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21. 发明申请

US20050264884A1 Projection objective for microlithography 审中-公开
标题翻译：微光刻的投影目标
公开(公告)号：US20050264884A1
公开(公告)日：2005-12-01
申请号：US11059364
申请日：2005-02-17
申请人： Christoph Zaczek , David Shafer , Wilhelm Ulrich
发明人： Christoph Zaczek , David Shafer , Wilhelm Ulrich
IPC分类号： G02B5/30 , G02B17/08 , G02B27/28 , G03F7/20
CPC分类号： G02B17/0892 , G02B17/045 , G02B27/283 , G03F7/70225
摘要： A projection objective (5) for microlithography for projecting a pattern arranged in an object plane (8) of the projection objective (5) has in the light path between the object plane (8) and the image plane (11) at least one beam deflecting device (19) with at least one totally reflective surface (17) that is inclined to an incidence direction of the radiation incident on the totally reflective surface (17) in such a way that substantially all the radiation coming from the object plane (8) and striking the totally reflective surface (17) is totally reflected at the totally reflective surface (17). A high reflectivity in conjunction with high angle of incidence with respect to the surface normal to the totally reflective surface (17) can be achieved with the aid of the beam deflecting device (19). In the case of catadioptric projection objectives, in particular, it is possible thereby to fashion designs that without the use of total reflection for beam deflection can be implemented only with a substantially greater outlay on construction.
摘要翻译：用于突出布置在投影物镜（5）的物平面（8）中的图案的用于微光刻的投影物镜（5）在物平面（8）和像平面（11）之间的光路中具有至少一个光束偏转装置（19）具有与入射在全反射表面（17）上的辐射的入射方向倾斜的至少一个全反射表面（17），使得基本上所有来自物平面（8）的辐射）和撞击全反射表面（17）在全反射表面（17）处被全反射。借助于光束偏转装置（19），可以实现高反射率和高入射角相对于垂直于全反射表面（17）的表面。在反射折射投影物镜的情况下，特别地，可以设计出不需要使用用于光束偏转的全反射的设计，只能在施工上实现更大的花费。

22. 发明授权

US08488103B2 Optical element for reflection of UV radiation, method for manufacturing the same and projection exposure apparatus comprising the same 有权
标题翻译：用于UV辐射反射的光学元件，其制造方法和包括该光学元件的投影曝光设备
公开(公告)号：US08488103B2
公开(公告)日：2013-07-16
申请号：US12780035
申请日：2010-05-14
申请人： Alexandra Pazidis , Christoph Zaczek , Horst Feldermann , Peter Huber
发明人： Alexandra Pazidis , Christoph Zaczek , Horst Feldermann , Peter Huber
IPC分类号： G03B27/54 , G03B27/42 , G02B5/08
CPC分类号： G02B5/0891 , G02B5/0833 , G03F7/70316 , G03F7/70958
摘要： An optical element (1a, 1b) for reflecting UV radiation at an operating wavelength below 250 nm, preferably at 193 nm, which has a substrate (2a, 2b), a reflective layer (3a, 3b) made of aluminum superimposed on the substrate (2a, 2b). The reflective aluminum layer (3a, 3b) is not transparent to UV radiation and is (111)-plane oriented. The reflective optical element (1a, 1b) has a reflectivity of more than 85%, preferably of more than 88%, and even more preferably of more than 92%, in a range of incident angles of at least 10°, preferably of at least 15°, at the operating wavelength. Also disclosed is an optical element having a reflective layer made from a material having a melting point higher than that of aluminum, as well as methods for producing such optical elements, and optical arrangements incorporating such optical elements.
摘要翻译：一种用于在工作波长低于250nm（优选193nm）下反射UV辐射的光学元件（1a，1b），其具有衬底（2a，2b），叠加在衬底上的由铝制成的反射层（3a，3b）（2a，2b）。反射铝层（3a，3b）对于紫外线辐射是不透明的，并且是（111）平面取向的。反射光学元件（1a，1b）在入射角至少为10°的范围内具有大于85％，优选大于88％，甚至更优选大于92％的反射率，优选地为至少15°，在工作波长。还公开了具有由熔点高于铝的材料制成的反射层的光学元件，以及用于制造这种光学元件的方法，以及包括这种光学元件的光学装置。

