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    • 21. 发明授权
    • Method and apparatus for deciding cause of abnormality in plasma processing apparatus
    • 用于确定等离子体处理装置中的异常原因的方法和装置
    • US07389203B2
    • 2008-06-17
    • US10849307
    • 2004-05-20
    • Hideki Tanaka
    • Hideki Tanaka
    • G06F15/00G06F11/30
    • H01L21/67253H01J37/32935
    • Analysis data constituted by a plurality of parameters is acquired on the basis of detection values obtained in processes for an object to be processed from a detector arranged in a plasma processing apparatus. With respect to parameters of analysis data decided as abnormal data, as a degree of influence on abnormality, a contribution to, e.g., a residual score is calculated (degree-of-influence calculating step). Contributions of the parameters are set at 0 or a value close to 0 in a descending order of contribution of the parameters to sequentially calculate residual scores, and, when the residual scores are not more than a predetermined value, the parameters having the contributions which are set at 0 or a value close to 0 until now as parameters which cause abnormality (cause-of-abnormality deciding step).
    • 基于由布置在等离子体处理装置中的检测器的待处理对象的处理中获得的检测值,获取由多个参数构成的分析数据。 关于被判定为异常数据的分析数据的参数,作为对异常的影响程度,计算对例如残差的贡献(影响度计算步骤)。 参数的贡献以参数的贡献的降序设置为0或接近0的值,以顺序地计算残差,并且当剩余分数不大于预定值时,具有贡献的参数 设定为0或接近0的值,直到现在为引起异常的参数(异常判定步骤)。
    • 27. 发明授权
    • Plasma leak monitoring method, plasma processing apparatus and plasma processing method
    • 等离子体泄漏监测方法,等离子体处理装置和等离子体处理方法
    • US07217942B2
    • 2007-05-15
    • US10644745
    • 2003-08-21
    • Hideki Tanaka
    • Hideki Tanaka
    • H01L21/00
    • H01J37/32935G01N21/68G01N2201/0227G01N2201/023
    • In a plasma processing apparatus that forms plasma from a process gas by supplying the process gas into a processing container and applying high-frequency power to an electrode provided inside the processing container on which a workpiece is placed and executes specific plasma processing on the processing surface of the workpiece, apparatus state parameter data indicating a state of the plasma processing apparatus are obtained through measurement executed by a parameter measuring instrument, optical data are obtained through measurement executed by an optical measuring instrument and electrical data are obtained through measurement executed by an electrical measuring instrument. A means for plasma leak judgment judges that a plasma leak has occurred if there is a fluctuation in the data.
    • 在等离子体处理装置中,通过将处理气体供给到处理容器中并将高频电力施加在设置有工件的处理容器内部的电极上,从而从处理气体形成等离子体,并对处理面进行特定的等离子体处理 通过由参数测量仪器执行的测量获得指示等离子体处理装置的状态的装置状态参数数据,通过光学测量仪器执行的测量获得光学数据,并且通过由电气执行的测量获得电气数据 测量仪器。 用于等离子体泄漏判定的装置判断如果数据有波动,则发生等离子体泄漏。
    • 28. 发明授权
    • Test system for mobile communication terminal in which state of progress of connection-transition test can be visually recognized
    • 移动通信终端的测试系统,可以在视觉上识别连接转换测试的进展状态
    • US07215951B2
    • 2007-05-08
    • US10802680
    • 2004-03-16
    • Hideki TanakaRyu MoritaToshio Inui
    • Hideki TanakaRyu MoritaToshio Inui
    • H04Q7/20H04B17/00H04M1/24
    • H04W24/00
    • A test procedure control unit outputs control information including time setting information along a procedure for carrying out a transition test of a connection state of a mobile communication terminal (UE) of a cellular system. A transmitting/receiving unit transmits test signals corresponding to cells toward the UE in accordance with the control information, and receives a response signal from the UE. A reception measurement unit measures a transition time of the connection state among the cells of the UE, in accordance with the response signal. A deciding unit receives a measured result of the transition time, and decides whether or not the connection state of the UE is transiting in accordance with the scheduled time-passage. The indicating unit causes the display unit to indicate, the decided result transition among the cells in accordance with the time-passage, so as to be visually recognizable on a single coordinate.
