, a ramp-down and a low plateau. The plasma density can be controlled by adjusting the duration of the ramp-up, the duration of the ramp-down, the amplitude and the repetition rate of the trapezoidal waveform. The ion energy distribution function at the substrate can be controlled by adjusting the amplitude and the relative duration between the high plateau and the low plateau of the trapezoidal waveform.
摘要翻译：提供一种用于激发包含衬底的电容耦合反应性等离子体反应器的至少一个电极的方法。通过施加具有包括斜坡上升，高平台，斜坡下降和低平台的梯形波形的RF电压来激发电极。可以通过调整斜坡的持续时间，斜坡下降的持续时间，梯形波形的振幅和重复率来控制等离子体密度。可以通过调整梯形波形的高平台和低平台之间的幅度和相对持续时间来控制衬底上的离子能量分布函数。

27. 发明授权

US08358416B2 Methods and apparatus for normalizing optical emission spectra 有权
标题翻译：用于归一化光发射光谱的方法和装置
公开(公告)号：US08358416B2
公开(公告)日：2013-01-22
申请号：US13415763
申请日：2012-03-08
申请人： Vijayakumar C. Venugopal , Eric Pape , Jean-Paul Booth
发明人： Vijayakumar C. Venugopal , Eric Pape , Jean-Paul Booth
IPC分类号： G01N21/00
CPC分类号： G01N21/274 , G01J3/02 , G01J3/0205 , G01J3/0218 , G01J3/0294 , G01J3/443 , G01N21/68
摘要： A processing system having a chamber for in-situ optical interrogation of plasma emission to quantitatively measure normalized optical emission spectra is provided. The processing chamber includes a confinement ring assembly, a flash lamp, and a set of quartz windows. The processing chamber also includes a plurality of collimated optical assemblies, the plurality of collimated optical assemblies are optically coupled to the set of quartz windows. The processing chamber also includes a plurality of fiber optic bundles. The processing chamber also includes a multi-channel spectrometer, the multi-channel spectrometer is configured with at least a signal channel and a reference channel, the signal channel is optically coupled to at least the flash lamp, the set of quartz windows, the set of collimated optical assemblies, the illuminated fiber optic bundle, and the collection fiber optic bundle to measure a first signal.
摘要翻译：提供一种具有用于等离子体发射的原位光询问室以定量测量归一化光发射光谱的处理系统。处理室包括限制环组件，闪光灯和一组石英窗。处理室还包括多个准直光学组件，多个准直光学组件光学耦合到该组石英窗口。处理室还包括多个光纤束。处理室还包括多通道光谱仪，多通道光谱仪配置有至少一个信号通道和一个参考通道，信号通道光学耦合到至少闪光灯，该组石英窗，该组准直光学组件，照明光纤束和收集光纤束以测量第一信号。

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