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    • 22. 发明授权
    • Gravure roll edge masking system for in-line film coating
    • 用于直线涂膜的凹版辊边缘遮蔽系统
    • US09539605B2
    • 2017-01-10
    • US13407365
    • 2012-02-28
    • Jeffrey S. L'HeureuxJoshua R. CloutierWill E. Nunn
    • Jeffrey S. L'HeureuxJoshua R. CloutierWill E. Nunn
    • B05C1/08B41F9/10D06B1/14B05B15/04
    • B05C1/0839B05B12/20B05C1/08B05C1/0813B05C1/0826B41F9/10D06B1/143
    • Methods and apparatuses for masking the edges of a substrate when performing direct or reverse gravure coating using a kiss-coat configuration, particularly useful for in-line coating of biaxially oriented polymeric films. The methods and apparatuses include a masking plate configured to prevent the edge of a portion of a substrate from contacting a gravure roll, the masking plate includes a top portion having a Rockwell B hardness equal to or greater than 80, and a thickness of between 0.03125 inches and 0.375 inches. This masking plate prevents build-up of coating on the edges of the substrate which otherwise can cause film orientation production instabilities such as film breaks, sticking to tenter clips, and/or edge trim recycling incompatibilities. The masking plate provides a masking method that is effective and durable, minimizing production downtime and maintenance.
    • 当使用亲吻涂层构造进行直接或反向凹版涂布时,掩蔽基材的边缘的方法和装置,特别适用于双轴取向聚合物薄膜的在线涂布。 所述方法和装置包括:掩模板,被配置为防止基板的一部分的边缘与凹版辊接触,所述掩模板包括具有等于或大于80的洛氏硬度的硬度,并且厚度在0.03125 英寸和0.375英寸。 该掩模板防止涂层在基材的边缘上积聚,否则可能导致膜定向生产不稳定性,例如膜断裂,粘附到拉幅机夹子和/或边缘修整回收不兼容性。 掩模板提供有效和耐用的掩蔽方法,最大限度地减少生产停机时间和维护。