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    • 21. 发明授权
    • Susceptor apparatus for inverted type MOCVD reactor
    • 反型MOCVD反应器的受体装置
    • US08366830B2
    • 2013-02-05
    • US10382198
    • 2003-03-04
    • Shuji NakamuraSteven DenBaarsMax BatresMichael Coulter
    • Shuji NakamuraSteven DenBaarsMax BatresMichael Coulter
    • H01L21/00C23C14/00C23C16/00
    • C23C16/4584C23C16/4581C23C16/46C30B25/10C30B25/12
    • The present invention discloses a susceptor mounting assembly for holding semiconductor wafers in an MOCVD reactor during growth of epitaxial layers on the wafers, that is particularly adapted for mounting a susceptor in an inverted type reactor chamber. It includes a tower having an upper and lower end with the upper end mounted to the top inside surface of the reactor chamber and a susceptor is arranged at the tower's lower end. Semiconductor wafers are held adjacent to the susceptor such that heat from the susceptor passes into wafers. A second embodiment of a susceptor mounting assembly according to the invention also comprises a tower having an upper and lower end. The tower's upper end is mounted to the top inside surface of the reactor chamber. A susceptor is housed within a cup and the cup is mounted to the tower's lower end.
    • 本发明公开了一种用于在晶圆上生长外延层期间将半导体晶片保持在MOCVD反应器中的基座安装组件,其特别适用于将基座安装在倒置型反应室中。 它包括具有上端和下端的塔,其上端安装到反应室的顶部内表面,并且基座设置在塔的下端。 半导体晶片被保持在基座附近,使得来自基座的热量进入晶片。 根据本发明的基座安装组件的第二实施例还包括具有上端和下端的塔。 塔的上端安装在反应室的顶部内表面。 托架被容纳在一个杯子内,杯子安装在塔的下端。
    • 27. 发明授权
    • Apparatus for inverted multi-wafer MOCVD fabrication
    • 倒装多晶圆MOCVD制造装置
    • US08133322B2
    • 2012-03-13
    • US10256814
    • 2002-09-27
    • Shuji NakamuraSteven DenBaarsMax BatresMichael Coulter
    • Shuji NakamuraSteven DenBaarsMax BatresMichael Coulter
    • C23C16/455C23C16/458C23C16/46C23C16/06C23C16/22
    • C23C16/45565C23C16/455C23C16/45502C23C16/4584C30B25/10C30B25/14
    • A semiconductor fabrication reactor according to the invention comprises a rotatable susceptor mounted to the top of a reactor chamber. One or more wafers are mounted to a surface of the susceptor and the rotation of the susceptor causes the wafers to rotate within the chamber. A heater heats the susceptor and a chamber gas inlet allows semiconductor growth gasses into the reactor chamber to deposit semiconductor material on said wafers. A chamber gas outlet is included to allow growth gasses to exit the chamber. In a preferred embodiment, the inlet is at or below the level of said wafers and the outlet is preferably at or above the level of the wafers. A semiconductor fabrication system according to the invention comprises a source of gasses for forming epitaxial layers on wafers and a source of gasses for dopants in said epitaxial layers. A gas line carries the dopant and epitaxial source gasses to a reactor for growing semiconductor devices on wafers, and the source gasses in the gas line are injected into the reactor chamber through a reactor inlet. The reactor comprises an inverted susceptor mounted in a reactor chamber that is capable of rotating. One or more wafers are mounted to a surface of the susceptor, the rotation of the susceptor causing the wafers to rotate within the chamber. A heater heats the susceptor and the source gasses deposit semiconductor material on the wafers.
    • 根据本发明的半导体制造反应器包括安装到反应器室的顶部的可旋转基座。 将一个或多个晶片安装到基座的表面,并且基座的旋转导致晶片在腔室内旋转。 加热器加热基座,腔室气体入口允许半导体生长气体进入反应器室以将半导体材料沉积在所述晶片上。 包括室气体出口以允许生长气体离开室。 在优选实施例中,入口处于或低于所述晶片的水平面,并且出口优选地处于或高于晶片的水平面。 根据本发明的半导体制造系统包括用于在晶片上形成外延层的气体源和用于所述外延层中的掺杂剂的气体源。 气体管线将掺杂剂和外延源气体输送到用于在晶片上生长半导体器件的反应器,并且气体管线中的源气体通过反应器入口注入反应器室。 反应器包括安装在能够旋转的反应器室中的反转基座。 一个或多个晶片被安装到基座的表面,基座的旋转导致晶片在腔室内旋转。 加热器加热基座和源气体将半导体材料沉积在晶片上。