会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 21. 发明授权
    • Plasma display panel
    • 等离子显示面板
    • US07733022B2
    • 2010-06-08
    • US11035044
    • 2005-01-14
    • Deok Soo KimByung Chul LeeJin Young KimYun Gi KimSung Gon ShinSung Min Jun
    • Deok Soo KimByung Chul LeeJin Young KimYun Gi KimSung Gon ShinSung Min Jun
    • H01J17/49
    • H01J11/34H01J11/12
    • Disclosed herein is a plasma display panel in which afterimage is improved. The plasma display panel according to the present invention includes a panel unit having an upper plate and a lower plate, a frame that supports circuitry, and a conductive material formed between the panel unit and the frame. As such, a conductive material is formed on a bottom surface of a lower plate of a panel. Thus, charges introduced into the lower plate are properly controlled to improve the waveform stability of the panel. Also, a charge characteristic is improved to implement a stable operation. Accordingly, an afterimage time can be reduced. Further, a sheet of a low hardness and light weight is used. It is thus possible to absorb shock and noise of a PDP, accomplish light weight of the PDP and reduce the materials of the sheet.
    • 这里公开了等离子体显示面板,其中余像被改善。 根据本发明的等离子体显示面板包括具有上板和下板的面板单元,支撑电路的框架和形成在面板单元和框架之间的导电材料。 因此,导电材料形成在面板的下板的底表面上。 因此,适当地控制引入下板的电荷,以提高面板的波形稳定性。 此外,改善了充电特性以实现稳定的操作。 因此,可以减少余像时间。 此外,使用低硬度和重量轻的片材。 因此可以吸收PDP的冲击和噪音,实现PDP的重量轻并且减少片材的材料。
    • 22. 发明授权
    • Photomask for obtaining a graded pattern profile on a photoresist
    • 用于在光致抗蚀剂上获得渐变图案轮廓的光掩模
    • US06391500B1
    • 2002-05-21
    • US09684062
    • 2000-10-06
    • Byung Chul Lee
    • Byung Chul Lee
    • G03F900
    • G03F1/50
    • A photomask for use in a photolithography technique includes a transparent portion for transmitting light from a light source, an opaque portion coated with an opaque material for interrupting the light from the light source, and a border portion positioned between the transparent and the opaque portions. The border portion includes a number of patterned structures coated with the opaque material and arranged along an edge of the opaque portion, wherein the amount of light passing through the border portion is gradually increased when moving from a first border line between the opaque and the border portions to a second border line between the border and the transparent portions.
    • 用于光刻技术的光掩模包括用于透射来自光源的光的透明部分,涂覆有用于遮断来自光源的光的不透明材料的不透明部分,以及位于透明部分和不透明部分之间的边界部分。 边界部分包括涂覆有不透明材料并沿着不透明部分的边缘布置的多个图案化结构,其中当从不透明和边界之间的第一边界线移动时,穿过边界部分的光量逐渐增加 部分到边界和透明部分之间的第二边界线。