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21. 发明申请

US20120003585A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION 审中-公开
标题翻译：丙酰胺或辐射敏感性树脂组合物和使用组合物形成图案的方法
公开(公告)号：US20120003585A1
公开(公告)日：2012-01-05
申请号：US13256167
申请日：2010-03-12
申请人： Hideaki Tsubaki , Koji Shirakawa , Tadateru Yatsuo , Toru Tsuchihashi , Tomotaka Tsuchimura
发明人： Hideaki Tsubaki , Koji Shirakawa , Tadateru Yatsuo , Toru Tsuchihashi , Tomotaka Tsuchimura
IPC分类号： G03F7/039 , G03F7/20 , H01L21/02 , G03F7/32
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0046
摘要： According to one embodiment, an actinic-ray- or radiation-sensitive resin composition comprises (A) any of the compounds of General Formula (I) below and (B) a resin that contains the residue (c) of a compound having an ionization potential value lower than that of phenol and when acted on by an acid, exhibits an increased solubility in an alkali developer, wherein Ar represents an aromatic ring having Cy groups and optionally further other substituents, n is an integer of 2 or greater, Cy represents a group having a substituted or unsubstituted alkyl group or a group having a substituted or unsubstituted cycloaliphatic group, provided that a plurality of Cy groups may be identical with or different from each other, and M+ represents an organic onium ion.
摘要翻译：根据一个实施方案，光化射线或辐射敏感性树脂组合物包含（A）下述通式（I）的任何化合物和（B）含有具有电离的化合物的残基（c）的树脂电位值低于苯酚，当用酸作用时，在碱性显影剂中表现出增加的溶解度，其中Ar表示具有Cy基团和任选进一步其它取代基的芳环，n表示2以上的整数，Cy表示具有取代或未取代的烷基的基团或具有取代或未取代的脂环族基团的基团，条件是多个Cy基团可以彼此相同或不同，M +表示有机鎓离子。

22. 发明授权

US08080362B2 Positive resist composition 有权
标题翻译：正抗蚀剂组成
公开(公告)号：US08080362B2
公开(公告)日：2011-12-20
申请号：US11926479
申请日：2007-10-29
申请人： Koji Shirakawa , Toru Fujimori , Shoichiro Yasunami
发明人： Koji Shirakawa , Toru Fujimori , Shoichiro Yasunami
IPC分类号： G03C1/00 , G03F7/00 , H01L21/00
CPC分类号： G03F7/0392 , G03F7/0397 , Y10S430/122
摘要： A positive resist composition comprising (a) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, contains a structural unit having a group represented by formula (X) defined in the specification, has a weight average molecular weight of not more than 5,000, and contains an acid decomposable group in an amount of not more than 40% based on the sum total of a number of the acid decomposable group and a number of an alkali-soluble group not protected with the acid decomposable group, and (b) a compound that generates an acid upon irradiation of an actinic ray or radiation.
摘要翻译：一种正型抗蚀剂组合物，其包含（a）通过酸的作用而分解以增加在碱性显影液中的溶解度的树脂，含有具有本说明书中定义的由式（X）表示的基团的结构单元，其重均分子量分子量不大于5000，并且基于酸分解基团的数量和未被酸保护的碱可溶性基团的总数，含有不大于40％的酸分解基团可分解基团，和（b）在光化射线或辐射照射时产生酸的化合物。

23. 发明申请

US20110300485A1 ORGANIC SOLVENT DEVELOPMENT OR MULTIPLE DEVELOPMENT PATTERN-FORMING METHOD USING ELECTRON BEAMS OR EUV RAYS 有权
标题翻译：有机溶剂开发或使用电子束或EUV的多种开发方法
公开(公告)号：US20110300485A1
公开(公告)日：2011-12-08
申请号：US13202389
申请日：2010-02-19
申请人： Hideaki Tsubaki , Koji Shirakawa , Toru Tsuchihashi
发明人： Hideaki Tsubaki , Koji Shirakawa , Toru Tsuchihashi
IPC分类号： G03F7/20
CPC分类号： G03F7/325 , G03F7/0392 , G03F7/0397 , G03F7/322
摘要： Provided is a pattern-forming method including, in the following order: (1) a process of forming a film with an actinic ray-sensitive or radiation-sensitive resin composition comprising a resin which contains an acid-decomposable repeating unit and is capable of decreasing the solubility in an organic solvent by the action of an acid; (2) a process of exposing the film with an electron beam or an EUV ray; and (4) a process of developing the film with a developer containing an organic solvent.
摘要翻译：提供了一种图案形成方法，其包括以下顺序：（1）用含有光敏性或辐射敏感性树脂组合物形成膜的方法，所述树脂组合物包含含有酸可分解重复单元的树脂，并且能够通过酸的作用降低有机溶剂中的溶解度; （2）用电子束或EUV射线曝光胶片的方法; 和（4）用含有机溶剂的显影剂显影该膜的方法。

