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21. 发明申请

US20060098183A1 Exposure system, test mask for monitoring polarization, and method for monitoring polarization 失效
标题翻译：曝光系统，用于监测极化的测试掩模，以及监测极化的方法
公开(公告)号：US20060098183A1
公开(公告)日：2006-05-11
申请号：US11267103
申请日：2005-11-07
申请人： Takashi Sato , Kazuya Fukuhara , Keita Asanuma
发明人： Takashi Sato , Kazuya Fukuhara , Keita Asanuma
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03F1/44 , H01L21/0271
摘要： An exposure system includes an exposure tool configured to project grating patterns oriented in different directions onto test areas by a linearly polarized light, respectively, each of the grating patterns having a space width preventing higher order diffracted lights from an image formation, a data collector configured to collect sets of test optical intensity data on the test areas, and a polarization direction monitor configured to monitor a polarization direction of the linearly polarized light by comparing the sets of the test optical intensity data.
摘要翻译：曝光系统包括：曝光工具，被配置为将通过线性偏振光将不同方向的光栅图案定向到测试区域，每个光栅图案具有防止来自图像形成的较高阶衍射光的空间宽度，数据收集器配置以在测试区域上收集测试光强度数据集;以及偏振方向监视器，被配置为通过比较测试光强数据的集合来监视线偏振光的偏振方向。

22. 发明申请

US20050275820A1 Method for evaluating a local flare, correction method for a mask pattern, manufacturing method for a semiconductor device and a computer program product 有权
标题翻译：用于评估局部耀斑的方法，掩模图案的校正方法，半导体器件的制造方法和计算机程序产品
公开(公告)号：US20050275820A1
公开(公告)日：2005-12-15
申请号：US11136404
申请日：2005-05-25
申请人： Kazuya Fukuhara , Satoshi Tanaka , Kenji Chiba , Kei Hayasaki , Kenji Kawano
发明人： Kazuya Fukuhara , Satoshi Tanaka , Kenji Chiba , Kei Hayasaki , Kenji Kawano
IPC分类号： G03B27/72 , G03F1/36 , G03F1/84 , H01L21/027
CPC分类号： G03B27/72
摘要： A method for evaluating a local flare in an exposure tool, includes: measuring a projection light intensity distribution by transferring a monitor mask pattern onto a semiconductor substrate; calculating a first ratio between an illumination light intensity on the monitor mask pattern and a first projection light intensity calculated based on the monitor mask pattern; calculating a distribution function of a local flare, due to a mask pattern coverage of the monitor mask pattern, based on the first ratio and the projection light intensity distribution; dividing a design mask pattern into a plurality of unit areas; calculating a second ratio between the illumination light intensity on each of the unit areas and a second projection light intensity calculated based on the design mask pattern; and calculating a local flare intensity in each of the unit areas, based on the second ratio and the distribution function.
摘要翻译：一种用于评估曝光工具中的局部耀斑的方法，包括：通过将监视器掩模图案转移到半导体衬底上来测量投影光强度分布; 计算监视器掩模图案上的照明光强度与基于监视器掩模图案计算的第一投影光强度之间的第一比率; 基于第一比率和投影光强度分布，计算由于监视器掩模图案的掩模图案覆盖而导致的局部光晕的分布函数; 将设计掩模图案分割成多个单位区域; 计算每个单位区域上的照明光强度和基于设计掩模图案计算的第二投影光强度之间的第二比率; 以及基于第二比率和分布函数计算每个单位区域中的局部火炬强度。

