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21. 发明授权

US10537977B2 Carbon dioxide compression and delivery system 有权
公开(公告)号：US10537977B2
公开(公告)日：2020-01-21
申请号：US15532439
申请日：2017-02-01
申请人： SAES PURE GAS, INC.
发明人： Charles H Applegarth , Matthew S Browning
IPC分类号： B24C1/00 , B24C3/32 , F17C7/04
摘要： The present invention is embodied in a carbon dioxide compression and delivery device that uses a plurality of reversible thermoelectric devices and to a method to operate such carbon dioxide compression and delivery device.

22. 发明授权

US09169118B1 Hydrogen gas separator system having a micro-channel construction with a tubular wire insert for retaining catalyst material 有权
标题翻译：具有微通道结构的氢气分离器系统，其具有用于保持催化剂材料的管状焊丝插入件
公开(公告)号：US09169118B1
公开(公告)日：2015-10-27
申请号：US13101113
申请日：2011-05-04
申请人： Peter R. Bossard
发明人： Peter R. Bossard
IPC分类号： B01J19/18 , B01D63/06 , C01B3/00 , B01J8/00
CPC分类号： C01B3/00 , B01D53/229 , B01D53/8687 , B01D53/869 , B01D63/06 , B01D63/062 , B01D63/065 , B01D69/10 , B01D71/022 , B01D2255/102 , B01D2255/20738 , B01D2255/20761 , B01D2255/20784 , B01D2255/20792 , B01D2256/16 , B01D2257/702 , B01D2257/80 , B01D2313/42 , B01J8/009 , B01J19/0093 , B01J19/1812 , B01J2219/00797 , B01J2219/00801 , B01J2219/00822 , B01J2219/00835 , B01J2219/0086 , B01J2219/00869 , B01J2219/00907 , C01B3/505 , C01B2203/0405 , C01B2203/10 , C01B2203/1005
摘要： A hydrogen purification method that is used to separate hydrogen gas from a source gas. A hydrogen separator is provided that has at least one hydrogen permeable tube. A support tube is provided for each hydrogen permeable tube. A support tube is coaxially aligned with the hydrogen permeable tube, wherein a micro-channel exists between the hydrogen permeable tube and the support tube in an area of overlap. A tubular wire structure is placed within the micro-channel. The tubular wire structure is coated with catalyst material. The source gas is introduced into the micro-channel. The source gas spreads thinly past the tubular wire structure in the micro-channel. The restrictions of the micro-channel cause the source gas to embody turbulent flow characteristics as it flows. The turbulent flow causes the hydrogen separator to separate hydrogen from the source gas in a highly efficient manner.
摘要翻译：用于从源气体分离氢气的氢气净化方法。提供了一种氢分离器，其具有至少一个氢可渗透管。为每个氢可渗透管提供支撑管。支撑管与氢可渗透管同轴对准，其中微通道在重叠区域内存在于氢可渗透管和支撑管之间。管状线结构放置在微通道内。管状线结构涂覆有催化剂材料。源气体被引入微通道。源气体通过微通道中的管状线结构薄薄地扩散。微通道的限制导致源气体在流动时体现湍流特性。湍流导致氢气分离器以高效的方式从源气体中分离出氢气。

23. 发明授权

US09039814B2 System and method for welding a plurality of small diameter palladium alloy tubes to a common base plate in a space efficient manner 有权
标题翻译：以空间有效的方式将多个小直径钯合金管焊接到共用基板的系统和方法
公开(公告)号：US09039814B2
公开(公告)日：2015-05-26
申请号：US13865451
申请日：2013-04-18
申请人： SAES PURE GAS, INC.
发明人： Peter R. Bossard
IPC分类号： B01D53/22 , B01D71/02 , B01D69/04 , B01D63/06 , B01D65/00 , F28F9/18 , F28F21/08
CPC分类号： B01D71/022 , B01D63/061 , B01D65/003 , B01D69/04 , F28F9/185 , F28F21/082 , F28F2275/067
摘要： The tube assemblies are joined together into a matrix by a plate. The plate has a first surface, an opposite second surface and a plurality of holes. Each hole has a countersunk region that descends into the plate from the first surface. Tube assemblies are provided. Each tube assembly has a first end, an opposite second end, and a flare structure. The flare structure is sized to be fully received within the countersunk region. The tube assemblies extend through the holes in the plate. The flare structure of each tube assembly is welded to the plate within the countersunk region of each hole through which each tube assembly passes.
摘要翻译：管组件通过板连接在一起成矩阵。板具有第一表面，相对的第二表面和多个孔。每个孔具有从第一表面下降到板中的埋头区域。提供管组件。每个管组件具有第一端，相对的第二端和火炬结构。火炬结构的尺寸被设计成完全接收在埋头区域内。管组件延伸通过板中的孔。每个管组件的火炬结构焊接到每个管组件通过的每个孔的埋头区域内的板。

