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21. 发明申请

US20060131710A1 Advanced cavity structure for wafer level chip scale package 审中-公开
标题翻译：先进的腔体结构，用于晶圆级芯片级封装
公开(公告)号：US20060131710A1
公开(公告)日：2006-06-22
申请号：US11020041
申请日：2004-12-21
申请人： Chin Kuo , Jack Deng , Fu-Tien Weng , Chih-Kung Chang , Bii-Jung Chang
发明人： Chin Kuo , Jack Deng , Fu-Tien Weng , Chih-Kung Chang , Bii-Jung Chang
IPC分类号： H01L21/00 , H01L23/02
CPC分类号： H01L27/14685 , H01L27/14618 , H01L27/14621 , H01L2924/0002 , H01L2924/00
摘要： The present invention provides an advanced cavity structure for optically sensitive devices in wafer level chip scale package and methods of manufacturing thereof. Image sensor or light detection integrated circuits are formed on substrate. Substantially absorptive bleached cavity walls are formed about the image sensor or light detection integrated circuits. Upon attaching a transparent layer to the bleached cavity walls and above the image sensor or light detection integrated circuits, open chambers are formed thereby permitting the image sensor or light detection integrated circuits to receive and manipulate signals without decreasing or decaying the optical sensitivity of the incident light. Furthermore, individual image sensor or light detection integrated circuits may be separated from each other to comprise wafer level chip scale packages of at least one image sensor or light detection integrated circuits, at least one transparent layer, and at least one open chamber.
摘要翻译：本发明提供了一种用于晶片级芯片级封装中的光敏器件的高级腔结构及其制造方法。图像传感器或光检测集成电路形成在基板上。围绕图像传感器或光检测集成电路形成基本吸收漂白的空腔壁。当将透明层附着到漂白的空腔壁和图像传感器或光检测集成电路上方时，形成开放室，从而允许图像传感器或光检测集成电路接收和操纵信号而不会降低或衰减事件的光学灵敏度光。此外，各个图像传感器或光检测集成电路可以彼此分离，以包括至少一个图像传感器或光检测集成电路，至少一个透明层和至少一个开放室的晶片级芯片级封装。

22. 发明申请

US20070018073A1 CMOS image sensor device with beehive pattern color sensor cell array 审中-公开
标题翻译：具有蜂窝图案彩色传感器单元阵列的CMOS图像传感器装置
公开(公告)号：US20070018073A1
公开(公告)日：2007-01-25
申请号：US11213186
申请日：2005-08-25
申请人： Tzu-Hsuan Hsu , Dun-Nian Yaung , Chih-Kung Chang
发明人： Tzu-Hsuan Hsu , Dun-Nian Yaung , Chih-Kung Chang
IPC分类号： H01L27/00
CPC分类号： H01L27/14645 , H01L27/14641 , H04N5/37457 , H04N9/045
摘要： A CMOS image sensor cell includes a first pixel area in which at least one first photodiode is disposed for generating a first sense signal in response to a photo-signal of a first color; a second pixel area neighboring the first pixel area, in which at least one second photodiode is disposed for generating a second sense signal in response to a photo-signal of a second color; and a third pixel area neighboring the first and second pixel areas, in which at least one third photodiode is disposed for generating a third sense signal in response to a photo-signal of a third color. A sense amplifier is disposed substantially within the first, second and third pixel areas for amplifying the first, second and third sense signals. The first, second and third pixel areas that substantially occupy an entire area of the image sensor cell are substantially equal in size.
摘要翻译： CMOS图像传感器单元包括第一像素区域，其中至少一个第一光电二极管被设置用于响应于第一颜色的光信号产生第一感测信号; 与第一像素区域相邻的第二像素区域，其中设置至少一个第二光电二极管以响应于第二颜色的光信号产生第二感测信号; 以及与所述第一和第二像素区域相邻的第三像素区域，其中设置至少一个第三光电二极管以响应于第三颜色的光信号产生第三感测信号。读出放大器基本上设置在第一，第二和第三像素区域内，用于放大第一，第二和第三感测信号。基本上占据图像传感器单元的整个区域的第一，第二和第三像素区域的尺寸基本相等。

23. 发明授权

US06671396B1 Method to monitor stepper lens quality in color filter process 有权
标题翻译：监控滤色镜过程中步进镜头质量的方法
公开(公告)号：US06671396B1
公开(公告)日：2003-12-30
申请号：US09664421
申请日：2000-09-18
申请人： Chih-Kung Chang , Bii-Jung Chang , Sheng-Liang Pang , Kuo-Liang Lu
发明人： Chih-Kung Chang , Bii-Jung Chang , Sheng-Liang Pang , Kuo-Liang Lu
IPC分类号： G06K900
CPC分类号： G03F7/70591 , G03F1/44 , G03F7/70916
摘要： Pigment-based resists tend to give off a certain amount of organic vapor during exposure. This brings about contamination of the projection lens surface as well as other parts of the system. A method to monitor this accumulation of solvent vapor on the lens surface is disclosed, based on a test matrix (in which exposure time and focal distance are systematically varied) through which a series of images are formed in the resist and then evaluated for quality. A key feature is the test patterns that are used for forming the images. Said patterns are designed so as to maximize the total amount of diffraction that occurs during image formation, thereby maximizing sensitivity to changes in lens quality. Several examples of the test patterns are provided.
摘要翻译：颜料基抗蚀剂倾向于在曝光期间发出一定量的有机蒸气。这导致投影透镜表面以及系统的其它部分的污染。基于通过其在抗蚀剂中形成一系列图像然后对质量进行评估的测试矩阵（其中曝光时间和焦距被系统地改变）来监测溶剂蒸汽在透镜表面上的累积的方法。关键特征是用于形成图像的测试图案。所述图案被设计成使得在图像形成期间发生的总的衍射量最大化，从而使对透镜质量变化的灵敏度最大化。提供了几个测试模式的例子。

