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21. 发明授权

US07404866B2 Sliding member and method for manufacture thereof 失效
标题翻译：滑动构件及其制造方法
公开(公告)号：US07404866B2
公开(公告)日：2008-07-29
申请号：US10480653
申请日：2002-06-26
申请人： Kazuyuki Nakanishi , Hideo Tachikawa , Hiroyuki Mori , Tadashi Oshima
发明人： Kazuyuki Nakanishi , Hideo Tachikawa , Hiroyuki Mori , Tadashi Oshima
IPC分类号： C22C38/12 , C22C9/00 , C22C21/00 , C22C47/16
CPC分类号： F16H57/041 , B22F7/08 , B22F2999/00 , C23C4/04 , C23C4/06 , C23C4/08 , C23C4/12 , C23C8/02 , C23C24/08 , F16C33/06 , F16C33/12 , F16C2204/20 , F16C2204/60 , B22F3/115
摘要： A sliding member includes a superficial portion forming a sliding surface. The superficial portion includes an oxygen-containing alloy containing at least one metallic element selected from the group consisting of molybdenum and tungsten in an amount of from 2 to 80% by weight; and oxygen in an amount of from 0.5 to 15% by weight. The sliding member sustains lubricating characteristics given to the sliding surface over a long period of time to maintain a low friction coefficient and durability.
摘要翻译：滑动构件包括形成滑动表面的表面部分。表面部分包括含有至少一种金属元素的含氧合金，其含量为2-80重量％的钼和钨组成的组; 和氧浓度为0.5〜15重量％。滑动构件在长时间内保持给予滑动面的润滑特性，以保持低摩擦系数和耐久性。

22. 发明申请

US20050142361A1 Amorphous carbon, amorphous-carbon coated member, and process for forming amorphous carbon film 有权
标题翻译：无定形碳，无定形碳涂层构件和形成无定形碳膜的方法
公开(公告)号：US20050142361A1
公开(公告)日：2005-06-30
申请号：US11002125
申请日：2004-12-03
申请人： Kazuyuki Nakanishi , Tadashi Oshima , Hideo Hasegawa , Hiroyuki Mori , Takashi Iseki , Hideo Tachikawa , Munehisa Matsui
发明人： Kazuyuki Nakanishi , Tadashi Oshima , Hideo Hasegawa , Hiroyuki Mori , Takashi Iseki , Hideo Tachikawa , Munehisa Matsui
IPC分类号： C01B31/02 , B32B9/00 , C23C16/26 , H01L21/205 , H05H1/24
CPC分类号： C23C16/26 , Y10T428/30
摘要： To provide a soft amorphous carbon exhibiting a low elastic modulus, an amorphous-carbon coated member provided with a coated film comprising the amorphous carbon, and a process for forming an amorphous carbon film. The amorphous carbon comprises carbon as a major component and hydrogen in an amount of from more than 30 atomic % to 60 atomic % or less, and exhibits an elastic modulus of from 40 or more to 150 GPa or less. Moreover, the amorphous-carbon coated member comprises a conductive substrate, and a coated film fixed on at least a part of a surface of the substrate and composed of the amorphous carbon. In addition, in a process for forming the amorphous-carbon coated film, an amorphous carbon film is formed on a surface of conductive substrates by a plasma CVD method. Not only a plurality of the substrates are disposed on a substrate holder, which is disposed in a film-forming furnace and is connected with a negative electrode, in such a state that they face to each other, but also a processing gas pressure and a plasma power source are operated so as to overlap negative glows of the neighboring two substrates.
摘要翻译：为了提供具有低弹性模量的软无定形碳，设置有包含无定形碳的涂膜的非晶碳涂覆部件以及形成非晶碳膜的方法。无定形碳包含碳为主要成分，氢为超过30原子％至60原子％以下的量，弹性模量为40以上且150GPa以下。此外，无定形碳涂覆部件包括导电基板和固定在基板表面的至少一部分上并由非晶碳构成的涂膜。另外，在形成非晶碳涂膜的方法中，通过等离子体CVD法在导电性基板的表面上形成无定形碳膜。不仅多个基板被设置在基板保持器上，所述基板保持器设置在成膜炉中并且与负极连接，并且彼此相对的状态，而且处理气体压力和等离子体动力源被操作成与相邻两个基板的负发光重叠。