    • 测试过程控制单元沿着用于执行蜂窝系统的移动通信终端(UE)的连接状态的转换测试的过程,输出包括时间设置信息的控制信息。 发送/接收单元根据控制信息向UE发送对应于小区的测试信号,并从UE接收响应信号。 接收测量单元根据响应信号测量UE的小区之间的连接状态的转换时间。 决定单元接收转移时间的测量结果,并且根据预定时间段来判定UE的连接状态是否正在进行。 指示单元使得显示单元根据时间通道指示确定的单元之间的结果转换,以便在单个坐标上可视地识别。
    • 29. 发明申请
    • Method and apparatus for determining an operation status of a plasma processing apparatus, program and storage medium storing same
    • 用于确定等离子体处理装置的操作状态的方法和装置,存储它的程序和存储介质
    • US20070050076A1
    • 2007-03-01
    • US11476104
    • 2006-06-28
    • Yoshihiro YamazakiHideki Tanaka
    • Yoshihiro YamazakiHideki Tanaka
    • G06F19/00H01L21/306C23F1/00
    • G05B23/024H01J37/32935
    • In an operation status determination method for a plasma processing apparatus, a principal component analysis is carried out by using operation status data groups. Processing parameter values in the respective operation status data groups are converted into principal component scores which are plotted in a two-dimensional coordinate system with axes of the selected principal components. A movement vector P from a first recipe operation status data group for reference apparatus to a first recipe operation status data group for target apparatus is calculated. An actually measured normal area A2 is set, and a predicted normal area B2 is set by moving the area A2 along the movement vector P. Then, it is determined whether or not the principal component scores corresponding to the respective processing parameter values when the second recipe is applied to the target apparatus are included in the predicted normal area B2.
    • 在等离子体处理装置的操作状态判定方法中,通过使用操作状态数据组来进行主成分分析。 将各个操作状态数据组中的处理参数值转换成主分量分数,其被绘制在具有所选主要分量的轴的二维坐标系中。 计算从参考装置的第一配方操作状态数据组到目标装置的第一配方操作状态数据组的运动矢量P. 设置实际测量的正常区域A 2,并且通过沿着移动向量P移动区域A 2来设置预测的正常区域B 2。然后,确定与各个处理参数值对应的主成分分数 当将第二配方应用于目标装置时,包括在预测的正常区域B 2中。
    • 30. 发明授权
    • Common mode noise filter
    • 共模噪声滤波器
    • US07119649B2
    • 2006-10-10
    • US10562557
    • 2005-05-24
    • Atsushi ShinkaiHironobu ChibaShogo NakayamaHideki Tanaka
    • Atsushi ShinkaiHironobu ChibaShogo NakayamaHideki Tanaka
    • H01F5/00
    • H01F17/0013H01F2017/0026H01F2017/0093H03H2001/0085H03H2001/0092
    • A common mode noise filter includes a first insulating layer made of magnetic material, a first conductor on the first insulating layer, a second insulating layer located on the first conductor and made of nonmagnetic material, a second conductor having a spiral shape on the second insulating layer and connected with the first conductor, a third insulating layer located on the second conductor and made of nonmagnetic material, a third conductor having a spiral shape provided on the third insulating layer, a fourth insulating layer located on the third conductor and made of nonmagnetic material, a fourth conductor connected with the third conductor, a fifth insulating layer provided on the fourth conductor and made of magnetic material. The first conductor and the second conductor provide a first coil. The third conductor and the fourth conductor provide a second coil. The third insulating layer is thicker than the second insulating layer and the fourth insulating layer. This filter can increase impedance of the first and second coils against common mode components.
    • 共模噪声滤波器包括由磁性材料制成的第一绝缘层,第一绝缘层上的第一导体,位于第一导体上的由非磁性材料制成的第二绝缘层,在第二绝缘层上具有螺旋形状的第二导体 层并与第一导体连接,位于第二导体上并由非磁性材料制成的第三绝缘层,设置在第三绝缘层上的具有螺旋形状的第三导体,位于第三导体上并由非磁性构成的第四绝缘层 材料,与第三导体连接的第四导体,设置在第四导体上并由磁性材料制成的第五绝缘层。 第一导体和第二导体提供第一线圈。 第三导体和第四导体提供第二线圈。 第三绝缘层比第二绝缘层和第四绝缘层厚。 该滤波器可以增加第一和第二线圈对共模分量的阻抗。