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21. 发明授权

US08698998B2 Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device 有权
标题翻译：曝光装置，其清洁部件的方法，曝光装置的维护方法，维护装置及其制造方法
公开(公告)号：US08698998B2
公开(公告)日：2014-04-15
申请号：US11822964
申请日：2007-07-11
申请人： Hiroyuki Nagasaka , Kenichi Shiraishi , Soichi Owa , Shigeru Hirukawa
发明人： Hiroyuki Nagasaka , Kenichi Shiraishi , Soichi Owa , Shigeru Hirukawa
IPC分类号： G03B27/52 , G03B27/42 , G03B27/54 , G03B27/32 , G03F7/20
CPC分类号： G03F7/70925 , G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/7095 , G03F7/70958 , G03F7/70975
摘要： An exposure apparatus EXS forms an immersion area AR2 of a liquid LQ on the side of the image plane of a projection optical system PL and performs exposure of a substrate P via the projection optical system PL and the liquid LQ of the immersion region AR2. The exposure apparatus EXS has an optical cleaning unit (80) which irradiates a predetermined irradiation light Lu, having an optical cleaning effect, onto, for example, the upper surface (31) of the substrate stage PST which makes contact with the liquid LQ for forming the immersion area AR2. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region.
摘要翻译：曝光装置EXS在投影光学系统PL的像面一侧形成液体LQ的浸渍区域AR2，经由投影光学系统PL和浸渍区域AR2的液体LQ进行基板P的曝光。曝光装置EXS具有光学清洁单元（80），其将具有光学清洁效果的预定照射光Lu照射到例如与液体LQ接触的基板台PST的上表面（31）形成浸渍区域AR2。因此，可以防止由于与浸没区域中的液体接触的构件的污染导致的曝光精度和测量精度的劣化。

22. 发明授权

US08233133B2 Exposure method, exposure apparatus, and method for producing device 有权
标题翻译：曝光方法，曝光装置及其制造方法
公开(公告)号：US08233133B2
公开(公告)日：2012-07-31
申请号：US11312478
申请日：2005-12-21
申请人： Shigeru Hirukawa
发明人： Shigeru Hirukawa
IPC分类号： G03B27/52 , G03B27/42 , G03B27/58
CPC分类号： G03F7/70341 , G03F7/70258 , G03F7/70433 , G03F7/7085 , G03F7/70858 , G03F7/70875 , G03F7/70891
摘要： A liquid immersion photolithography system has an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. In addition, a plurality of nozzles are arranged so as to provide a substantially uniform velocity distribution of the liquid flow between the substrate and the projection optical system.
摘要翻译：液浸光刻系统具有用电磁辐射使基板曝光的曝光系统，并且包括将电磁辐射聚焦在基板上的投影光学系统。液体供应系统在投影光学系统和基板之间提供液体流动。此外，多个喷嘴被布置成在基板和投影光学系统之间提供基本均匀的液体流速分布。

23. 发明授权

US07713889B2 Substrate processing method, photomask manufacturing method, photomask, and device manufacturing method 有权
标题翻译：基板加工方法，光掩模制造方法，光掩模和器件制造方法
公开(公告)号：US07713889B2
公开(公告)日：2010-05-11
申请号：US11600151
申请日：2006-11-16
申请人： Shigeru Hirukawa
发明人： Shigeru Hirukawa
IPC分类号： H01L21/00
CPC分类号： G03F7/705 , G03F1/36 , G03F7/70108
摘要： A device linewidth characteristic is predicted based on a sharp-edged feature of a projected image of a predetermined pattern (steps 104 to 110), and an exposure condition of the pattern is adjusted based on the device linewidth characteristic that has been predicted (step 112). Then, exposure is performed under the adjusted exposure condition. That is, patterning of a resist on a substrate is performed with the projected image of the pattern (step 114). And, by developing the substrate after patterning, a resist pattern that satisfies a desired device linewidth characteristic is formed on the substrate. Accordingly, by performing etching of the substrate with the resist pattern serving as a mask, a pattern after etching can be formed with a desired linewidth.
摘要翻译：基于预定图案的投影图像的尖锐特征预测装置线宽特性（步骤104至110），并且基于已经预测的装置线宽特性来调整图案的曝光条件（步骤112 ）。然后，在调整后的曝光条件下进行曝光。也就是说，利用图案的投影图像来执行基板上的抗蚀剂的图案化（步骤114）。并且，通过在图案化之后显影衬底，在衬底上形成满足所需器件线宽特性的抗蚀剂图案。因此，通过用抗蚀剂图案作为掩模进行基板的蚀刻，可以以期望的线宽形成蚀刻后的图案。