23. 发明授权

US08049964B2 Optical element with an antireflection coating, projection objective, and exposure apparatus comprising such an element 有权
标题翻译：具有抗反射涂层的光学元件，投影物镜和包括这种元件的曝光设备
公开(公告)号：US08049964B2
公开(公告)日：2011-11-01
申请号：US11917500
申请日：2006-06-13
申请人： Christoph Zaczek , Alexandra Pazidis
发明人： Christoph Zaczek , Alexandra Pazidis
IPC分类号： G02B1/10 , G02B5/08 , G02B5/20 , F21V9/04 , F21V9/06 , G03B27/42
CPC分类号： G03F7/70958 , G02B1/02 , G02B1/113 , G02B1/115 , G03F7/70341 , G03F7/70941
摘要： An optical element (14) transparent for radiation with a wavelength λ in the ultraviolet wavelength range below 250 nm, in particular at 193 nm, comprises a substrate (17) with a refractive index nS larger than 1.6, and an antireflection coating (16) formed on at least part of the surface of the substrate (17) between the substrate (17) and an ambient medium with a refractive index nA, preferably with nA=1.0. The antireflection coating (16) consists of a single layer of a material with a refractive index nL of about nL=√{square root over (nAnS)}, in particular nL>1.3, and the optical thickness dL of the single layer is about λ/4. The optical element (14) is preferably part of a projection objective (5) in a microlithography projection exposure apparatus (1) and located adjacent to a light-sensitive substrate (10).
摘要翻译：对于紫外线波长范围在250nm以下，特别是193nm的波长λ的辐射透光的光学元件（14）包括折射率nS大于1.6的基板（17）和抗反射涂层（16）形成在衬底（17）和具有折射率nA，优选nA = 1.0的环境介质之间的衬底（17）的至少部分表面上。抗反射涂层（16）由折射率nL约为nL =√{平方根（nAnS）}的材料的单层组成，特别是nL> 1.3，单层的光学厚度dL约为 λ/ 4。光学元件（14）优选在微光刻投影曝光装置（1）中的投影物镜（5）的一部分，并且位于与感光基板（10）相邻的位置。

24. 发明授权

US07583443B2 Reflective optical element for ultraviolet radiation, projection optical system and projection exposure system therewith, and method for forming the same 有权
标题翻译：用于紫外线辐射的反射光学元件，投影光学系统和投影曝光系统及其形成方法
公开(公告)号：US07583443B2
公开(公告)日：2009-09-01
申请号：US12321220
申请日：2009-01-20
申请人： Christoph Zaczek
发明人： Christoph Zaczek
IPC分类号： G02B1/10
CPC分类号： G02B5/0825 , G02B5/0875 , G02B5/0891
摘要： A reflective optical element (1) for radiation with a wavelength λ in the ultraviolet wavelength range comprises a reflective surface (6), and a dielectric multilayer system (4) formed on the reflective surface (6) which comprises at least two successive pairs of layers (5.i, 5.i+1), each pair of layers (5.1 to 5.N) consisting of a high refractive index layer (H1 to HN) alternating with a low refractive index layer (L1 to LN), wherein the optical thicknesses (Hi, Hi+1) of the high refractive index layers (Hi, Hi+1) and the optical thicknesses (Li, Li+1) of the low refractive index layers (Li, Li+1) of each adjacent pair of layers (5.i, 5.i+1) are different from each other.
摘要翻译：用于在紫外线波长范围内具有波长λ的辐射的反射光学元件（1）包括形成在反射表面（6）上的反射表面（6）和电介质多层系统（4），其包括至少两个连续的对层（5.i，5.i + 1），由低折射率层（L1至LN）交替的高折射率层（H1至HN）组成的每对层（5.1至5.N），其中高折射率层（Hi，Hi + 1）的光学厚度（Hi，Hi + 1）和相邻的低折射率层（Li，Li + 1）的光学厚度（Li，Li + 1）一对层（5.i，5.i + 1）彼此不同。

25. 发明申请

US20080192335A1 Optical Element with an Antireflection Coating, Projection Objective, and Exposure Apparatus Comprising Such an Element 有权
标题翻译：具有抗反射涂层的光学元件，投射物镜和包括这种元件的曝光装置
公开(公告)号：US20080192335A1
公开(公告)日：2008-08-14
申请号：US11917500
申请日：2006-06-13
申请人： Christoph Zaczek , Alexandra Pazidis
发明人： Christoph Zaczek , Alexandra Pazidis
IPC分类号： G02B5/20 , G02B1/11
CPC分类号： G03F7/70958 , G02B1/02 , G02B1/113 , G02B1/115 , G03F7/70341 , G03F7/70941
摘要： An optical element (14) transparent for radiation with a wavelength λ in the ultraviolet wavelength range below 250 nm, in particular at 193 nm, comprises a substrate (17) with a refractive index nS larger than 1.6, and an antireflection coating (16) formed on at least part of the surface of the substrate (17) between the substrate (17) and an ambient medium with a refractive index nA, preferably with nA=1.0. The antireflection coating (16) consists of a single layer of a material with a refractive index nL of about nL=√{square root over (nAnS)}, in particular nL>1.3, and the optical thickness dL of the single layer is about λ/4. The optical element (14) is preferably part of a projection objective (5) in a microlithography projection exposure apparatus (1) and located adjacent to a light-sensitive substrate (10).
摘要翻译：在紫外线波长范围在250nm以下，特别是193nm的波长为λ的辐射透明的光学元件（14）包括具有大于1.6的折射率n S S的衬底（17），以及形成在基板（17）的表面的至少部分之间的抗反射涂层（16），所述基板（17）和折射率为n A的环境介质之间，优选为n < SUB> A = 1.0。抗反射涂层（16）由单层材料构成，折射率为nLL的材料的平均根数超过（n A 特别是nL 1.3，单层的光学厚度d L L大约是λ / 4。光学元件（14）优选在微光刻投影曝光装置（1）中的投影物镜（5）的一部分，并且位于与感光基板（10）相邻的位置。