23. 发明申请

US20090114353A1 Method of Papermaking 审中-公开
标题翻译：造纸方法
公开(公告)号：US20090114353A1
公开(公告)日：2009-05-07
申请号：US11922880
申请日：2005-12-14
申请人： Tsugio Tachikawa , Hiroshi Tachikawa , Hideo Tachikawa
发明人： Tsugio Tachikawa , Hiroshi Tachikawa , Hideo Tachikawa
IPC分类号： D21C11/00
CPC分类号： D21F1/66 , C02F1/66 , C02F1/76 , C02F2103/28 , C02F2209/29 , C02F2303/04 , D21C5/02 , D21C9/12 , D21C9/14 , D21H17/11 , Y02W30/648
摘要： An inventive method of papermaking can be provided for creating an optimum wet end environment. In a preferred method, an aqueous solution of sodium hypochlorite acidified by hydrochloric acid to have a pH of greater than or equal to 4 and less than 7 and adjusted to have an effective chlorine concentration of 1,000 to 10,000 ppm, preferably 3,000 to 8,000 ppm is prepared and charged to a white water pit in a manner to be effective chlorine concentration therein to greater than or equal to 0.5 ppm. Before a step of papermaking, it is preferred that aqueous solution sodium hypochlorite having pH of greater than or equal to 4 and less than 7 is added continuously or intermittently to a raw material water with the expectation that at breaching a residual chlorine concentration becomes greater than or equal to 500 ppm.
摘要翻译：可以提供创造造纸最佳湿端环境的创造性的造纸方法。在优选的方法中，通过盐酸酸化以具有大于或等于4且小于7的pH调节至具有1,000至10,000ppm，优选3,000至8,000ppm的有效氯浓度的次氯酸钠水溶液是制备并以其中有效氯浓度的方式将其装入白水坑中至大于或等于0.5ppm。在造纸步骤之前，优选将pH大于或等于4且小于7的水溶液次氯酸钠连续或间歇地添加到原料水中，期望在破坏残留氯浓度时大于或等于500ppm。

24. 发明申请

US20050257684A1 Sliding film, sliding member, composition for sliding film, sliding device, swash-plate type compressor, process for forming sliding film, and process for producing sliding member 失效
标题翻译：滑动膜，滑动构件，滑动膜用组合物，滑动装置，斜盘式压缩机，滑动膜形成工序，滑动构件的制造工序
公开(公告)号：US20050257684A1
公开(公告)日：2005-11-24
申请号：US11133848
申请日：2005-05-20
申请人： Manabu Sugiura , Takahiro Sugioka , Hiroyuki Kawaura , Takao Kobayashi , Goro Watanabe , Kenichi Suzuki , Hideo Tachikawa , Hideo Hasegawa
发明人： Manabu Sugiura , Takahiro Sugioka , Hiroyuki Kawaura , Takao Kobayashi , Goro Watanabe , Kenichi Suzuki , Hideo Tachikawa , Hideo Hasegawa
IPC分类号： C08J5/16 , C08J5/18 , C09D5/00 , C10M125/02 , C10M125/22 , C10M147/00 , F01B3/00 , F04B27/10
CPC分类号： C10M103/00 , C10M105/50 , C10M131/00 , C10M2201/003 , C10M2201/041 , C10M2201/0413 , C10M2201/061 , C10M2201/0613 , C10M2201/065 , C10M2201/0653 , C10M2201/066 , C10M2201/0663 , C10M2201/081 , C10M2213/02 , C10M2213/023 , C10M2213/062 , C10M2213/0623 , C10N2240/30 , C10N2250/18 , F04B27/1054 , F05C2201/049 , F05C2201/0493 , F05C2251/14 , F05C2253/12 , F05C2253/20
摘要： A sliding film includes a solid lubricant, a binder resin, and a low-melting-point material. The binder resin is for holding the solid lubricant on a surface of a substrate, and exhibits a glass transition temperature. The low-melting-point material exhibits a melting point lower than the glass transition temperature of the binder resin. The low-melting-point material demonstrates a latent heat which can absorb frictional heat generated between sliding members, and accordingly retards the degradation of the binder resin. As a result, the sliding film produces high seizure resistance.
摘要翻译：滑动膜包括固体润滑剂，粘合剂树脂和低熔点材料。粘合剂树脂用于将固体润滑剂保持在基材的表面上，并显示玻璃化转变温度。低熔点材料的熔点低于粘合剂树脂的玻璃化转变温度。低熔点材料表现出潜热，其可以吸收滑动构件之间产生的摩擦热，并因此延缓粘合剂树脂的降解。结果，滑膜产生高的耐咬住性。