24. 发明申请

US20090218653A1 Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device 有权
标题翻译：曝光装置，其清洁部件的方法，曝光装置的维护方法，维护装置及其制造方法
公开(公告)号：US20090218653A1
公开(公告)日：2009-09-03
申请号：US12453269
申请日：2009-05-05
申请人： Hiroyuki Nagasaka , Kenichi Shiraishi , Soichi Owa , Shigeru Hirukawa
发明人： Hiroyuki Nagasaka , Kenichi Shiraishi , Soichi Owa , Shigeru Hirukawa
IPC分类号： H01L35/00 , G03B27/52 , G03F7/20
CPC分类号： G03F7/70925 , G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/7095 , G03F7/70958 , G03F7/70975
摘要： A lithography apparatus includes a part having a photocatalytic coating. The lithography apparatus can be an extreme ultraviolet lithography apparatus or an immersion lithography apparatus.
摘要翻译：光刻设备包括具有光催化涂层的部件。光刻设备可以是极紫外光刻设备或浸没光刻设备。

25. 发明授权

US07505111B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07505111B2
公开(公告)日：2009-03-17
申请号：US11656550
申请日：2007-01-23
申请人： Shigeru Hirukawa , Issey Tanaka
发明人： Shigeru Hirukawa , Issey Tanaka
IPC分类号： G03B27/52 , G03B27/42 , G03B27/58
CPC分类号： G03F7/709 , G03F7/70341 , G03F7/70716
摘要： An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage on which the substrate is mounted that moves within a two-dimensional plane holding the substrate. The apparatus also includes a supply mechanism that supplies liquid to a predetermined spatial area which includes a space between the projection optical system and the substrate on the substrate stage, and an adjustment unit that adjusts exposure conditions based on temperature information on the liquid between the projection optical system and the substrate.
摘要翻译：曝光装置用能量束照射图案，并经由投影光学系统将图案转印到基板上。曝光装置包括：基板台，其上安装有基板，其在保持基板的二维平面内移动。该装置还包括供给机构，该供给机构将液体供给到包括投影光学系统与基板台之间的基板之间的空间的预定空间区域，以及调整单元，其基于温度信息调整曝光条件，光学系统和基板。

26. 发明申请

US20080151203A1 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20080151203A1
公开(公告)日：2008-06-26
申请号：US12010824
申请日：2008-01-30
申请人： Shigeru Hirukawa , Nobutaka Magome , Issey Tanaka
发明人： Shigeru Hirukawa , Nobutaka Magome , Issey Tanaka
IPC分类号： G03B27/52
CPC分类号： G03F7/709 , G03F7/70341 , G03F7/70716
摘要： An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage on which the substrate is mounted and that moves within a two-dimensional plane holding the substrate. A supply mechanism supplies liquid to a space between the projection optical system and the substrate on the substrate stage. A recovery mechanism recovers the liquid and an auxiliary recovery mechanism recovers the liquid which could not be recovered by the recovery mechanism.
摘要翻译：曝光装置用能量束照射图案，并经由投影光学系统将图案转印到基板上。曝光装置包括其上安装有基板并且在保持基板的二维平面内移动的基板台。供给机构将液体供给到基板台上的投影光学系统与基板之间的空间。回收机构回收液体，辅助回收机构回收回收机构无法回收的液体。

27. 发明授权

US07242455B2 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US07242455B2
公开(公告)日：2007-07-10
申请号：US11141518
申请日：2005-06-01
申请人： Masahiro Nei , Naoyuki Kobayashi , Hiroshi Chiba , Shigeru Hirukawa
发明人： Masahiro Nei , Naoyuki Kobayashi , Hiroshi Chiba , Shigeru Hirukawa
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F9/7019 , G03F7/70341 , G03F9/7011 , G03F9/7015 , G03F9/7034 , G03F9/7046 , G03F9/7088 , G03F9/7096
摘要： An exposure apparatus performs exposure for a substrate by filling a space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate through the liquid by using the projection optical system. The exposure apparatus includes a substrate stage for holding the substrate, a liquid supply unit for supplying the liquid to a side of an image plane of the projection optical system, and a focus/leveling-detecting system for detecting surface information about a surface of the substrate not through the liquid. The exposure apparatus performs liquid immersion exposure for the substrate while adjusting a positional relationship between the surface of the substrate and the image plane formed through the projection optical system and the liquid, on the basis of the surface information detected by the focus/leveling-detecting system. The liquid immersion exposure can be performed at a satisfactory pattern transfer accuracy.
摘要翻译：曝光装置通过用液体填充投影光学系统和基板之间的空间来对基板进行曝光，并且通过使用投影光学系统通过液体将图案的图像投影到基板上。曝光装置包括用于保持基板的基板台，用于将液体供给到投影光学系统的像面的一侧的液体供应单元，以及用于检测关于投影光学系统的表面的表面信息的聚焦/调平检测系统底物不通过液体。曝光装置在基于通过投影光学系统和液体形成的图像平面之间的位置关系的基础上，对基板进行液浸曝光，基于由聚焦/调平检测系统。可以以令人满意的图案转印精度进行液浸曝光。