24. 发明授权

US5993165A In Situ getter pump system and method 失效
标题翻译：原位吸气泵系统及方法
公开(公告)号：US5993165A
公开(公告)日：1999-11-30
申请号：US810619
申请日：1997-02-28
申请人： D'arcy H. Lorimer , Gordon P. Krueger
发明人： D'arcy H. Lorimer , Gordon P. Krueger
IPC分类号： C23C14/54 , C23C14/56 , F04B37/02 , F04B37/08 , F04B37/16 , H01L21/02 , H01L21/20
CPC分类号： C23C14/564 , C23C14/54 , C23C14/56 , F04B37/02 , F04B37/08
摘要： A wafer processing system including a processing chamber, a low pressure pump coupled to the processing chamber for pumping noble and non-noble gases, a valve mechanism coupling a source of noble gas to the processing chamber, an in situ getter pump disposed within the processing chamber which pumps certain non-noble gases during the flow of the noble gas into the chamber, and a processing mechanism for processing a wafer disposed within the processing chamber. Preferably, the in situ getter pump can be operated at a number of different temperatures to preferentially pump different species of gas at those temperatures. A gas analyzer is used to automatically control the temperature of the getter pump to control the species of gasses that are pumped from the chamber. A method for processing a wafer of the present invention includes the steps of placing a wafer within a processing chamber and sealing the chamber, flowing a noble gas into the chamber while simultaneously pumping the chamber with an external low pressure pump and with an in situ getter pump disposed within the chamber which pumps non-noble gases, and processing the wafer within the chamber while the noble gas continues to flow. The method also preferably includes the steps of monitoring the composition of the gas within the chamber and controlling the temperature of the getter material based upon the analysis of the composition.
摘要翻译：一种晶片处理系统，包括处理室，耦合到处理室的用于泵送贵重和非惰性气体的低压泵，将惰性气体源连接到处理室的阀机构，设置在处理中的原位吸气泵在惰性气体流入室期间泵送某些非惰性气体的腔室，以及用于处理设置在处理室内的晶片的处理机构。优选地，原位吸气泵可以在多个不同温度下操作，以在这些温度下优先泵送不同种类的气体。气体分析仪用于自动控制吸气泵的温度，以控制从腔室泵送的气体种类。本发明的晶片处理方法包括以下步骤：将晶片放置在处理室内并密封该腔室，将惰性气体流入腔室，同时用外部低压泵泵送腔室，并使用原位吸气剂设置在室内的泵，其泵送非惰性气体，并且在惰性气体继续流动的同时处理室内的晶片。该方法还优选包括以下步骤：基于组合物的分析来监测室内气体的组成并控制吸气剂材料的温度。

25. 发明授权

US5879134A In situ getter pump system and method 失效
标题翻译：原位吸气泵系统及方法
公开(公告)号：US5879134A
公开(公告)日：1999-03-09
申请号：US807957
申请日：1997-02-28
申请人： D'Arcy H. Lorimer , Gordon P. Krueger
发明人： D'Arcy H. Lorimer , Gordon P. Krueger
IPC分类号： C23C14/54 , C23C14/56 , F04B37/02 , F04B37/08 , F04B37/16 , H01L21/02 , H01L21/20
CPC分类号： C23C14/564 , C23C14/54 , C23C14/56 , F04B37/02 , F04B37/08
摘要： A wafer processing system including a processing chamber, a low pressure pump coupled to the processing chamber for pumping noble and non-noble gases, a valve mechanism coupling a source of noble gas to the processing chamber, an in situ getter pump disposed within the processing chamber which pumps certain non-noble gases during the flow of the noble gas into the chamber, and a processing mechanism for processing a wafer disposed within the processing chamber. Preferably, the in situ getter pump can be operated at a number of different temperatures to preferentially pump different species of gas at those temperatures. A gas analyzer is used to automatically control the temperature of the getter pump to control the species of gasses that are pumped from the chamber. A method for processing a wafer of the present invention includes the steps of placing a wafer within a processing chamber and sealing the chamber, flowing a noble gas into the chamber while simultaneously pumping the chamber with an external low pressure pump and with an in situ getter pump disposed within the chamber which pumps non-noble gases, and processing the wafer within the chamber while the noble gas continues to flow. The method also preferably includes the steps of monitoring the composition of the gas within the chamber and controlling the temperature of the getter material based upon the analysis of the composition.
摘要翻译：一种晶片处理系统，包括处理室，耦合到处理室的用于泵送贵重和非惰性气体的低压泵，将惰性气体源连接到处理室的阀机构，设置在处理中的原位吸气泵在惰性气体流入室期间泵送某些非惰性气体的腔室，以及用于处理设置在处理室内的晶片的处理机构。优选地，原位吸气泵可以在多个不同温度下操作，以在这些温度下优先泵送不同种类的气体。气体分析仪用于自动控制吸气泵的温度，以控制从腔室泵送的气体种类。本发明的晶片处理方法包括以下步骤：将晶片放置在处理室内并密封该腔室，将惰性气体流入腔室，同时用外部低压泵泵送腔室，并使用原位吸气剂设置在室内的泵，其泵送非惰性气体，并且在惰性气体继续流动的同时处理室内的晶片。该方法还优选包括以下步骤：基于组合物的分析来监测室内气体的组成并控制吸气剂材料的温度。

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