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    • 23. 发明授权
    • Ultra low contact area end effector
    • 超低接触面末端执行器
    • US07293811B2
    • 2007-11-13
    • US11404536
    • 2006-04-14
    • Anthony C. BonoraRoger G. Hine
    • Anthony C. BonoraRoger G. Hine
    • A47J45/00
    • H01L21/6838H01L21/68707Y10S414/141
    • The present invention comprises a vacuum end effector having workpiece supports that work in conjunction with distorted workpiece surfaces. In one embodiment, each workpiece support has the ability to gimbal and conform the workpiece surface in contact with an outer edge of the support. Each workpiece support preferably provides a knife-like contact edge to minimize the contact area between the support and the workpiece while still providing an effective vacuum area to hold the wafer securely on the support. In another embodiment, each workpiece support is replaceable without having to remove the end effector from the robot assembly
    • 本发明包括具有工件支撑件的真空端部执行器,其与变形的工件表面一起工作。 在一个实施例中,每个工件支撑件具有万向架和使工件表面与支撑件的外边缘接触的能力。 每个工件支撑件优选地提供刀形接触边缘以最小化支撑件和工件之间的接触面积,同时仍然提供有效的真空区域以将晶片牢固地保持在支撑件上。 在另一个实施例中,每个工件支撑件是可更换的,而不必从机器人组件移除端部执行器
    • 24. 发明授权
    • Active edge grip rest pad
    • 主动边缘抓地垫
    • US07290813B2
    • 2007-11-06
    • US11014401
    • 2004-12-16
    • Anthony C. BonoraRoger G. HineD. Wayne Nobles, Jr.Norma B. Riley
    • Anthony C. BonoraRoger G. HineD. Wayne Nobles, Jr.Norma B. Riley
    • B65G49/07
    • H01L21/68707Y10S294/902Y10S414/141
    • The present invention comprises a distal rest pad for supporting a portion of a wafer seated on an end effector. In one embodiment, the rest pad includes a bottom support pad and an edge stop. Each element is mounted separately to the distal end of a support plate. The bottom support pad includes an inclined surface that transitions to a substantially horizontal surface at its distal end. The edge stop has a substantially vertical wafer contact surface that the peripheral edge of a wafer eventually contacts as the wafer is urged towards the distal rest pad. In another embodiment, the bottom support pad comprises an inclined surface. In yet another embodiment, the distal rest pad comprises a single structure. This distal rest pad includes a backstop portion and a bottom support separated by a particle collection groove. The bottom support may include an inclined lead-in surface that transitions into a flat contact surface or only comprise an inclined lead-in surface.
    • 本发明包括用于支撑位于末端执行器上的晶片的一部分的远端休息垫。 在一个实施例中,休息垫包括底部支撑垫和边缘止动件。 每个元件分别安装到支撑板的远端。 底部支撑垫包括在其远端处转变到基本水平的表面的倾斜表面。 边缘止动器具有基本垂直的晶片接触表面,当晶片被推向远侧支撑垫时,晶片的周边边缘最终接触。 在另一个实施例中,底部支撑垫包括倾斜表面。 在另一个实施例中,远侧支撑垫包括单个结构。 该远端休息垫包括由颗粒收集槽分隔的止挡部分和底部支撑件。 底部支撑件可以包括倾斜的导入表面,其转变成平坦的接触表面或仅包括倾斜的导入表面。