25. 发明申请

US20090173696A1 METHOD AND SYSTEM OF DIGESTING EXCESS SLUDGE 审中-公开
标题翻译：消除污染物的方法和系统
公开(公告)号：US20090173696A1
公开(公告)日：2009-07-09
申请号：US12294312
申请日：2007-03-26
申请人： Tugio Tachikawa , Hiroshi Tachikawa , Hideo Tachikawa
发明人： Tugio Tachikawa , Hiroshi Tachikawa , Hideo Tachikawa
IPC分类号： C02F11/14 , C02F1/76 , B01D21/02 , B01D21/34 , C02F103/00
CPC分类号： C02F1/76 , C02F3/1231 , C02F11/004 , C02F11/06 , Y02W10/15
摘要： In an activated sludge treatment of organic waste water, excess sludge from the activated sludge aeration vessel is processed with hypochlorous acid in place of ozone without set up of aeration vessels and blowers to improve volume reduction cost of sludge without deterioration of water quality. The hypochlorous acid process is carried out by using an acidulous sodium hypochlorite aqueous solution which is prepared by mixing sodium hypochlorite aqueous solution with a dilute hydrochloric acid and diluting the resulting mixture with water within 1,000 ppm to 50,000 ppm of available chlorine concentration at a pH zone of more than 4 to less than 7.
摘要翻译：在有机废水的活性污泥处理中，活性污泥曝气容器的过剩污泥用次氯酸代替臭氧处理，不设置曝气容器和鼓风机，以提高污泥的体积减少成本，而不会降低水质。次氯酸过程是通过使用将次氯酸钠水溶液与稀盐酸混合并将水混合物在pH范围内的有效氯浓度在1,000ppm至50,000ppm内稀释而制备的酸性次氯酸钠水溶液进行的超过4到小于7。

26. 发明授权

US06214479B1 Covered member and method of producing the same 失效
标题翻译：覆盖构件及其制造方法
公开(公告)号：US06214479B1
公开(公告)日：2001-04-10
申请号：US09091414
申请日：1998-06-23
申请人： Hiroyuki Mori , Hideo Tachikawa
发明人： Hiroyuki Mori , Hideo Tachikawa
IPC分类号： B32B900
CPC分类号： C23C16/0263 , C23C4/02 , C23C14/022 , C23C30/00 , Y10T428/12472 , Y10T428/12743 , Y10T428/1275 , Y10T428/1284 , Y10T428/12847 , Y10T428/24355 , Y10T428/24364
摘要： This invention provides a covered member which possesses a high bond strength of a base material and a covering film, and has a smooth surface. The covered member comprises a base material and a covering film and the surface of the base material to be covered with the covering film is characterized by an uneven surface having projections with an average height in the range from 10 to 100 nm and an average width of not more than 300 nm. The uneven surface can be formed by ion impacting. A surface of a covering film formed on that is smooth since the unevenness of the surface is extremely fine.
摘要翻译：本发明提供一种具有基材和覆膜的高粘合强度并且具有光滑表面的被覆盖构件。被覆盖构件包括基材和覆盖膜，被覆盖膜覆盖的基材的表面的特征在于具有平均高度在10至100nm范围内的突起的不平坦表面，平均宽度不超过300nm。不均匀的表面可以通过离子冲击形成。形成在其上的覆盖膜的表面是光滑的，因为表面的不平坦度非常好。