24. 发明申请

US20060183027A1 Novel method to form a microlens 审中-公开
标题翻译：形成微透镜的新方法
公开(公告)号：US20060183027A1
公开(公告)日：2006-08-17
申请号：US11060197
申请日：2005-02-17
申请人： Hua-Tai Lin , J. Chen , Chih-Kung Chang
发明人： Hua-Tai Lin , J. Chen , Chih-Kung Chang
IPC分类号： H01L31/0232
CPC分类号： H01L27/14685 , H01L27/14627
摘要： A method of manufacturing a microlens includes forming a photoresist layer over a substrate having a photo sensor located therein and exposing the photoresist layer in an exposure system having a lower resolution. The exposure uses a photomask having a microlens pattern comprising a plurality of dark regions and clear regions alternately disposed. The photoresist is developed to from the microlens having a curved shape.
摘要翻译：制造微透镜的方法包括在具有位于其中的光电传感器的衬底上形成光致抗蚀剂层，并且在具有较低分辨率的曝光系统中曝光光致抗蚀剂层。曝光使用具有交替布置的包括多个暗区域和透明区域的微透镜图案的光掩模。光致抗蚀剂从具有弯曲形状的微透镜显影。

25. 发明授权

US09559137B2 Color filter of illumination image sensor and method for fabricating the same 有权
标题翻译：照明图像传感器的滤色器及其制造方法
公开(公告)号：US09559137B2
公开(公告)日：2017-01-31
申请号：US12940756
申请日：2010-11-05
申请人： Hao-Min Chen , Chen-Wei Lu , Chih-Kung Chang
发明人： Hao-Min Chen , Chen-Wei Lu , Chih-Kung Chang
IPC分类号： H01L27/146
CPC分类号： H01L27/1464 , H01L27/14621 , H01L27/14623
摘要： The invention provides a color filter of an illumination image sensor and a method for fabricating the same. A color filter of an illumination image sensor includes a light shield portion constructed by a plurality of grid photoresist patterns, wherein the light shield portion covers a back side surface of the silicon wafer in a periphery region of an illumination image sensor chip.
摘要翻译：本发明提供一种照明图像传感器的滤色器及其制造方法。照明图像传感器的滤色器包括由多个栅格光致抗蚀剂图案构成的遮光部，其中，遮光部覆盖照明图像传感器芯片的周边区域中的硅晶片的背面。

26. 发明申请

US20120113304A1 COLOR FILTER OF BACK SIDE ILLUMINATION IMAGE SENSOR AND METHOD FOR FABRICATING THE SAME 有权
标题翻译：背面照明图像传感器的彩色滤光片及其制作方法
公开(公告)号：US20120113304A1
公开(公告)日：2012-05-10
申请号：US12940756
申请日：2010-11-05
申请人： Hao-Min CHEN , Chen-Wei Lu , Chih-Kung Chang
发明人： Hao-Min CHEN , Chen-Wei Lu , Chih-Kung Chang
IPC分类号： H04N5/335
CPC分类号： H01L27/1464 , H01L27/14621 , H01L27/14623
摘要： The invention provides a color filter of an illumination image sensor and a method for fabricating the same. A color filter of an illumination image sensor includes a light shield portion constructed by a plurality of grid photoresist patterns, wherein the light shield portion covers a back side surface of the silicon wafer in a periphery region of an illumination image sensor chip.
摘要翻译：本发明提供一种照明图像传感器的滤色器及其制造方法。照明图像传感器的滤色器包括由多个栅格光致抗蚀剂图案构成的遮光部，其中，遮光部覆盖照明图像传感器芯片的周边区域中的硅晶片的背面。

27. 发明申请

US20070279520A1 IMAGE SENSING DEVICE AND PACKAGE METHOD THEREFOR 审中-公开
标题翻译：图像感测装置及其包装方法
公开(公告)号：US20070279520A1
公开(公告)日：2007-12-06
申请号：US11676813
申请日：2007-02-20
申请人： Hsiao-Wen Lee , Chih-Kung Chang , Pai-Chun Peter Zung , Chien-Pang Lin
发明人： Hsiao-Wen Lee , Chih-Kung Chang , Pai-Chun Peter Zung , Chien-Pang Lin
IPC分类号： H04N5/238
CPC分类号： H04N5/2254 , H01L27/14618 , H01L27/14625 , H01L27/14627 , H01L27/14685 , H01L2224/13 , H04N5/2257
摘要： A package module for an image sensing device is provided. The package module includes a substrate having thereon a photoelectric element array, a first optical element array formed on the photoelectric element array, a package lid having thereon a second optical element array opposite to the first optical element array and having an arrangement corresponding to that of the first optical element array; and a spacer disposed on a bonding area between the package lid and the substrate for adjusting a distance between the package lid and the substrate.
摘要翻译：提供了一种用于图像感测装置的封装模块。封装模块包括其上具有光电元件阵列的基板，形成在光电元件阵列上的第一光学元件阵列，封装盖，其上具有与第一光学元件阵列相对的第二光学元件阵列，并且具有与第一光学元件阵列; 以及间隔件，设置在封装盖和基板之间的接合区域上，用于调节封装盖和基板之间的距离。

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