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21. 发明申请

US20060219910A1 Monochromator and scanning electron microscope using the same 有权
标题翻译：单色器和扫描电子显微镜使用相同
公开(公告)号：US20060219910A1
公开(公告)日：2006-10-05
申请号：US11344529
申请日：2006-02-01
申请人： Yoichi Ose , Shunroku Taya , Hideo Todokoro , Tadashi Otaka , Mitsugu Sato , Makoto Ezumi
发明人： Yoichi Ose , Shunroku Taya , Hideo Todokoro , Tadashi Otaka , Mitsugu Sato , Makoto Ezumi
IPC分类号： G21K7/00 , G01N23/00
CPC分类号： H01J37/05 , H01J37/153 , H01J37/28
摘要： An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.
摘要翻译：本发明提供一种扫描电子显微镜，该扫描电子显微镜由能够高分辨率，单色化能量和降低色差的单色仪组成，而不会显着降低一次电子束的电流强度。扫描电子显微镜安装有一对具有相反偏转方向的扇形磁场和电场，以聚焦电子束，然后通过狭缝限制能量宽度，并且安装相同形状的另一对扇形磁场和电场在与包含狭缝的表面形成对称镜的位置处。该结构用于抵消物点和对称镜位置的能量分散，并通过会聚透镜系统空间收缩点聚光点光束，提高扫描电子显微镜的图像分辨率。

22. 发明授权

US07075078B2 Scanning electron microscope 失效
标题翻译：扫描电子显微镜
公开(公告)号：US07075078B2
公开(公告)日：2006-07-11
申请号：US11064819
申请日：2005-02-25
申请人： Yoichi Ose , Hideo Todokoro , Makoto Ezumi , Mitsugu Sato
发明人： Yoichi Ose , Hideo Todokoro , Makoto Ezumi , Mitsugu Sato
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： H01J37/147 , H01J37/1471 , H01J37/153 , H01J37/28 , H01J2237/12 , H01J2237/14 , H01J2237/1516 , H01J2237/244 , H01J2237/2817
摘要： A disclosed scanning electron microscope (SEM) is intended to prevent deterioration of resolution due to increase in off-axis aberration resulting from a deviation of a primary electron bean from the optical axis of the microscope. An example of the SEM has an image shifting deflector system including two deflectors disposed respectively at upper and lower stages. The deflector at the lower stage is a multipole electrostatic deflecting electrode and is disposed in an objective. Even if the distance of image shifting is great, an image of a high resolution can be formed, and dimensions can be measured in a high accuracy. The SEM is able to achieve precision inspection at a high throughput when applied to inspection in semiconductor device fabricating processes that process a wafer having a large area and provided with very minute circuit elements.
摘要翻译：所公开的扫描电子显微镜（SEM）旨在防止由于一次电子束与显微镜的光轴偏离而引起的离轴像差增加而导致的分辨率的劣化。 SEM的示例具有包括分别设置在上部和下部的两个偏转器的图像偏移偏转器系统。下级的偏转器是多极静电偏转电极，并设置在物镜中。即使图像偏移的距离大，也可以形成高分辨率的图像，能够高精度地测量尺寸。当在用于处理具有大面积的晶片并且具有非常微小的电路元件的半导体器件制造工艺中进行检查时，SEM能够以高产量实现精确检查。