27. 发明授权

US4909862A Process for ion nitriding aluminum material 失效
标题翻译：离子氮化铝材料的工艺
公开(公告)号：US4909862A
公开(公告)日：1990-03-20
申请号：US365856
申请日：1989-06-13
申请人： Hideo Tachikawa , Tohru Arai , Hironori Fujita , Kazuyuki Oguri
发明人： Hideo Tachikawa , Tohru Arai , Hironori Fujita , Kazuyuki Oguri
IPC分类号： C23C8/36 , C23F4/00
CPC分类号： C23C8/36
摘要： A process for ion nitriding aluminum material which comprises the steps of placing an object of aluminum or aluminum alloy for treatment in a closed vessel; evacuating residual oxygen gas from said closed vessel; charging said closed vessel with a heating gas and inducing discharges in said closed vessel, thereby heating the surface of the object for treatment to a prescribed nitriding temperature; charging said closed vessel with a surface-roughening gas composed of a rare gas and 5-2000 ppm of a gas containing at least one element of oxygen, nitrogen, and carbon, and roughening the surface of the object for treatment by means of glow discharges or ion beams in the atmosphere of said surface roughening gas; and charging said closed vessel with a nitriding gas and simultaneously inducing glow discharges in said closed vessel, thereby forming a nitride layer on the surface of the object for treatment.

28. 发明授权

US4522660A Process for ion nitriding of aluminum or an aluminum alloy and apparatus therefor 失效
标题翻译：铝或铝合金的离子渗氮方法及其设备
公开(公告)号：US4522660A
公开(公告)日：1985-06-11
申请号：US501001
申请日：1983-06-03
申请人： Takatoshi Suzuki , Hideo Tachikawa , Shigeo Moriyama
发明人： Takatoshi Suzuki , Hideo Tachikawa , Shigeo Moriyama
IPC分类号： C01B21/072 , C23C8/36 , C23C14/58 , C23C26/00 , C21D1/48
CPC分类号： C23C14/5826 , C23C14/58 , C23C14/586 , C23C26/00 , C23C8/36
摘要： A process for ion nitriding of aluminum or an aluminum alloy and an apparatus therefor, wherein aluminum or an aluminum alloy as an article to be treated is disposed on a substrate holder provided in a sealed container. A predetermined metal having an intensive affinity for oxygen is also disposed in the vicinity of the article to be treated, and a glow discharge is operated between an electrode provided in the sealed container as an anode and the substrate holder as a cathode. The electrode may be directly provided at the sealed container itself or it may be independently provided therein. According to the process and apparatus of the present invention, it is possible to form on the surface of aluminum or an aluminum alloy an aluminum nitride layer having an intensive adhesion to a substrate thereof, high hardness and excellent wear resistance.
摘要翻译：铝或铝合金的离子渗氮方法及其设备，其中将铝或铝合金作为待处理物品设置在设置在密封容器中的基板保持器上。对待处理物品附近也设置有对氧气具有强烈亲合力的预定金属，并且在设置在作为阳极的密封容器中的电极和作为阴极的基板保持器之间进行辉光放电。电极可以直接设置在密封容器本身处，或者可以独立地设置在其中。根据本发明的方法和装置，可以在铝或铝合金的表面上形成对其基材具有强烈粘附性的氮化铝层，高硬度和优异的耐磨性。