23. 发明授权

US06930757B2 Managing method of exposure apparatus, managing method of mask, exposure method, and manufacturing method of semiconductor device 失效
标题翻译：曝光装置的管理方法，掩模的管理方法，曝光方法以及半导体器件的制造方法
公开(公告)号：US06930757B2
公开(公告)日：2005-08-16
申请号：US10636613
申请日：2003-08-08
申请人： Takashi Sato , Kazuya Fukuhara
发明人： Takashi Sato , Kazuya Fukuhara
IPC分类号： G03F7/20 , G03B27/32 , H01L21/027 , G03B27/42
CPC分类号： G03B27/32 , G03F7/70525
摘要： There is disclosed a managing method of an exposure apparatus comprising selecting one or more exposure apparatuses out of a plurality of the exposure apparatuses for each a predetermined partial exposure area, whose dimensional differences of each an exposed pattern among the exposure apparatuses are within a predetermined permissible range in each the predetermined partial exposure area in a whole of an exposure area which is the exposed patterns are transferred using the exposure apparatuses, and managing the exposure apparatuses which are selected for each the predetermined partial exposure area, as a group of the exposure apparatuses, by grouping the exposure apparatuses for each the predetermined partial exposure area.
摘要翻译：公开了一种曝光装置的管理方法，包括：对于每个曝光装置中的每个曝光图案的尺寸差在预定的允许范围内的预定部分曝光区域，从多个曝光装置中选择一个或多个曝光装置作为曝光图案的一组，将曝光图案的曝光区域的整体曝光区域中的每个预定部分曝光区域的范围作为一组曝光装置进行曝光，并对每个规定的部分曝光区域进行选择的曝光装置的管理通过对每个预定的部分曝光区域分组曝光装置。

24. 发明申请

US20050099613A1 Mask for inspecting an exposure apparatus, a method of inspecting an exposure apparatus, and an exposure apparatus 失效
标题翻译：用于检查曝光装置的掩模，曝光装置的检查方法和曝光装置
公开(公告)号：US20050099613A1
公开(公告)日：2005-05-12
申请号：US10958594
申请日：2004-10-06
申请人： Kazuya Fukuhara
发明人： Kazuya Fukuhara
IPC分类号： C01B33/18 , C01F7/02 , C08K7/18 , C08L101/00 , C09K5/08 , G03B27/42 , G03F1/00 , G03F1/68 , G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F7/70125 , G03F1/44 , G03F7/70566 , G03F7/70591 , G03F7/70616
摘要： To inspect the polarization state of light flux for exposure of an exposure apparatus, a mask for inspection is held at the photomask position. This mask for inspection comprises a polarizing element which is disposed in a light path of light flux forming an image of a light source and which can selectively transmit light flux with a plurality of polarization directions.
摘要翻译：为了检查用于曝光装置曝光的光束的偏振状态，在光掩模位置处保持用于检查的掩模。该用于检查的掩模包括偏振元件，其设置在形成光源的图像的光束的光路中，并且可以选择性地透射具有多个偏振方向的光通量。

25. 发明申请

US20130217155A1 PATTERN FORMING METHOD, PATTERN FORMING APPARATUS, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 有权
标题翻译：图案形成方法，图案形成装置及制造半导体装置的方法
公开(公告)号：US20130217155A1
公开(公告)日：2013-08-22
申请号：US13607504
申请日：2012-09-07
申请人： Kazuya Fukuhara , Masayuki Hatano
发明人： Kazuya Fukuhara , Masayuki Hatano
IPC分类号： B05D3/00 , H01L21/31 , C23C16/52
CPC分类号： B29C43/021 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/565 , H01L2924/0002 , H01L2924/00
摘要： According to one embodiment, a pattern forming method using a template containing a pattern that has at least one recess section or protrusion section to transfer the shape of the pattern to a resin layer on a substrate, is provided. The method includes a process for coating the resin on the substrate, a process for making the hardness of the first portion as a portion of the resin higher than the hardness of the second portion as the portion other than the first portion, and a process in which the portion other than the pattern of the template makes contact with the first portion, in a state where a gap is maintained between the template and the resin, the shape of the pattern is transferred to the second portion, and the resin is cured. Embodiments of an apparatus for pattern forming are also provided.
摘要翻译：根据一个实施例，提供一种使用包含具有至少一个凹部或突起部的图案的模板的图案形成方法，以将图案的形状转印到基板上的树脂层。该方法包括在基板上涂布树脂的方法，使作为树脂部分的第一部分的硬度高于作为第一部分以外的部分的第二部分的硬度的方法，以及在模板和树脂之间保持间隙的状态下，模板图案之外的部分与第一部分接触的部分，图案的形状被转印到第二部分，树脂固化。还提供了用于图案形成的装置的实施例。

