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    • 22. 发明申请
    • Circuit board assembly
    • 电路板组装
    • US20090255721A1
    • 2009-10-15
    • US12081099
    • 2008-04-10
    • Wei-Cheng ChenCheng-Chao Liao
    • Wei-Cheng ChenCheng-Chao Liao
    • H05K1/11
    • H05K3/306H05K3/3405H05K3/3447H05K2201/09063H05K2201/10287H05K2201/10598H05K2201/10757
    • A circuit board assembly includes: a circuit board having opposite first and second surfaces and formed with a first through-hole defined by a hole-defining wall that extends between and that terminates at the first and second surfaces and that cooperates with the first and second surfaces to define first and second turns, respectively, the circuit board further having an abutting wall that extends between and that terminates at the first and second surfaces and that cooperates with the second surface to define a third turn; and an electric wire having a fixed end that is soldered to the circuit board, extending through the first through-hole, and passing over the first, second and third turns of the circuit board so as to form an inflection region between the first and second turns.
    • 电路板组件包括:具有相对的第一和第二表面的电路板,并形成有由孔限定壁限定的第一通孔,该第一通孔在第一和第二表面之间延伸并终止于第一和第二表面,并且与第一和第二表面配合 表面分别限定第一和第二匝,电路板还具有在第一和第二表面之间延伸并且终止于第一和第二表面的邻接壁,并且与第二表面配合以限定第三匝; 以及电线,其固定端焊接到所述电路板,延伸穿过所述第一通孔,并且越过所述电路板的所述第一,第二和第三匝,以在所述第一和第二通孔之间形成拐点区域 轮到
    • 25. 发明申请
    • WATERING CONTROL METHOD BY MONITORING SOIL MOISTURE
    • 监测土壤水分的水控制方法
    • US20150201570A1
    • 2015-07-23
    • US14336032
    • 2014-07-21
    • MOU-LI LINTA-CHI LIUWEI-CHENG CHEN
    • MOU-LI LINTA-CHI LIUWEI-CHENG CHEN
    • A01G25/16
    • A01G25/167Y10T137/0318
    • The invention provides a method of controlling watering by monitoring soil moisture, including the steps of: determining a control moisture and a measuring frequency; measuring a soil moisture according to the measuring frequency by a moisture sensor; implementing a watering process when the ratio of the soil moisture to the control moisture is lower than a first control value; implementing a waiting process after the watering process; measuring the soil moisture using the moisture sensor after finishing the waiting process; and implementing the step of measuring the soil moisture according to the measuring frequency by the moisture sensor when the ratio of the soil moisture to the control moisture is higher than a second control value, and implementing the watering process and the step of the waiting process when the ratio of the soil moisture to the control moisture is lower than the second control value.
    • 本发明提供了一种通过监测土壤水分来控制浇水的方法,包括以下步骤:确定控制水分和测量频率; 通过湿度传感器根据测量频率测量土壤水分; 当土壤水分与对照水分的比例低​​于第一控制值时,实施浇水过程; 在浇水过程后实施等待过程; 完成等待过程后,使用湿度传感器测量土壤水分; 并且当土壤水分与控制水分的比例高于第二控制值时,通过水分传感器实施根据测量频率测量土壤湿度的步骤,并且实施浇水过程和等待过程的步骤 土壤水分与对照水分的比例低​​于第二个控制值。
    • 27. 发明申请
    • VAPOR DEPOSITION APPARATUS AND SUSCEPTOR
    • 蒸气沉积装置和SUSCEPTOR
    • US20120017832A1
    • 2012-01-26
    • US13010598
    • 2011-01-20
    • Wei-Cheng CHENZong-Lin LeeKung-Ming LiangYung-Hsin Shie
    • Wei-Cheng CHENZong-Lin LeeKung-Ming LiangYung-Hsin Shie
    • C23C16/06C23C16/511C23C16/448
    • C23C16/4584
    • A vapor deposition apparatus includes a susceptor, a gas supply unit, a heating unit and a rotation unit. The susceptor has a first substrate-holding portion and a second substrate-holding portion. The first substrate-holding portion has a first depth, and the second substrate-holding portion has a second depth that is larger than the first depth. The gas supply unit supplies precursors to the susceptor. The heating unit is used to heat the susceptor. The rotation unit can rotate the susceptor so that the heating unit can uniformly heat the susceptor. Because the second depth is larger than the first depth, the substrate held in the second substrate-holding portion can not directly contact the susceptor with a higher temperature and thus its temperature is lower than the second substrate-holding portion, so as to maintain the uniformity of the properties of the manufactured chips.
    • 气相沉积设备包括基座,气体供应单元,加热单元和旋转单元。 基座具有第一基板保持部和第二基板保持部。 第一基板保持部分具有第一深度,并且第二基板保持部分具有大于第一深度的第二深度。 气体供应单元向基座提供前体。 加热单元用于加热基座。 旋转单元可以旋转基座,使得加热单元可以均匀地加热基座。 由于第二深度大于第一深度,所以保持在第二基板保持部中的基板不能与较高温度的基座直接接触,因此其温度低于第二基板保持部,以便保持 所制造的芯片的性能的均匀性。