29. 发明授权

US07368168B2 Low-friction sliding member 有权
标题翻译：低摩擦滑动构件
公开(公告)号：US07368168B2
公开(公告)日：2008-05-06
申请号：US11115192
申请日：2005-04-27
申请人： Hiroyuki Mori , Fumio Shimizu , Hideo Tachikawa , Toshihide Ohmori , Hiroshi Moritani , Mamoru Tohyama , Yoshio Shimura , Shigeru Hotta , Takashi Iseki
发明人： Hiroyuki Mori , Fumio Shimizu , Hideo Tachikawa , Toshihide Ohmori , Hiroshi Moritani , Mamoru Tohyama , Yoshio Shimura , Shigeru Hotta , Takashi Iseki
IPC分类号： C23C16/26
CPC分类号： B32B9/00 , Y10T428/24479 , Y10T428/24628 , Y10T428/30
摘要： A low-friction sliding member is used under a wet condition employing a lubricant, and includes a substrate having a surface, and an amorphous hard carbon film formed on the surface of the substrate for contacting slidably with a mating member. The amorphous hard carbon film includes silicon in an amount of from 1 atomic % or more to 20 atomic % or less, hydrogen in an amount of from 20 atomic % or more to 50 atomic % or less, and the balance of carbon and inevitable impurities, when the entirety is taken as 100 atomic %, and exhibits a surface roughness Rzjis of 0.8 μm or less. The low-friction sliding member exhibits reduced friction coefficients between itself and mating members, without relying on the adsorption and reaction of additives, included in lubricants, to the amorphous hard carbon films.
摘要翻译：在使用润滑剂的湿润条件下使用低摩擦滑动构件，并且包括具有表面的基板和形成在基板的表面上的非结晶硬碳膜，用于与配合构件可滑动地接触。无定形硬碳膜包括含量为1原子％以上且20原子％以下的硅，20原子％以上至50原子％以下的氢，其余为碳和不可避免的杂质，当整体取为100原子％，表面粗糙度为0.8μm或更小时。低摩擦滑动构件在其与配合构件之间表现出降低的摩擦系数，而不依赖于包含在润滑剂中的添加剂对无定形硬碳膜的吸附和反应。

30. 发明授权

US4597808A Process for ion nitriding aluminum or aluminum alloys 失效
标题翻译：离子氮化铝或铝合金的工艺
公开(公告)号：US4597808A
公开(公告)日：1986-07-01
申请号：US718788
申请日：1985-03-29
申请人： Hideo Tachikawa , Takatoshi Suzuki , Hironori Fujita , Tohru Arai
发明人： Hideo Tachikawa , Takatoshi Suzuki , Hironori Fujita , Tohru Arai
IPC分类号： C23C8/36 , C21D1/48
CPC分类号： C23C8/36
摘要： A process for ion nitriding aluminum or an aluminum alloy as an article to be treated, in which: the article is disposed in a sealed vessel; the oxygen gas in the vessel is removed; the surface of the article is heated to a prescribed nitriding temperature; the surface of the article is activated to facilitate the formation of an aluminum nitride layer by the subsequent nitriding treatment; and thereafter the article is subjected to ion nitriding, thereby forming an aluminum nitride layer having excellent wear resistance and high hardness. This ion nitriding treatment for aluminum material can be carried out even at temperatures lower than a solution treatment temperature of aluminum material.
摘要翻译：一种用于将铝或铝合金作为待处理物品的离子氮化方法，其中：将物品置于密封容器中; 去除容器中的氧气; 将制品的表面加热到规定的氮化温度; 活性物质的表面通过随后的氮化处理促进形成氮化铝层; 然后将制品进行离子氮化，从而形成具有优异的耐磨性和高硬度的氮化铝层。即使在低于铝材的固溶处理温度的温度下也可以进行铝材的离子渗氮处理。

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