26. 发明授权

US08407628B2 Photomask manufacturing method and semiconductor device manufacturing method 有权
公开(公告)号：US08407628B2
公开(公告)日：2013-03-26
申请号：US12770062
申请日：2010-04-29
申请人： Masamitsu Itoh , Takashi Hirano , Kazuya Fukuhara
发明人： Masamitsu Itoh , Takashi Hirano , Kazuya Fukuhara
IPC分类号： G06F17/50 , G03F1/00
CPC分类号： G06F17/5081 , G03F1/50
摘要： This invention discloses a photomask manufacturing method. A pattern dimensional map is generated by preparing a photomask in which a mask pattern is formed on a transparent substrate, and measuring a mask in-plane distribution of the pattern dimensions. A transmittance correction coefficient map is generated by dividing a pattern formation region into a plurality of subregions, and determining a transmittance correction coefficient for each of the plurality of subregions. The transmittance correction value of each subregion is calculated on the basis of the pattern dimensional map and the transmittance correction coefficient map. The transmittance of the transparent substrate corresponding to each subregion is changed on the basis of the transmittance correction value.

27. 发明申请

US20120328992A1 SEMICONDUCTOR DEVICE MANUFACTURING METHOD 有权
标题翻译：半导体器件制造方法
公开(公告)号：US20120328992A1
公开(公告)日：2012-12-27
申请号：US13606834
申请日：2012-09-07
申请人： Kazuya Fukuhara , Takaki Hashimoto , Kazuyuki Masukawa , Yasunobu Kai
发明人： Kazuya Fukuhara , Takaki Hashimoto , Kazuyuki Masukawa , Yasunobu Kai
IPC分类号： G03F7/20
CPC分类号： G03F1/00 , G03F1/36 , G03F7/70433
摘要： A semiconductor device manufacturing method includes applying illumination light to a photomask, and projecting diffracted light components from the photomask via a projection optical system to form a photoresist pattern on a substrate. The photomask includes a plurality of opening patterns which are arranged on each of a plurality of parallel lines at regular second intervals in a second direction and which have regular first intervals in a first direction perpendicular to the second direction. The plurality of opening patterns arranged on the adjacent ones of the plurality of parallel lines are displaced from each other half the second interval in the second direction. Moreover, the dimensions of the plurality of opening patterns and the complex amplitude transmittance of nontransparent region in the photomask are set so that three of the diffracted light components passing through the pupil of the projection optical system have equal amplitude.
摘要翻译：一种半导体器件制造方法，包括将照明光施加到光掩模，以及经由投影光学系统从光掩模投射衍射光成分，以在基板上形成光刻胶图案。光掩模包括多个开口图案，其以在第二方向上的规则的第二间隔布置在多条平行线中的每一条上，并且在垂直于第二方向的第一方向上具有规则的第一间隔。布置在多条平行线上相邻的多个平行线上的多个开口图案在第二方向上相互偏移第二间隔的一半。此外，设置多个开口图案的尺寸和光掩模中的非透明区域的复振幅透射率，使得穿过投影光学系统的光瞳的三个衍射光分量具有相等的幅度。

28. 发明授权

US08294889B2 Method for inspecting nano-imprint template 有权
标题翻译：检测纳米印迹模板的方法
公开(公告)号：US08294889B2
公开(公告)日：2012-10-23
申请号：US12776003
申请日：2010-05-07
申请人： Hiroyuki Kashiwagi , Kazuya Fukuhara
发明人： Hiroyuki Kashiwagi , Kazuya Fukuhara
IPC分类号： G01N21/01
CPC分类号： G01N21/956 , B82Y20/00 , G01N2021/4707 , G01N2021/95615
摘要： A method for inspecting a nano-imprint template, includes irradiating light onto a template for nano-imprinting from a back surface side of the template, the template having a front surface where a pattern is formed, detecting near-field light which is generated near the front surface of the template by the irradiation of the light, and performing an inspection of the template on the basis of the detected near-field light.
摘要翻译：一种用于检查纳米压印模板的方法，包括将光从模板的背面侧照射到用于纳米压印的模板上，模板具有形成图案的正面，检测近场产生的近场光通过照射光的模板的前表面，并且基于检测到的近场光执行模板的检查。