24. 发明授权

US07432034B2 Negative resist composition 有权
标题翻译：负阻抗组成
公开(公告)号：US07432034B2
公开(公告)日：2008-10-07
申请号：US10642291
申请日：2003-08-18
申请人： Shoichiro Yasunami , Koji Shirakawa
发明人： Shoichiro Yasunami , Koji Shirakawa
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0382 , Y10S430/106 , Y10S430/111
摘要： A negative resist composition of the present invention comprises: (A) an alkali-soluble resin; (B-1) a cross-linking agent capable of cross-linking with the alkali-soluble resin (A) by the action of an acid, in which the cross-linking agent is a phenol compound containing: in the molecule one or more benzene rings; and at least two cross-linking groups bonded to any of the benzene rings, the cross-linking group being a group selected from the group consisting of a hydroxymethyl group, an alkoxymethyl group and an acyloxymethyl group; (B-2) a cross-linking agent capable of cross-linking with the alkali-soluble resin (A) by the action of an acid, in which the cross-linking agent contains at least two specific groups; and (C) a compound capable of generating an acid upon irradiation with an actinic ray or radiation.
摘要翻译：本发明的负光刻胶组合物包含：（A）碱溶性树脂; （B-1）能够通过酸的作用与碱溶性树脂（A）交联的交联剂，其中交联剂是酚化合物，其在分子中含有一个或多个苯环; 和至少两个与任何苯环结合的交联基团，所述交联基团是选自羟甲基，烷氧基甲基和酰氧基甲基的基团; （B-2）能够通过酸的作用与碱溶性树脂（A）交联的交联剂，其中交联剂含有至少两个特定基团; 和（C）能够在用光化射线或辐射照射时能产生酸的化合物。

25. 发明授权

US07326513B2 Positive working resist composition 有权
标题翻译：积极的工作抗拒组成
公开(公告)号：US07326513B2
公开(公告)日：2008-02-05
申请号：US10791559
申请日：2004-03-03
申请人： Shoichiro Yasunami , Koji Shirakawa , Kazuyoshi Mizutani
发明人： Shoichiro Yasunami , Koji Shirakawa , Kazuyoshi Mizutani
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/0392 , G03F7/0045
摘要： A positive working resist composition comprising (A1) a resin containing a repeating unit represented by formula (1) defined in the specification and a repeating unit represented by formula (2) defined in the specification and having a property of being insoluble or sparingly soluble in an alkali developing solution and becoming soluble in an alkali developing solution by the action of an acid, and (B) a compound capable of generating sulfonic acid upon irradiation with active rays or radiations in an amount of from 5 to 20% by weight based on the total solid content of the positive working resist composition.
摘要翻译：一种正性抗蚀剂组合物，其包含（A1）含有本说明书中定义的式（1）表示的重复单元的树脂和由说明书中定义的式（2）表示的重复单元，并且具有不溶或微溶于碱显影液，通过酸的作用变得可溶于碱性显影液，（B）以活性射线或辐射照射时能够产生磺酸的化合物的量为5〜20重量％，基于正性抗蚀剂组合物的总固体含量。

26. 发明授权

US06727040B2 Positive resist composition to be irradiated with one of an electron beam and X-ray 有权
标题翻译：要用电子束和X射线之一照射正电子抗蚀剂组合物
公开(公告)号：US06727040B2
公开(公告)日：2004-04-27
申请号：US10024358
申请日：2001-12-21
申请人： Tomoya Sasaki , Kazuyoshi Mizutani , Koji Shirakawa
发明人： Tomoya Sasaki , Kazuyoshi Mizutani , Koji Shirakawa
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/115 , Y10S430/143 , Y10S430/167
摘要： A positive resist composition to be irradiated with one of an electron beam and X-ray, comprises: (a) a compound capable of generating an acid upon irradiation with one of electron beam and X-ray; (b1) a resin: increasing the solubility in an alkali developer by the action of an acid; and having a group capable of leaving by the action of an acid, in which the leaving group includes a residue of a compound, the compound having a smaller ionization potential value than p-ethylphenol; and (c) a solvent.
摘要翻译：用电子束和X射线之一照射的正性抗蚀剂组合物包括：（a）在用电子束和X射线之一照射时能够产生酸的化合物; （b1）树脂：通过酸的作用增加在碱性显影剂中的溶解度; 并且具有能够通过酸的作用离开的基团，其中离去基团包括化合物的残基，具有比对乙基苯酚更小的电离电位值的化合物; 和（c）溶剂。

