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    • 29. 发明授权
    • Thin film transistor
    • 薄膜晶体管
    • US08344373B2
    • 2013-01-01
    • US12891704
    • 2010-09-27
    • Ayumu SatoHideya KumomiRyo HayashiTomohiro Watanabe
    • Ayumu SatoHideya KumomiRyo HayashiTomohiro Watanabe
    • H01L29/786H01L21/84
    • H01L29/7869
    • To achieve, in an oxide semiconductor thin layer transistor, both the stability of threshold voltage against electric stress and suppression of variation in the threshold voltage in a transfer characteristic. A thin film transistor includes an oxide semiconductor layer and a gate insulating layer disposed so as to be in contact with the oxide semiconductor layer, wherein the oxide semiconductor layer contains hydrogen atoms and includes at least two regions that function as active layers of the oxide semiconductor and have different average hydrogen concentrations in the layer thickness direction; and when the regions functioning as the active layers of the oxide semiconductor are sequentially defined as, from the side of the gate insulating layer, a first region and a second region, the average hydrogen concentration of the first region is lower than the average hydrogen concentration of the second region.
    • 为了在氧化物半导体薄层晶体管中实现阈值电压对电应力的稳定性和抑制传输特性中阈值电压变化的两者。 薄膜晶体管包括氧化物半导体层和设置成与氧化物半导体层接触的栅极绝缘层,其中氧化物半导体层包含氢原子,并且包括至少两个用作氧化物半导体的有源层的区域 并且在层厚度方向上具有不同的平均氢浓度; 并且当用作氧化物半导体的有源层的区域依次定义为从栅极绝缘层的侧面开始第一区域和第二区域时,第一区域的平均氢浓度低于平均氢浓度 的第二个地区。