28. 发明申请

US20070115447A1 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20070115447A1
公开(公告)日：2007-05-24
申请号：US11655083
申请日：2007-01-19
申请人： Shigeru Hirukawa , Nobutaka Magome , Issey Tanaka
发明人： Shigeru Hirukawa , Nobutaka Magome , Issey Tanaka
IPC分类号： G03B27/42
CPC分类号： G03F7/709 , G03F7/70341 , G03F7/70716
摘要： An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage on which the substrate is mounted and that moves within a two-dimensional plane holding the substrate. In addition, a supply mechanism supplies liquid to locally fill a space between the projection optical system and the substrate on the substrate stage with the liquid, and a recovery mechanism recovers the liquid. A plate is provided in at least a part of the periphery of a mounted area of the substrate on the substrate stage. The plate has a surface arranged at substantially the same height as a surface of the substrate mounted on the substrate stage.
摘要翻译：曝光装置用能量束照射图案，并经由投影光学系统将图案转印到基板上。曝光装置包括其上安装有基板并且在保持基板的二维平面内移动的基板台。此外，供给机构用液体供给液体以局部填充基板台上的投影光学系统与基板之间的空间，回收机构回收液体。在衬底台上的衬底的安装区域的周边的至少一部分中设置有板。板具有布置成与安装在基板台上的基板的表面基本相同的高度的表面。

29. 发明申请

US20060250596A1 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US20060250596A1
公开(公告)日：2006-11-09
申请号：US11482153
申请日：2006-07-07
申请人： Masahiro Nei , Naoyuki Kobayashi , Hiroshi Chiba , Shigeru Hirukawa
发明人： Masahiro Nei , Naoyuki Kobayashi , Hiroshi Chiba , Shigeru Hirukawa
IPC分类号： G03B27/42
CPC分类号： G03F9/7019 , G03F7/70341 , G03F9/7011 , G03F9/7015 , G03F9/7034 , G03F9/7046 , G03F9/7088 , G03F9/7096
摘要： An exposure apparatus includes a projection optical system for projecting a pattern on a reticle onto an object to be exposed. The apparatus also includes a reference mark that serves as a reference for an alignment between the reticle and the object. The apparatus also includes a first fluid that has a refractive index of 1 or greater, and fills a space between at least part of said projection optical system and the object and a space between at least part of said projection optical system and the reference mark. In addition, an alignment mechanism aligns the object by using said projection optical system and the first fluid.
摘要翻译：曝光装置包括投影光学系统，用于将掩模版上的图案投影到待曝光的物体上。该装置还包括参考标记，其用作参考标号和对象之间的对准。该装置还包括折射率为1或更大的第一流体，并且填充所述投影光学系统的至少一部分与物体之间的空间以及至少部分所述投影光学系统与参考标记之间的空间。此外，对准机构通过使用所述投影光学系统和第一流体来对准物体。

30. 发明申请

US20050206850A1 Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium 有权
标题翻译：图像形成状态调整系统，曝光方法和曝光装置以及程序和信息存储介质
公开(公告)号：US20050206850A1
公开(公告)日：2005-09-22
申请号：US10901209
申请日：2004-07-29
申请人： Yasuo Shimizu , Shigeru Hirukawa , Kousuke Suzuki , Tomoyuki Matsuyama
发明人： Yasuo Shimizu , Shigeru Hirukawa , Kousuke Suzuki , Tomoyuki Matsuyama
IPC分类号： G03B21/18 , G03F7/20
CPC分类号： G03B21/18 , G03B27/42 , G03F7/70258 , G03F7/705 , G03F7/70508 , G03F7/70525 , G03F7/706
摘要： A second communications server obtains adjustment information of an adjustment unit in an exposure apparatus and information related to image forming quality (such as wavefront aberration) of a projection optical system under an exposure condition that serves as a reference, via a first communications server, and then calculates an optimal adjustment amount of the adjustment unit under a target exposure condition based on the information. In addition, the second communications server obtains adjustment information of the adjustment and actual measurement data of image forming quality of the projection optical system via the first communications server, and then calculates the optimal adjustment amount of the adjustment unit under the target exposure condition based on the information. And, the second communications server controls the adjustment unit in the exposure apparatus via the first communications server, based on the calculations results.
摘要翻译：第二通信服务器经由第一通信服务器获取曝光装置中的调整单元的调整信息和与投影光学系统的图像形成质量（例如波前像差）有关的曝光条件下的调整信息，以及然后基于该信息计算目标曝光条件下的调整单元的最佳调整量。此外，第二通信服务器经由第一通信服务器获取投影光学系统的图像形成质量的调整和实际测量数据的调整信息，然后基于目标曝光条件计算调整单元的最佳调整量信息。并且，第二通信服务器基于计算结果经由第一通信服务器控制曝光装置中的调整单元。

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