23. 发明授权

US06956211B2 Charged particle beam apparatus and charged particle beam irradiation method 有权
标题翻译：带电粒子束装置和带电粒子束照射法
公开(公告)号：US06956211B2
公开(公告)日：2005-10-18
申请号：US10656166
申请日：2003-09-08
申请人： Mitsugu Sato , Hideo Todokoro , Yoichi Ose , Makoto Ezumi , Noriaki Arai , Takashi Doi
发明人： Mitsugu Sato , Hideo Todokoro , Yoichi Ose , Makoto Ezumi , Noriaki Arai , Takashi Doi
IPC分类号： G01Q10/00 , G01Q20/02 , G01Q30/02 , H01J3/14 , H01J29/70 , H01J37/153 , H01J37/28
CPC分类号： H01J37/153 , H01J2237/1506 , H01J2237/1534 , H01J2237/28
摘要： A charged particle beam apparatus produces little reduction in resolution when the beam is inclined with respect to a sample. The trajectory of a primary beam 4 is deflected by a deflector or changed by a movable aperture such that the beam is incident on a plurality of lenses 6 and 7 off the axes thereof. A means is provided to control the off-axis trajectory of the beam such that an aberration produced by the objective lens 7 when the beam is inclined can be canceled by an aberration produced by the other lens 6.
摘要翻译：当束相对于样品倾斜时，带电粒子束装置的分辨率几乎不降低。主光束4的轨迹被偏转器偏转或者被可动孔径改变，使得光束入射到多个透镜6和7的轴线上。提供了一种用于控制光束的离轴轨迹的装置，使得当光束倾斜时由物镜7产生的像差可以被另一透镜6产生的像差消除。

24. 发明授权

US07022983B2 Monochromator and scanning electron microscope using the same 失效
公开(公告)号：US07022983B2
公开(公告)日：2006-04-04
申请号：US10751907
申请日：2004-01-07
申请人： Yoichi Ose , Shunroku Taya , Hideo Todokoro , Tadashi Otaka , Mitsugu Sato , Makoto Ezumi
发明人： Yoichi Ose , Shunroku Taya , Hideo Todokoro , Tadashi Otaka , Mitsugu Sato , Makoto Ezumi
IPC分类号： H01J37/05
CPC分类号： H01J37/05 , H01J37/153 , H01J37/28
摘要： An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.

25. 发明申请

US20050139773A1 Scanning electron microscope 失效
标题翻译：扫描电子显微镜
公开(公告)号：US20050139773A1
公开(公告)日：2005-06-30
申请号：US11064819
申请日：2005-02-25
申请人： Yoichi Ose , Hideo Todokoro , Makoto Ezumi , Mitsugu Sato
发明人： Yoichi Ose , Hideo Todokoro , Makoto Ezumi , Mitsugu Sato
IPC分类号： G01Q30/02 , G21K7/00 , H01J37/147 , H01J37/28 , G01N23/00
CPC分类号： H01J37/147 , H01J37/1471 , H01J37/153 , H01J37/28 , H01J2237/12 , H01J2237/14 , H01J2237/1516 , H01J2237/244 , H01J2237/2817
摘要： The present invention is intended to prevent the deterioration of resolution due to increase in off-axis aberration resulting from the deviation of a primary electron bean from the optical axis of a scanning electron microscope. A scanning electron microscope is provided with an image shifting deflector system including two deflectors disposed respectively at upper and lower stages. The deflector disposed at the lower stage is a multipole electrostatic deflecting electrode and is disposed in an objective. Even if the distance of image shifting is great, an image of a high resolution can be formed and dimensions can be measured in a high accuracy. The SEM is able to achieving precision inspection at a high throughput when applied to inspection in semiconductor device fabricating processes that process a wafer having a large area and provided with very minute circuit elements.
摘要翻译：本发明旨在防止由于一次电子束与扫描型电子显微镜的光轴的偏离引起的离轴像差的增加而导致的分辨率的劣化。扫描电子显微镜设置有分别设置在上部和下部的两个偏转器的图像偏转偏转器系统。设置在下级的偏转器是多极静电偏转电极，并且设置在物镜中。即使图像偏移的距离大，也可以形成高分辨率的图像，并且可以高精度地测量尺寸。当在用于处理具有大面积的晶片并且具有非常微小的电路元件的半导体器件制造工艺中进行检查时，SEM能够以高产量实现精密检查。

