会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 22. 发明申请
    • Programmable interconnect structures
    • 可编程互连结构
    • US20050162933A1
    • 2005-07-28
    • US11040731
    • 2005-01-24
    • Raminda Madurawe
    • Raminda Madurawe
    • G06F7/38G06F17/50G11C5/00H03K17/693H03K19/173H03K19/177
    • H03K19/1776H03K19/17704H03K19/17736H03K19/1778H03K19/17796
    • A programmable interconnect structure in an integrated circuit comprising: a plurality of wires; and a buffer comprising an input and an output, said buffer receiving a weak signal at the input and providing a buffered signal at the output; and a first programmable multiplexer comprising: a plurality of inputs and an output, wherein the inputs are coupled to said plurality of wires, and the output is coupled to said input of the buffer; and a user configurable configuration circuit comprising a plurality of memory elements, wherein the data stored in the memory elements select one of said plurality of wires to couple to said buffer input; and a second programmable multiplexer comprising: an input and a plurality of outputs, wherein the input is coupled to said output of the buffer and the outputs are coupled to said plurality of wires; and a user configurable configuration circuit comprising a plurality of memory elements, wherein the data stored in the memory elements select said buffer output to couple to one of said plurality of wires; wherein, a signal received by the buffer on any one of the plurality of wires is buffered and transmitted to one or more of the other wires. The area of the structure is significantly reduced by increasing the number of programmable switches, generating a layout efficient wire sharing multiplexing scheme, moving the memory elements to a vertical position and using a single large area output stage in the buffer.
    • 一种集成电路中的可编程互连结构,包括:多条导线; 以及包括输入和输出的缓冲器,所述缓冲器在输入处接收弱信号并在输出端提供缓冲信号; 以及第一可编程多路复用器,包括:多个输入和输出,其中所述输入耦合到所述多条导线,并且所述输出耦合到所述缓冲器的所述输入; 以及包括多个存储器元件的用户可配置配置电路,其中存储在所述存储器元件中的数据选择所述多条线中的一条以耦合到所述缓冲器输入; 以及第二可编程多路复用器,包括:输入和多个输出,其中所述输入耦合到所述缓冲器的所述输出,并且所述输出耦合到所述多条导线; 以及包括多个存储器元件的用户可配置配置电路,其中存储在所述存储器元件中的数据选择所述缓冲器输出以耦合到所述多条线中的一条; 其中,所述缓冲器在所述多个导线中的任何一个上接收的信号被缓冲并传输到一个或多个其它导线。 通过增加可编程开关的数量,生成布局高效的有线共享复用方案,将存储元件移动到垂直位置,并在缓冲器中使用单个大面积输出级,可显着减少结构的面积。
    • 23. 发明申请
    • Insulated-gate field-effect thin film transistors
    • 绝缘栅场效应薄膜晶体管
    • US20050121721A1
    • 2005-06-09
    • US10979024
    • 2004-11-02
    • Raminda Madurawe
    • Raminda Madurawe
    • H01L21/00H01L21/84H01L27/01H01L27/12H01L29/74H01L29/786
    • H01L27/1214H01L21/26513H01L21/2658H01L27/0688H01L27/1203H01L29/665H01L29/78621H01L29/78696
    • A new Insulated-Gate Field-Effect Thin Film Transistor (Gated-FET) is disclosed. A semiconductor thin film Gated-FET device, comprising: a lightly doped resistive channel region formed on a semiconductor thin film layer, the thickness of the channel comprising the entire thin film thickness; and an insulator layer deposited on said channel surface with a gate region formed on a gate material deposited on said insulator layer, said gate region receiving a gate voltage comprised of: a first level that modulate said channel resistance to a substantially non-conductive state by fully depleting majority carriers from said thin film layer in the channel region; and a second level that modulate said channel resistance to a substantially conductive state by at least partially accumulating majority carriers near the gate surface of the thin film layer in said channel region.
    • 公开了一种新的绝缘栅场效应薄膜晶体管(Gated-FET)。 一种半导体薄膜栅极FET器件,包括:形成在半导体薄膜层上的轻掺杂电阻沟道区,所述沟道的厚度包括整个薄膜厚度; 以及沉积在所述沟道表面上的绝缘体层,所述栅极区域形成在沉积在所述绝缘体层上的栅极材料上,所述栅极区域接收栅极电压,所述栅极电压包括:第一电平,其将所述沟道电阻调制到基本上不导通的状态, 在沟道区域中从所述薄膜层中充分耗尽多数载流子; 以及第二电平,其通过在所述沟道区域中至少部分地积聚靠近所述薄膜层的栅极表面的多数载流子来将所述沟道电阻调制到基本导电状态。
    • 24. 发明申请
    • Programmable interconnect structures
    • 可编程互连结构
    • US20050091630A1
    • 2005-04-28
    • US10691013
    • 2003-10-23
    • Raminda Madurawe
    • Raminda Madurawe
    • G06F7/38G06F17/50G11C5/00H03K17/693H03K19/173H03K19/177
    • H03K19/1776H03K19/17704H03K19/17736H03K19/1778H03K19/17796
    • A programmable interconnect structure for an integrated circuit comprises: a pass-gate fabricated on a substrate layer to electrically connect a first node to a second node; and a configuration circuit including at least one memory element to control said pass-gate fabricated substantially above said substrate layer; and a programmable method to select between isolating said first and second nodes and connecting said first and second nodes. A programmable buffer structure for an integrated circuit comprises: a first and a second terminal; and a programmable pull-up and a programmable pull-down circuit coupled between said first and second terminals; and a configuration circuit including at least one memory element coupled to said pull-up and pull-down circuits; and a programmable method to select between isolating said first terminal from second terminal by deactivating said pull-up and pull-down circuits, and coupling said first terminal to second terminal by activating said pull-up and pull-down circuits. A method of forming a programmable interconnect structure for an integrated circuit comprises: fabricating one or more pass-gates on a substrate layer to electrically connect two points; and selectively fabricating either a memory circuit or a conductive pattern substantially above said pass-gates to control a portion of said pass-gates; and fabricating an interconnect and routing layer substantially above said memory circuits to connect said pass-gates and one of said memory circuits and conductive pattern.
    • 用于集成电路的可编程互连结构包括:制造在衬底层上以将第一节点电连接到第二节点的通过门; 以及配置电路,其包括至少一个存储元件,以控制基本上在所述衬底层上方制造的所述通孔; 以及可编程方法,用于在隔离所述第一和第二节点之间选择并连接所述第一和第二节点。 一种用于集成电路的可编程缓冲器结构包括:第一和第二端子; 以及耦合在所述第一和第二端子之间的可编程上拉和可编程下拉电路; 以及配置电路,包括耦合到所述上拉和下拉电路的至少一个存储元件; 以及可编程方法,用于通过停用所述上拉和下拉电路来将所述第一端子与第二端子隔离,并且通过激活所述上拉和下拉电路将所述第一端子耦合到第二端子来进行选择。 形成用于集成电路的可编程互连结构的方法包括:在衬底层上制造一个或多个栅极以电连接两个点; 并且选择性地制造基本上在所述通过栅极上方的存储器电路或导电图案以控制所述通孔的一部分; 以及基本上在所述存储器电路之上制造互连和布线层,以连接所述通孔和所述存储器电路和导电图案之一。