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    • 21. 发明申请
    • VOLUME-BASED DISPENSING CONTROL METHOD
    • 基于体积分配控制方法
    • US20100327468A1
    • 2010-12-30
    • US12650685
    • 2009-12-31
    • Ki Man YANG
    • Ki Man YANG
    • B29D11/00
    • B29D11/00634B29D11/00807H01L2224/48091H01L2924/00014
    • A volume-based dispensing control method is capable of enabling a pump to dispense a resin with greatly increased accuracy. The method includes: a preliminary dispensing step in which a resin is dispensed on one or more workpieces with a pump; a volume measuring step in which the workpieces passed through the preliminary dispensing step is scanned by an optical scanner to measure a dispensed resin volume; a corrected-volume calculating step in which a corrected volume of the resin to be additionally dispensed is calculated by using a difference between the dispensed resin volume measured in the volume measuring step and a predetermined dispensing volume; and a corrective dispensing step in which the resin is dispensed on the workpieces in light of the corrected volume calculated in the corrected-volume calculating step.
    • 基于体积的分配控制方法能够使泵以大大提高的精度来分配树脂。 该方法包括:初步分配步骤,其中用泵将树脂分配在一个或多个工件上; 体积测量步骤,其中通过预分配步骤的工件通过光学扫描仪扫描以测量分配的树脂体积; 校正体积计算步骤,其中通过使用在体积测量步骤中测量的分配树脂体积与预定分配体积之间的差来计算要额外分配的树脂的校正体积; 以及校正分注步骤,其中根据在校正量计算步骤中计算出的校正容积将树脂分配在工件上。
    • 23. 发明授权
    • Preparing method of silica slurry for wafer polishing
    • 二氧化硅浆料的制备方法用于晶片抛光
    • US06432151B1
    • 2002-08-13
    • US09644018
    • 2000-08-22
    • Jae Hyun SoMin Ho OhSun Hyuck BaeSeung Man YangDo Hyun Kim
    • Jae Hyun SoMin Ho OhSun Hyuck BaeSeung Man YangDo Hyun Kim
    • C09K314
    • C09K3/1463C01B33/126C09G1/02
    • Disclosed herein is a method of preparing silica slurry for wafer polishing. This method includes pre-treating relatively inexpensive and commercially available fumed or colloidal silica particles as a seed by a settling, a crushing using a ball mill and a paint shaker, and a sonication to produce an aqueous dispersion of the silica particles. The pre-treated silica particles are then combined with tetraethylorothosilicate as a precursor, an alcohol solvent and a base, and grown to a desired size by hydrolysis and polycondensation of the precursor, tetraethylorothosilicate. Then, the alcohol solvent, in which the silica particles are grown, are displaced with water by a vacuum distillation. The resulting aqueous dispersion of the grown silica dispersion is hydrothermally treated in an autoclave. Thus, this method allows the economical preparation of the spherical silica particles having a highly uniform size and a very high purity.
    • 本文公开了一种制备用于晶片抛光的二氧化硅浆料的方法。 该方法包括通过沉降,使用球磨机和油漆搅拌器进行粉碎,超声处理来预处理比较廉价且市售的热解法或胶态二氧化硅颗粒作为种子,以产生二氧化硅颗粒的水分散体。 然后将经预处理的二氧化硅颗粒与作为前体的四乙基偏硅酸盐,醇溶剂和碱组合,并通过前体四乙基硅酸酯的水解和缩聚生长至所需尺寸。 然后,通过真空蒸馏,用水代替生成二氧化硅颗粒的醇溶剂。 将生成的二氧化硅分散体的所得水分散体在高压釜中进行水热处理。 因此,该方法允许经济地制备具有高度均匀尺寸和非常高纯度的球形二氧化硅颗粒。