26. 发明授权

US06885001B2 Scanning electron microscope 失效
公开(公告)号：US06885001B2
公开(公告)日：2005-04-26
申请号：US10817834
申请日：2004-04-06
申请人： Yoichi Ose , Hideo Todokoro , Makoto Ezumi , Mitsugu Sato
发明人： Yoichi Ose , Hideo Todokoro , Makoto Ezumi , Mitsugu Sato
IPC分类号： G01Q30/02 , G21K7/00 , H01J37/147 , H01J37/28
CPC分类号： H01J37/147 , H01J37/1471 , H01J37/153 , H01J37/28 , H01J2237/12 , H01J2237/14 , H01J2237/1516 , H01J2237/244 , H01J2237/2817
摘要： The present invention is intended to prevent the deterioration of resolution due to increase in off-axis aberration resulting from the deviation of a primary electron bean from the optical axis of a scanning electron microscope. A scanning electron microscope is provided with an image shifting deflector system including two deflectors disposed respectively at upper and lower stages. The deflector disposed at the lower stage is a multipole electrostatic deflecting electrode and is disposed in an objective. Even if the distance of image shifting is great, an image of a high resolution can be formed and dimensions can be measured in a high accuracy. The SEM is able to achieving precision inspection at a high throughput when applied to inspection in semiconductor device fabricating processes that process a wafer having a large area and provided with very minute circuit elements.

27. 发明授权

US06787772B2 Scanning electron microscope 失效
公开(公告)号：US06787772B2
公开(公告)日：2004-09-07
申请号：US09768356
申请日：2001-01-25
申请人： Yoichi Ose , Hideo Todokoro , Makoto Ezumi , Mitsugu Sato
发明人： Yoichi Ose , Hideo Todokoro , Makoto Ezumi , Mitsugu Sato
IPC分类号： H01J3728
CPC分类号： H01J37/147 , H01J37/1471 , H01J37/153 , H01J37/28 , H01J2237/12 , H01J2237/14 , H01J2237/1516 , H01J2237/244 , H01J2237/2817
摘要： The present invention is intended to prevent the deterioration of resolution due to increase in off-axis aberration resulting from the deviation of a primary electron bean from the optical axis of a scanning electron microscope. A scanning electron microscope is provided with an image shifting deflector system including two deflectors disposed respectively at upper and lower stages. The deflector disposed at the lower stage is a multipole electrostatic deflecting electrode and is disposed in an objective. Even if the distance of image shifting is great, an image of a high resolution can be formed and dimensions can be measured in a high accuracy. The SEM is able to achieving precision inspection at a high throughput when applied to inspection in semiconductor device fabricating processes that process a wafer having a large area and provided with very minute circuit elements.

28. 发明授权

US07340111B2 Image evaluation method and microscope 失效
标题翻译：图像评估方法和显微镜
公开(公告)号：US07340111B2
公开(公告)日：2008-03-04
申请号：US11124252
申请日：2005-05-09
申请人： Tohru Ishitani , Mitsugu Sato , Hideo Todokoro , Tadashi Otaka , Takashi Iizumi , Atsushi Takane
发明人： Tohru Ishitani , Mitsugu Sato , Hideo Todokoro , Tadashi Otaka , Takashi Iizumi , Atsushi Takane
IPC分类号： G06K9/32
CPC分类号： H01J37/28 , H01J37/222 , H01J37/263 , H01J2237/2823
摘要： Image evaluation method capable of objectively evaluating the image resolution of a microscope image. An image resolution method is characterized in that resolution in partial regions of an image is obtained over an entire area of the image or a portion of the image, averaging is performed over the entire area of the image or the portion of the image, and the averaged value is established as the resolution evaluation value of the entire area of the image or the portion of the image. This method eliminates the subjective impressions of the evaluator from evaluation of microscope image resolution, so image resolution evaluation values of high accuracy and good repeatability can be obtained.
摘要翻译：能够客观评价显微镜图像的图像分辨率的图像评价方法。图像分辨方法的特征在于，在图像的整个区域或图像的一部分上获得图像的部分区域中的分辨率，在图像的整个区域或图像的整个区域上进行平均化，建立平均值作为图像的整个区域或图像的部分的分辨率评估值。该方法消除了评估者对显微镜图像分辨率评估的主观印象，因此可以获得高精度和良好重复性的图像分辨率评估值。