29. 发明申请

US20110101544A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME 有权
标题翻译：半导体器件及其制造方法
公开(公告)号：US20110101544A1
公开(公告)日：2011-05-05
申请号：US12913332
申请日：2010-10-27
申请人： Kazuya FUKUHARA , Kiyonori Yoshitomi , Takehiko Ikegami , Yujiro Kawasoe
发明人： Kazuya FUKUHARA , Kiyonori Yoshitomi , Takehiko Ikegami , Yujiro Kawasoe
IPC分类号： H01L23/498 , H01L21/60
CPC分类号： H01L23/49575 , H01L21/56 , H01L23/3107 , H01L23/4952 , H01L23/49541 , H01L24/05 , H01L24/06 , H01L24/45 , H01L24/48 , H01L24/49 , H01L24/78 , H01L24/85 , H01L2224/04042 , H01L2224/05553 , H01L2224/05554 , H01L2224/05556 , H01L2224/05647 , H01L2224/32245 , H01L2224/45015 , H01L2224/45144 , H01L2224/45147 , H01L2224/48091 , H01L2224/48095 , H01L2224/48247 , H01L2224/48257 , H01L2224/48465 , H01L2224/48647 , H01L2224/48847 , H01L2224/4903 , H01L2224/49051 , H01L2224/49113 , H01L2224/49171 , H01L2224/49179 , H01L2224/73265 , H01L2224/78301 , H01L2224/85148 , H01L2224/85181 , H01L2224/85345 , H01L2224/92247 , H01L2924/00011 , H01L2924/00014 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01029 , H01L2924/01033 , H01L2924/01047 , H01L2924/01079 , H01L2924/01082 , H01L2924/14 , H01L2924/181 , H01L2924/20752 , H01L2924/20753 , H01L2924/00 , H01L2924/00012 , H01L2224/43
摘要： A semiconductor device permitting the reduction of cost is disclosed. In a semiconductor package wherein electrode pads of a semiconductor chip and corresponding inner leads are electrically coupled with each other through a plurality of bonding wires, sensing wires (second and fourth bonding wires) are made thinner than other bonding wires (first and third bonding wires) coupled to inner leads same as those with the sensing wires coupled thereto, thereby reducing the cost of gold wires to attain the reduction in cost of the semiconductor package.
摘要翻译：公开了允许降低成本的半导体器件。在半导体封装中，半导体芯片的电极焊盘和对应的内部引线通过多根接合线彼此电耦合，使感测线（第二和第四接合线）比其它接合线（第一和第三接合线）耦合到与将感测线耦合到其上的内引线相同的内引线，从而降低金线的成本以实现半导体封装的成本降低。

30. 发明授权

US07925090B2 Method of determining photo mask, method of manufacturing semiconductor device, and computer program product 失效
标题翻译：确定光掩模的方法，制造半导体器件的方法以及计算机程序产品
公开(公告)号：US07925090B2
公开(公告)日：2011-04-12
申请号：US11601797
申请日：2006-11-20
申请人： Toshiya Kotani , Kazuya Fukuhara , Kyoko Izuha
发明人： Toshiya Kotani , Kazuya Fukuhara , Kyoko Izuha
IPC分类号： G06K9/34
CPC分类号： G03F7/70441
摘要： A method of determining a photo mask, includes specifying a mask pattern for a photo mask for a first exposure apparatus, specifying a plurality of exposure conditions allowed to be set for a second exposure apparatus, predicting a projection image of the mask pattern to be projected on a substrate by the second exposure apparatus, for each of the exposure conditions, predicting a processed pattern to be formed on a substrate surface on the basis of the projection image, for each of the exposure conditions, determining whether or not the processed pattern meets a predetermined condition for each of the exposure conditions, and determining that the photo mask is applicable to the second exposure apparatus if the processed pattern meets the predetermined condition for at least one of the exposure conditions.
摘要翻译：一种确定光掩模的方法包括：为第一曝光装置指定用于光掩模的掩模图案，指定允许为第二曝光装置设置的多个曝光条件，预测要投影的掩模图案的投影图像在第二曝光装置的基板上，对于每个曝光条件，对于每个曝光条件，基于投影图像预测要在基板表面上形成的处理图案，确定处理图案是否满足对于每个曝光条件的预定条件，并且如果处理的图案满足至少一个曝光条件的预定条件，则确定光掩模适用于第二曝光装置。

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