26. 发明申请

US20070132989A1 Devices and methods for inspecting optical elements with a view to contamination 有权
标题翻译：为了污染而检查光学元件的装置和方法
公开(公告)号：US20070132989A1
公开(公告)日：2007-06-14
申请号：US11635293
申请日：2006-12-07
申请人： Julian Kaller , Herbert Fink , Christoph Zaczek , Wolfgang Rupp
发明人： Julian Kaller , Herbert Fink , Christoph Zaczek , Wolfgang Rupp
IPC分类号： G01N21/00
CPC分类号： G01N21/94 , G01N21/958 , G01N2021/9583 , G03F7/7085 , G03F7/70916 , G03F7/70925
摘要： Described is an examination system (1) for locating contamination (2) on an optical element (4) installed in an optical system (5), which examination system (1) comprises: a spatially resolving detector (6); imaging optics (7) that magnify in particular at a magnification of between 2 times and 100 times, for magnified imaging of a surface sub-region (3a) of the optical element (4) on the spatially resolving detector (6); as well as a movement mechanism (12), in particular a motorised movement mechanism (12), for displacing the imaging optics (7) together with the detector (6) relative to the surface (3) of the optical element (4) such that any desired surface sub-region of the surface (3) can be imaged at magnification.
摘要翻译：描述了一种用于将污染物（2）定位在安装在光学系统（5）中的光学元件（4）上的检查系统（1），该检查系统（1）包括：空间分辨检测器（6）; 用于在空间分辨检测器（6）上的光学元件（4）的表面子区域（3a）放大成像的放大倍率在2倍至100倍之间放大的成像光学元件（7）; 以及运动机构（12），特别是机动运动机构（12），用于相对于光学元件（4）的表面（3）将成像光学元件（7）与检测器（6）一起移位，如表面（3）的任何期望的表面亚区域可以在放大倍数下成像。

27. 发明授权

US07093937B2 Optical component and coating system for coating substrates for optical components 有权
标题翻译：用于光学部件涂覆基板的光学部件和涂层系统
公开(公告)号：US07093937B2
公开(公告)日：2006-08-22
申请号：US11052751
申请日：2005-02-09
申请人： Harry Bauer , Matthias Heller , Hans-Jochen Paul , Jens Ullmann , Patrick Scheible , Christoph Zaczek
发明人： Harry Bauer , Matthias Heller , Hans-Jochen Paul , Jens Ullmann , Patrick Scheible , Christoph Zaczek
IPC分类号： G02C7/02
CPC分类号： G02B1/10 , C23C14/0021 , C23C14/044 , C23C14/505
摘要： An optical component and a coating system for coating substrates for optical components with essentially rotationally symmetric coatings, the system having a planetary-drive system (1) that has a rotating planet carrier (2) and several planets (4), each of which carries a single substrate, that corotate both with the planet carrier and with respect to the primary carrier. In one embodiment a set of stationary first masks (20) that allow controlling the radial variation in physical film thickness is arranged between a source (8) of material situated beneath the planets and the substrates. A set of second masks that mask off evaporation angles exceeding a limiting evaporation or incidence angle (β max) for every substrate also corotate with the primary carrier (2), which allows depositing coatings having a prescribed radial film-thickness distribution and a virtually constant density of the coating material over their full radial extents for relatively low, and only slightly varying, evaporation angles.
摘要翻译：一种用于涂覆具有基本上旋转对称涂层的光学部件的基板的光学部件和涂层系统，该系统具有行星传动系统（1），其具有旋转的行星架（2）和几个行星（4），每个行星架单个衬底，其与行星架相关并且相对于主载体共转。在一个实施例中，允许控制物理膜厚度的径向变化的一组固定第一掩模（20）布置在位于行星下方的材料源（8）和基板之间。掩盖每个底物超过限制蒸发或入射角（βmax）的蒸发角度的一组第二掩模也与主载体（2）一致，这允许沉积具有规定径向膜厚度分布和实际上恒定的涂层在完全径向范围内涂层材料的密度相对较低且仅略微变化的蒸发角度。