29. 发明申请

US20070029478A1 Method of forming a sample image and charged particle beam apparatus 失效
标题翻译：形成样品图像和带电粒子束装置的方法
公开(公告)号：US20070029478A1
公开(公告)日：2007-02-08
申请号：US11501229
申请日：2006-08-09
申请人： Mitsugu Sato , Atsushi Takane , Takashi Iizumi , Tadashi Otaka , Hideo Todokoro , Satoru Yamaguchi , Kazutaka Nimura
发明人： Mitsugu Sato , Atsushi Takane , Takashi Iizumi , Tadashi Otaka , Hideo Todokoro , Satoru Yamaguchi , Kazutaka Nimura
IPC分类号： G21K7/00
CPC分类号： H01J37/28 , G06T5/50 , G06T7/30 , G06T2207/10056 , H01J37/222 , H01J2237/221 , H01J2237/226
摘要： An object of the present invention is to provide a sample image forming method and a charged particle beam apparatus which are suitable for realizing suppressing of the view area displacement with high accuracy while the influence of charging due to irradiation of the charged particle beam is being suppressed. In order to attain the above object, the present invention provide a method of forming a sample image by scanning a charged particle beam on a sample and forming an image based on secondary signals emitted from the sample, the method comprising the steps of forming a plurality of composite images by superposing a plurality of images obtained by a plurality of scanning times; and forming a further composite image by correcting positional displacements among the plurality of composite images and superposing the plurality of composite images, and a charged particle beam apparatus for realizing the above method.
摘要翻译：本发明的目的是提供一种在抑制由于带电粒子束的照射引起的充电的影响被抑制的情况下，能够高精度地实现视区域位移的抑制的样本图像形成方法和带电粒子束装置。为了实现上述目的，本发明提供一种通过在样品上扫描带电粒子束并基于从样品发射的二次信号形成图像来形成样品图像的方法，该方法包括以下步骤：形成多个通过叠加通过多个扫描时间获得的多个图像的合成图像; 以及通过校正多个合成图像之间的位置偏移并叠加多个合成图像来形成另一个合成图像，以及用于实现上述方法的带电粒子束装置。

30. 发明授权

US07034296B2 Method of forming a sample image and charged particle beam apparatus 有权
公开(公告)号：US07034296B2
公开(公告)日：2006-04-25
申请号：US10239062
申请日：2001-11-21
申请人： Mitsugu Sato , Atsushi Takane , Takashi Iizumi , Tadashi Otaka , Hideo Todokoro , Satoru Yamaguchi , Kazutaka Nimura
发明人： Mitsugu Sato , Atsushi Takane , Takashi Iizumi , Tadashi Otaka , Hideo Todokoro , Satoru Yamaguchi , Kazutaka Nimura
IPC分类号： G21K7/00 , G01N23/00
CPC分类号： G01N23/22 , H01J37/222 , H01J37/28
摘要： An object of the present invention is to provide a sample image forming method and a charged particle beam apparatus which are suitable for realizing suppressing of the view area displacement with high accuracy while the influence of charging due to irradiation of the charged particle beam is being suppressed.In order to attain the above object, the present invention provide a method of forming a sample image by scanning a charged particle beam on a sample and forming an image based on secondary signals emitted from the sample, the method comprising the steps of forming a plurality of composite images by superposing a plurality of images obtained by a plurality of scanning times; and forming a further composite image by correcting positional displacements among the plurality of composite images and superposing the plurality of composite images, and a charged particle beam apparatus for realizing the above method.

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