会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 13. 发明申请
    • ONIUM SALT, PHOTOACID GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, AND METHOD FOR PRODUCING DEVICE
    • 盐酸盐,光致发生剂,感光性树脂组合物及其制造方法
    • US20170075219A1
    • 2017-03-16
    • US15310733
    • 2015-05-13
    • TOYO GOSEI CO., LTD.
    • Takashi Miyazawa
    • G03F7/004C07C309/06G03F7/32G03F7/038G03F7/16G03F7/20C07C381/12G03F7/039
    • G03F7/0045C07C309/06C07C381/12G03F7/0382G03F7/0392G03F7/0397G03F7/162G03F7/168G03F7/2004G03F7/327
    • An onium salt represented by formula (a). Z-A-W—Y+(R)n X− (a) (In formula (a), Z, A, W, Y, (R)n, and X have the following meanings: Z represents a monovalent organic group having a ring structure provided with a conjugated π electron system, which may have one or more substituent groups; W represents a divalent organic group having a ring structure provided with a conjugated π electron system, which may have one or more substituent groups; A represents a divalent linking group containing a direct coupling of one or more bonds selected from a group consisting of a carbon-carbon single bond, a carbon-carbon double bond, and a carbon-carbon triple bond (any Z and/or W substituent group may form a ring structure in which one or more atoms included in Z and/or W are saturated or partially saturated together with A); Y is an iodine or sulfur atom, n=1 when Y is an iodine atom, and n=2 when Y is a sulfur atom; (R)n may be identical to or different from one another, and each (R)n is a monovalent organic group having a carbon number of 1 or more, which may have a substituent group; and X is a monovalent anion.)
    • 由式(a)表示的鎓盐。 ZAW-Y +(X)-X-(a)(式(a)中,Z,A,W,Y,(R)n和X具有下列含义:Z表示具有环结构的一价有机基团 具有共轭π电子体系,其可以具有一个或多个取代基; W表示具有带有共轭π电子体系的环结构的二价有机基团,其可以具有一个或多个取代基; A表示含二价连接基团 选自由碳 - 碳单键,碳 - 碳双键和碳 - 碳三键组成的组中的一种或多种键的任意直接键合(任何Z和/或W取代基可以形成环结构 包含在Z和/或W中的一个或多个原子与A)一起饱和或部分饱和; Y是碘或硫原子,当Y是碘原子时,n = 1,当Y是硫原子时n = 2 ;(R)n可以彼此相同或不同,并且每个(R)n是具有碳数的一价有机基团 1以上,可以具有取代基; X是一价阴离子)
    • 15. 发明申请
    • COMPOSITION FOR FORMING LIQUID CRYSTAL LAYER, LIQUID CRYSTAL DISPLAY DEVICE, AND METHOD FOR PRODUCING LIQUID CRYSTAL DISPLAY DEVICE
    • US20130135570A1
    • 2013-05-30
    • US13814025
    • 2011-07-27
    • Masanobu MizusakiSatoshi EnomotoYuki Hara
    • Masanobu MizusakiSatoshi EnomotoYuki Hara
    • G02F1/1337
    • G02F1/133711C08F20/20C08F22/105C09K19/32C09K2019/0448G02F1/133723G02F2202/023
    • The present invention provides a composition for forming a liquid crystal layer from which a liquid crystal display device hardly generating image sticking can be obtained. The composition for forming a liquid crystal layer according to the present invention contains a liquid crystal material and one or two or more monomers, wherein at least one of the monomers is a phenanthrene derivative represented by the following chemical formula (1): the following chemical formula (2): or the following chemical formula (3): wherein R1 and R2 are identical or different, and each denote an -Sp-P group, a hydrogen atom, a halogen atom, a —CN group, a —NO2 group, a —NCO group, a —NCS group, an —OCN group, a —SCN group, a —SF5 group, or a straight-chain or branched-chain alkyl group having 1 to 12 carbon atoms; at least one of R1 and R2 denotes an -Sp-P group; P denotes a polymerizable group; Sp denotes a straight-chain, branched-chain or cyclic alkylene group or alkyleneoxy group having 1 to 6 carbon atoms, or a direct bond of both groups interposing Sp; a hydrogen atom which R1 and R2 have may be replaced by a fluorine atom or a chlorine atom; and a —CH2— group which R1 and R2 have, unless oxygen atoms, sulfur atoms and nitrogen atoms are mutually adjacent, may be substituted with an —O— group, a —S— group, a —NH— group, a —CO— group, a —COO— group, a —OCO— group, an —O—COO— group, a —OCH2— group, a —CH2O— group, a —SCH2— group, a —CH2S— group, a —N(CH3)— group, a —N(C2H5)— group, a —N(C3H7)— group, a —N(C4H5)— group, a —CF2O— group, a —OCF2— group, a —CF2S— group, a —SCF2— group, a —N(CF3)— group, a —CH2CH2— group, a —CF2CH2— group, a —CH2CF2— group, a —CF2CF2— group, a —CH═CH— group, a —CF═CF— group, a —C≡C— group, a —CH═CH—COO— group, or a —OCO—CH═CH— group.
    • 18. 发明申请
    • Sulfonium salts
    • 锍盐
    • US20070219368A1
    • 2007-09-20
    • US11724221
    • 2007-03-15
    • Jun IwabuchiYosuke Osawa
    • Jun IwabuchiYosuke Osawa
    • C07D285/00C07C319/00
    • C07C381/12C07D285/16
    • The present invention provides a sulfonium salt which can serve as a photo-acid-generator, the sulfonium salt not raising the problem of poor compatibility to a photoresist polymer having an acid-dissociable group. The sulfonium salt is represented by formula (1): wherein R1 represents a linear or branched C2 to C9 divalent hydrocarbon group; each of R2 to R5 represents a hydrogen atom or a linear or branched C1 to C3 hydrocarbon group; each of R6 and R7 represents an organic group; R6 and R7 may be linked together to form a divalent organic group; and X− represents an anion.
    • 本发明提供可用作光酸产生剂的锍盐,锍盐不会引起与具有酸解离性基团的光致抗蚀剂聚合物的相容性差。 锍盐由式(1)表示:其中R 1表示直链或支链C 2至C 9二价烃基; R 2至R 5中的每一个表示氢原子或直链或支链C 1至C 3烃基; R 6和R 7中的每一个表示有机基团; R 6和R 7可以连接在一起形成二价有机基团; 而X - > - 表示阴离子。