28. 发明授权

US09684252B2 Optical element with an antireflection coating, projection objective, and exposure apparatus comprising such an element 有权
公开(公告)号：US09684252B2
公开(公告)日：2017-06-20
申请号：US13281138
申请日：2011-10-25
申请人： Christoph Zaczek , Alexandra Pazidis
发明人： Christoph Zaczek , Alexandra Pazidis
IPC分类号： G03F7/20 , G02B1/113 , G02B1/115 , G02B1/02
CPC分类号： G03F7/70958 , G02B1/02 , G02B1/113 , G02B1/115 , G03F7/70341 , G03F7/70941
摘要： An optical element (14) transparent for radiation with a wavelength λ in the ultraviolet wavelength range below 250 nm, in particular at 193 nm, comprises a substrate (17) with a refractive index ns larger than 1.6, and an antireflection coating (16) formed on at least part of the surface of the substrate (17) between the substrate (17) and an ambient medium with a refractive index nA, preferably with nA=1.0. The antireflection coating (16) consists of a single layer of a material with a refractive index nL of about nL=√{square root over (nAnS)}, in particular nL>1.3, and the optical thickness dL of the single layer is about λ/4. The optical element (14) is preferably part of a projection objective (5) in a microlithography projection exposure apparatus (1) and located adjacent to a light-sensitive substrate (10).

29. 发明授权

US08435726B2 Method of processing an optical element and an optical element, in particular for a microlithographic projection exposure apparatus 有权
标题翻译：特别是用于微光刻投影曝光装置的光学元件和光学元件的处理方法
公开(公告)号：US08435726B2
公开(公告)日：2013-05-07
申请号：US12135781
申请日：2008-06-09
申请人： Alexandra Pazidis , Christoph Zaczek , Alexander Hirnet , Herbert Fink , Dieter Schmerek
发明人： Alexandra Pazidis , Christoph Zaczek , Alexander Hirnet , Herbert Fink , Dieter Schmerek
IPC分类号： G02B3/00
CPC分类号： G03F7/70958
摘要： A method of processing an optical element which has a substrate (110) and a layer system (120) applied to the substrate (110), wherein the layer system (120) in a starting condition has a plurality of volume defects (130), wherein the method includes at least partially filling at least one of the volume defects (130) with a filling material (140). Also disclosed is an associated method of manufacturing an optical element.
摘要翻译：一种处理光学元件的方法，所述光学元件具有施加到所述衬底（110）上的衬底（110）和层系统（120），其中处于起始状态的层系统（120）具有多个体积缺陷（130），其中所述方法包括用填充材料（140）至少部分地填充所述体积缺陷（130）中的至少一个。还公开了一种制造光学元件的相关方法。

30. 发明授权

US07659976B2 Devices and methods for inspecting optical elements with a view to contamination 有权
标题翻译：为了污染而检查光学元件的装置和方法
公开(公告)号：US07659976B2
公开(公告)日：2010-02-09
申请号：US11635293
申请日：2006-12-07
申请人： Julian Kaller , Herbert Fink , Christoph Zaczek , Wolfgang Rupp
发明人： Julian Kaller , Herbert Fink , Christoph Zaczek , Wolfgang Rupp
IPC分类号： G01N21/00
CPC分类号： G01N21/94 , G01N21/958 , G01N2021/9583 , G03F7/7085 , G03F7/70916 , G03F7/70925
摘要： Described is an examination system (1) for locating contamination (2) on an optical element (4) installed in an optical system (5), which examination system (1) comprises: a spatially resolving detector (6); imaging optics (7) that magnify in particular at a magnification of between 2 times and 100 times, for magnified imaging of a surface sub-region (3a) of the optical element (4) on the spatially resolving detector (6); as well as a movement mechanism (12), in particular a motorized movement mechanism (12), for displacing the imaging optics (7) together with the detector (6) relative to the surface (3) of the optical element (4) such that any desired surface sub-region of the surface (3) can be imaged at magnification.
摘要翻译：描述了一种用于将污染物（2）定位在安装在光学系统（5）中的光学元件（4）上的检查系统（1），该检查系统（1）包括：空间分辨检测器（6）; 用于在空间分辨检测器（6）上放大成像光学元件（4）的表面子区域（3a）的放大倍率在2倍至100倍之间的放大倍率的成像光学元件（7）。以及运动机构（12），特别是机动运动机构（12），用于相对于光学元件（4）的表面（3）将成像光学元件（7）与检测器（6）一起移位，如表面（3）的任何期望的表面亚区域可以在放大倍数下成像。

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