27. 发明授权

US5639587A Positive photoresist composition containing alkali soluble resins and quinonediazide ester mixture 失效
标题翻译：含有碱溶性树脂和醌二叠氮化物酯混合物的正性光致抗蚀剂组合物
公开(公告)号：US5639587A
公开(公告)日：1997-06-17
申请号：US615832
申请日：1996-03-14
申请人： Kenichiro Sato , Koji Shirakawa , Shinji Sakaguchi
发明人： Kenichiro Sato , Koji Shirakawa , Shinji Sakaguchi
IPC分类号： G03F7/022 , H01L21/027 , G03F7/023
CPC分类号： G03F7/022
摘要： A positive photoresist composition is disclosed, which comprises an alkali-soluble resin, at least one of 1,2-naphthoquinonediazidesulfonic monoesters of specific polyhydroxy compounds, and at least one of 1,2-naphthoquinonediazidesulfonic ester of specific polyhydroxy compounds. The positive photoresist composition exhibits remarkably improved sensitivity and resolution, and broad development latitude regardless of the film thickness, and further, low film thickness dependence of resist performances.
摘要翻译：公开了一种正性光致抗蚀剂组合物，其包含碱溶性树脂，特定多羟基化合物的1,2-萘醌二叠氮化物磺酸单酯中的至少一种和特定多羟基化合物的1,2-萘醌二叠氮化物磺酸酯中的至少一种。正光致抗蚀剂组合物显示出显着提高的灵敏度和分辨率，并且广泛的开发纬度，而不管膜厚度如何，以及抗蚀剂性能的低膜厚依赖性。

28. 发明申请

US20120094235A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION 审中-公开
标题翻译：丙酰胺或辐射敏感性树脂组合物和使用组合物形成图案的方法
公开(公告)号：US20120094235A1
公开(公告)日：2012-04-19
申请号：US13320116
申请日：2010-05-20
申请人： Toru Tsuchihashi , Hideaki Tsubaki , Koji Shirakawa , Hidenori Takahashi , Tomotaka Tsuchimura
发明人： Toru Tsuchihashi , Hideaki Tsubaki , Koji Shirakawa , Hidenori Takahashi , Tomotaka Tsuchimura
IPC分类号： G03F7/20 , G03F7/027
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin (A) whose solubility in an alkali developer is increased by the action of an acid, the resin containing any of the units of general formula (AI) below and any of the units of general formula (AII) below, and a compound (B) that when exposed to actinic rays or radiation, generates an acid with any of the structures of general formula (BI) below.
摘要翻译：根据一个实施方案，光化射线或辐射敏感性树脂组合物包括其在碱性显影剂中的溶解度通过酸的作用而增加的树脂（A），所述树脂包含任何通式（AI）的单元，和下述通式（AII）的任何单元和当暴露于光化射线或辐射时产生具有以下通式（BI）的任何结构的酸的化合物（B）。

29. 发明授权

US07361446B2 Positive resist composition 有权
标题翻译：正抗蚀剂组成
公开(公告)号：US07361446B2
公开(公告)日：2008-04-22
申请号：US10812074
申请日：2004-03-30
申请人： Koji Shirakawa , Toru Fujimori , Shoichiro Yasunami
发明人： Koji Shirakawa , Toru Fujimori , Shoichiro Yasunami
IPC分类号： G03C1/73 , G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0392 , G03F7/0397 , Y10S430/122
摘要： A positive resist composition comprising (a) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, contains a structural unit having a group represented by formula (X) defined in the specification, has a weight average molecular weight of not more than 5,000, and contains an acid decomposable group in an amount of not more than 40% based on the sum total of a number of the acid decomposable group and a number of an alkali-soluble group not protected with the acid decomposable group, and (b) a compound that generates an acid upon irradiation of an actinic ray or radiation.
摘要翻译：一种正型抗蚀剂组合物，其包含（a）通过酸的作用而分解以增加在碱性显影液中的溶解度的树脂，含有具有本说明书中定义的由式（X）表示的基团的结构单元，其重均分子量分子量不大于5000，并且基于酸分解基团的数量和未被酸保护的碱可溶性基团的总数，含有不大于40％的酸分解基团可分解基团，和（b）在光化射线或辐射照射时产生酸的化合物。

30. 发明授权

US06746813B2 Negative resist composition 有权
标题翻译：负阻抗组成
公开(公告)号：US06746813B2
公开(公告)日：2004-06-08
申请号：US10396583
申请日：2003-03-26
申请人： Shoichiro Yasunami , Yutaka Adegawa , Koji Shirakawa
发明人： Shoichiro Yasunami , Yutaka Adegawa , Koji Shirakawa
IPC分类号： G03F7004
CPC分类号： G03F7/0382 , Y10S430/106
摘要： A negative resist composition comprising (A-1) an alkali-soluble resin containing a repeating unit represented by formula (1) defined in the specification, (A-2) an alkali-soluble resin containing a repeating unit represented by formula (2) defined in the specification, (B) a crosslinking agent crosslinking with the alkali-soluble resin (A-1) or (A-2) by the action of an acid, (C) a compound that generates an acid upon irradiation of an actinic ray or radiation, and (D) a nitrogen-containing basic compound.
摘要翻译：一种负型抗蚀剂组合物，其包含（A-1）含有本说明书中定义的式（1）表示的重复单元的碱溶性树脂（A-2）含有式（2）表示的重复单元的碱溶性树脂，（B）通过酸的作用与碱溶性树脂（A-1）或（A-2）交联的交联剂，（C）在光化反应下产生酸的化合物射线或辐射，和（D）含氮碱性化合物。

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