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    • 29. 发明申请
    • Processing chamber with wave reflector
    • 带反射镜的加工室
    • US20060032447A1
    • 2006-02-16
    • US11074632
    • 2005-03-09
    • Ping-Yin LiuMing-Fong ChenHung-Yin Tsai
    • Ping-Yin LiuMing-Fong ChenHung-Yin Tsai
    • C23C16/00
    • C23C16/274C23C16/482C23C16/511C23C16/52
    • The processing chamber comprises an energy wave source and a curved spherical surface, wherein the curved spherical surface of the chamber is composed of at least a Fresnel reflector for reflecting the energy wave discharged from the energy wave source and projecting the same onto a platform as the energy wave source is operating in coordination with the curved spherical surface. In addition, the energy wave source can be a microwave source or a light source. It is noted that the curved spherical surface can be a Fresnel reflector, a wave spherical surface with a portion thereof being replaced by a Fresnel reflector, a curved spherical surface with a portion therof being replaced by at least two Fresnel reflectors, and a surface entirely formed of a plurality of Fresnel reflectors. The processing chamber disclosed in the present invention significantly increases energy density, area, and energy uniformity of the projection region so as to diminish required space of equipment and costs of equipment and manufacture.
    • 所述处理室包括能量波源和弯曲球形表面,其中所述腔室的弯曲球形表面由至少一个菲涅尔反射器组成,用于反射从能量波源放出的能量波,并将其投射到平台上作为 能量波源与曲面球面协调工作。 此外,能量波源可以是微波源或光源。 要注意的是,弯曲的球面可以是菲涅耳反射器,波面球形表面的一部分被菲涅耳反射器代替,弯曲的球形表面具有由至少两个菲涅尔反射器代替的部分,并且完全表面的表面 由多个菲涅耳反射器形成。 本发明公开的处理室显着地增加了投影区域的能量密度,面积和能量均匀性,从而减少了设备所需的空间和设备和制造成本。